FR2147497A5 - - Google Patents
Info
- Publication number
- FR2147497A5 FR2147497A5 FR7127812A FR7127812A FR2147497A5 FR 2147497 A5 FR2147497 A5 FR 2147497A5 FR 7127812 A FR7127812 A FR 7127812A FR 7127812 A FR7127812 A FR 7127812A FR 2147497 A5 FR2147497 A5 FR 2147497A5
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
- H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
- Plasma Technology (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7127812A FR2147497A5 (de) | 1971-07-29 | 1971-07-29 | |
US00275304A US3778656A (en) | 1971-07-29 | 1972-07-26 | Ion source employing a microwave resonant cavity |
GB3521172A GB1352654A (en) | 1971-07-29 | 1972-07-27 | Ion source which makes use of a microwave resonant cavity |
DE2237252A DE2237252A1 (de) | 1971-07-29 | 1972-07-28 | Ionenquelle mit hochfrequenz-hohlraumresonator |
DE19727228091U DE7228091U (de) | 1971-07-29 | 1972-07-28 | Ionenquelle mit hochfrequenz-hohlraumresonator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7127812A FR2147497A5 (de) | 1971-07-29 | 1971-07-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2147497A5 true FR2147497A5 (de) | 1973-03-09 |
Family
ID=9081130
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7127812A Expired FR2147497A5 (de) | 1971-07-29 | 1971-07-29 |
Country Status (4)
Country | Link |
---|---|
US (1) | US3778656A (de) |
DE (2) | DE2237252A1 (de) |
FR (1) | FR2147497A5 (de) |
GB (1) | GB1352654A (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2475798A1 (fr) * | 1980-02-13 | 1981-08-14 | Commissariat Energie Atomique | Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede |
EP0334184A2 (de) * | 1988-03-16 | 1989-09-27 | Hitachi, Ltd. | Mikrowellenionenquelle |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2621824C2 (de) * | 1976-05-17 | 1982-04-29 | Hitachi, Ltd., Tokyo | Mikrowellen-Entladungs-Ionenquelle |
US4185213A (en) * | 1977-08-31 | 1980-01-22 | Reynolds Metals Company | Gaseous electrode for MHD generator |
JPS55131175A (en) * | 1979-03-30 | 1980-10-11 | Toshiba Corp | Surface treatment apparatus with microwave plasma |
US4240007A (en) * | 1979-06-29 | 1980-12-16 | International Business Machines Corporation | Microchannel ion gun |
US4393333A (en) * | 1979-12-10 | 1983-07-12 | Hitachi, Ltd. | Microwave plasma ion source |
JPS5947421B2 (ja) * | 1980-03-24 | 1984-11-19 | 株式会社日立製作所 | マイクロ波イオン源 |
CA1159012A (en) * | 1980-05-02 | 1983-12-20 | Seitaro Matsuo | Plasma deposition apparatus |
JPS5779621A (en) * | 1980-11-05 | 1982-05-18 | Mitsubishi Electric Corp | Plasma processing device |
JPS6043620B2 (ja) * | 1982-11-25 | 1985-09-28 | 日新ハイボルテージ株式会社 | マイクロ波イオン源 |
US4507588A (en) * | 1983-02-28 | 1985-03-26 | Board Of Trustees Operating Michigan State University | Ion generating apparatus and method for the use thereof |
FR2546358B1 (fr) * | 1983-05-20 | 1985-07-05 | Commissariat Energie Atomique | Source d'ions a resonance cyclotronique des electrons |
FR2572847B1 (fr) * | 1984-11-06 | 1986-12-26 | Commissariat Energie Atomique | Procede et dispositif d'allumage d'une source d'ions hyperfrequence |
US4649278A (en) * | 1985-05-02 | 1987-03-10 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Generation of intense negative ion beams |
DE3703207A1 (de) * | 1987-02-04 | 1988-08-18 | Loet Und Schweissgeraete Gmbh | Hochfrequenzionenquelle |
DE3712971A1 (de) * | 1987-04-16 | 1988-11-03 | Plasonic Oberflaechentechnik G | Verfahren und vorrichtung zum erzeugen eines plasmas |
US4778561A (en) * | 1987-10-30 | 1988-10-18 | Veeco Instruments, Inc. | Electron cyclotron resonance plasma source |
DE3738352A1 (de) * | 1987-11-11 | 1989-05-24 | Technics Plasma Gmbh | Filamentloses magnetron-ionenstrahlsystem |
DE3803355A1 (de) * | 1988-02-05 | 1989-08-17 | Leybold Ag | Teilchenquelle fuer eine reaktive ionenstrahlaetz- oder plasmadepositionsanlage |
DE3834984A1 (de) * | 1988-10-14 | 1990-04-19 | Leybold Ag | Einrichtung zur erzeugung von elektrisch geladenen und/oder ungeladenen teilchen |
GB9224745D0 (en) * | 1992-11-26 | 1993-01-13 | Atomic Energy Authority Uk | Microwave plasma generator |
DE19513345C2 (de) * | 1995-04-08 | 2000-08-03 | Ehret Hans P | ECR-Ionenquelle |
DE19600223A1 (de) * | 1996-01-05 | 1997-07-17 | Ralf Dr Dipl Phys Spitzl | Vorrichtung zur Erzeugung von Plasmen mittels Mikrowellen |
DE19608949A1 (de) * | 1996-03-08 | 1997-09-11 | Ralf Dr Spitzl | Vorrichtung zur Erzeugung von leistungsfähigen Mikrowellenplasmen |
DE19757852C2 (de) * | 1997-12-24 | 2001-06-28 | Karlsruhe Forschzent | Vorrichtung und Verfahren zur Dotierung von Gefäßstützen mit radiaktiven und nicht radioaktiven Atomen |
DE19900437B4 (de) * | 1999-01-11 | 2009-04-23 | Ehret, Hans-P. | Verfahren und Vorrichtung zur Ionenimplantation in Festkörpern und/oder zur Beschichtung von Festkörperoberflächen sowie die Verwendung von Verfahren und Vorrichtung |
US7461502B2 (en) * | 2003-03-20 | 2008-12-09 | Elwing Llc | Spacecraft thruster |
ES2272909T3 (es) * | 2003-03-20 | 2007-05-01 | Elwing Llc | Propulsor para vehiculo espacial. |
EP1995458B1 (de) * | 2004-09-22 | 2013-01-23 | Elwing LLC | Raumfahrtstahlruder |
JP2011511929A (ja) | 2007-10-10 | 2011-04-14 | エム ケー エス インストルメンツ インコーポレーテッド | 四重極または飛行時間型質量分光計を用いた化学イオン化反応または陽子移動反応質量分光分析 |
NL2014415B1 (en) * | 2015-03-06 | 2016-10-13 | Jiaco Instr Holding B V | System and method for decapsulation of plastic integrated circuit packages. |
CN106102301B (zh) * | 2016-07-29 | 2019-01-29 | 中国原子能科学研究院 | 紧凑型超导质子回旋加速器中可耐高压的静电偏转板 |
ES2696227B2 (es) * | 2018-07-10 | 2019-06-12 | Centro De Investig Energeticas Medioambientales Y Tecnologicas Ciemat | Fuente de iones interna para ciclotrones de baja erosion |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3418206A (en) * | 1963-04-29 | 1968-12-24 | Boeing Co | Particle accelerator |
-
1971
- 1971-07-29 FR FR7127812A patent/FR2147497A5/fr not_active Expired
-
1972
- 1972-07-26 US US00275304A patent/US3778656A/en not_active Expired - Lifetime
- 1972-07-27 GB GB3521172A patent/GB1352654A/en not_active Expired
- 1972-07-28 DE DE2237252A patent/DE2237252A1/de active Pending
- 1972-07-28 DE DE19727228091U patent/DE7228091U/de not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2475798A1 (fr) * | 1980-02-13 | 1981-08-14 | Commissariat Energie Atomique | Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede |
EP0334184A2 (de) * | 1988-03-16 | 1989-09-27 | Hitachi, Ltd. | Mikrowellenionenquelle |
EP0334184A3 (en) * | 1988-03-16 | 1989-11-29 | Hitachi, Ltd. | Microwave ion source |
Also Published As
Publication number | Publication date |
---|---|
GB1352654A (en) | 1974-05-08 |
US3778656A (en) | 1973-12-11 |
DE7228091U (de) | 1973-09-20 |
DE2237252A1 (de) | 1973-02-01 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |