FR2575187B1 - Composition et procede pour le depot non-electrolytique de cuivre sur un substrat avec son procede de regarnissage, et substrat ainsi obtenu - Google Patents
Composition et procede pour le depot non-electrolytique de cuivre sur un substrat avec son procede de regarnissage, et substrat ainsi obtenuInfo
- Publication number
- FR2575187B1 FR2575187B1 FR858518963A FR8518963A FR2575187B1 FR 2575187 B1 FR2575187 B1 FR 2575187B1 FR 858518963 A FR858518963 A FR 858518963A FR 8518963 A FR8518963 A FR 8518963A FR 2575187 B1 FR2575187 B1 FR 2575187B1
- Authority
- FR
- France
- Prior art keywords
- substrate
- copper
- composition
- electrolytic deposition
- surfacing method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/9335—Product by special process
- Y10S428/936—Chemical deposition, e.g. electroless plating
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Electrolytic Production Of Metals (AREA)
- Sealing Material Composition (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB848432395A GB8432395D0 (en) | 1984-12-21 | 1984-12-21 | Copper plating |
GB848432400A GB8432400D0 (en) | 1984-12-21 | 1984-12-21 | Copper plating |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2575187A1 FR2575187A1 (fr) | 1986-06-27 |
FR2575187B1 true FR2575187B1 (fr) | 1989-04-28 |
Family
ID=26288606
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR858518963A Expired FR2575187B1 (fr) | 1984-12-21 | 1985-12-20 | Composition et procede pour le depot non-electrolytique de cuivre sur un substrat avec son procede de regarnissage, et substrat ainsi obtenu |
Country Status (14)
Country | Link |
---|---|
US (1) | US4617205A (fr) |
JP (1) | JPS61183474A (fr) |
AU (1) | AU559526B2 (fr) |
BR (1) | BR8506459A (fr) |
CA (1) | CA1255975A (fr) |
CH (1) | CH671037A5 (fr) |
DE (1) | DE3544932C2 (fr) |
ES (1) | ES8701853A1 (fr) |
FR (1) | FR2575187B1 (fr) |
GB (1) | GB2169924B (fr) |
HK (1) | HK22090A (fr) |
IT (1) | IT1182104B (fr) |
NL (1) | NL8503530A (fr) |
SE (1) | SE460483B (fr) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2595319B2 (ja) * | 1988-07-20 | 1997-04-02 | 日本電装株式会社 | 化学銅めっき液及びそれを用いた銅めっき皮膜の形成方法 |
US4877450A (en) * | 1989-02-23 | 1989-10-31 | Learonal, Inc. | Formaldehyde-free electroless copper plating solutions |
US5104688A (en) * | 1990-06-04 | 1992-04-14 | Macdermid, Incorporated | Pretreatment composition and process for tin-lead immersion plating |
JPH0650135Y2 (ja) * | 1991-01-29 | 1994-12-21 | 三京ダイヤモンド工業株式会社 | ダイヤモンドブレード |
DE4111559C1 (en) * | 1991-04-05 | 1992-04-30 | Schering Ag Berlin Und Bergkamen, 1000 Berlin, De | Currentless bath for chemical deposition of copper@ (alloy) - contains polyethyleneimine deriv. and is formaldehyde-free |
WO1992017624A1 (fr) * | 1991-04-05 | 1992-10-15 | Schering Aktiengesellschaft | Bain exempt de formaldehyde pour depot sans courant de cuivre, procede et utilisation d'imines de polyethylene dans des bains exempts de formaldehyde |
EP1054081B1 (fr) * | 1993-03-18 | 2006-02-01 | ATOTECH Deutschland GmbH | Bain de revêtement par immersion sans formaldéhyde, auto-accélérant et auto-rajeunissant, méthode et composition |
US5419926A (en) * | 1993-11-22 | 1995-05-30 | Lilly London, Inc. | Ammonia-free deposition of copper by disproportionation |
US6042889A (en) * | 1994-02-28 | 2000-03-28 | International Business Machines Corporation | Method for electrolessly depositing a metal onto a substrate using mediator ions |
US5900186A (en) * | 1995-12-19 | 1999-05-04 | Morton International, Inc. | Composition and method for reducing copper oxide to metallic copper |
US5721014A (en) * | 1995-12-19 | 1998-02-24 | Surface Tek Specialty Products, Inc. | Composition and method for reducing copper oxide to metallic copper |
US5753309A (en) * | 1995-12-19 | 1998-05-19 | Surface Tek Specialty Products, Inc. | Composition and method for reducing copper oxide to metallic copper |
JP3208410B2 (ja) | 1997-04-07 | 2001-09-10 | 奥野製薬工業株式会社 | 非導電性プラスチック成形品への電気めっき方法 |
JP3444276B2 (ja) * | 2000-06-19 | 2003-09-08 | 株式会社村田製作所 | 無電解銅めっき浴、無電解銅めっき方法および電子部品 |
JP4482744B2 (ja) | 2001-02-23 | 2010-06-16 | 株式会社日立製作所 | 無電解銅めっき液、無電解銅めっき方法、配線板の製造方法 |
JP4595237B2 (ja) * | 2001-04-27 | 2010-12-08 | 日立金属株式会社 | 銅めっき液および銅めっき方法 |
JP2003147541A (ja) * | 2001-11-15 | 2003-05-21 | Hitachi Ltd | 無電解銅めっき液、無電解銅めっき用補給液及び配線板の製造方法 |
US6897152B2 (en) * | 2003-02-05 | 2005-05-24 | Enthone Inc. | Copper bath composition for electroless and/or electrolytic filling of vias and trenches for integrated circuit fabrication |
TWI348499B (en) * | 2006-07-07 | 2011-09-11 | Rohm & Haas Elect Mat | Electroless copper and redox couples |
US20080241401A1 (en) * | 2007-03-28 | 2008-10-02 | Hok-Kin Choi | Method of monitoring electroless plating chemistry |
US20080248194A1 (en) * | 2007-04-04 | 2008-10-09 | L'air Liquide - Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Method for producing a copper layer on a substrate in a flat panel display manufacturing process |
TWI504787B (zh) * | 2011-03-01 | 2015-10-21 | Grand Plastic Technology Co Ltd | 高深寬比通孔無電鍍銅沉積方法及配方 |
JP6180419B2 (ja) * | 2011-10-05 | 2017-08-16 | アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング | ホルムアルデヒドのない無電解銅めっき溶液 |
US9153449B2 (en) * | 2012-03-19 | 2015-10-06 | Lam Research Corporation | Electroless gap fill |
US20160273112A1 (en) * | 2013-03-27 | 2016-09-22 | Atotech Deutschland Gmbh | Electroless copper plating solution |
EP2784181B1 (fr) * | 2013-03-27 | 2015-12-09 | ATOTECH Deutschland GmbH | Solution de dépôt de cuivre chimique |
ES2684353T3 (es) * | 2013-09-25 | 2018-10-02 | Atotech Deutschland Gmbh | Método para depositar una capa de siembra de cobre sobre una capa de barrera y baño de cobreado |
US9951433B2 (en) * | 2014-01-27 | 2018-04-24 | Okuno Chemical Industries Co., Ltd. | Conductive film-forming bath |
US9869026B2 (en) | 2014-07-15 | 2018-01-16 | Rohm And Haas Electronic Materials Llc | Electroless copper plating compositions |
US20160145745A1 (en) * | 2014-11-24 | 2016-05-26 | Rohm And Haas Electronic Materials Llc | Formaldehyde-free electroless metal plating compositions and methods |
EP3034650B1 (fr) | 2014-12-16 | 2017-06-21 | ATOTECH Deutschland GmbH | Compositions de bain de placage pour un dépôt autocatalytique de métaux et d'alliages métalliques |
EP3035122B1 (fr) | 2014-12-16 | 2019-03-20 | ATOTECH Deutschland GmbH | Procédé de fabrication de lignes fines |
TWI680206B (zh) | 2015-03-20 | 2019-12-21 | 德商德國艾托特克公司 | 矽基材之活化方法 |
EP3452635B1 (fr) | 2016-05-04 | 2020-02-26 | ATOTECH Deutschland GmbH | Procédé de dépôt d'un métal ou d'alliage métallique sur une surface d'un substrat comprenant son activation |
EP3578683B1 (fr) | 2018-06-08 | 2021-02-24 | ATOTECH Deutschland GmbH | Bain de placage de cuivre ou d'alliage de cuivre autocatalytique et procédé de galvanoplastie |
CN111621773B (zh) * | 2020-05-27 | 2022-08-16 | 广东东硕科技有限公司 | 二硫代氨基甲酸类化合物在化学镀钯中的应用以及化学镀钯组合物 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3607317A (en) * | 1969-02-04 | 1971-09-21 | Photocircuits Corp | Ductility promoter and stabilizer for electroless copper plating baths |
US4171225A (en) * | 1976-01-23 | 1979-10-16 | U.S. Philips Corporation | Electroless copper plating solutions |
US4209331A (en) * | 1978-05-25 | 1980-06-24 | Macdermid Incorporated | Electroless copper composition solution using a hypophosphite reducing agent |
-
1985
- 1985-12-17 US US06/809,979 patent/US4617205A/en not_active Expired - Lifetime
- 1985-12-19 DE DE3544932A patent/DE3544932C2/de not_active Expired
- 1985-12-19 CA CA000498113A patent/CA1255975A/fr not_active Expired
- 1985-12-20 GB GB08531356A patent/GB2169924B/en not_active Expired
- 1985-12-20 FR FR858518963A patent/FR2575187B1/fr not_active Expired
- 1985-12-20 SE SE8506078A patent/SE460483B/xx not_active IP Right Cessation
- 1985-12-20 NL NL8503530A patent/NL8503530A/nl not_active Application Discontinuation
- 1985-12-20 ES ES550306A patent/ES8701853A1/es not_active Expired
- 1985-12-20 IT IT48967/85A patent/IT1182104B/it active
- 1985-12-20 AU AU51554/85A patent/AU559526B2/en not_active Ceased
- 1985-12-21 JP JP60289106A patent/JPS61183474A/ja active Granted
- 1985-12-23 BR BR8506459A patent/BR8506459A/pt unknown
-
1986
- 1986-01-27 CH CH308/86A patent/CH671037A5/de not_active IP Right Cessation
-
1990
- 1990-03-22 HK HK220/90A patent/HK22090A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
AU5155485A (en) | 1986-06-26 |
ES8701853A1 (es) | 1986-12-01 |
SE460483B (sv) | 1989-10-16 |
JPH0224910B2 (fr) | 1990-05-31 |
SE8506078L (sv) | 1986-06-22 |
US4617205A (en) | 1986-10-14 |
IT1182104B (it) | 1987-09-30 |
GB2169924A (en) | 1986-07-23 |
DE3544932C2 (de) | 1987-04-09 |
ES550306A0 (es) | 1986-12-01 |
CH671037A5 (fr) | 1989-07-31 |
DE3544932A1 (de) | 1986-07-03 |
IT8548967A0 (it) | 1985-12-20 |
FR2575187A1 (fr) | 1986-06-27 |
GB8531356D0 (en) | 1986-02-05 |
HK22090A (en) | 1990-03-30 |
BR8506459A (pt) | 1986-09-02 |
SE8506078D0 (sv) | 1985-12-20 |
AU559526B2 (en) | 1987-03-12 |
JPS61183474A (ja) | 1986-08-16 |
CA1255975A (fr) | 1989-06-20 |
GB2169924B (en) | 1988-07-13 |
NL8503530A (nl) | 1986-07-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |