FR2436625A1 - Recipient a vide et autres pieces d'equipement a vide - Google Patents
Recipient a vide et autres pieces d'equipement a videInfo
- Publication number
- FR2436625A1 FR2436625A1 FR7901177A FR7901177A FR2436625A1 FR 2436625 A1 FR2436625 A1 FR 2436625A1 FR 7901177 A FR7901177 A FR 7901177A FR 7901177 A FR7901177 A FR 7901177A FR 2436625 A1 FR2436625 A1 FR 2436625A1
- Authority
- FR
- France
- Prior art keywords
- vacuum
- equipment parts
- container
- vacuum equipment
- vacuum container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/02—Apparatus characterised by their chemically-resistant properties
- B01J2219/0204—Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components
- B01J2219/0236—Metal based
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
- Flanged Joints, Insulating Joints, And Other Joints (AREA)
Abstract
LES RECIPIENTS ET AUTRES PIECES D'EQUIPEMENT A VIDE SELON L'INVENTION ONT AU MOINS LEUR SURFACE SOUMISE AU VIDE MUNIE D'UN REVETEMENT DE NITRURE METALLIQUE, PAR EXEMPLE DE NITRURE DE TANTALE, APPLIQUE PAR EVAPORATION REACTIVE SOUS VIDE. IL EN RESULTE UNE DIMINUTION CONSIDERABLE DE LA QUANTITE D'IMPURETES GAZEUSES LIBEREES PAR LADITE SURFACE LORSQU'ELLE EST SOUMISE A L'ACTION DU VIDE EN COURS DE FONCTIONNEMENT.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53115863A JPS5832229B2 (ja) | 1978-09-22 | 1978-09-22 | 金属窒化物を被覆した真空容器及び真空機器用部品 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2436625A1 true FR2436625A1 (fr) | 1980-04-18 |
FR2436625B1 FR2436625B1 (fr) | 1983-07-29 |
Family
ID=14673005
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7901177A Granted FR2436625A1 (fr) | 1978-09-22 | 1979-01-10 | Recipient a vide et autres pieces d'equipement a vide |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5832229B2 (fr) |
CH (1) | CH646072A5 (fr) |
DE (1) | DE2900057C3 (fr) |
FR (1) | FR2436625A1 (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2472035A1 (fr) * | 1979-12-13 | 1981-06-26 | Toyo Engineering Corp | Procede pour traiter a temperature elevee des matieres contenant un hydrocarbure afin d'eviter des depots de carbone a la surface des reacteurs |
EP1033745A2 (fr) * | 1999-03-02 | 2000-09-06 | Motorola, Inc. | Méthode de formation d'une couche barrière pour une interconnection en cuivre |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6055877U (ja) * | 1983-09-26 | 1985-04-19 | 株式会社タニタ | 着火器の火口 |
US5478524A (en) * | 1992-08-24 | 1995-12-26 | Nissan Motor Co., Ltd. | Super high vacuum vessel |
JP4829485B2 (ja) * | 2003-06-10 | 2011-12-07 | 有限会社真空実験室 | 真空部品用材料、真空部品、真空装置、真空部品用材料の製造方法、真空部品の処理方法及び真空装置の処理方法 |
US11015244B2 (en) | 2013-12-30 | 2021-05-25 | Advanced Material Solutions, Llc | Radiation shielding for a CVD reactor |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1405264A (fr) * | 1964-05-12 | 1965-07-09 | Commissariat Energie Atomique | Procédé de fabrication d'enceintes sous vide |
FR2022248A1 (fr) * | 1968-10-09 | 1970-07-31 | Gen Electric | |
US3537891A (en) * | 1967-09-25 | 1970-11-03 | Gen Electric | Resistor films of transition metal nitrides and method of forming |
FR2211347A1 (fr) * | 1972-12-26 | 1974-07-19 | Varian Associates |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE7120919U (de) * | 1971-08-26 | Rhone Poulenc Sa | Laboratoriums Autoklav aus ver glastem Stahl | |
JPS4834912A (fr) * | 1971-09-09 | 1973-05-23 | ||
JPS5210867A (en) * | 1975-07-15 | 1977-01-27 | Matsushita Electric Ind Co Ltd | Apparatus for forming films in vacuum |
-
1978
- 1978-09-22 JP JP53115863A patent/JPS5832229B2/ja not_active Expired
-
1979
- 1979-01-02 DE DE19792900057 patent/DE2900057C3/de not_active Expired
- 1979-01-09 CH CH19579A patent/CH646072A5/de not_active IP Right Cessation
- 1979-01-10 FR FR7901177A patent/FR2436625A1/fr active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1405264A (fr) * | 1964-05-12 | 1965-07-09 | Commissariat Energie Atomique | Procédé de fabrication d'enceintes sous vide |
US3537891A (en) * | 1967-09-25 | 1970-11-03 | Gen Electric | Resistor films of transition metal nitrides and method of forming |
FR2022248A1 (fr) * | 1968-10-09 | 1970-07-31 | Gen Electric | |
FR2211347A1 (fr) * | 1972-12-26 | 1974-07-19 | Varian Associates |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2472035A1 (fr) * | 1979-12-13 | 1981-06-26 | Toyo Engineering Corp | Procede pour traiter a temperature elevee des matieres contenant un hydrocarbure afin d'eviter des depots de carbone a la surface des reacteurs |
EP1033745A2 (fr) * | 1999-03-02 | 2000-09-06 | Motorola, Inc. | Méthode de formation d'une couche barrière pour une interconnection en cuivre |
EP1033745A3 (fr) * | 1999-03-02 | 2001-12-19 | Motorola, Inc. | Méthode de formation d'une couche barrière pour une interconnection en cuivre |
US6451181B1 (en) | 1999-03-02 | 2002-09-17 | Motorola, Inc. | Method of forming a semiconductor device barrier layer |
Also Published As
Publication number | Publication date |
---|---|
JPS5832229B2 (ja) | 1983-07-12 |
DE2900057B2 (de) | 1980-11-27 |
FR2436625B1 (fr) | 1983-07-29 |
JPS5544509A (en) | 1980-03-28 |
DE2900057C3 (de) | 1981-10-08 |
CH646072A5 (en) | 1984-11-15 |
DE2900057A1 (de) | 1980-03-27 |
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