FR1439444A - Procédé de formation de films minces par dépôt de vapeurs - Google Patents

Procédé de formation de films minces par dépôt de vapeurs

Info

Publication number
FR1439444A
FR1439444A FR21717A FR21717A FR1439444A FR 1439444 A FR1439444 A FR 1439444A FR 21717 A FR21717 A FR 21717A FR 21717 A FR21717 A FR 21717A FR 1439444 A FR1439444 A FR 1439444A
Authority
FR
France
Prior art keywords
vapor deposition
thin films
forming thin
forming
films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR21717A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of FR1439444A publication Critical patent/FR1439444A/fr
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/045—Electric field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR21717A 1964-06-24 1965-06-22 Procédé de formation de films minces par dépôt de vapeurs Expired FR1439444A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US377674A US3406040A (en) 1964-06-24 1964-06-24 Vapor deposition method for forming thin polymeric films

Publications (1)

Publication Number Publication Date
FR1439444A true FR1439444A (fr) 1966-05-20

Family

ID=23490086

Family Applications (1)

Application Number Title Priority Date Filing Date
FR21717A Expired FR1439444A (fr) 1964-06-24 1965-06-22 Procédé de formation de films minces par dépôt de vapeurs

Country Status (4)

Country Link
US (1) US3406040A (fr)
DE (1) DE1521313A1 (fr)
FR (1) FR1439444A (fr)
GB (1) GB1092744A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2443883A1 (fr) * 1978-12-11 1980-07-11 Lord Corp Procede de depot de films organiques par implantation ionique pour obtenir des revetements

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3480553A (en) * 1967-02-20 1969-11-25 Gen Electric Oxidation resistant high energy magnetic material
US3885060A (en) * 1968-08-23 1975-05-20 Hitachi Ltd Production of insolubilized organic polymers
US3627599A (en) * 1969-04-25 1971-12-14 Rca Corp Method of applying an n,n{40 diallylmelamine resist to a surface
US3663265A (en) * 1970-11-16 1972-05-16 North American Rockwell Deposition of polymeric coatings utilizing electrical excitation
US4161418A (en) * 1975-06-27 1979-07-17 Futaba Denshi Kogyo K. K. Ionized-cluster-beam deposition process for fabricating p-n junction semiconductor layers
JPS523583A (en) * 1975-06-27 1977-01-12 Toshinori Takagi Crystal film forming process
GB1601427A (en) * 1977-06-20 1981-10-28 Siemens Ag Deposition of a layer of electrically-conductive material on a graphite body
JPS58167602A (ja) * 1982-03-29 1983-10-03 Futaba Corp 有機物薄膜の形成方法
DE3571772D1 (en) * 1984-03-21 1989-08-31 Ulvac Corp Improvements in or relating to the covering of substrates with synthetic resin films
JPS63215578A (ja) * 1987-02-28 1988-09-08 株式会社豊田中央研究所 セラミツク材料表面への固体潤滑被膜の形成方法
US4876984A (en) * 1987-06-12 1989-10-31 Ricoh Company, Ltd. Apparatus for forming a thin film

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2428868A (en) * 1944-05-01 1947-10-14 Rca Corp Apparatus for producing hardened optical coatings by electron bombardment
US3080481A (en) * 1959-04-17 1963-03-05 Sprague Electric Co Method of making transistors
US3117022A (en) * 1960-09-06 1964-01-07 Space Technhology Lab Inc Deposition arrangement
US3132046A (en) * 1960-09-28 1964-05-05 Space Technology Lab Inc Method for the deposition of thin films by electron bombardment
US3192892A (en) * 1961-11-24 1965-07-06 Sperry Rand Corp Ion bombardment cleaning and coating apparatus
US3211570A (en) * 1961-12-21 1965-10-12 Winfield W Salisbury Process of making sine wave gratings
US3161542A (en) * 1961-12-29 1964-12-15 Ibm Peltier heating and cooling of substrates and masks
US3168418A (en) * 1962-03-27 1965-02-02 Alloyd Electronics Device for monitoring and controlling evaporation rate in vacuum deposition
NL293028A (fr) * 1962-06-05
US3310424A (en) * 1963-05-14 1967-03-21 Litton Systems Inc Method for providing an insulating film on a substrate
US3297465A (en) * 1963-12-31 1967-01-10 Ibm Method for producing organic plasma and for depositing polymer films

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2443883A1 (fr) * 1978-12-11 1980-07-11 Lord Corp Procede de depot de films organiques par implantation ionique pour obtenir des revetements

Also Published As

Publication number Publication date
DE1521313A1 (de) 1969-11-06
GB1092744A (en) 1967-11-29
US3406040A (en) 1968-10-15

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