FR2285423A1 - Photohardenable or photopolymerisable compsn - using cationic sulphur, selenium or tellurium cpd as photosensitiser - Google Patents
Photohardenable or photopolymerisable compsn - using cationic sulphur, selenium or tellurium cpd as photosensitiserInfo
- Publication number
- FR2285423A1 FR2285423A1 FR7528525A FR7528525A FR2285423A1 FR 2285423 A1 FR2285423 A1 FR 2285423A1 FR 7528525 A FR7528525 A FR 7528525A FR 7528525 A FR7528525 A FR 7528525A FR 2285423 A1 FR2285423 A1 FR 2285423A1
- Authority
- FR
- France
- Prior art keywords
- compsn
- photosensitiser
- photopolymerisable
- photohardenable
- cpd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052711 selenium Inorganic materials 0.000 title abstract 2
- 229910052714 tellurium Inorganic materials 0.000 title abstract 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 title 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 title 1
- 239000005864 Sulphur Substances 0.000 title 1
- 125000002091 cationic group Chemical group 0.000 title 1
- 239000011669 selenium Substances 0.000 title 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 title 1
- 239000002253 acid Substances 0.000 abstract 2
- 239000000470 constituent Substances 0.000 abstract 2
- 150000007513 acids Chemical class 0.000 abstract 1
- 150000001450 anions Chemical class 0.000 abstract 1
- 125000000623 heterocyclic group Chemical group 0.000 abstract 1
- 125000001183 hydrocarbyl group Chemical group 0.000 abstract 1
- 239000003112 inhibitor Substances 0.000 abstract 1
- 231100000331 toxic Toxicity 0.000 abstract 1
- 230000002588 toxic effect Effects 0.000 abstract 1
- 229910052723 transition metal Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G85/00—General processes for preparing compounds provided for in this subclass
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Epoxy Resins (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Abstract
Photopolymerisable compsn. contains >=1 constituent which is polymerisable or hardenable by acids and a photosensitiser having the formula: where A is S, Se or Te; n is 1 or 2; R1, R2, and R3 are each independently an opt. substd. hydrocarbyl radical or a heterocyclic radical or two of R1, R2 and R3 form a heterocycle with A and the other one of them is hydrocarbyl; Xn- is the anion of an acid which is able to polymerise or harden the above constituent. The compsns. are used for printing plates, printed circuits etc. The compsns. can be stored for long time in the dark without gelification and therefore do not require an inhibitor in this respect. Also the compsn. avoids the use of toxic cpds. such as transition metal carbonyls and N-nitrosamines used in previous process.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB40682/74A GB1526923A (en) | 1974-09-18 | 1974-09-18 | Photopolymerisable compositions |
GB759875 | 1975-02-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2285423A1 true FR2285423A1 (en) | 1976-04-16 |
FR2285423B1 FR2285423B1 (en) | 1979-08-31 |
Family
ID=26241548
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7528525A Granted FR2285423A1 (en) | 1974-09-18 | 1975-09-17 | Photohardenable or photopolymerisable compsn - using cationic sulphur, selenium or tellurium cpd as photosensitiser |
Country Status (9)
Country | Link |
---|---|
JP (1) | JPS6057442B2 (en) |
DE (1) | DE2541709C2 (en) |
DK (1) | DK415875A (en) |
FR (1) | FR2285423A1 (en) |
IE (1) | IE42085B1 (en) |
IT (1) | IT1042624B (en) |
NL (1) | NL179654C (en) |
NZ (1) | NZ178699A (en) |
SE (1) | SE425399B (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2358434A1 (en) * | 1976-07-14 | 1978-02-10 | Gen Electric | COMPOSITIONS SUITABLE TO UNDERGO CATIONIC POLYMERIZATION CONTAINING AN ONIUM SALT |
FR2380322A1 (en) * | 1977-02-14 | 1978-09-08 | Gen Electric | COMPOSITIONS OF ORGANIC RESINS CURABLE BY ULTRA-VIOLET LIGHT |
FR2399444A1 (en) * | 1977-08-05 | 1979-03-02 | Gen Electric | COMPOSITIONS OF OXYGEN-FREE PHOTOCURING ORGANIC RESINS BELONGING TO AN OXIRANE GROUP AND CURING PROCESS |
FR2399443A1 (en) * | 1977-08-05 | 1979-03-02 | Gen Electric | LIGHT-CURING COMPOSITION BASED ON ALIPHATICALLY UNSATURE ORGANIC MATERIAL |
FR2403351A1 (en) * | 1977-09-14 | 1979-04-13 | Gen Electric | PHOTOINITIATORS IN THE FORM OF ONIUM SALTS OF ELEMENTS OF THE VIA GROUP |
FR2416920A1 (en) * | 1978-02-08 | 1979-09-07 | Minnesota Mining & Mfg | PHOTOPOLYMERISABLE COMPOSITIONS ODORLESS SULFONIUM EPOXIDES |
FR2416922A1 (en) * | 1978-02-08 | 1979-09-07 | Minnesota Mining & Mfg | LIQUID COMPOSITIONS CONTAINING COMPLEX SALTS OF SULFONIUM AND OXYETHYLENE |
EP0011918A2 (en) * | 1978-10-27 | 1980-06-11 | Imperial Chemical Industries Plc | Polymerisable compositions, derived coatings and other polymerised products |
FR2447387A1 (en) * | 1979-01-29 | 1980-08-22 | Minnesota Mining & Mfg | LIQUID COMPOSITIONS BASED ON COMPLEX PHOTODECOMPOSABLE SALTS |
EP0014785A1 (en) * | 1979-02-12 | 1980-09-03 | General Electric Company | Coating method and curable compositions |
EP1591832A2 (en) * | 2004-04-20 | 2005-11-02 | Fuji Photo Film Co., Ltd. | Photosensitive composition, compound used in the same, and patterning method using the same |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4069054A (en) * | 1975-09-02 | 1978-01-17 | Minnesota Mining And Manufacturing Company | Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer |
US4273668A (en) * | 1977-09-14 | 1981-06-16 | General Electric Company | Arylsulfonium salt-solvent mixtures |
SE8901048D0 (en) * | 1989-03-23 | 1989-03-23 | Becker Wilhelm Ab | polymerisation |
DE3909688A1 (en) * | 1989-03-23 | 1990-09-27 | Espe Stiftung | METHOD FOR GLUING OR POOLING SUBSTRATES AND DEVICE FOR CARRYING OUT ITSELF |
EP0410606B1 (en) | 1989-07-12 | 1996-11-13 | Fuji Photo Film Co., Ltd. | Siloxane polymers and positive working light-sensitive compositions comprising the same |
US6723483B1 (en) * | 1999-12-27 | 2004-04-20 | Wako Pure Chemical Industries, Ltd. | Sulfonium salt compounds |
KR100763625B1 (en) * | 2000-08-30 | 2007-10-05 | 와코 쥰야꾸 고교 가부시키가이샤 | Sulfonium Salt Compound |
RU2495468C1 (en) | 2010-02-05 | 2013-10-10 | Кэнон Кабусики Кайся | Negative photosensitive polymer composition, method of forming pattern and liquid ejection head |
US8980968B2 (en) * | 2010-02-05 | 2015-03-17 | Canon Kabushiki Kaisha | Photosensitive resin composition, method for producing structure, and liquid discharge head |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3412046A (en) * | 1965-07-01 | 1968-11-19 | Dexter Corp | Catalyzed polyepoxide-anhydride resin systems |
-
1975
- 1975-09-11 IE IE1980/75A patent/IE42085B1/en unknown
- 1975-09-16 NZ NZ17869975A patent/NZ178699A/en unknown
- 1975-09-17 DK DK415875A patent/DK415875A/en not_active Application Discontinuation
- 1975-09-17 IT IT27334/75A patent/IT1042624B/en active
- 1975-09-17 NL NL7510920A patent/NL179654C/en not_active IP Right Cessation
- 1975-09-17 SE SE7510390A patent/SE425399B/en not_active IP Right Cessation
- 1975-09-17 FR FR7528525A patent/FR2285423A1/en active Granted
- 1975-09-18 DE DE2541709A patent/DE2541709C2/en not_active Expired
- 1975-09-18 JP JP50113094A patent/JPS6057442B2/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3412046A (en) * | 1965-07-01 | 1968-11-19 | Dexter Corp | Catalyzed polyepoxide-anhydride resin systems |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2358434A1 (en) * | 1976-07-14 | 1978-02-10 | Gen Electric | COMPOSITIONS SUITABLE TO UNDERGO CATIONIC POLYMERIZATION CONTAINING AN ONIUM SALT |
FR2380322A1 (en) * | 1977-02-14 | 1978-09-08 | Gen Electric | COMPOSITIONS OF ORGANIC RESINS CURABLE BY ULTRA-VIOLET LIGHT |
FR2399444A1 (en) * | 1977-08-05 | 1979-03-02 | Gen Electric | COMPOSITIONS OF OXYGEN-FREE PHOTOCURING ORGANIC RESINS BELONGING TO AN OXIRANE GROUP AND CURING PROCESS |
FR2399443A1 (en) * | 1977-08-05 | 1979-03-02 | Gen Electric | LIGHT-CURING COMPOSITION BASED ON ALIPHATICALLY UNSATURE ORGANIC MATERIAL |
FR2545491A1 (en) * | 1977-08-05 | 1984-11-09 | Gen Electric | Light-curable organic resin compositions provided with oxygen belonging to an oxirane group and curing process |
FR2403351A1 (en) * | 1977-09-14 | 1979-04-13 | Gen Electric | PHOTOINITIATORS IN THE FORM OF ONIUM SALTS OF ELEMENTS OF THE VIA GROUP |
FR2416922A1 (en) * | 1978-02-08 | 1979-09-07 | Minnesota Mining & Mfg | LIQUID COMPOSITIONS CONTAINING COMPLEX SALTS OF SULFONIUM AND OXYETHYLENE |
FR2416920A1 (en) * | 1978-02-08 | 1979-09-07 | Minnesota Mining & Mfg | PHOTOPOLYMERISABLE COMPOSITIONS ODORLESS SULFONIUM EPOXIDES |
EP0011918A2 (en) * | 1978-10-27 | 1980-06-11 | Imperial Chemical Industries Plc | Polymerisable compositions, derived coatings and other polymerised products |
EP0011918A3 (en) * | 1978-10-27 | 1981-01-21 | Imperial Chemical Industries Plc | Polymerisable compositions, derived coatings and other polymerised products |
FR2447387A1 (en) * | 1979-01-29 | 1980-08-22 | Minnesota Mining & Mfg | LIQUID COMPOSITIONS BASED ON COMPLEX PHOTODECOMPOSABLE SALTS |
EP0014785A1 (en) * | 1979-02-12 | 1980-09-03 | General Electric Company | Coating method and curable compositions |
EP1591832A2 (en) * | 2004-04-20 | 2005-11-02 | Fuji Photo Film Co., Ltd. | Photosensitive composition, compound used in the same, and patterning method using the same |
EP1591832A3 (en) * | 2004-04-20 | 2005-11-16 | Fuji Photo Film Co., Ltd. | Photosensitive composition, compound used in the same, and patterning method using the same |
US7323286B2 (en) | 2004-04-20 | 2008-01-29 | Fujifilm Corporation | Photosensitive composition, compound used in the same, and patterning method using the same |
Also Published As
Publication number | Publication date |
---|---|
SE7510390L (en) | 1976-03-19 |
SE425399B (en) | 1982-09-27 |
FR2285423B1 (en) | 1979-08-31 |
DK415875A (en) | 1976-03-19 |
JPS5156885A (en) | 1976-05-18 |
IE42085B1 (en) | 1980-06-04 |
DE2541709C2 (en) | 1985-02-21 |
NL179654C (en) | 1986-10-16 |
NL179654B (en) | 1986-05-16 |
NZ178699A (en) | 1978-03-06 |
IE42085L (en) | 1976-03-18 |
NL7510920A (en) | 1976-03-22 |
IT1042624B (en) | 1980-01-30 |
AU8489975A (en) | 1977-03-24 |
JPS6057442B2 (en) | 1985-12-14 |
DE2541709A1 (en) | 1976-04-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |