FR2296852A1 - Systeme de mesure des caracteristiques de lignes conductrices - Google Patents
Systeme de mesure des caracteristiques de lignes conductricesInfo
- Publication number
- FR2296852A1 FR2296852A1 FR7537209A FR7537209A FR2296852A1 FR 2296852 A1 FR2296852 A1 FR 2296852A1 FR 7537209 A FR7537209 A FR 7537209A FR 7537209 A FR7537209 A FR 7537209A FR 2296852 A1 FR2296852 A1 FR 2296852A1
- Authority
- FR
- France
- Prior art keywords
- measuring
- conductive lines
- conductive
- lines
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
- G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
- G01R27/08—Measuring resistance by measuring both voltage and current
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2853—Electrical testing of internal connections or -isolation, e.g. latch-up or chip-to-lead connections
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Engineering & Computer Science (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Measurement Of Resistance Or Impedance (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/538,288 US3974443A (en) | 1975-01-02 | 1975-01-02 | Conductive line width and resistivity measuring system |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2296852A1 true FR2296852A1 (fr) | 1976-07-30 |
FR2296852B1 FR2296852B1 (fr) | 1978-05-12 |
Family
ID=24146264
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7537209A Granted FR2296852A1 (fr) | 1975-01-02 | 1975-12-01 | Systeme de mesure des caracteristiques de lignes conductrices |
Country Status (5)
Country | Link |
---|---|
US (1) | US3974443A (fr) |
JP (1) | JPS5845816B2 (fr) |
DE (1) | DE2554536C2 (fr) |
FR (1) | FR2296852A1 (fr) |
GB (1) | GB1479869A (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2407483A1 (fr) * | 1977-10-31 | 1979-05-25 | Western Electric Co | Procede et dispositif de test d'elements conducteurs |
FR2473789A1 (fr) * | 1980-01-09 | 1981-07-17 | Ibm France | Procedes et structures de test pour circuits integres a semi-conducteurs permettant la determination electrique de certaines tolerances lors des etapes photolithographiques. |
FR2618021A1 (fr) * | 1987-07-07 | 1989-01-13 | Thomson Semiconducteurs | Structure et procede de test pour circuit integre permettant la determination des effets de surface de couches |
FR2706042A1 (fr) * | 1993-06-03 | 1994-12-09 | Matra Cap Systems Sa | Procédé de contrôle des pistes d'un circuit d'interconnexion et circuit permettant de mette en Óoeuvre un tel procédé. |
Families Citing this family (51)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4024561A (en) * | 1976-04-01 | 1977-05-17 | International Business Machines Corporation | Field effect transistor monitors |
US4144493A (en) * | 1976-06-30 | 1979-03-13 | International Business Machines Corporation | Integrated circuit test structure |
US4232262A (en) * | 1978-10-12 | 1980-11-04 | Emo George C | Connector contact terminal contamination probe |
US4218653A (en) * | 1978-10-12 | 1980-08-19 | Bell Telephone Laboratories, Incorporated | Connector contact contamination probe |
US4486705A (en) * | 1981-01-16 | 1984-12-04 | Burroughs Corporation | Method of testing networks on a wafer having grounding points on its periphery |
US4423408A (en) * | 1981-02-09 | 1983-12-27 | Honeywell Inc. | Remote data gathering panel |
US4399205A (en) * | 1981-11-30 | 1983-08-16 | International Business Machines Corporation | Method and apparatus for determining photomask alignment |
US4751458A (en) * | 1984-04-02 | 1988-06-14 | American Telephone And Telegraph Company, At&T Bell Laboratories | Test pads for integrated circuit chips |
US4560583A (en) * | 1984-06-29 | 1985-12-24 | International Business Machines Corporation | Resistor design system |
US4652812A (en) * | 1984-11-27 | 1987-03-24 | Harris Corporation | One-sided ion migration velocity measurement and electromigration failure warning device |
US4672314A (en) * | 1985-04-12 | 1987-06-09 | Rca Corporation | Comprehensive semiconductor test structure |
US4797604A (en) * | 1987-12-09 | 1989-01-10 | Etcon Corporation | Wire length meter suppling current to a wire from which a signal representative of length is derived |
JPH01184935A (ja) * | 1988-01-20 | 1989-07-24 | Toshiba Corp | 半導体装置 |
US4922182A (en) * | 1988-08-03 | 1990-05-01 | Monroe Electronics, Inc. | Auto reactance compensated non-contacting resistivity measuring device |
US4918377A (en) * | 1988-12-05 | 1990-04-17 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Integrated circuit reliability testing |
ATE85133T1 (de) * | 1989-02-16 | 1993-02-15 | Mania Gmbh | Schaltung zum messen von widerstaenden von prueflingen. |
US4978923A (en) * | 1989-04-26 | 1990-12-18 | Ron Maltiel | Electrical measurements of the profile of semiconductor devices during their manufacturing process |
US5044750A (en) * | 1990-08-13 | 1991-09-03 | National Semiconductor Corporation | Method for checking lithography critical dimensions |
US5082792A (en) * | 1990-08-15 | 1992-01-21 | Lsi Logic Corporation | Forming a physical structure on an integrated circuit device and determining its size by measurement of resistance |
US5602492A (en) * | 1992-03-13 | 1997-02-11 | The United States Of America As Represented By The Secretary Of Commerce | Electrical test structure and method for measuring the relative locations of conducting features on an insulating substrate |
US5857258A (en) * | 1992-03-13 | 1999-01-12 | The United States Of America As Represented By The Secretary Of Commerce | Electrical test structure and method for measuring the relative locations of conductive features on an insulating substrate |
US5247262A (en) * | 1992-03-13 | 1993-09-21 | The United States Of America As Represented By The Secretary Of Commerce | Linewidth micro-bridge test structure |
US5383136A (en) * | 1992-03-13 | 1995-01-17 | The United States Of America As Represented By The Secretary Of Commerce | Electrical test structure and method for measuring the relative locations of conducting features on an insulating substrate |
US5617340A (en) * | 1994-04-28 | 1997-04-01 | The United States Of America As Represented By The Secretary Of Commerce | Method and reference standards for measuring overlay in multilayer structures, and for calibrating imaging equipment as used in semiconductor manufacturing |
EP0578899B1 (fr) * | 1992-07-15 | 1996-12-27 | STMicroelectronics S.r.l. | Procédé de mesure du degré de planéité d'une couche diélectrique dans un circuit intégré et circuit intégré incorporant les moyens de réalisier ce procédé |
US5485080A (en) * | 1993-09-08 | 1996-01-16 | The United States Of America As Represented By The Secretary Of Commerce | Non-contact measurement of linewidths of conductors in semiconductor device structures |
WO1995007469A1 (fr) * | 1993-09-08 | 1995-03-16 | THE UNITED STATES OF AMERICA, represented by THE SECRETARY, DEPARTMENT OF COMMERCE | Mesure sans contact de la grosseur de ligne d'un conducteur situe sur un substrat semiconducteur |
EP0685881A1 (fr) * | 1994-05-31 | 1995-12-06 | AT&T Corp. | Structure pour contrôler la largeur du trait et méthode |
US5777486A (en) * | 1994-10-03 | 1998-07-07 | United Microelectronics Corporation | Electromigration test pattern simulating semiconductor components |
US5552718A (en) * | 1995-01-04 | 1996-09-03 | International Business Machines Corp. | Electrical test structure and method for space and line measurement |
JPH0972870A (ja) * | 1995-07-06 | 1997-03-18 | Toyota Central Res & Dev Lab Inc | 劣化検出方法及び劣化検出装置 |
KR100223924B1 (ko) * | 1996-07-19 | 1999-10-15 | 구본준 | 전극의 라인폭을 측정하기 위한 테스트패턴 |
US6239604B1 (en) * | 1996-10-04 | 2001-05-29 | U.S. Philips Corporation | Method for inspecting an integrated circuit by measuring a voltage drop in a supply line of sub-circuit thereof |
US5963784A (en) * | 1997-05-09 | 1999-10-05 | Vlsi Technology, Inc. | Methods of determining parameters of a semiconductor device and the width of an insulative spacer of a semiconductor device |
KR100272659B1 (ko) * | 1997-06-28 | 2000-12-01 | 김영환 | 반도체 소자의 금속배선 선폭 측정방법 |
US6057171A (en) * | 1997-09-25 | 2000-05-02 | Frequency Technology, Inc. | Methods for determining on-chip interconnect process parameters |
EP1278997B1 (fr) * | 2000-01-21 | 2005-10-26 | Infineon Technologies AG | Procede d'etalonnage d'un systeme electrique de mesure de largeurs de ligne, plaque s'utilisant dans ce procede, et systeme electrique d'etalonnage de mesure de largeurs de ligne |
KR100336792B1 (ko) * | 2000-05-25 | 2002-05-16 | 박종섭 | 실리사이드막 제조공정의 평가를 위한 시험 패턴의 구조 |
US7183623B2 (en) * | 2001-10-02 | 2007-02-27 | Agere Systems Inc. | Trimmed integrated circuits with fuse circuits |
US6747445B2 (en) | 2001-10-31 | 2004-06-08 | Agere Systems Inc. | Stress migration test structure and method therefor |
JP3652671B2 (ja) * | 2002-05-24 | 2005-05-25 | 沖電気工業株式会社 | 測定用配線パターン及びその測定方法 |
JP2005091065A (ja) * | 2003-09-16 | 2005-04-07 | Oki Electric Ind Co Ltd | 半導体装置への動作電圧供給装置及び動作電圧供給方法 |
US7119571B2 (en) * | 2004-11-24 | 2006-10-10 | Applied Materials, Inc. | Test structure design for reliability test |
KR100828512B1 (ko) * | 2005-10-11 | 2008-05-13 | 삼성전기주식회사 | 개방 및 단락의 동시 모니터링이 가능한 반도체 칩 패키지 |
US7902849B2 (en) * | 2006-01-03 | 2011-03-08 | Applied Materials Israel, Ltd. | Apparatus and method for test structure inspection |
US7750660B2 (en) * | 2006-03-30 | 2010-07-06 | Qualcomm Incorporated | Integrated circuit with improved test capability via reduced pin count |
DE102006025365B4 (de) * | 2006-05-31 | 2010-10-07 | Advanced Micro Devices, Inc., Sunnyvale | Teststruktur zum Abschätzen von Elektromigrationseffekten, die durch poröse Barrierenmaterialien hervorgerufen werden |
US7514940B1 (en) * | 2006-12-13 | 2009-04-07 | National Semiconductor Corporation | System and method for determining effective channel dimensions of metal oxide semiconductor devices |
US8013400B1 (en) | 2008-04-21 | 2011-09-06 | National Semiconductor Corporation | Method and system for scaling channel length |
US9252202B2 (en) * | 2011-08-23 | 2016-02-02 | Wafertech, Llc | Test structure and method for determining overlay accuracy in semiconductor devices using resistance measurement |
US9159646B2 (en) | 2012-12-13 | 2015-10-13 | Intel Corporation | Apparatus and method to monitor die edge defects |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2659862A (en) * | 1951-11-01 | 1953-11-17 | Branson Instr | Apparatus for electrical measurement of thickness using current ratios |
US2659861A (en) * | 1951-11-01 | 1953-11-17 | Branson Instr | Apparatus for electrical thickness measurement |
US2854626A (en) * | 1954-12-31 | 1958-09-30 | Davidson Martin | Plating thickness indicator |
US3134077A (en) * | 1961-09-18 | 1964-05-19 | Tektronix Inc | Electrical probe apparatus for measuring the characteristics of semiconductor material |
CH399588A (de) * | 1962-07-17 | 1965-09-30 | Siemens Ag | Verfahren zum Bestimmen des spezifischen Widerstandes einer dünnen Halbleiterschicht |
US3335340A (en) * | 1964-02-24 | 1967-08-08 | Ibm | Combined transistor and testing structures and fabrication thereof |
US3440715A (en) * | 1967-08-22 | 1969-04-29 | Bell Telephone Labor Inc | Method of fabricating integrated circuits by controlled process |
SE320676B (fr) * | 1968-03-14 | 1970-02-16 | Aka Ab Apparatkemiska | |
US3650020A (en) * | 1970-02-24 | 1972-03-21 | Bell Telephone Labor Inc | Method of monitoring semiconductor device fabrication |
GB1320122A (en) * | 1971-01-15 | 1973-06-13 | Fulmer Res Inst Ltd | Method and equipment for the determination of the degree of abrasiveness of magnetic tape |
US3808527A (en) * | 1973-06-28 | 1974-04-30 | Ibm | Alignment determining system |
-
1975
- 1975-01-02 US US05/538,288 patent/US3974443A/en not_active Expired - Lifetime
- 1975-12-01 FR FR7537209A patent/FR2296852A1/fr active Granted
- 1975-12-04 DE DE2554536A patent/DE2554536C2/de not_active Expired
- 1975-12-15 GB GB51204/75A patent/GB1479869A/en not_active Expired
- 1975-12-23 JP JP50152964A patent/JPS5845816B2/ja not_active Expired
Non-Patent Citations (2)
Title |
---|
ARTICLE DE T.H. BAKER ET AL. "DUMBELL-TYPE RESISTANCE TESTING STRUCTURE".) * |
REVUE US "IBM TECHNICAL DISCLOSURE BULLETIN", VOL. 14, NO. 12, MAI 1972, PAGE 3707 * |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2407483A1 (fr) * | 1977-10-31 | 1979-05-25 | Western Electric Co | Procede et dispositif de test d'elements conducteurs |
FR2473789A1 (fr) * | 1980-01-09 | 1981-07-17 | Ibm France | Procedes et structures de test pour circuits integres a semi-conducteurs permettant la determination electrique de certaines tolerances lors des etapes photolithographiques. |
EP0032197A1 (fr) * | 1980-01-09 | 1981-07-22 | International Business Machines Corporation | Procédés de test pour circuits intégrés à semi-conducteurs permettant la détermination électrique de certaines tolérances lors des étapes photolithographiques |
FR2618021A1 (fr) * | 1987-07-07 | 1989-01-13 | Thomson Semiconducteurs | Structure et procede de test pour circuit integre permettant la determination des effets de surface de couches |
EP0299887A1 (fr) * | 1987-07-07 | 1989-01-18 | STMicroelectronics S.A. | Structure et procédé de test pour circuit intégré permettant la détermination des effets de surface de couches |
US4906921A (en) * | 1987-07-07 | 1990-03-06 | Sgs-Thompson Microelectronics S.A. | Structure and process for testing integrated circuits permitting determination of the properties of layers |
FR2706042A1 (fr) * | 1993-06-03 | 1994-12-09 | Matra Cap Systems Sa | Procédé de contrôle des pistes d'un circuit d'interconnexion et circuit permettant de mette en Óoeuvre un tel procédé. |
EP0636894A1 (fr) * | 1993-06-03 | 1995-02-01 | Matra Cap Systemes | Circuit et procédé de contrôle des pistes d'un circuit d'interconnexion |
Also Published As
Publication number | Publication date |
---|---|
DE2554536A1 (de) | 1976-07-08 |
JPS5845816B2 (ja) | 1983-10-12 |
JPS5190573A (fr) | 1976-08-09 |
GB1479869A (en) | 1977-07-13 |
US3974443A (en) | 1976-08-10 |
FR2296852B1 (fr) | 1978-05-12 |
DE2554536C2 (de) | 1986-04-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |