FR2174967B1 - - Google Patents

Info

Publication number
FR2174967B1
FR2174967B1 FR7307650A FR7307650A FR2174967B1 FR 2174967 B1 FR2174967 B1 FR 2174967B1 FR 7307650 A FR7307650 A FR 7307650A FR 7307650 A FR7307650 A FR 7307650A FR 2174967 B1 FR2174967 B1 FR 2174967B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7307650A
Other languages
French (fr)
Other versions
FR2174967A1 (de
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers Patent und Beteiligungs AG
Original Assignee
Balzers Patent und Beteiligungs AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent und Beteiligungs AG filed Critical Balzers Patent und Beteiligungs AG
Publication of FR2174967A1 publication Critical patent/FR2174967A1/fr
Application granted granted Critical
Publication of FR2174967B1 publication Critical patent/FR2174967B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
FR7307650A 1972-03-06 1973-03-05 Expired FR2174967B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH327572A CH565869A5 (de) 1972-03-06 1972-03-06

Publications (2)

Publication Number Publication Date
FR2174967A1 FR2174967A1 (de) 1973-10-19
FR2174967B1 true FR2174967B1 (de) 1977-04-22

Family

ID=4252464

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7307650A Expired FR2174967B1 (de) 1972-03-06 1973-03-05

Country Status (7)

Country Link
JP (1) JPS5411798B2 (de)
AT (1) AT319007B (de)
CH (1) CH565869A5 (de)
DE (1) DE2305359C3 (de)
FR (1) FR2174967B1 (de)
GB (1) GB1394655A (de)
NL (1) NL151137B (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5691437A (en) * 1979-12-26 1981-07-24 Nippon Hoso Kyokai <Nhk> Preparation of metallized element
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
JPS6115967A (ja) * 1984-06-29 1986-01-24 Sumitomo Electric Ind Ltd 表面処理方法
JPS61177366A (ja) * 1985-01-31 1986-08-09 Sharp Corp 超微粒子分散基板の製造装置
US4888202A (en) * 1986-07-31 1989-12-19 Nippon Telegraph And Telephone Corporation Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film

Also Published As

Publication number Publication date
NL151137B (nl) 1976-10-15
NL7205592A (de) 1973-09-10
DE2305359C3 (de) 1980-01-10
DE2305359B2 (de) 1975-07-17
JPS48102076A (de) 1973-12-21
JPS5411798B2 (de) 1979-05-17
CH565869A5 (de) 1975-08-29
AT319007B (de) 1974-11-25
FR2174967A1 (de) 1973-10-19
DE2305359A1 (de) 1973-09-13
GB1394655A (en) 1975-05-21

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Legal Events

Date Code Title Description
ST Notification of lapse