FR2436625A1 - Recipient a vide et autres pieces d'equipement a vide - Google Patents

Recipient a vide et autres pieces d'equipement a vide

Info

Publication number
FR2436625A1
FR2436625A1 FR7901177A FR7901177A FR2436625A1 FR 2436625 A1 FR2436625 A1 FR 2436625A1 FR 7901177 A FR7901177 A FR 7901177A FR 7901177 A FR7901177 A FR 7901177A FR 2436625 A1 FR2436625 A1 FR 2436625A1
Authority
FR
France
Prior art keywords
vacuum
equipment parts
container
vacuum equipment
vacuum container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7901177A
Other languages
English (en)
Other versions
FR2436625B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Publication of FR2436625A1 publication Critical patent/FR2436625A1/fr
Application granted granted Critical
Publication of FR2436625B1 publication Critical patent/FR2436625B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/02—Apparatus characterised by their chemically-resistant properties
    • B01J2219/0204—Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components
    • B01J2219/0236—Metal based

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Flanged Joints, Insulating Joints, And Other Joints (AREA)

Abstract

LES RECIPIENTS ET AUTRES PIECES D'EQUIPEMENT A VIDE SELON L'INVENTION ONT AU MOINS LEUR SURFACE SOUMISE AU VIDE MUNIE D'UN REVETEMENT DE NITRURE METALLIQUE, PAR EXEMPLE DE NITRURE DE TANTALE, APPLIQUE PAR EVAPORATION REACTIVE SOUS VIDE. IL EN RESULTE UNE DIMINUTION CONSIDERABLE DE LA QUANTITE D'IMPURETES GAZEUSES LIBEREES PAR LADITE SURFACE LORSQU'ELLE EST SOUMISE A L'ACTION DU VIDE EN COURS DE FONCTIONNEMENT.
FR7901177A 1978-09-22 1979-01-10 Recipient a vide et autres pieces d'equipement a vide Granted FR2436625A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53115863A JPS5832229B2 (ja) 1978-09-22 1978-09-22 金属窒化物を被覆した真空容器及び真空機器用部品

Publications (2)

Publication Number Publication Date
FR2436625A1 true FR2436625A1 (fr) 1980-04-18
FR2436625B1 FR2436625B1 (fr) 1983-07-29

Family

ID=14673005

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7901177A Granted FR2436625A1 (fr) 1978-09-22 1979-01-10 Recipient a vide et autres pieces d'equipement a vide

Country Status (4)

Country Link
JP (1) JPS5832229B2 (fr)
CH (1) CH646072A5 (fr)
DE (1) DE2900057C3 (fr)
FR (1) FR2436625A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2472035A1 (fr) * 1979-12-13 1981-06-26 Toyo Engineering Corp Procede pour traiter a temperature elevee des matieres contenant un hydrocarbure afin d'eviter des depots de carbone a la surface des reacteurs
EP1033745A2 (fr) * 1999-03-02 2000-09-06 Motorola, Inc. Méthode de formation d'une couche barrière pour une interconnection en cuivre

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6055877U (ja) * 1983-09-26 1985-04-19 株式会社タニタ 着火器の火口
US5478524A (en) * 1992-08-24 1995-12-26 Nissan Motor Co., Ltd. Super high vacuum vessel
JP4829485B2 (ja) * 2003-06-10 2011-12-07 有限会社真空実験室 真空部品用材料、真空部品、真空装置、真空部品用材料の製造方法、真空部品の処理方法及び真空装置の処理方法
US11015244B2 (en) 2013-12-30 2021-05-25 Advanced Material Solutions, Llc Radiation shielding for a CVD reactor

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1405264A (fr) * 1964-05-12 1965-07-09 Commissariat Energie Atomique Procédé de fabrication d'enceintes sous vide
FR2022248A1 (fr) * 1968-10-09 1970-07-31 Gen Electric
US3537891A (en) * 1967-09-25 1970-11-03 Gen Electric Resistor films of transition metal nitrides and method of forming
FR2211347A1 (fr) * 1972-12-26 1974-07-19 Varian Associates

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE7120919U (de) * 1971-08-26 Rhone Poulenc Sa Laboratoriums Autoklav aus ver glastem Stahl
JPS4834912A (fr) * 1971-09-09 1973-05-23
JPS5210867A (en) * 1975-07-15 1977-01-27 Matsushita Electric Ind Co Ltd Apparatus for forming films in vacuum

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1405264A (fr) * 1964-05-12 1965-07-09 Commissariat Energie Atomique Procédé de fabrication d'enceintes sous vide
US3537891A (en) * 1967-09-25 1970-11-03 Gen Electric Resistor films of transition metal nitrides and method of forming
FR2022248A1 (fr) * 1968-10-09 1970-07-31 Gen Electric
FR2211347A1 (fr) * 1972-12-26 1974-07-19 Varian Associates

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2472035A1 (fr) * 1979-12-13 1981-06-26 Toyo Engineering Corp Procede pour traiter a temperature elevee des matieres contenant un hydrocarbure afin d'eviter des depots de carbone a la surface des reacteurs
EP1033745A2 (fr) * 1999-03-02 2000-09-06 Motorola, Inc. Méthode de formation d'une couche barrière pour une interconnection en cuivre
EP1033745A3 (fr) * 1999-03-02 2001-12-19 Motorola, Inc. Méthode de formation d'une couche barrière pour une interconnection en cuivre
US6451181B1 (en) 1999-03-02 2002-09-17 Motorola, Inc. Method of forming a semiconductor device barrier layer

Also Published As

Publication number Publication date
JPS5832229B2 (ja) 1983-07-12
DE2900057B2 (de) 1980-11-27
FR2436625B1 (fr) 1983-07-29
JPS5544509A (en) 1980-03-28
DE2900057C3 (de) 1981-10-08
CH646072A5 (en) 1984-11-15
DE2900057A1 (de) 1980-03-27

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