FR2759491B1 - Cathode froide a emission de champ et son procede de fabrication - Google Patents
Cathode froide a emission de champ et son procede de fabricationInfo
- Publication number
- FR2759491B1 FR2759491B1 FR9801480A FR9801480A FR2759491B1 FR 2759491 B1 FR2759491 B1 FR 2759491B1 FR 9801480 A FR9801480 A FR 9801480A FR 9801480 A FR9801480 A FR 9801480A FR 2759491 B1 FR2759491 B1 FR 2759491B1
- Authority
- FR
- France
- Prior art keywords
- manufacturing
- field emission
- emission cathode
- cold field
- cold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/304—Field-emissive cathodes
- H01J1/3042—Field-emissive cathodes microengineered, e.g. Spindt-type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/30—Cold cathodes
- H01J2201/319—Circuit elements associated with the emitters by direct integration
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2676797A JP3080021B2 (ja) | 1997-02-10 | 1997-02-10 | 電界放出型冷陰極およびその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2759491A1 FR2759491A1 (fr) | 1998-08-14 |
FR2759491B1 true FR2759491B1 (fr) | 1999-06-25 |
Family
ID=12202451
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9801480A Expired - Fee Related FR2759491B1 (fr) | 1997-02-10 | 1998-02-09 | Cathode froide a emission de champ et son procede de fabrication |
Country Status (4)
Country | Link |
---|---|
US (1) | US5910701A (fr) |
JP (1) | JP3080021B2 (fr) |
KR (1) | KR19980071203A (fr) |
FR (1) | FR2759491B1 (fr) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100262144B1 (ko) * | 1997-07-02 | 2000-07-15 | 하제준 | 일체화된 mosfet로 조절되는 fea 및 그 제조방법 |
US6168491B1 (en) | 1998-03-23 | 2001-01-02 | The United States Of America As Represented By The Secretary Of The Navy | Method of forming field emitter cell and array with vertical thin-film-edge emitter |
US6084245A (en) * | 1998-03-23 | 2000-07-04 | The United States Of America As Represented By The Secretary Of The Navy | Field emitter cell and array with vertical thin-film-edge emitter |
US6936484B2 (en) * | 1998-10-16 | 2005-08-30 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Method of manufacturing semiconductor device and semiconductor device |
JP3139476B2 (ja) * | 1998-11-06 | 2001-02-26 | 日本電気株式会社 | 電界放出型冷陰極 |
US6366266B1 (en) * | 1999-09-02 | 2002-04-02 | Micron Technology, Inc. | Method and apparatus for programmable field emission display |
US6333598B1 (en) | 2000-01-07 | 2001-12-25 | The United States Of America As Represented By The Secretary Of The Navy | Low gate current field emitter cell and array with vertical thin-film-edge emitter |
US6683414B2 (en) * | 2001-10-25 | 2004-01-27 | Northrop Grumman Corporation | Ion-shielded focusing method for high-density electron beams generated by planar cold cathode electron emitters |
KR100441751B1 (ko) * | 2001-12-28 | 2004-07-27 | 한국전자통신연구원 | 전계 방출 소자의 제조 방법 |
KR20080034348A (ko) * | 2006-10-16 | 2008-04-21 | 삼성에스디아이 주식회사 | 전자 방출 디바이스 |
JP6124502B2 (ja) * | 2012-02-29 | 2017-05-10 | キヤノン株式会社 | 固体撮像装置およびその製造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2650119A1 (fr) * | 1989-07-21 | 1991-01-25 | Thomson Tubes Electroniques | Dispositif de regulation de courant individuel de pointe dans un reseau plan de microcathodes a effet de champ, et procede de realisation |
US5371431A (en) * | 1992-03-04 | 1994-12-06 | Mcnc | Vertical microelectronic field emission devices including elongate vertical pillars having resistive bottom portions |
JP3142388B2 (ja) * | 1992-09-16 | 2001-03-07 | 富士通株式会社 | 陰極装置 |
US5584739A (en) * | 1993-02-10 | 1996-12-17 | Futaba Denshi Kogyo K.K | Field emission element and process for manufacturing same |
JP2861755B2 (ja) * | 1993-10-28 | 1999-02-24 | 日本電気株式会社 | 電界放出型陰極装置 |
JP3296398B2 (ja) * | 1995-09-07 | 2002-06-24 | 株式会社東芝 | 電界放出型冷陰極装置およびその製造方法 |
JP3080004B2 (ja) * | 1996-06-21 | 2000-08-21 | 日本電気株式会社 | 電界放出型冷陰極およびその製造方法 |
-
1997
- 1997-02-10 JP JP2676797A patent/JP3080021B2/ja not_active Expired - Fee Related
-
1998
- 1998-02-05 US US09/019,469 patent/US5910701A/en not_active Expired - Fee Related
- 1998-02-09 KR KR1019980003735A patent/KR19980071203A/ko not_active Application Discontinuation
- 1998-02-09 FR FR9801480A patent/FR2759491B1/fr not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5910701A (en) | 1999-06-08 |
FR2759491A1 (fr) | 1998-08-14 |
JPH10223127A (ja) | 1998-08-21 |
JP3080021B2 (ja) | 2000-08-21 |
KR19980071203A (ko) | 1998-10-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |
Effective date: 20071030 |