FR2422984A1 - ELECTRONIC RESERVE FOR ELECTRONIC LITHOGRAPHY - Google Patents

ELECTRONIC RESERVE FOR ELECTRONIC LITHOGRAPHY

Info

Publication number
FR2422984A1
FR2422984A1 FR7831321A FR7831321A FR2422984A1 FR 2422984 A1 FR2422984 A1 FR 2422984A1 FR 7831321 A FR7831321 A FR 7831321A FR 7831321 A FR7831321 A FR 7831321A FR 2422984 A1 FR2422984 A1 FR 2422984A1
Authority
FR
France
Prior art keywords
electronic
resist
lithography
electron
reserve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
FR7831321A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Czech Academy of Sciences CAS
Original Assignee
Czech Academy of Sciences CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Czech Academy of Sciences CAS filed Critical Czech Academy of Sciences CAS
Publication of FR2422984A1 publication Critical patent/FR2422984A1/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

L'invention concerne une réserve électronique négative destinée à la lithographie électronique. Elle est formée d'un copolymère de butadiène 1,3 ou d'isoprène et de méthacrylate ou acrylate de glycidyle. La réserve se distingue par une grande sensibilité à l'irradiation électronique et en même temps par une bonne adhérence au substrat et par sa résistance aux agents d'attaque usuels. On prépare le copolymère par polymérisation par radicaux de sorte que l'on obtient une grande pureté du produit sans qu'une purification soit nécessaire L'aptitude à l'utilisation de réserve ainsi obtenue est prolongée. Applicable notamment à la fabrication de circuits intégrés.The invention relates to a negative electron resist for electron lithography. It is formed from a copolymer of 1,3 butadiene or of isoprene and of glycidyl methacrylate or acrylate. The resist is distinguished by high sensitivity to electron irradiation and at the same time by good adhesion to the substrate and by its resistance to usual etchant. The copolymer is prepared by radical polymerization so that a high purity of the product is obtained without the need for purification. The usability of the resist thus obtained is prolonged. Applicable in particular to the manufacture of integrated circuits.

FR7831321A 1977-11-07 1978-11-06 ELECTRONIC RESERVE FOR ELECTRONIC LITHOGRAPHY Pending FR2422984A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CS777258A CS193322B1 (en) 1977-11-07 1977-11-07 Electron resisit

Publications (1)

Publication Number Publication Date
FR2422984A1 true FR2422984A1 (en) 1979-11-09

Family

ID=5421395

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7831321A Pending FR2422984A1 (en) 1977-11-07 1978-11-06 ELECTRONIC RESERVE FOR ELECTRONIC LITHOGRAPHY

Country Status (8)

Country Link
US (1) US4269962A (en)
JP (1) JPS5476135A (en)
BE (1) BE871801A (en)
CS (1) CS193322B1 (en)
DE (1) DE2848254A1 (en)
FR (1) FR2422984A1 (en)
GB (1) GB2009759A (en)
NL (1) NL7810885A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5614232A (en) * 1979-07-16 1981-02-12 Mitsubishi Rayon Co Ltd Negative type resist resin
CA2377081A1 (en) 2002-03-15 2003-09-15 Quantiscript Inc. Method of producing an etch-resistant polymer structure using electron beam lithography

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3480441A (en) * 1966-08-09 1969-11-25 Ibm Photosensitive compositions
US3885060A (en) * 1968-08-23 1975-05-20 Hitachi Ltd Production of insolubilized organic polymers
US3840449A (en) * 1968-12-13 1974-10-08 Bridgestone Tire Co Ltd Novel method of producing two-component and multi-component copolymers containing conjugated diene compounds and conjugated polar vinyl monomers using photo polymerization
US3615469A (en) * 1969-06-02 1971-10-26 Goodrich Co B F Polymeric printing plates
BE794343A (en) * 1972-01-21 1973-07-19 Westinghouse Electric Corp METHOD FOR PROTECTING PART OF A SUBSTRATE SUBJECT TO THE ACTION OF AN ELECTRONIC HARNESS
US3787212A (en) * 1972-08-04 1974-01-22 Monsanto Co Polymeric photosensitive compositions and methods using same
GB1448838A (en) * 1972-11-14 1976-09-08 Kansai Paint Co Ltd Lithography
US3865597A (en) * 1973-03-26 1975-02-11 Western Electric Co Additives to negative photoresists which increase the sensitivity thereof
US4061799A (en) * 1973-11-05 1977-12-06 Texas Instruments Incorporated Method of patterning styrene diene block copolymer electron beam resists
US3931435A (en) * 1974-12-20 1976-01-06 International Business Machines Corporation Electron beam positive resists containing acetate polymers
JPS51116893A (en) * 1975-04-08 1976-10-14 Ube Ind Ltd Photo-setting compositions
US4130424A (en) * 1976-08-06 1978-12-19 Bell Telephone Laboratories, Incorporated Process using radiation curable epoxy containing resist and resultant product

Also Published As

Publication number Publication date
BE871801A (en) 1979-03-01
GB2009759A (en) 1979-06-20
US4269962A (en) 1981-05-26
DE2848254A1 (en) 1979-05-10
CS193322B1 (en) 1979-10-31
JPS5476135A (en) 1979-06-18
NL7810885A (en) 1979-05-09

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