FR2453423A1 - Element optique epais a courbure variable - Google Patents
Element optique epais a courbure variableInfo
- Publication number
- FR2453423A1 FR2453423A1 FR7908451A FR7908451A FR2453423A1 FR 2453423 A1 FR2453423 A1 FR 2453423A1 FR 7908451 A FR7908451 A FR 7908451A FR 7908451 A FR7908451 A FR 7908451A FR 2453423 A1 FR2453423 A1 FR 2453423A1
- Authority
- FR
- France
- Prior art keywords
- bimetal
- optical element
- variable curvature
- thick optical
- supply electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Abstract
Elément optique à courbure variable comprenant un premier bilame dont un des constituants au moins est réalisé en matière piézo-électrique et des électrodes d'alimentation dudit bilame, caractérisé en ce qu'il comporte en outre au moins un bilame piézo-électrique de renforcement 10 pourvu d'électrodes d'alimentation 15, 16 connectées respectivement à celles 6, 7 du premier bilame et dont un élément placé contre un élément correspondant du premier bilame est fixé à celui-ci par l'intermédiaire d'une couche 14 de matière élastique présentant une faible résistance à la traction par rapport à celle des éléments constituant les bilames de matière piézo-électrique.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7908451A FR2453423A1 (fr) | 1979-04-04 | 1979-04-04 | Element optique epais a courbure variable |
US06/136,266 US4298247A (en) | 1979-04-04 | 1980-04-01 | Thick optical element having a variable curvature |
DE19803012830 DE3012830A1 (de) | 1979-04-04 | 1980-04-02 | Optisches element mit variabler kruemmung |
JP4340380A JPS55135802A (en) | 1979-04-04 | 1980-04-02 | Thick optical element having variable curvature |
GB8011077A GB2046936B (en) | 1979-04-04 | 1980-04-02 | Thick optical element having a variable curvature |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7908451A FR2453423A1 (fr) | 1979-04-04 | 1979-04-04 | Element optique epais a courbure variable |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2453423A1 true FR2453423A1 (fr) | 1980-10-31 |
FR2453423B1 FR2453423B1 (fr) | 1982-02-19 |
Family
ID=9223933
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7908451A Granted FR2453423A1 (fr) | 1979-04-04 | 1979-04-04 | Element optique epais a courbure variable |
Country Status (5)
Country | Link |
---|---|
US (1) | US4298247A (fr) |
JP (1) | JPS55135802A (fr) |
DE (1) | DE3012830A1 (fr) |
FR (1) | FR2453423A1 (fr) |
GB (1) | GB2046936B (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0033070A2 (fr) * | 1980-01-25 | 1981-08-05 | International Business Machines Corporation | Elément actif de guide d'onde |
FR2496380A1 (fr) * | 1980-12-15 | 1982-06-18 | Thomson Csf | Dispositif piezoresistif a commande electrique |
Families Citing this family (54)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58181033A (ja) * | 1982-04-16 | 1983-10-22 | Canon Inc | 照射角可変電子閃光装置 |
JPS5932182A (ja) * | 1982-08-16 | 1984-02-21 | Sumitomo Special Metals Co Ltd | バイモルフ用圧電素子 |
US4588268A (en) * | 1984-03-12 | 1986-05-13 | Itek Corporation | Tip-tilt mirror actuation system having simplified driver circuitry |
US4657358A (en) * | 1985-08-23 | 1987-04-14 | Itek Corporation | Cooled deformable mirror |
JPH0739252Y2 (ja) * | 1986-12-10 | 1995-09-06 | 株式会社トーキン | 圧電アクチュエータ |
DE3711466A1 (de) * | 1987-04-04 | 1988-10-27 | Zeiss Carl Fa | Vorrichtung zur verbindung von koerpern |
US4885055A (en) * | 1987-08-21 | 1989-12-05 | Brigham Young University | Layered devices having surface curvature and method of constructing same |
JPH01120502A (ja) * | 1987-11-05 | 1989-05-12 | Sanyo Electric Co Ltd | 焦点調整装置 |
JPH03205074A (ja) * | 1990-01-08 | 1991-09-06 | Ebara Corp | ゲレンデの勾配調整機構 |
US5274492A (en) * | 1992-07-02 | 1993-12-28 | Mahmoud Razzaghi | Light spot size and shape control for laser projector |
EP0599154A1 (fr) * | 1992-11-20 | 1994-06-01 | Ascom Tech Ag | Modulateur pour un faisceau de lumière |
US5455709A (en) * | 1993-03-23 | 1995-10-03 | Martin Marietta Corporation | Total internal reflection spatial light modulation apparatus and method of fabrication thereof |
JPH0772318A (ja) * | 1993-04-28 | 1995-03-17 | Canon Inc | 反射装置とこれを用いた照明装置や露光装置、並びにデバイス製造方法 |
RU2068191C1 (ru) * | 1996-02-12 | 1996-10-20 | Йелстаун Корпорейшн Н.В. | Многослойное пьезоэлектрическое деформируемое биморфное зеркало |
RU2069883C1 (ru) * | 1996-03-19 | 1996-11-27 | Йелстаун Корпорейшн Н.В. | Мозаичное адаптивное биморфное зеркало |
RU2099754C1 (ru) * | 1996-10-17 | 1997-12-20 | Йелстаун Корпорейшн Н.В. | Деформируемое зеркало на основе многослойной активной биморфной структуры |
DE19816018A1 (de) * | 1998-04-09 | 1999-10-14 | Volkswagen Ag | Anzeigeeinrichtung in Kraftfahrzeugen zur digitalen oder analogen Anzeige von betriebsbezogenen Daten |
US6067183A (en) * | 1998-12-09 | 2000-05-23 | Eastman Kodak Company | Light modulator with specific electrode configurations |
US6357910B1 (en) * | 1999-08-04 | 2002-03-19 | Photosonic, Inc. | Multiwavelength pyrometer for measurement in hostile environments |
US7015624B1 (en) | 1999-10-22 | 2006-03-21 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Non-uniform thickness electroactive device |
US6874897B2 (en) * | 2000-01-27 | 2005-04-05 | Aoptix Technologies, Inc. | Deformable curvature mirror with unipolar-wiring |
US6464364B2 (en) * | 2000-01-27 | 2002-10-15 | Aoptix Technologies, Inc. | Deformable curvature mirror |
US6392257B1 (en) | 2000-02-10 | 2002-05-21 | Motorola Inc. | Semiconductor structure, semiconductor device, communicating device, integrated circuit, and process for fabricating the same |
KR20030011083A (ko) | 2000-05-31 | 2003-02-06 | 모토로라 인코포레이티드 | 반도체 디바이스 및 이를 제조하기 위한 방법 |
AU2001277001A1 (en) | 2000-07-24 | 2002-02-05 | Motorola, Inc. | Heterojunction tunneling diodes and process for fabricating same |
US20020096683A1 (en) | 2001-01-19 | 2002-07-25 | Motorola, Inc. | Structure and method for fabricating GaN devices utilizing the formation of a compliant substrate |
WO2002082551A1 (fr) | 2001-04-02 | 2002-10-17 | Motorola, Inc. | Structure de semi-conducteur a courant de fuite attenue |
US20020158245A1 (en) * | 2001-04-26 | 2002-10-31 | Motorola, Inc. | Structure and method for fabricating semiconductor structures and devices utilizing binary metal oxide layers |
US6721510B2 (en) * | 2001-06-26 | 2004-04-13 | Aoptix Technologies, Inc. | Atmospheric optical data transmission system |
US6992321B2 (en) | 2001-07-13 | 2006-01-31 | Motorola, Inc. | Structure and method for fabricating semiconductor structures and devices utilizing piezoelectric materials |
US7019332B2 (en) * | 2001-07-20 | 2006-03-28 | Freescale Semiconductor, Inc. | Fabrication of a wavelength locker within a semiconductor structure |
US6855992B2 (en) | 2001-07-24 | 2005-02-15 | Motorola Inc. | Structure and method for fabricating configurable transistor devices utilizing the formation of a compliant substrate for materials used to form the same |
US20030034491A1 (en) | 2001-08-14 | 2003-02-20 | Motorola, Inc. | Structure and method for fabricating semiconductor structures and devices for detecting an object |
DE10150424B4 (de) * | 2001-10-11 | 2004-07-29 | Siemens Ag | Reflexionssystem und Verwendung des Reflexionssystems |
US20030071327A1 (en) | 2001-10-17 | 2003-04-17 | Motorola, Inc. | Method and apparatus utilizing monocrystalline insulator |
US6916717B2 (en) | 2002-05-03 | 2005-07-12 | Motorola, Inc. | Method for growing a monocrystalline oxide layer and for fabricating a semiconductor device on a monocrystalline substrate |
US20040079285A1 (en) * | 2002-10-24 | 2004-04-29 | Motorola, Inc. | Automation of oxide material growth in molecular beam epitaxy systems |
US7169619B2 (en) | 2002-11-19 | 2007-01-30 | Freescale Semiconductor, Inc. | Method for fabricating semiconductor structures on vicinal substrates using a low temperature, low pressure, alkaline earth metal-rich process |
US6885065B2 (en) * | 2002-11-20 | 2005-04-26 | Freescale Semiconductor, Inc. | Ferromagnetic semiconductor structure and method for forming the same |
US6963090B2 (en) * | 2003-01-09 | 2005-11-08 | Freescale Semiconductor, Inc. | Enhancement mode metal-oxide-semiconductor field effect transistor |
US7286766B2 (en) * | 2003-01-16 | 2007-10-23 | Aoptix Technologies, Inc. | Free space optical communication system with power level management |
US7020374B2 (en) | 2003-02-03 | 2006-03-28 | Freescale Semiconductor, Inc. | Optical waveguide structure and method for fabricating the same |
US6965128B2 (en) | 2003-02-03 | 2005-11-15 | Freescale Semiconductor, Inc. | Structure and method for fabricating semiconductor microresonator devices |
US20060018045A1 (en) * | 2003-10-23 | 2006-01-26 | Carl Zeiss Smt Ag | Mirror arrangement and method of manufacturing thereof, optical system and lithographic method of manufacturing a miniaturized device |
FR2866122B1 (fr) * | 2004-02-06 | 2006-05-19 | Europ De Systemes Optiques Soc | Miroir bimorphe. |
FR2875607B1 (fr) * | 2004-09-20 | 2006-11-24 | Cit Alcatel | Miroir a deformation locale par variation d'epaisseur d'un materiau electro-actif controlee par effet electrique |
DE102010028111B4 (de) | 2010-04-22 | 2016-01-21 | Technische Universität Dresden | Mikromechanisches Element |
DE102011084117A1 (de) | 2011-10-07 | 2013-04-11 | Carl Zeiss Smt Gmbh | Reflektives optisches Element für den EUV-Wellenlängenbereich, Verfahren zur Erzeugung und zur Korrektur eines solchen Elements, Projektionsobjektiv für die Mikrolithographie mit einem solchen Element und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv |
US20130301113A1 (en) * | 2012-04-17 | 2013-11-14 | California Institute Of Technology | Deformable mirrors and methods of making the same |
JP6612439B2 (ja) * | 2015-09-23 | 2019-11-27 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 圧電装置を備える光学結像装置 |
DE102018211596A1 (de) | 2018-07-12 | 2020-01-16 | Carl Zeiss Smt Gmbh | Verfahren zur Herstellung eines reflektierenden optischen Elementes einer Projektionsbelichtungsanlage und reflektierendes optisches Element für eine Projektionsbelichtungsanlage, Projektionsobjektiv und Projektionsbelichtungsanlage |
DE102020203750A1 (de) | 2020-03-24 | 2021-09-30 | Carl Zeiss Smt Gmbh | Vorrichtung zur Erfassung einer Temperatur, Anlage zur Herstellung eines optischen Elementes und Verfahren zur Herstellung eines optischen Elementes |
DE102022200976A1 (de) | 2022-01-31 | 2023-01-05 | Carl Zeiss Smt Gmbh | Kalibrierkörper und Verfahren zur Kalibrierung |
DE102022210037A1 (de) | 2022-09-23 | 2024-03-28 | Carl Zeiss Smt Gmbh | Anordnung zum Tempern mindestens eines Teilbereichs eines optischen Elementes |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3758199A (en) * | 1971-11-22 | 1973-09-11 | Sperry Rand Corp | Piezoelectrically actuated light deflector |
FR2389145A1 (fr) * | 1977-04-27 | 1978-11-24 | Quantel Sa | Miroir a focale variable |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4289379A (en) * | 1977-04-27 | 1981-09-15 | Quantel S.A. | Optical system having a variable focal length |
-
1979
- 1979-04-04 FR FR7908451A patent/FR2453423A1/fr active Granted
-
1980
- 1980-04-01 US US06/136,266 patent/US4298247A/en not_active Expired - Lifetime
- 1980-04-02 DE DE19803012830 patent/DE3012830A1/de active Granted
- 1980-04-02 JP JP4340380A patent/JPS55135802A/ja active Granted
- 1980-04-02 GB GB8011077A patent/GB2046936B/en not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3758199A (en) * | 1971-11-22 | 1973-09-11 | Sperry Rand Corp | Piezoelectrically actuated light deflector |
FR2389145A1 (fr) * | 1977-04-27 | 1978-11-24 | Quantel Sa | Miroir a focale variable |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0033070A2 (fr) * | 1980-01-25 | 1981-08-05 | International Business Machines Corporation | Elément actif de guide d'onde |
EP0033070A3 (en) * | 1980-01-25 | 1982-07-28 | International Business Machines Corporation | Active waveguide element |
FR2496380A1 (fr) * | 1980-12-15 | 1982-06-18 | Thomson Csf | Dispositif piezoresistif a commande electrique |
Also Published As
Publication number | Publication date |
---|---|
JPS55135802A (en) | 1980-10-23 |
DE3012830C2 (fr) | 1991-01-31 |
FR2453423B1 (fr) | 1982-02-19 |
GB2046936B (en) | 1983-05-18 |
GB2046936A (en) | 1980-11-19 |
JPS6239721B2 (fr) | 1987-08-25 |
DE3012830A1 (de) | 1980-10-16 |
US4298247A (en) | 1981-11-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |