FR2397067A1 - Dispositif d'injection de gaz pour gravure ou depot reactifs sous decharge luminescente - Google Patents
Dispositif d'injection de gaz pour gravure ou depot reactifs sous decharge luminescenteInfo
- Publication number
- FR2397067A1 FR2397067A1 FR7720766A FR7720766A FR2397067A1 FR 2397067 A1 FR2397067 A1 FR 2397067A1 FR 7720766 A FR7720766 A FR 7720766A FR 7720766 A FR7720766 A FR 7720766A FR 2397067 A1 FR2397067 A1 FR 2397067A1
- Authority
- FR
- France
- Prior art keywords
- glow discharge
- gas
- iii
- vessel
- reactive materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45568—Porous nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5096—Flat-bed apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
Abstract
Dispositif d'introduction de gaz dans une enceinte de gravure ou de dépôt réactifs. L'enceinte comprend, à sa partir supérieure, un conduit d'arrivée de gaz 24, des moyens pour porter lesdits gaz dans un état réactif, une sole 10 supportant ledit substrat et un conduit d'évacuation des gaz, Le dispositif est caractérisé en ce qu'il comprend une paroi poreuse auxdits gaz, cette paroi 40 étant disposée à la sortie du conduit d'arrivée de gaz, au-dessus et à proximité de la sole, sa fonction étant de répartir uniformément le flux de gaz sur la surface supérieure de ladite sole. Application aux dépôts de couches sur des semiconducteurs par dépôts réactif sous décharge luminescente.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7720766A FR2397067A1 (fr) | 1977-07-06 | 1977-07-06 | Dispositif d'injection de gaz pour gravure ou depot reactifs sous decharge luminescente |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7720766A FR2397067A1 (fr) | 1977-07-06 | 1977-07-06 | Dispositif d'injection de gaz pour gravure ou depot reactifs sous decharge luminescente |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2397067A1 true FR2397067A1 (fr) | 1979-02-02 |
FR2397067B1 FR2397067B1 (fr) | 1982-10-15 |
Family
ID=9193055
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7720766A Granted FR2397067A1 (fr) | 1977-07-06 | 1977-07-06 | Dispositif d'injection de gaz pour gravure ou depot reactifs sous decharge luminescente |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2397067A1 (fr) |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4352974A (en) * | 1979-08-01 | 1982-10-05 | Hitachi, Ltd. | Plasma etcher having isotropic subchamber with gas outlet for producing uniform etching |
EP0066088A2 (fr) * | 1981-06-02 | 1982-12-08 | International Business Machines Corporation | Anode perforée pour dispositif de décapage ionique réactif |
FR2514033A1 (fr) * | 1981-10-02 | 1983-04-08 | Henaff Louis | Installation pour le depot de couches minces en grande surface en phase vapeur reactive par plasma |
FR2538987A1 (fr) * | 1983-01-05 | 1984-07-06 | Commissariat Energie Atomique | Enceinte pour le traitement et notamment la gravure de substrats par la methode du plasma reactif |
US4491509A (en) * | 1984-03-09 | 1985-01-01 | At&T Technologies, Inc. | Methods of and apparatus for sputtering material onto a substrate |
WO1985002418A1 (fr) * | 1983-12-01 | 1985-06-06 | Shatterproof Glass Corporation | Systeme de distribution de gaz pour cathodes de pulverisation |
WO1987006776A1 (fr) * | 1986-04-29 | 1987-11-05 | Loughborough Consultants Limited | Appareil a decharge electrique |
EP0296891A2 (fr) * | 1987-06-26 | 1988-12-28 | Applied Materials, Inc. | Procédé pour l'autonettoyage d'une chambre de réaction |
EP0413389A1 (fr) * | 1989-08-17 | 1991-02-20 | Philips Patentverwaltung GmbH | Procédé de déposition de particules microcristallines solides à partir de la phase gazeuse par dépôt chimique en phase vapeur |
DE4102198A1 (de) * | 1990-01-26 | 1991-08-08 | Fuji Electric Co Ltd | Rf-plasma-cvd-vorrichtung und duennfilm-herstellungsverfahren unter anwendung der vorrichtung |
DE4029268A1 (de) * | 1990-09-14 | 1992-03-19 | Balzers Hochvakuum | Verfahren und anordnung zur gleichspannungs-bogenentladungs-unterstuetzten, reaktiven behandlung von gut |
US5158644A (en) * | 1986-12-19 | 1992-10-27 | Applied Materials, Inc. | Reactor chamber self-cleaning process |
EP0523609A2 (fr) * | 1991-07-15 | 1993-01-20 | Matsushita Electric Industrial Co., Ltd. | Procédé de formation d'un film par dépôt chimique en phase vapeur assisté par plasma |
WO1999065057A1 (fr) * | 1998-06-12 | 1999-12-16 | Applied Materials, Inc. | Unite de repartition de gaz |
CN113913790A (zh) * | 2020-07-08 | 2022-01-11 | 湖南红太阳光电科技有限公司 | 一种平板式pecvd设备用多段式电极板辉光放电装置 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6784033B1 (en) | 1984-02-15 | 2004-08-31 | Semiconductor Energy Laboratory Co., Ltd. | Method for the manufacture of an insulated gate field effect semiconductor device |
JPH0752718B2 (ja) | 1984-11-26 | 1995-06-05 | 株式会社半導体エネルギー研究所 | 薄膜形成方法 |
US6786997B1 (en) | 1984-11-26 | 2004-09-07 | Semiconductor Energy Laboratory Co., Ltd. | Plasma processing apparatus |
US6113701A (en) | 1985-02-14 | 2000-09-05 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, manufacturing method, and system |
US6673722B1 (en) | 1985-10-14 | 2004-01-06 | Semiconductor Energy Laboratory Co., Ltd. | Microwave enhanced CVD system under magnetic field |
US6230650B1 (en) | 1985-10-14 | 2001-05-15 | Semiconductor Energy Laboratory Co., Ltd. | Microwave enhanced CVD system under magnetic field |
-
1977
- 1977-07-06 FR FR7720766A patent/FR2397067A1/fr active Granted
Cited By (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4352974A (en) * | 1979-08-01 | 1982-10-05 | Hitachi, Ltd. | Plasma etcher having isotropic subchamber with gas outlet for producing uniform etching |
EP0066088A2 (fr) * | 1981-06-02 | 1982-12-08 | International Business Machines Corporation | Anode perforée pour dispositif de décapage ionique réactif |
EP0066088A3 (en) * | 1981-06-02 | 1984-02-01 | International Business Machines Corporation | Perforated anode for use in reactive ion etching apparatus |
FR2514033A1 (fr) * | 1981-10-02 | 1983-04-08 | Henaff Louis | Installation pour le depot de couches minces en grande surface en phase vapeur reactive par plasma |
FR2538987A1 (fr) * | 1983-01-05 | 1984-07-06 | Commissariat Energie Atomique | Enceinte pour le traitement et notamment la gravure de substrats par la methode du plasma reactif |
EP0115970A1 (fr) * | 1983-01-05 | 1984-08-15 | Commissariat A L'energie Atomique | Enceinte pour le traitement et notamment la gravure de substrats par la méthode du plasma réactif |
WO1985002418A1 (fr) * | 1983-12-01 | 1985-06-06 | Shatterproof Glass Corporation | Systeme de distribution de gaz pour cathodes de pulverisation |
US4491509A (en) * | 1984-03-09 | 1985-01-01 | At&T Technologies, Inc. | Methods of and apparatus for sputtering material onto a substrate |
WO1987006776A1 (fr) * | 1986-04-29 | 1987-11-05 | Loughborough Consultants Limited | Appareil a decharge electrique |
US5158644A (en) * | 1986-12-19 | 1992-10-27 | Applied Materials, Inc. | Reactor chamber self-cleaning process |
EP0296891A3 (en) * | 1987-06-26 | 1990-05-30 | Applied Materials, Inc. | Reactor chamber for selfcleaning process |
EP0296891A2 (fr) * | 1987-06-26 | 1988-12-28 | Applied Materials, Inc. | Procédé pour l'autonettoyage d'une chambre de réaction |
EP0413389A1 (fr) * | 1989-08-17 | 1991-02-20 | Philips Patentverwaltung GmbH | Procédé de déposition de particules microcristallines solides à partir de la phase gazeuse par dépôt chimique en phase vapeur |
DE4102198A1 (de) * | 1990-01-26 | 1991-08-08 | Fuji Electric Co Ltd | Rf-plasma-cvd-vorrichtung und duennfilm-herstellungsverfahren unter anwendung der vorrichtung |
DE4029268A1 (de) * | 1990-09-14 | 1992-03-19 | Balzers Hochvakuum | Verfahren und anordnung zur gleichspannungs-bogenentladungs-unterstuetzten, reaktiven behandlung von gut |
US5336326A (en) * | 1990-09-14 | 1994-08-09 | Balzers Aktiengesellschaft | Method of and apparatus for a direct voltage arc discharge enhanced reactive treatment of objects |
EP0523609A2 (fr) * | 1991-07-15 | 1993-01-20 | Matsushita Electric Industrial Co., Ltd. | Procédé de formation d'un film par dépôt chimique en phase vapeur assisté par plasma |
EP0523609A3 (fr) * | 1991-07-15 | 1995-06-14 | Matsushita Electric Ind Co Ltd | |
WO1999065057A1 (fr) * | 1998-06-12 | 1999-12-16 | Applied Materials, Inc. | Unite de repartition de gaz |
CN113913790A (zh) * | 2020-07-08 | 2022-01-11 | 湖南红太阳光电科技有限公司 | 一种平板式pecvd设备用多段式电极板辉光放电装置 |
Also Published As
Publication number | Publication date |
---|---|
FR2397067B1 (fr) | 1982-10-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |