FR2295452B2 - - Google Patents

Info

Publication number: FR2295452B2
Authority: FR; France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

FR7534729A

Other languages

French (fr)

Other versions

FR2295452A2 (en

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

International Business Machines Corp

Original Assignee

International Business Machines Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1974-12-21

Filing date

1975-11-07

Publication date

1977-12-16

1975-11-07 Application filed by International Business Machines Corp filed Critical International Business Machines Corp

1976-07-16 Publication of FR2295452A2 publication Critical patent/FR2295452A2/en

1977-12-16 Application granted granted Critical

1977-12-16 Publication of FR2295452B2 publication Critical patent/FR2295452B2/fr

Status Granted legal-status Critical Current

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Projection-Type Copiers In General (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Variable Magnification In Projection-Type Copying Machines (AREA)
Automatic Focus Adjustment (AREA)

FR7534729A 1974-12-21 1975-11-07 METHOD AND DEVICE FOR PROJECTING IMAGES ON A SEMICONDUCTOR PLATE Granted FR2295452A2 (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE19742460914 DE2460914C2 (en)	1974-12-21	1974-12-21	Photolithographic projection apparatus

Publications (2)

Publication Number	Publication Date
FR2295452A2 FR2295452A2 (en)	1976-07-16
FR2295452B2 true FR2295452B2 (en)	1977-12-16

Family

ID=5934300

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
FR7534729A Granted FR2295452A2 (en)	1974-12-21	1975-11-07	METHOD AND DEVICE FOR PROJECTING IMAGES ON A SEMICONDUCTOR PLATE

Country Status (4)

Country	Link
JP (1)	JPS548070B2 (en)
DE (1)	DE2460914C2 (en)
FR (1)	FR2295452A2 (en)
GB (1)	GB1510007A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2633297A1 (en) *	1976-07-23	1978-01-26	Siemens Ag	AUTOMATIC ADJUSTMENT PROCEDURE
DE2635275C2 (en) *	1976-08-05	1984-09-06	Siemens AG, 1000 Berlin und 8000 München	Method for adjusting a disk-shaped substrate relative to a photomask in an X-ray exposure apparatus
DE2757386C3 (en) *	1977-12-22	1981-11-26	Agfa-Gevaert Ag, 5090 Leverkusen	Exposure arrangement for copiers
FR2450470A1 (en) *	1979-02-27	1980-09-26	Thomson Csf	OPTICAL PROJECTION SYSTEM IN PHOTOREPETITION
JP2576814B2 (en) *	1995-06-16	1997-01-29	株式会社日立製作所	Exposure method
TWI237307B (en)	2003-05-01	2005-08-01	Nikon Corp	Optical projection system, light exposing apparatus and light exposing method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US2464793A (en) *	1942-08-08	1949-03-22	Lester Cooke Jr H	Method and apparatus for photographic scanning
DE1173327B (en) *	1961-04-10	1964-07-02	Logetronics Inc	Arrangement for detecting and automatically adjusting the focus in a photographic device
DE2050590C2 (en) *	1970-10-15	1982-06-16	Ibm Deutschland Gmbh, 7000 Stuttgart	Projection device
US3819265A (en) *	1972-08-02	1974-06-25	Bell Telephone Labor Inc	Scanning projection printer apparatus and method

1974
- 1974-12-21 DE DE19742460914 patent/DE2460914C2/en not_active Expired
1975
- 1975-11-06 GB GB4598375A patent/GB1510007A/en not_active Expired
- 1975-11-07 FR FR7534729A patent/FR2295452A2/en active Granted
- 1975-11-11 JP JP13475275A patent/JPS548070B2/ja not_active Expired

Also Published As

Publication number	Publication date
GB1510007A (en)	1978-05-10
JPS548070B2 (en)	1979-04-12
JPS5186975A (en)	1976-07-30
DE2460914A1 (en)	1976-06-24
DE2460914C2 (en)	1983-08-18
FR2295452A2 (en)	1976-07-16

Publication	Publication Date	Title
FR2272605B1 (en)	1978-09-22
JPS50105022A (en)	1975-08-19
FR2286478B1 (en)	1981-02-06
FR2276292B1 (en)	1979-01-19
FR2271174A1 (en)	1975-12-12
FR2295452B2 (en)	1977-12-16
FR2275643B1 (en)	1977-03-11
FR2266187B1 (en)	1976-12-10
JPS50135717U (en)	1975-11-08
JPS50101526A (en)	1975-08-12
JPS50103276A (en)	1975-08-15
JPS50113653U (en)	1975-09-17
JPS50133503A (en)	1975-10-22
JPS50106051U (en)	1975-09-01
JPS50104946U (en)	1975-08-29
JPS50105733U (en)	1975-08-30
JPS50114363A (en)	1975-09-08
HU170128B (en)	1977-04-28
JPS50121511A (en)	1975-09-23
JPS50122897A (en)	1975-09-26
JPS50123167U (en)	1975-10-08
JPS50124644A (en)	1975-09-30
CH579438A5 (en)	1976-09-15
CH577999A5 (en)	1976-07-30
CH581409A5 (en)	1976-10-29