FI20205586A - Coating of particulate materials - Google Patents
Coating of particulate materialsInfo
- Publication number
- FI20205586A FI20205586A FI20205586A FI20205586A FI20205586A FI 20205586 A FI20205586 A FI 20205586A FI 20205586 A FI20205586 A FI 20205586A FI 20205586 A FI20205586 A FI 20205586A FI 20205586 A FI20205586 A FI 20205586A
- Authority
- FI
- Finland
- Prior art keywords
- flow
- fluid
- reactive fluid
- particulate substrate
- reaction chamber
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4417—Methods specially adapted for coating powder
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Chemical deposition reactor assembly 100 configured for formation of coatings on surfaces of particulate materials, such as powders and/or fibers, by chemical deposition is provided, said reactor assembly comprises a reaction chamber 101; at least one reactive fluid intake line 21 configured to mediate a flow of reactive fluid 12 into the reaction chamber, and an inert fluid delivery arrangement comprising an essentially tubular enclosed section 31 configured to pass through the reaction chamber 101 and loadable with the particulate substrate 10, said tubular member comprising at least one aperture 31A defining a volume, where the particulate substrate within the enclosed section 31 is exposed to the flow of reactive fluid 12. In said tubular enclosure 31, a flow of inert fluid 11 is mediated through the particulate substrate 10 towards the aperture 31A such, that, within the volume exposed to the flow of reactive fluid 12, the flow of inert fluid 11 encounters the flow of reactive fluid 12, whereby a coating is formed at the surfaces of particulate substrate within said volume.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20205586A FI129344B (en) | 2019-06-06 | 2019-06-06 | Coating of particulate materials |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20205586A FI129344B (en) | 2019-06-06 | 2019-06-06 | Coating of particulate materials |
Publications (3)
Publication Number | Publication Date |
---|---|
FI20205586A1 FI20205586A1 (en) | 2020-12-07 |
FI20205586A true FI20205586A (en) | 2020-12-07 |
FI129344B FI129344B (en) | 2021-12-15 |
Family
ID=79171383
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI20205586A FI129344B (en) | 2019-06-06 | 2019-06-06 | Coating of particulate materials |
Country Status (1)
Country | Link |
---|---|
FI (1) | FI129344B (en) |
-
2019
- 2019-06-06 FI FI20205586A patent/FI129344B/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
FI129344B (en) | 2021-12-15 |
FI20205586A1 (en) | 2020-12-07 |
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