FR2422984A1 - ELECTRONIC RESERVE FOR ELECTRONIC LITHOGRAPHY - Google Patents
ELECTRONIC RESERVE FOR ELECTRONIC LITHOGRAPHYInfo
- Publication number
- FR2422984A1 FR2422984A1 FR7831321A FR7831321A FR2422984A1 FR 2422984 A1 FR2422984 A1 FR 2422984A1 FR 7831321 A FR7831321 A FR 7831321A FR 7831321 A FR7831321 A FR 7831321A FR 2422984 A1 FR2422984 A1 FR 2422984A1
- Authority
- FR
- France
- Prior art keywords
- electronic
- resist
- lithography
- electron
- reserve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
L'invention concerne une réserve électronique négative destinée à la lithographie électronique. Elle est formée d'un copolymère de butadiène 1,3 ou d'isoprène et de méthacrylate ou acrylate de glycidyle. La réserve se distingue par une grande sensibilité à l'irradiation électronique et en même temps par une bonne adhérence au substrat et par sa résistance aux agents d'attaque usuels. On prépare le copolymère par polymérisation par radicaux de sorte que l'on obtient une grande pureté du produit sans qu'une purification soit nécessaire L'aptitude à l'utilisation de réserve ainsi obtenue est prolongée. Applicable notamment à la fabrication de circuits intégrés.The invention relates to a negative electron resist for electron lithography. It is formed from a copolymer of 1,3 butadiene or of isoprene and of glycidyl methacrylate or acrylate. The resist is distinguished by high sensitivity to electron irradiation and at the same time by good adhesion to the substrate and by its resistance to usual etchant. The copolymer is prepared by radical polymerization so that a high purity of the product is obtained without the need for purification. The usability of the resist thus obtained is prolonged. Applicable in particular to the manufacture of integrated circuits.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CS777258A CS193322B1 (en) | 1977-11-07 | 1977-11-07 | Electron resisit |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2422984A1 true FR2422984A1 (en) | 1979-11-09 |
Family
ID=5421395
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7831321A Pending FR2422984A1 (en) | 1977-11-07 | 1978-11-06 | ELECTRONIC RESERVE FOR ELECTRONIC LITHOGRAPHY |
Country Status (8)
Country | Link |
---|---|
US (1) | US4269962A (en) |
JP (1) | JPS5476135A (en) |
BE (1) | BE871801A (en) |
CS (1) | CS193322B1 (en) |
DE (1) | DE2848254A1 (en) |
FR (1) | FR2422984A1 (en) |
GB (1) | GB2009759A (en) |
NL (1) | NL7810885A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5614232A (en) * | 1979-07-16 | 1981-02-12 | Mitsubishi Rayon Co Ltd | Negative type resist resin |
CA2377081A1 (en) | 2002-03-15 | 2003-09-15 | Quantiscript Inc. | Method of producing an etch-resistant polymer structure using electron beam lithography |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3480441A (en) * | 1966-08-09 | 1969-11-25 | Ibm | Photosensitive compositions |
US3885060A (en) * | 1968-08-23 | 1975-05-20 | Hitachi Ltd | Production of insolubilized organic polymers |
US3840449A (en) * | 1968-12-13 | 1974-10-08 | Bridgestone Tire Co Ltd | Novel method of producing two-component and multi-component copolymers containing conjugated diene compounds and conjugated polar vinyl monomers using photo polymerization |
US3615469A (en) * | 1969-06-02 | 1971-10-26 | Goodrich Co B F | Polymeric printing plates |
BE794343A (en) * | 1972-01-21 | 1973-07-19 | Westinghouse Electric Corp | METHOD FOR PROTECTING PART OF A SUBSTRATE SUBJECT TO THE ACTION OF AN ELECTRONIC HARNESS |
US3787212A (en) * | 1972-08-04 | 1974-01-22 | Monsanto Co | Polymeric photosensitive compositions and methods using same |
GB1448838A (en) * | 1972-11-14 | 1976-09-08 | Kansai Paint Co Ltd | Lithography |
US3865597A (en) * | 1973-03-26 | 1975-02-11 | Western Electric Co | Additives to negative photoresists which increase the sensitivity thereof |
US4061799A (en) * | 1973-11-05 | 1977-12-06 | Texas Instruments Incorporated | Method of patterning styrene diene block copolymer electron beam resists |
US3931435A (en) * | 1974-12-20 | 1976-01-06 | International Business Machines Corporation | Electron beam positive resists containing acetate polymers |
JPS51116893A (en) * | 1975-04-08 | 1976-10-14 | Ube Ind Ltd | Photo-setting compositions |
US4130424A (en) * | 1976-08-06 | 1978-12-19 | Bell Telephone Laboratories, Incorporated | Process using radiation curable epoxy containing resist and resultant product |
-
1977
- 1977-11-07 CS CS777258A patent/CS193322B1/en unknown
-
1978
- 1978-10-27 US US05/955,457 patent/US4269962A/en not_active Expired - Lifetime
- 1978-10-27 GB GB7842258A patent/GB2009759A/en not_active Withdrawn
- 1978-11-01 NL NL7810885A patent/NL7810885A/en not_active Application Discontinuation
- 1978-11-06 BE BE191560A patent/BE871801A/en unknown
- 1978-11-06 FR FR7831321A patent/FR2422984A1/en active Pending
- 1978-11-06 JP JP13592378A patent/JPS5476135A/en active Pending
- 1978-11-07 DE DE19782848254 patent/DE2848254A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
BE871801A (en) | 1979-03-01 |
GB2009759A (en) | 1979-06-20 |
US4269962A (en) | 1981-05-26 |
DE2848254A1 (en) | 1979-05-10 |
CS193322B1 (en) | 1979-10-31 |
JPS5476135A (en) | 1979-06-18 |
NL7810885A (en) | 1979-05-09 |
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