FR2445512A1 - Position detecting system for image forming appts. - includes two part photodiode providing two signals with difference proportional to position error - Google Patents

Position detecting system for image forming appts. - includes two part photodiode providing two signals with difference proportional to position error

Info

Publication number
FR2445512A1
FR2445512A1 FR7836485A FR7836485A FR2445512A1 FR 2445512 A1 FR2445512 A1 FR 2445512A1 FR 7836485 A FR7836485 A FR 7836485A FR 7836485 A FR7836485 A FR 7836485A FR 2445512 A1 FR2445512 A1 FR 2445512A1
Authority
FR
France
Prior art keywords
image forming
signals
position error
detecting system
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7836485A
Other languages
French (fr)
Other versions
FR2445512B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7836485A priority Critical patent/FR2445512A1/en
Publication of FR2445512A1 publication Critical patent/FR2445512A1/en
Application granted granted Critical
Publication of FR2445512B1 publication Critical patent/FR2445512B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

The position detector uses an optical system in order to detect the exact relative positions of the components of an image forming system. The image forming system includes a photo-sensitive surface on which an image is formed in the mfr. of electronic components. The detector may include a triangular reflecting prism (40) having a beam of light directed at one of its corners. The light is focussed by a lens (L3). The beam is split (41, 42) at the prism corner, and reflected towards two detectors (31, 32). The signals (s1, S2) provided by the two detectors are equal when the light is received symmetrically, corresponding to zero position error. For a non-zero position error, there is a difference in intensity between the two parts of the beam. The detector is intended to form part of a control loop.
FR7836485A 1978-12-27 1978-12-27 Position detecting system for image forming appts. - includes two part photodiode providing two signals with difference proportional to position error Granted FR2445512A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7836485A FR2445512A1 (en) 1978-12-27 1978-12-27 Position detecting system for image forming appts. - includes two part photodiode providing two signals with difference proportional to position error

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7836485A FR2445512A1 (en) 1978-12-27 1978-12-27 Position detecting system for image forming appts. - includes two part photodiode providing two signals with difference proportional to position error

Publications (2)

Publication Number Publication Date
FR2445512A1 true FR2445512A1 (en) 1980-07-25
FR2445512B1 FR2445512B1 (en) 1982-04-30

Family

ID=9216583

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7836485A Granted FR2445512A1 (en) 1978-12-27 1978-12-27 Position detecting system for image forming appts. - includes two part photodiode providing two signals with difference proportional to position error

Country Status (1)

Country Link
FR (1) FR2445512A1 (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0031680A2 (en) * 1979-12-27 1981-07-08 Fujitsu Limited Focusing apparatus
FR2503416A1 (en) * 1981-04-03 1982-10-08 Philips Nv DEVICE FOR DETECTING THE POSITION OF AN OBJECT
FR2504281A1 (en) * 1981-04-16 1982-10-22 Euromask PROJECTION APPARATUS WITH FOCUSING DEVICE
FR2506960A1 (en) * 1981-05-28 1982-12-03 Zeiss Jena Veb Carl Image plane positioner for semiconductor substrate photolithography - utilises two light beams in same plane, perpendicular to and intersecting at image plane centre
EP0083413A1 (en) * 1981-12-31 1983-07-13 International Business Machines Corporation Autofocus arrangement for electron-beam lithographic systems
EP0197221A1 (en) * 1985-03-15 1986-10-15 Kabushiki Kaisha Toshiba Device for measuring the position of an object
EP0231977A1 (en) * 1986-02-03 1987-08-12 Koninklijke Philips Electronics N.V. Optical imaging arrangement comprising an opto-electric focussing-error detection system
EP0336537A1 (en) * 1988-02-16 1989-10-11 Canon Kabushiki Kaisha Device for detecting positional relationship between two objects
EP0426866A1 (en) * 1989-04-21 1991-05-15 Hitachi, Ltd. Projection/exposure device and projection/exposure method
US6094268A (en) * 1989-04-21 2000-07-25 Hitachi, Ltd. Projection exposure apparatus and projection exposure method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3342102A (en) * 1965-02-23 1967-09-19 Bell & Howell Co Image plane position appraisal system for a slide projector
DE1251975B (en) * 1967-10-12
GB1203128A (en) * 1967-11-18 1970-08-26 Leitz Ernst Gmbh A device for the automatic focusing of slide projectors
FR2266187A1 (en) * 1974-03-25 1975-10-24 Western Electric Co Projection photolithographic process for producing LSI circuits - involves step and repeat exposure for minimum distortion

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1251975B (en) * 1967-10-12
US3342102A (en) * 1965-02-23 1967-09-19 Bell & Howell Co Image plane position appraisal system for a slide projector
GB1203128A (en) * 1967-11-18 1970-08-26 Leitz Ernst Gmbh A device for the automatic focusing of slide projectors
FR2266187A1 (en) * 1974-03-25 1975-10-24 Western Electric Co Projection photolithographic process for producing LSI circuits - involves step and repeat exposure for minimum distortion

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0031680A2 (en) * 1979-12-27 1981-07-08 Fujitsu Limited Focusing apparatus
EP0031680A3 (en) * 1979-12-27 1982-02-17 Fujitsu Limited Focusing apparatus
FR2503416A1 (en) * 1981-04-03 1982-10-08 Philips Nv DEVICE FOR DETECTING THE POSITION OF AN OBJECT
FR2504281A1 (en) * 1981-04-16 1982-10-22 Euromask PROJECTION APPARATUS WITH FOCUSING DEVICE
EP0063980A1 (en) * 1981-04-16 1982-11-03 Matra Gca S.A. Projection apparatus with a focusing device
FR2506960A1 (en) * 1981-05-28 1982-12-03 Zeiss Jena Veb Carl Image plane positioner for semiconductor substrate photolithography - utilises two light beams in same plane, perpendicular to and intersecting at image plane centre
EP0083413A1 (en) * 1981-12-31 1983-07-13 International Business Machines Corporation Autofocus arrangement for electron-beam lithographic systems
EP0197221A1 (en) * 1985-03-15 1986-10-15 Kabushiki Kaisha Toshiba Device for measuring the position of an object
US4698513A (en) * 1985-03-15 1987-10-06 Kabushiki Kaishi Toshiba Position detector by vibrating a light beam for averaging the reflected light
EP0231977A1 (en) * 1986-02-03 1987-08-12 Koninklijke Philips Electronics N.V. Optical imaging arrangement comprising an opto-electric focussing-error detection system
EP0336537A1 (en) * 1988-02-16 1989-10-11 Canon Kabushiki Kaisha Device for detecting positional relationship between two objects
EP0426866A1 (en) * 1989-04-21 1991-05-15 Hitachi, Ltd. Projection/exposure device and projection/exposure method
US5227862A (en) * 1989-04-21 1993-07-13 Hitachi, Ltd. Projection exposure apparatus and projection exposure method
EP0426866B1 (en) * 1989-04-21 1996-07-10 Hitachi, Ltd. Projection/exposure device and projection/exposure method
US6094268A (en) * 1989-04-21 2000-07-25 Hitachi, Ltd. Projection exposure apparatus and projection exposure method

Also Published As

Publication number Publication date
FR2445512B1 (en) 1982-04-30

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