FR2399740A1 - Diode a avalanche a hetero-jonction, et oscillateur en mode dit " a temps de transit " utilisant une telle diode - Google Patents
Diode a avalanche a hetero-jonction, et oscillateur en mode dit " a temps de transit " utilisant une telle diodeInfo
- Publication number
- FR2399740A1 FR2399740A1 FR7723779A FR7723779A FR2399740A1 FR 2399740 A1 FR2399740 A1 FR 2399740A1 FR 7723779 A FR7723779 A FR 7723779A FR 7723779 A FR7723779 A FR 7723779A FR 2399740 A1 FR2399740 A1 FR 2399740A1
- Authority
- FR
- France
- Prior art keywords
- diode
- mode
- doped
- avalanche
- junction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000407 epitaxy Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229910002058 ternary alloy Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/864—Transit-time diodes, e.g. IMPATT, TRAPATT diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
- H01L29/201—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds, e.g. alloys
- H01L29/205—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds, e.g. alloys in different semiconductor regions, e.g. heterojunctions
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
Abstract
L'invention concerne une diode à avalanche destinée à fonctionner en mode à temps de transit >> (mode IMPATT de la terminologie anglo-saxonne). Pour améliorer le rendement, on cherche à avoir une zone d'avalanche limitée à une région de faible épaisseur par rapport à l'épaisseur totale de la jonction semi-conductrice. La diode selon l'invention comporte un substrat monocristallin In P dopé n**+ supportant une série de trois couches, déposées par épitaxie et dont les réseaux monocristallins se raccordent, à savoir une couche In P dopée n et deux couches Ga0,47 In 0,53 As dopées n et p**+, ces deux dernières étant de très faible épaisseur. Une polarisation inverse est appliquée à la jonction p** + n et produit le phénomène d'avalanche dans la mince couche n d'alliage ternaire. Application à la génération de très haute fréquence.
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7723779A FR2399740A1 (fr) | 1977-08-02 | 1977-08-02 | Diode a avalanche a hetero-jonction, et oscillateur en mode dit " a temps de transit " utilisant une telle diode |
JP9138078A JPS5452481A (en) | 1977-08-02 | 1978-07-26 | Heterojunction avalanche diode |
US05/929,500 US4186407A (en) | 1977-08-02 | 1978-07-31 | Heterojunction avalanche diode with a ternary alloy of gallium, indium and arsenic, and a binary alloy of indium and phosphorus |
DE19782833543 DE2833543A1 (de) | 1977-08-02 | 1978-07-31 | Lawinendiode mit hetero-uebergang |
CA308,516A CA1104265A (fr) | 1977-08-02 | 1978-08-01 | Diode de zener, jonction heterogene, faite d'un alliage ternaire de gallium, indium et arsenic, et d'un alliage binaire d'indium et de phosphore |
GB7832031A GB2002579B (en) | 1977-08-02 | 1978-08-02 | Avalanche diode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7723779A FR2399740A1 (fr) | 1977-08-02 | 1977-08-02 | Diode a avalanche a hetero-jonction, et oscillateur en mode dit " a temps de transit " utilisant une telle diode |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2399740A1 true FR2399740A1 (fr) | 1979-03-02 |
FR2399740B1 FR2399740B1 (fr) | 1982-02-26 |
Family
ID=9194131
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7723779A Granted FR2399740A1 (fr) | 1977-08-02 | 1977-08-02 | Diode a avalanche a hetero-jonction, et oscillateur en mode dit " a temps de transit " utilisant une telle diode |
Country Status (6)
Country | Link |
---|---|
US (1) | US4186407A (fr) |
JP (1) | JPS5452481A (fr) |
CA (1) | CA1104265A (fr) |
DE (1) | DE2833543A1 (fr) |
FR (1) | FR2399740A1 (fr) |
GB (1) | GB2002579B (fr) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2447612A1 (fr) * | 1979-01-26 | 1980-08-22 | Thomson Csf | Composant semi-conducteur a heterojonction |
US4250516A (en) * | 1979-08-06 | 1981-02-10 | Bell Telephone Laboratories, Incorporated | Multistage avalanche photodetector |
US4291320A (en) * | 1980-01-10 | 1981-09-22 | Rockwell International Corporation | Heterojunction IMPATT diode |
US4353081A (en) * | 1980-01-29 | 1982-10-05 | Bell Telephone Laboratories, Incorporated | Graded bandgap rectifying semiconductor devices |
FR2476944A1 (fr) * | 1980-02-21 | 1981-08-28 | Bois Daniel | Relais optoelectronique integre utilisant un semiconducteur a photoconductivite persistante et matrice de tels relais |
US4276098A (en) * | 1980-03-31 | 1981-06-30 | Bell Telephone Laboratories, Incorporated | Batch processing of semiconductor devices |
US4319937A (en) * | 1980-11-12 | 1982-03-16 | University Of Illinois Foundation | Homogeneous liquid phase epitaxial growth of heterojunction materials |
US4468851A (en) * | 1981-12-14 | 1984-09-04 | The United States Of America As Represented By The Secretary Of The Navy | Process for making a heterojunction source-drain insulated gate field-effect transistors utilizing diffusion to form the lattice |
JPS63153867A (ja) * | 1986-08-04 | 1988-06-27 | Fujitsu Ltd | 共鳴トンネリング半導体装置 |
FR2689683B1 (fr) * | 1992-04-07 | 1994-05-20 | Thomson Composants Microondes | Dispositif semiconducteur a transistors complementaires. |
GB9823115D0 (en) * | 1998-10-23 | 1998-12-16 | Secr Defence | Improvements in impatt diodes |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3466512A (en) * | 1967-05-29 | 1969-09-09 | Bell Telephone Labor Inc | Impact avalanche transit time diodes with heterojunction structure |
US3982261A (en) * | 1972-09-22 | 1976-09-21 | Varian Associates | Epitaxial indium-gallium-arsenide phosphide layer on lattice-matched indium-phosphide substrate and devices |
FR2225842B1 (fr) * | 1973-04-13 | 1977-09-02 | Thomson Csf | |
US4017332A (en) * | 1975-02-27 | 1977-04-12 | Varian Associates | Solar cells employing stacked opposite conductivity layers |
JPS52101990A (en) * | 1976-02-21 | 1977-08-26 | Hitachi Ltd | Semiconductor device for photoelectric transducer and its manufacture |
US4075651A (en) * | 1976-03-29 | 1978-02-21 | Varian Associates, Inc. | High speed fet employing ternary and quarternary iii-v active layers |
-
1977
- 1977-08-02 FR FR7723779A patent/FR2399740A1/fr active Granted
-
1978
- 1978-07-26 JP JP9138078A patent/JPS5452481A/ja active Pending
- 1978-07-31 DE DE19782833543 patent/DE2833543A1/de not_active Ceased
- 1978-07-31 US US05/929,500 patent/US4186407A/en not_active Expired - Lifetime
- 1978-08-01 CA CA308,516A patent/CA1104265A/fr not_active Expired
- 1978-08-02 GB GB7832031A patent/GB2002579B/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5452481A (en) | 1979-04-25 |
GB2002579B (en) | 1982-05-19 |
DE2833543A1 (de) | 1979-02-15 |
GB2002579A (en) | 1979-02-21 |
US4186407A (en) | 1980-01-29 |
CA1104265A (fr) | 1981-06-30 |
FR2399740B1 (fr) | 1982-02-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |