FR2738984B1 - Procede et dispositif de mesure d'un flux d'ions dans un plasma - Google Patents
Procede et dispositif de mesure d'un flux d'ions dans un plasmaInfo
- Publication number
- FR2738984B1 FR2738984B1 FR9511181A FR9511181A FR2738984B1 FR 2738984 B1 FR2738984 B1 FR 2738984B1 FR 9511181 A FR9511181 A FR 9511181A FR 9511181 A FR9511181 A FR 9511181A FR 2738984 B1 FR2738984 B1 FR 2738984B1
- Authority
- FR
- France
- Prior art keywords
- plasma
- measuring
- ion flow
- ion
- flow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
- H05H1/0081—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature by electric means
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9511181A FR2738984B1 (fr) | 1995-09-19 | 1995-09-19 | Procede et dispositif de mesure d'un flux d'ions dans un plasma |
PCT/FR1996/001451 WO1997011587A1 (fr) | 1995-09-19 | 1996-09-18 | Procede et dispositif de mesure d'un flux d'ions dans un plasma |
JP51243797A JP3937453B2 (ja) | 1995-09-19 | 1996-09-18 | プラズマ中のイオン流の測定方法及び装置 |
US08/836,036 US5936413A (en) | 1995-09-19 | 1996-09-18 | Method and device for measuring an ion flow in a plasma |
DE69605643T DE69605643T2 (de) | 1995-09-19 | 1996-09-18 | Verfahren und vorrichtung zur messung eines zonenflusses in einem plasma |
EP96931869A EP0792571B1 (fr) | 1995-09-19 | 1996-09-18 | Procede et dispositif de mesure d'un flux d'ions dans un plasma |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9511181A FR2738984B1 (fr) | 1995-09-19 | 1995-09-19 | Procede et dispositif de mesure d'un flux d'ions dans un plasma |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2738984A1 FR2738984A1 (fr) | 1997-03-21 |
FR2738984B1 true FR2738984B1 (fr) | 1997-11-21 |
Family
ID=9482863
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9511181A Expired - Lifetime FR2738984B1 (fr) | 1995-09-19 | 1995-09-19 | Procede et dispositif de mesure d'un flux d'ions dans un plasma |
Country Status (6)
Country | Link |
---|---|
US (1) | US5936413A (fr) |
EP (1) | EP0792571B1 (fr) |
JP (1) | JP3937453B2 (fr) |
DE (1) | DE69605643T2 (fr) |
FR (1) | FR2738984B1 (fr) |
WO (1) | WO1997011587A1 (fr) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6326794B1 (en) * | 1999-01-14 | 2001-12-04 | International Business Machines Corporation | Method and apparatus for in-situ monitoring of ion energy distribution for endpoint detection via capacitance measurement |
US6646386B1 (en) | 1999-07-20 | 2003-11-11 | Tokyo Electron Limited | Stabilized oscillator circuit for plasma density measurement |
US6741944B1 (en) * | 1999-07-20 | 2004-05-25 | Tokyo Electron Limited | Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma |
TW484015B (en) * | 1999-07-21 | 2002-04-21 | Tokyo Electron Ltd | Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma |
US6861844B1 (en) | 1999-07-21 | 2005-03-01 | Tokyo Electron Limited | Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma |
JP2001203097A (ja) * | 2000-01-17 | 2001-07-27 | Canon Inc | プラズマ密度計測装置および方法並びにこれを利用したプラズマ処理装置および方法 |
JP4633881B2 (ja) * | 2000-02-21 | 2011-02-16 | 株式会社日立製作所 | プラズマ処理装置及びそれを用いた処理方法 |
US6653852B1 (en) | 2000-03-31 | 2003-11-25 | Lam Research Corporation | Wafer integrated plasma probe assembly array |
JP3670206B2 (ja) * | 2000-11-06 | 2005-07-13 | アルプス電気株式会社 | プラズマ処理装置又はプラズマ処理システムの性能評価方法、保守方法、性能管理システム、及び性能確認システム、並びにプラズマ処理装置 |
JP4455887B2 (ja) * | 2002-03-28 | 2010-04-21 | 東京エレクトロン株式会社 | 電気的特性を利用して、プラズマ反応炉内の膜の状態を判断するシステムおよび方法 |
JP3773189B2 (ja) * | 2002-04-24 | 2006-05-10 | 独立行政法人科学技術振興機構 | 窓型プローブ、プラズマ監視装置、及び、プラズマ処理装置 |
US6894474B2 (en) | 2002-06-07 | 2005-05-17 | Applied Materials, Inc. | Non-intrusive plasma probe |
US6972582B2 (en) * | 2003-02-10 | 2005-12-06 | Solid State Measurements, Inc. | Apparatus and method for measuring semiconductor wafer electrical properties |
US6902646B2 (en) * | 2003-08-14 | 2005-06-07 | Advanced Energy Industries, Inc. | Sensor array for measuring plasma characteristics in plasma processing environments |
US20050284570A1 (en) * | 2004-06-24 | 2005-12-29 | Doran Daniel B | Diagnostic plasma measurement device having patterned sensors and features |
US20060043063A1 (en) * | 2004-09-02 | 2006-03-02 | Mahoney Leonard J | Electrically floating diagnostic plasma probe with ion property sensors |
US7578301B2 (en) | 2005-03-28 | 2009-08-25 | Lam Research Corporation | Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system |
US7319316B2 (en) | 2005-06-29 | 2008-01-15 | Lam Research Corporation | Apparatus for measuring a set of electrical characteristics in a plasma |
US7479207B2 (en) | 2006-03-15 | 2009-01-20 | Lam Research Corporation | Adjustable height PIF probe |
DE102006014106B3 (de) * | 2006-03-24 | 2007-08-30 | RUHR-UNIVERSITäT BOCHUM | Vorrichtung und Verfahren zur Messung der Dichte eines Plasmas |
US7413672B1 (en) * | 2006-04-04 | 2008-08-19 | Lam Research Corporation | Controlling plasma processing using parameters derived through the use of a planar ion flux probing arrangement |
US7829468B2 (en) * | 2006-06-07 | 2010-11-09 | Lam Research Corporation | Method and apparatus to detect fault conditions of plasma processing reactor |
EP2114112B1 (fr) * | 2008-04-29 | 2015-09-23 | Plasmetrex GmbH | Appareil pour procédés industriels au plasma |
US8849585B2 (en) * | 2008-06-26 | 2014-09-30 | Lam Research Corporation | Methods for automatically characterizing a plasma |
CN102084475B (zh) * | 2008-07-07 | 2013-01-30 | 朗姆研究公司 | 用于等离子体处理室中的包括真空间隙的面向等离子体的探针装置 |
CN102714167B (zh) * | 2008-07-07 | 2015-04-22 | 朗姆研究公司 | 用于检测等离子处理室内的原位电弧放电事件的被动电容耦合静电(cce)探针装置 |
TWI458850B (zh) * | 2008-07-07 | 2014-11-01 | Lam Res Corp | 用來鑑定電漿處理腔室中之薄膜之特性的射頻偏壓電容耦合靜電探針裝置 |
KR20110039239A (ko) * | 2008-07-07 | 2011-04-15 | 램 리써치 코포레이션 | 플라즈마 처리 챔버에서의 스트라이크 단계를 검출하기 위한 용량 결합형 정전 (cce) 프로브 장치 및 그 방법 |
JP5734185B2 (ja) | 2008-07-07 | 2015-06-17 | ラム リサーチ コーポレーションLam Research Corporation | プラズマ処理チャンバ内のプラズマ不安定性事象を検出するための構成、及び、プラズマ不安定性事象を検出する方法 |
CN102084474B (zh) * | 2008-07-07 | 2012-11-14 | 朗姆研究公司 | 在等离子体处理室中检测去夹紧的电容耦合静电(cce)探针装置及其方法 |
IES20090733A2 (en) * | 2009-09-22 | 2011-03-30 | Donal O'sullivan | Sensor for measuring plasma parameters |
US20120197570A1 (en) * | 2011-01-27 | 2012-08-02 | Mehran Ramezani | Measurement of Parameters Within an Integrated Circuit Chip Using a Nano-Probe |
US20120283973A1 (en) | 2011-05-05 | 2012-11-08 | Imec | Plasma probe and method for plasma diagnostics |
US9404183B2 (en) | 2012-06-08 | 2016-08-02 | Novellus Systems, Inc. | Diagnostic and control systems and methods for substrate processing systems using DC self-bias voltage |
CN102928701A (zh) * | 2012-10-24 | 2013-02-13 | 上海市电力公司 | 用于直流输电下离子流场分布特性测量的测量*** |
KR101999720B1 (ko) * | 2012-11-20 | 2019-07-16 | 삼성디스플레이 주식회사 | 기판 정전기 검사 장치 및 기판 제조 방법 |
TWI635197B (zh) * | 2013-06-10 | 2018-09-11 | 諾發系統有限公司 | 用於使用直流自偏壓之基板處理系統的診斷及控制系統與方法 |
DE102013110722A1 (de) * | 2013-09-27 | 2015-04-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Plasma-ionengestütztes Beschichtungsverfahren und Plasmasonde |
WO2016177740A1 (fr) | 2015-05-04 | 2016-11-10 | ECOLE POLYTECHNIQUE FéDéRALE DE LAUSANNE | Procédé et dispositif pour déterminer des caractéristiques de plasma |
US11867643B2 (en) | 2019-01-31 | 2024-01-09 | Korea Research Institute Of Standards And Science | Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis apparatus in which planar-type plasma diagnosis apparatus is buried, and electrostatic chuck in which planar-type plasma diagnosis apparatus is buried |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2696584A (en) * | 1948-06-02 | 1954-12-07 | Kurt S Lion | Electric circuit |
US4006404A (en) * | 1976-01-30 | 1977-02-01 | The United States Of America As Represented By The Secretary Of The Navy | Pulsed plasma probe |
US4336532A (en) * | 1980-05-22 | 1982-06-22 | Radiation Engineering Inc. | Integrated nuclear radiation detector and monitor |
JPS60126832A (ja) * | 1983-12-14 | 1985-07-06 | Hitachi Ltd | ドライエツチング方法および装置 |
SU1733975A1 (ru) * | 1988-05-18 | 1992-05-15 | Научно-производственное объединение им.С.А.Лавочкина | Способ определени электронной температуры плазмы тлеющего разр да |
US5339039A (en) * | 1992-09-29 | 1994-08-16 | Arizona Board Of Regents On Behalf Of The University Of Arizona | Langmuir probe system for radio frequency excited plasma processing system |
US5467013A (en) * | 1993-12-07 | 1995-11-14 | Sematech, Inc. | Radio frequency monitor for semiconductor process control |
-
1995
- 1995-09-19 FR FR9511181A patent/FR2738984B1/fr not_active Expired - Lifetime
-
1996
- 1996-09-18 US US08/836,036 patent/US5936413A/en not_active Expired - Lifetime
- 1996-09-18 EP EP96931869A patent/EP0792571B1/fr not_active Expired - Lifetime
- 1996-09-18 DE DE69605643T patent/DE69605643T2/de not_active Expired - Lifetime
- 1996-09-18 WO PCT/FR1996/001451 patent/WO1997011587A1/fr active IP Right Grant
- 1996-09-18 JP JP51243797A patent/JP3937453B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69605643T2 (de) | 2000-04-06 |
JP3937453B2 (ja) | 2007-06-27 |
EP0792571A1 (fr) | 1997-09-03 |
DE69605643D1 (de) | 2000-01-20 |
JPH10509557A (ja) | 1998-09-14 |
US5936413A (en) | 1999-08-10 |
WO1997011587A1 (fr) | 1997-03-27 |
FR2738984A1 (fr) | 1997-03-21 |
EP0792571B1 (fr) | 1999-12-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2738984B1 (fr) | Procede et dispositif de mesure d'un flux d'ions dans un plasma | |
FR2740641B1 (fr) | Procede et circuit de determination d'un intervalle de quantification dans un codeur d'image | |
FR2740598B1 (fr) | Dispositif d'affichage et procede d'excitation de celui-ci | |
AU6168194A (en) | Method and apparatus for sensing flow in two directions and automatic calibration thereof | |
HK1004419A1 (en) | Method and apparatus for fault detection and correction in coriolis effect mass flowmeters | |
FR2752180B1 (fr) | Procede et dispositif de soudage a pilotage du faisceau de soudage | |
GB2277154B (en) | Method and apparatus for detecting particles in a flow | |
FR2733852B1 (fr) | Procede et circuit de commande de dispositif d'affichage | |
FR2736979B1 (fr) | Dispositif et procede detecteur dynamometrique pour roulements et paliers | |
FR2741955B1 (fr) | Procede et dispositif de mesure d'attitude de satellite | |
FR2754922B1 (fr) | Procede et dispositif de controle d'appareils de positionnement | |
FR2696007B1 (fr) | Dispositif pour la mesure d'ions dans un gaz. | |
GB2300484B (en) | Method and device for measurement value detection | |
FR2743148B1 (fr) | Dispositif et procede de controle de tubes par courants de foucault | |
FR2752935B1 (fr) | Procede de mesure d'un volume conducteur et dispositif de mise en oeuvre de ce procede | |
FR2739927B1 (fr) | Procede et dispositif de verification et/ou de controle d'appareils indicateurs ou enregistreurs de distance | |
FR2780778B3 (fr) | Procede et dispositif pour la mesure de l'epaisseur d'un materiau transparent | |
SG68089A1 (en) | Method and system for measuring particles in a liquid | |
AU7466894A (en) | Method and apparatus for measuring mass flow | |
FR2730571B1 (fr) | Procede et dispositif de mesure de la distribution de la mobilite d'elements particulaires dans un milieu | |
AU7148196A (en) | Method and apparatus for measuring particle size at low concentration | |
ZA941632B (en) | Method for operating an axle counting system and device for carrying out the method | |
FR2737022B1 (fr) | Procede et dispositif de traitement d'un film photographique | |
DE69515167T2 (de) | Feldeffekt tonungs-verfahren/vorrichtung | |
FR2562261B3 (fr) | Procede et dispositif de mesure d'un champ magnetique |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
CL | Concession to grant licences |