FR2562094B1 - Dispositif de fixation de substrats, en particulier dans des equipements de depot par evaporation sous vide - Google Patents

Dispositif de fixation de substrats, en particulier dans des equipements de depot par evaporation sous vide

Info

Publication number
FR2562094B1
FR2562094B1 FR8504564A FR8504564A FR2562094B1 FR 2562094 B1 FR2562094 B1 FR 2562094B1 FR 8504564 A FR8504564 A FR 8504564A FR 8504564 A FR8504564 A FR 8504564A FR 2562094 B1 FR2562094 B1 FR 2562094B1
Authority
FR
France
Prior art keywords
vacuum evaporation
deposit equipment
fixing substrates
evaporation deposit
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8504564A
Other languages
English (en)
Other versions
FR2562094A1 (fr
Inventor
Peter Mahler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers und Leybold Deutschland Holding AG
Original Assignee
Leybold Heraeus GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus GmbH filed Critical Leybold Heraeus GmbH
Publication of FR2562094A1 publication Critical patent/FR2562094A1/fr
Application granted granted Critical
Publication of FR2562094B1 publication Critical patent/FR2562094B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR8504564A 1984-03-27 1985-03-27 Dispositif de fixation de substrats, en particulier dans des equipements de depot par evaporation sous vide Expired FR2562094B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3411208A DE3411208C2 (de) 1984-03-27 1984-03-27 Haltevorrichtung für Substrate, insbesondere in Vakuum-Beschichtungsanlagen

Publications (2)

Publication Number Publication Date
FR2562094A1 FR2562094A1 (fr) 1985-10-04
FR2562094B1 true FR2562094B1 (fr) 1988-08-05

Family

ID=6231725

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8504564A Expired FR2562094B1 (fr) 1984-03-27 1985-03-27 Dispositif de fixation de substrats, en particulier dans des equipements de depot par evaporation sous vide

Country Status (5)

Country Link
US (1) US4589369A (fr)
JP (1) JPS616274A (fr)
DE (1) DE3411208C2 (fr)
FR (1) FR2562094B1 (fr)
GB (1) GB2156861B (fr)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55156262A (en) * 1979-05-25 1980-12-05 Nissan Motor Co Ltd Ignition lead angle controller
JPS5677557A (en) * 1979-11-30 1981-06-25 Hitachi Ltd Ignition device
US4595481A (en) * 1984-08-21 1986-06-17 Komag, Inc. Disk carrier
DE3606152A1 (de) * 1986-02-26 1987-08-27 Basf Ag Halterung fuer substratplatten auf traegerplatten
JPS63127972U (fr) * 1987-02-16 1988-08-22
JPH0198165U (fr) * 1987-12-18 1989-06-30
US4944860A (en) * 1988-11-04 1990-07-31 Eaton Corporation Platen assembly for a vacuum processing system
US5042423A (en) * 1988-12-20 1991-08-27 Texas Instruments Incorporated Semiconductor wafer carrier design
US5074736A (en) * 1988-12-20 1991-12-24 Texas Instruments Incorporated Semiconductor wafer carrier design
US5169453A (en) * 1989-03-20 1992-12-08 Toyoko Kagaku Co., Ltd. Wafer supporting jig and a decompressed gas phase growth method using such a jig
US4880518A (en) * 1989-03-27 1989-11-14 Intelmatec Corporation Disk carrier
US5089110A (en) * 1990-07-30 1992-02-18 Komag, Incorporated Data storage disk and plug
CA2076701C (fr) * 1991-08-26 1997-12-23 Sunghee Yoon Panneaux favorisant la circulation par cuivrage au bain chaud d'assemblages complexes
US5244555A (en) * 1991-11-27 1993-09-14 Komag, Inc. Floating pocket memory disk carrier, memory disk and method
JP3433760B2 (ja) * 1993-05-14 2003-08-04 ソニー株式会社 光ディスクの保護膜機
JP4059549B2 (ja) * 1997-09-20 2008-03-12 キヤノンアネルバ株式会社 基板支持装置
DE10146542B4 (de) 2001-09-21 2005-03-03 Dieter Henrich Handhabung von Gegenständen, wie Linsen
JP2005215216A (ja) * 2004-01-28 2005-08-11 Kyocera Kinseki Corp 光学用部品の基板の蒸着ジグ
EP1866465A2 (fr) * 2005-01-18 2007-12-19 ASM America, Inc. Systeme de reaction destine a creer une couche mince
JP2020505513A (ja) * 2017-01-23 2020-02-20 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 基板のためのホルダ
US10872804B2 (en) 2017-11-03 2020-12-22 Asm Ip Holding B.V. Apparatus and methods for isolating a reaction chamber from a loading chamber resulting in reduced contamination
US10872803B2 (en) 2017-11-03 2020-12-22 Asm Ip Holding B.V. Apparatus and methods for isolating a reaction chamber from a loading chamber resulting in reduced contamination

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4247781A (en) * 1979-06-29 1981-01-27 International Business Machines Corporation Cooled target disc for high current ion implantation method and apparatus
CH652754A5 (de) * 1981-03-13 1985-11-29 Balzers Hochvakuum Anordnung zum beschichten von substraten in einer vakuumbeschichtungsanlage.

Also Published As

Publication number Publication date
GB8506702D0 (en) 1985-04-17
GB2156861A (en) 1985-10-16
DE3411208C2 (de) 1987-01-29
FR2562094A1 (fr) 1985-10-04
GB2156861B (en) 1987-10-14
JPS616274A (ja) 1986-01-11
DE3411208A1 (de) 1985-10-10
US4589369A (en) 1986-05-20
JPH033744B2 (fr) 1991-01-21

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Legal Events

Date Code Title Description
ST Notification of lapse