FI129344B - Coating of particulate materials - Google Patents

Abstract

Chemical deposition reactor assembly 100 configured for formation of coatings on surfaces of particulate materials, such as powders and/or fibers, by chemical deposition is provided, said reactor assembly comprises a reaction chamber 101; at least one reactive fluid intake line 21 configured to mediate a flow of reactive fluid 12 into the reaction chamber, and an inert fluid delivery arrangement comprising an essentially tubular enclosed section 31 configured to pass through the reaction chamber 101 and loadable with the particulate substrate 10, said tubular member comprising at least one aperture 31A defining a volume, where the particulate substrate within the enclosed section 31 is exposed to the flow of reactive fluid 12. In said tubular enclosure 31, a flow of inert fluid 11 is mediated through the particulate substrate 10 towards the aperture 31A such, that, within the volume exposed to the flow of reactive fluid 12, the flow of inert fluid 11 encounters the flow of reactive fluid 12, whereby a coating is formed at the surfaces of particulate substrate within said volume.

Description

COATING OF PARTICULATE MATERIALS

FIELD OF THE INVENTION The present invention generally relates to thin-layer deposition methods and associated equipment. In particular, the present invention concerns a reactor assembly and a related method for formation of coatings on surfaces of fluid-permeable particulate materials using chemical deposition techniques.

BACKGROUND Chemical deposition methods, such as Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD), are extensively described in the art. ALD technology generally regarded as a subclass of CVD processes has proved an efficient tool for manufacturing high-quality conformal coatings on three-dimensional substrate structures. ALD is based on alternating self-saturative surface reactions, wherein different reactants (precursors) provided as chemical compounds or elements in a nonreactive (inert) gaseous carrier are sequentially pulsed into a reaction space accommodating a substrate. Deposition of a reactant is followed by purging the substrate by inert gas. Conventional ALD cycle proceeds in two half-reactions (pulse first precursor — purge; pulse second precursor — purge), whereby a layer of material is formed in a self-limiting (self- saturating) manner, typically being 0,05 — 0,2 nm thick. The cycle is repeated as many times as required for obtaining a film with a predetermined thickness. Typical substrate — exposure time for each precursor ranges within 0,01 — 1 seconds. Common precursors include metal oxides, elemental metals, metal nitrides and metal sulfides. ALD offers significant benefits in view of capability of the method to generate coatings on essentially porous structures, impregnated with a variety of chemicals, as precursor N gas(es) flow through the porous substrate and completely coat insides of the pores.

N & 25 However, the same functionality constitutes a significant drawback when applied to © formation of coating layers on the surfaces of particulate materials and essentially porous I materials. In conventional ALD processes, precursor gas can absorb into certain porous - substrates to a depth of about 1 mm in 1 second In an event when formation of a 2 nanometer-scale thick film is desired, removal of an excess of the reactant chemical S 30 (penetrated to a depth of about 1 mm) from said porous substrate is required. The latter is S attained by rinsing (purging) the substrate by inert gas for a relatively long time, such as 1 min or longer after each pulse. Taking into account that (precursor) pulse duration is typically 0,1 s, and that purge duration is typically 1 — 10 s after each pulse (e.g. for non-

porous substrates), rinsing time of 1 min or more per pulse significantly hinders the procedure.

Moreover, at most instances it is impossible to control uniformity of the coating layer formed on the porous substrate.

On the other hand, shortening of the pulse duration(s) does not enhance controllability over a depth of penetration of the reactant chemical into the porous substrate.

Hence, formation of thin films on the surfaces of porous substrates by conventional ALD methods is hindered by lack of uniformity, poor film thickness control and, as a result, an insufficient level of reproducibility of the method.

US 2017/0137940 A1 (Zeberoff et al) discloses a chemical deposition reactor, applicable for CVD or ALD processes, for coating bulk quantities of solid particles.

The reactor comprises a primary vacuum chamber that houses a rotating, horizontally oriented porous walled tubular vessel containing, in turn, a hollow rotary porous tube/a rotary shaft that connects the primary vacuum chamber with a secondary vacuum chamber.

The porous vessel and inner porous tube may be fabricated from stainless steel, for example.

Particulate substrate is placed in the porous vessel.

During the coating process, precursor gasses can be fed into the porous vessel from the primary vacuum chamber and exhausted through the inner porous tube and through the secondary vacuum chamber.

Alternatively, the precursor gasses can be fed into the porous vessel through the inner porous tube and exhausted through the primary vacuum chamber.

Propagation of gasses is enabled by — creating a desired pressure differential within the reactor arrangement.

Vahlas et al, Principles and applications of CVD powder technology, Materials Science and Engineering: R53 (2006), p.1-72 provides an overview of chemical vapor deposition reactors adapted for coating of particulate substrates, such as powders, for example.

The most frequently employed method to treat powders by CVD is maintaining them in a fluidized bed (FB) regime.

Some FB reactors, known as spouted-bed reactors, utilize N forcing a jet of gas vertically upwards through the mass of solid particles causing particles N to rapidly rise in a hollowed central core or spout within the bed.

The particles having 3 reached above the bed level fall back and travel downwards as a packed bed.

A systematic & cyclic pattern of solids movement is thus established with effective contact between the x 30 gas and the solids. 3 Above identified documents do not specifically address the ways of controlling the 3 coating parameters, such as depth, uniformity, etc. through regulating a flow of inert fluid < in the reactor.

In this regard, an update of atomic layer deposition technology is still desired, in view of addressing challenges associated with the application of ALD in manufacturing surface- coated porous materials.

SUMMARY OF THE INVENTION An objective of the present invention is to solve or to at least alleviate each of the problems arising from the limitations and disadvantages of the related art. The objective is achieved by various embodiments of a reactor assembly configured for formation of coatings on surfaces of particulate substrates by chemical deposition, related methods and uses thereof. Thereby, in one aspect of the invention a reactor assembly is provided, in accordance to what is defined in the independent claim 1. In preferred embodiment, the reactor assembly is provided, comprising: a reaction chamber, at least one reactive fluid intake line configured to mediate a flow of reactive fluid into the reaction chamber, an inert fluid delivery arrangement with at least one enclosed section provided as an essentially tubular member configured to pass through — the reaction chamber and loadable with the particulate substrate, said tubular member comprising at least one aperture defining a volume, where the particulate substrate within the enclosed section is exposed to the flow of reactive fluid, wherein, said enclosed section is configured to mediate a flow of inert fluid through the particulate substrate towards the reaction chamber such, that within the volume exposed to the flow of reactive — fluid, the flow of inert fluid encounters the flow of reactive fluid, whereby a coating is formed at the surfaces of particulate substrate within said volume. In embodiment, in the reactor assembly, the enclosed section is arranged separate from the reaction chamber, wherein fluid flow between the enclosed section and the reaction = chamber occurs solely via said particulate substrate.

O

N od 25 In embodiment, the aperture is covered by a support material, such as a mesh, a net, a c porous filter or a membrane. E In embodiment, the reactor assembly further comprising a loading device for loading the © particulate substrate to be coated into the reactor assembly and an unloading device for LO collecting coated substrate.

S I 30 In embodiment, the loading device and the unloading device are disposed at the opposite ends of the essentially tubular enclosed section.

In embodiment, the loading device and the unloading device are each provided in a separate auxiliary enclosure.

In embodiment, the reactor assembly further comprises a conveyor device, configured to convey particulate substrate via the enclosed section. In embodiments, the conveyor deviceis configured as any one of: a conveyor belt, a compression conveyor with a piston, a screw conveyor, or as a conveyor equipped with vibration means.

In embodiments, intake of inert fluid into the enclosed section is implemented via any one of the auxiliary enclosures.

In embodiment, the reactor assembly further comprises at least one heating element adjoining to- or being integrated into the enclosed section and/or any one of the auxiliary enclosures.

In embodiment, the reactor assembly further comprises a number of control devices configured to control the flow of inert fluid and/or the flow of particulate substrate through the enclosed space towards any one of the auxiliary enclosures.

In embodiment, the reactor assembly further comprises at least one reactive fluid flow regulating device configured to control the flow of reactive fluid in the at least one reactive fluid intake line.

In some embodiments, the reactor assembly is configured as an atomic layer deposition (ALD) device. In some embodiments, the reactor assembly is configured as a photo- — assisted ALD device. In further embodiments, the reactor assembly is configured as a Plasma Enhanced Atomic Layer Deposition (PEALD) device. In another aspect, a method for coating surfaces of particulate substrates by chemical S deposition is provided, in accordance to what is defined in the independent claim 14.

N O In embodiment, the method comprises: obtaining a chemical deposition reactor with a & 25 — reaction chamber and an inert fluid delivery arrangement with at least one enclosed Ek section provided as an essentially tubular member configured to pass through the reaction a © chamber and loadable with the particulate substrate with surfaces to be coated, said 3 tubular member comprising at least one aperture defining a volume, where the particulate IN substrate within the enclosed section is exposed to the flow of reactive fluid; directing reactive fluid into the reaction chamber; and directing inert fluid through the particulate substrate loaded into the essentially tubular enclosed section towards the reaction chamber such, that within the volume exposed to the flow of reactive fluid the flow of inert fluid encounters the flow of reactive fluid, whereby a coating is formed at the surfaces of particulate substrate within said volume. In said method, inert fluid is directed through the particulate substrate via the inert fluid delivery arrangement with at least one enclosed section arranged separate from the 5 reaction chamber such, that fluid flow between the enclosed section and the reaction chamber occurs solely via the fluid-permeable substrate. In embodiments, the depth to which reactive fluid penetrates into the particulate substrate is regulated by altering the flow of inert fluid and/or the flow of particulate substrate through the enclosed space at predetermined points of time, optionally accompanied by actuating time-controlled reverse flow. In embodiments, reactive fluid delivered into the reaction chamber comprises a predetermined precursor compound or compounds. In embodiments, a number of predetermined precursors is delivered into the reaction chamber in sequential order. In the embodiments, delivery of each precursor is followed — by rinsing the reaction chamber, wherein rinsing is implemented by directing inert fluid, into said reaction chamber, via the at least one reactive fluid intake line. In alternative embodiments, the coating is formed from a single precursor compound. In embodiments, the particulate substrate is a powder substrate or a fibrous substrate. In further aspect, a coated item of particulate material with surfaces comprising a coating — layer formed by the method according to the previous aspect is provided, in accordance to what is defined in the independent claim 19. N In embodiments, in said coated item, the particulate material is powder and/or fibers. & s The utility of the present invention arises from a variety of reasons depending on each © particular embodiment thereof. The invention provides for depositing coatings in the form - 25 — of thin films on the surfaces of particulate materials and porous materials with varying oc . . . a degree of porosity (e.g. 1 — 99%) in relatively fast and effortless manner. Indeed, the 3 invention allows conducting chemical deposition reactions on the surfaces of porous

LO O substrates with speed same or at least comparable to that for deposition on non-porous N . . . . o substrates. Expedited manufacturing rates allows for improved cost-effectiveness of the entire production chain.

The invention thus allows for significantly reducing, in terms of time, the step of rinsing the reaction space by inert fluids between pulsing precursors into said reaction space. The invention further provides for fine-tuning the measure, indicative of an extent to which precursors are allowed to penetrate into the porous substrate, whereby depth resolution (indicative of thickness of the coating) can be controlled with high precision. This is particularly important for applications, which require layer deposition on porous substrates with submicron resolution, such as micro- and nano-electronics and/or medical applications, e.g. implants. Moreover, the reactor installation disclosed herein is extremely flexible in terms of accommodating substrates of varying shapes and sizes. Thus, the reactor can be configured to accommodate single or multiple substrates of relatively simple shapes, such as sheets, slabs, discs, and the like, or substrate(s) having essentially complex 3D shapes. In majority of cases coated items establish ready-to-use items for a variety of applications, such as provision of supports for solid-state catalysts and/or provision of sensing devices.

In the present disclosure, materials with a layer thickness below 1 micrometer (um) are referred to as “thin films”. The expression “reactive fluid” is indicative in the present disclosure of a fluidic flow comprising at least one chemical compound, hereafter, a precursor, in an inert carrier. This expression is further applicable to a fluidic flow configured to convey at least two different precursors in sequential order, whereby each precursor is introduced into a reaction chamber one at a time. In the context of present disclosure, the term ALD comprises all applicable ALD based _ techniques and any equivalent or closely related technologies, such as, for example the S 25 following ALD sub-types: plasma-assisted ALD, PEALD (Plasma Enhanced Atomic 3 Layer Deposition) and photon-enhanced Atomic Layer Deposition (known also as photo- O ALD or flash enhanced ALD).

N Ek The expression “a number of” refers in the present disclosure to any positive integer o starting from one (1), e.g. to one, two, or three. The expression “a plurality of” refers LO 30 herein to any positive integer starting from two (2), e.g. to two, three, or four.

S S BRIEF DESCRIPTION OF THE DRAWINGS

Figs. 1A, 1B, 2, 4A and 4B schematically illustrate various exemplary configurations of a chemical deposition reactor assembly. Figs. 3A-3D schematically illustrate provision of certain elements within the reactor assembly, according to some configurations.

Figs SA schematically illustrates a concept underlying the method of operation of the reactor assembly, according to an embodiment. Fig. 5B schematically illustrates the method of operation of the reactor assembly, according to some exemplary configurations.

Fig. 6 schematically illustrates a coating method, according to the embodiments. Fig. 7 schematically illustrates a chemical deposition reactor assembly according to the embodiment.

DETAILED DESCRIPTION OF THE DRAWINGS Detailed embodiments of the present invention are disclosed herein with the reference to accompanying drawings. The same reference characters are used throughout the drawings to refer to same members. Following citations are used for the members: 100 — a reactor assembly; 101 — a reaction chamber; 102 — a lid; 103 — a central evacuation line / a pump fore-line; 104 — a pump, 105 — a valve (exhaust), 10, 10A — a porous substrate and its’ target surface to be coated, accordingly; = 11 — inert fluid; S 11A — inert carrier fluid for precursor chemical(s); 00 25 12 — reactive fluid; 2 12-X, -12-1, 12-2 — precursors: N 13 — an exhaust flow; E 21 — a reactive fluid intake line; © 22 — an inlet for receiving reactive fluid into the reaction chamber; O 30 23—areactive fluid flow regulating device; (D 24 — a precursor source; O 25 — a precursor flow regulating device; 31— an enclosed section within an inert fluid delivery arrangement; 31A — an aperture in the enclosed section 31, according to an embodiment

31-1, 31-2 — auxiliary enclosed sections, according to an embodiment; 311 — an inert fluid intake line; 312 — an inert fluid escape line (optional); 313, 313A — a heating element; 314 — a feed-through retainer; 32 — a source of electromagnetic radiation; 33 — an inert fluid flow regulating device; 34 —a conveying device; 35 — a loading device; 36 — an unloading device; 110 — an external chamber; 121 — a coating. Fig. 7 illustrates, at 100, a reactor assembly (hereafter, “a reactor”) in accordance to various embodiments.

Figs 1, 2 and 4 illustrate some other exemplary configurations. In all configurations the reactor 100 is implemented such, as to allow for formation of coatings on surfaces of essentially fluid-permeable substrates by chemical deposition. The essentially fluid- permeable substrates are preferably the substrates made of porous materials (Figs. 1, 2, 4) or, alternatively, the substrates made of particulate materials (Fig. 7).

The reactor is preferably configured to exploit principles of vapor-deposition based techniques. In terms of an overall implementation, the reactor 100 may be based on an ALD installation described in the U.S. patent no. 8211235 (Lindfors), for example, or on the installation trademarked as Picosun R-200 Advanced ALD system available from Picosun Oy, Finland. Nevertheless, the features underlying a concept of the present invention can be incorporated into any other chemical deposition reactor embodied as an _ ALD, MLD (Molecular Layer Deposition) or CVD device, for example.

N N Reference is made to Fig. 1A illustrating the reactor 100 according to one exemplary 3 configuration. The reactor 100 comprises a reaction chamber 101. A reaction space O (deposition space) is established by an interior of said reaction chamber 101.

i 30 In some instances, the reaction chamber 101 can be configured as an open-top vessel O sealed with a lid 102 (Figs. 1-3, 6). The reaction chamber shown on Figs. 1-3 and 6 thus 3 has a showerhead type flow. The reactor 100 has an essentially circular layout when O viewed from above.

In some instances, the reaction chamber can be configured as a vessel loadable from side or from the bottom (not shown). In such configurations the lid is configured as a hatch disposed laterally (within a sidewall) or at the bottom of the reactor vessel. Such type of reaction chambers may have a crossflow blown from the side, for example. The reactor 100 further comprises a number of appliances configured to mediate a flow of reactive fluid 12 into the reaction chamber 101. Mentioned appliances are provided as a number of intake lines (hereafter, feedlines) 21 and associated switching and/or regulating devices 23, such as valves, as disclosed further below. Fig. 1A is illustrative of the configuration, in which precursor fluid 12 is delivered inside — the reaction chamber 101 by means of at least one feedline 21 via a corresponding inlet

22. In some instances, it is preferred that the reactor comprises two, three or more feedlines 21 and a corresponding number of inlets 22 (not shown). By such an arrangement, a number of different precursors can be directed into the reaction chamber via separate — feedlines and inlets, accordingly. The reactor 100 can comprise as many feedlines and associated inlets as considered feasible in terms of the deposition process and the apparatus design. The reactor can be further configured without the feedline 21 (i.e. having the feedline 21 omitted completely). In such an event, the valve 23 is integrated into a sidewall of the — vessel that forms the reaction chamber 101 or into the lid 102. In some configurations, the reactor may comprise a manifold feedline with a common inlet 22 or a number of common inlets and a distributing pipework connectable to a variety of precursor sources and an inert gas supply or supplies (not shown).

N S Precursor(s) are delivered into the feedline 21 in a fluidic form. Reactive fluid 12 flowing s 25 — through the feedline 21 is preferably a gaseous substance comprising a predetermined © precursor chemical 12-X carried by an inert carrier 11A. Precursor(s) are supplied into - the feedline 21 from a supply source or sources 24 configured as containers, cartridges or & a piping system, for example. Each source 24 preferably contains a predetermined 8 precursor 12-X provided as a chemical compound or an element. Each source 24 is

LO S 30 equipped with at least one valve 25, provided as a manual closing valve, for example. A o variety of precursor chemicals required for deposition reaction(s), such as ALD reaction(s), can be directed into the reaction space via a single feedline 21.

In some instances, precursor(s) 12-X are provided in a gaseous form, such as ammonia gas (NHs). In some other instances, precursor(s) are provided in liquid or solid forms and vaporized prior to being admixed to the inert carrier. Inert carrier 11A is a fluid, preferably gas, such as nitrogen (N3), argon (Ar) or any other suitable gaseous medium that possesses essentially zero reactivity towards the precursors (reactants) and the reaction products. Inert carrier gas 11A is supplied from a separate source or sources (not shown). By the way of an example, widespread in creating microelectromechanical systems (MEMS) ALD process for depositing aluminum oxide using trimethylaluminum (first precursor) and water (second precursor) would employ two chemicals sequentially supplied into the reaction chamber from two sources 24 via the same feedline 21 or two different feedlines. Manufacturing complex multilayer structures (so called stacks), wherein each layer is produced in a separate ALD cycle and/or wherein said layers differ from one another in — terms of composition, may employ three or more different precursors and supply sources, accordingly. In some instances, a mixture of compounds, such as a predetermined precursor in a solvent, for example, can be supplied from the same source 24. Precursor(s) 12-X and the inert carrier 11A, supplied from different sources, enter the — feedline 21 via a multi-port valve 23. The valve 23 is configured as a three-port valve, for example, with an automated control system and optionally a manual backup control. In preferred configurations the valve 23 is a three-way ALD-valve. ALD valves are configured to maintain a steady flow of inert carrier fluid 11A into the reaction chamber N and to introduce fluidic precursor(s) 12-X into said carrier at predetermined points of N 25 time. The ALD valve can be configured to inject the precursor 12-X into the 3 (continuously) flowing carrier. Additionally or alternatively, other control means, such as & mass flow controller(s), for example (not shown), can be provided upstream said valve Ek 23 to interrupt the flow of carrier fluid 11A for a time period the precursor 12-X being o injected into the feedline 21. In either situation, injection of a precursor is performed in LO 30 — brief pulses (0,01 — 100 s, typically 0,1 5).

S o In configurations when the reactor comprises more than one feedline 21, it is preferred that each said feedline is eguipped with the ALD valve 23.

The feedline or feedlines 21 and the associated valve or valves 23 together establish a reactive fluid delivery arrangement. Said arrangement may further comprise a number of auxiliary components, such as precursor- and inert carrier intake lines disposed upstream the valve 23, additional fluid flow regulating appliances, such as valve(s) 25, for example, and control devices (not shown). In some configurations (not shown) the feedline 21 may be arranged such, as to direct reactive fluid 12 into the reaction chamber 101 via the lid 102. The lid 102 may optionally comprise a flange or flanges along and/or around its edge. The reactor 100 further comprises an evacuation line 103 for discharging an exhaust flow 13, such as excess carrier, precursor and reaction products, out of the reaction chamber

101. The evacuation line 103 constitutes a fore-line for an evacuation pump unit 104 and it may comprise, in some configurations, a closing valve 105, preferably upstream the pump unit 104. It is preferred that withdrawal of fluidic substance from the reaction chamber is implemented in an uninterrupted manner, whereby the pump unit 104, preferably configured as a vacuum pump, removes fluidic substance from the reaction chamber continuously during the entire deposition process. It is preferred that the reaction chamber 101 is kept under vacuum during operation, loading and unloading, whereupon pressure therein is typically maintained at a level of 100 Pa (1 mbar) or preferably less. Still, in some configurations, pressure in the reaction chamber is set-up at the same level as the ambient pressure. In configuration shown on Fig. 1B the reactor 100 additionally includes an external housing 110, in which the reaction chamber 101 is accommodated. In some instances, an intermediate space established by an interior of said external housing 110 is maintained _ under vacuum and referred to as a vacuum chamber. It is preferred that pressure in said S 25 intermediate space is maintained at a level of at least 1 kPa (10 mbar) to establish a A pressure difference between the interior of the reaction chamber 101 (typically, less than 2 100 Pa) and the interior of the external housing 110.

N Ek Said intermediate space can further accommodate a number of heating elements 313, o 313A. A number of heating elements 313 can be placed such, as to adjoin the reaction 3 30 chamber 101. Additionally or alternatively, a number of heating elements can be S integrated into a wall or walls of the vessel that forms the reaction chamber 101. In further, additional or alternative configurations, heating of the reaction space can be implemented by directing pre-heated fluid, such as gas, thereinto, via the feedline 21, for example. In such an event, a number of heating elements can be arranged such, as to adjoin or to encompass said feedline 21 or to incorporate into a pipe forming said feedline (not shown). The external housing 110 can be further included into configurations shown on Figs. 2, 4A, 4B and 7, in the same manner as shown on Fig. 1B.

With reference back to Fig. 1A, the fluid-permeable substrate 10, configured as a porous material and having a target surface 10A intended for deposition of a coating layer thereon is further received, in its entirety or at least in part, into the reaction chamber 101. For the purposes of the invention it is preferred that the substrate 10 is received into the reaction chamber in a manner that no other surface(s) of said substrate is/are exposed to the flow — of reactive fluid except the target surface 10A. Thus, position of the substrate 10 in the reactor assembly is such that it is solely the target surface 10A of said porous material, which is exposed to the flow of reactive fluid 12.

The expression “a target surface” is hereby indicative of an exterior surface of the porous material to be coated. With reference to Figs. 1-6, by the “porous material” we refer to a — finite item consisting of or comprising of said porous material. In a latter case, the porous material can be configured as an item comprising a layer of porous material thereon or being encapsulated in said porous material. In some configurations, the porous material 10 is provided as essentially solid porous substrate or substrates for chemical deposition reaction(s).

A variety of porous materials can be utilized as porous substrate(s) including, but not limited to metals, ceramics, polymers, composites and semiconductor materials (e.g. silicon). Cellular solids, such as metal foams and ceramic foams, can further be exploited. With reference to Fig. 7, the fluid-permeable substrate can be further established by an N essentially flowable particulate substrate, including, but not limited to powder substrates N 25 and/or fibrous substrates. In fact, said particulate substrate can be considered as a 3 modification of porous substrate having pores formed by air gaps established between & particles, fibers or any other related particulate matter.

I & The invention sets no restrictions on the nature of the fluid-permeable substrate, such as = the porous substrate or the particulate substrate; nevertheless, for the one skilled in the art 3 30 itis clear that selection of the substrate depends on ability of potential substrate materials O to withstand reaction conditions, such as temperature and pressure, and on compatibility of the predetermined precursor chemicals with said substrate material and with one another to form a predesigned coating.

As mentioned hereinabove, in conventional chemical deposition systems, such as ALD systems, precursor chemical(s) diffuse into some porous substrates placed into the reaction chamber, at possible rates within a range between 0,001 — 1000 mm/s, such as at a rate of about 1 mm per second, for example, and deposit onto insides of the pores.

The reactor 100 is configured to effectively prevent diffusion of precursor chemical(s), which arrive with the reactive fluid 12 onto the fluid-permeable substrate 10, inside said substrate. Precursor(s) do not penetrate inside the substrate 10, but instead reside(s) on the surface of said substrate exposed to the reactive fluid flow (viz. the target surface 10A), whereby a coating is formed at said target surface.

The coating is formed upon establishing and/or adjusting a counter-flow by directing inert fluid 11 through the fluid-permeable substrate 10 in a direction of the reaction chamber

101. While reactive fluid 12 containing a precursor 12-X arrives at the target surface 10A via the reaction chamber 101, the flow of inert fluid 11 arrives at said target surface 10A through the fluid-permeable material 10. At the surface 10A the flow of inert fluid 11 — encounters the flow of reactive fluid 12 and prevents precursor(s) from penetrating into the substrate. This results in formation of a coating 121 and is described in greater detail hereinbelow, with reference to Figs. 5 and 6. The flow of inert fluid 11 into the reaction chamber 101 is mediated by an inert fluid delivery arrangement. Said arrangement comprises an essentially hollow, enclosed space, hereafter, an enclosed section 31, having a predetermined volume (V) The enclosed section 31 is essentially isolated from the reaction chamber 101 such, that fluid communication (fluid flow) between the section 31 and the reaction chamber 101 occurs solely via the fluid-permeable material 10. Inert fluid 11 is allowed to flow through an interior of the enclosed section 31 in an unhindered manner. N 25 Itis preferred that the fluid-permeable substrate 10 is received, at least in part, inside the A enclosed section 31. <Q & In some configurations, the inert fluid delivery arrangement further comprises at least one x inert fluid intake line 311. 3 In some configurations, the inert fluid delivery arrangement comprises the enclosed 3 30 section 31 established by said at least one inert fluid intake line 311. Exemplary O configuration of such kind is shown on Fig. 3A.

Propagation of fluids through essentially solid (porous) or particulate materials is accompanied by changes in fluid dynamics characteristics of said fluids, such as velocity, flow geometry, boundary conditions, and the like.

Thus, change in fluid dynamics occurs upon propagation of inert fluid 11, flowing from the (essentially hollow) volume, such as via the interior of the enclosed section 31, through the porous material 10. Change in fluid propagation characteristics allows for provision of the fluid intake volume configured as an essentially tubular member with a porous “inlet” 10 at one end (Fig. 3A). To ensure sufficient flow volume especially through essentially large pieces (e.g. having surfaces to be coated exceeding 1 cm?) of fluid-permeable materials, in particular, porous — materials at uniform flow rates, it is advantageous that the enclosed section or space 31 is configured to adjoin the reaction chamber 101. In such instances, the enclosed section 31 can be viewed as an expansion of the inert fluid intake line 311. The section 31 is thus configured to adjoin the reaction chamber 101 such, that fluid flow between said section 31 and the reaction chamber 101 occurs solely via the porous material 10 and an unhindered flow of inert fluid is enabled throughout the entire enclosed space 31. The inert fluid intake line or lines 311 can be implemented in the same manner as the feedline(s) 21, i.e. provided as a pipe or a pipework connectable to a related fluid source preferably via appropriate distributing device(s), such as valve(s) (as described hereinbelow). In some configurations, the enclosed section 31 is provided essentially outside the reaction chamber 101 (Figs. 1A, 1B, 2). Fig. 1A shows a reactor layout, in which the enclosed space 31 adjoins the reaction chamber essentially via a sidewall of the vessel that forms said reaction chamber.

In said _ sidewall an aperture is arranged to accommodate the porous substrate 10 (not shown). S 25 The aperture can be optionally adjustable.

For example, the aperture may include a A motorized circumference-adjusting system configured in a manner of two-layer rotary 2 bladed iris diaphragm (not shown). The porous substrate 10 thus forms a fluid-permeable N inlet for the inert fluid 11 flowing from the volume defined by the enclosed section 31 to = the reaction space. © 3 30 In some configurations, the enclosed section 31 can be further provided as an elongated, S essentially tubular member comprising a number of inert fluid intake lines 311. Such an arrangement allows for connecting two or more reactors to a common inert fluid intake source (not shown).

In some instances, inert fluids designated by reference numerals 11, 11A may be supplied from the same source or a number of interconnected sources (not shown).

Fig. 2 illustrates another exemplary configuration of the reactor 100, in which the enclosed section 31 is provided in the lid 102. The fluid-permeable inlet is established by the porous substrate 10 to allow the flow of inert fluid 11 from the enclosed space 31 (disposed in the lid 102), via the intake line 311, to the reaction space. Other configurations include provision of the enclosed space 31 in the form of the intake line 311 (in a manner shown on Fig. 3A) or provision of the space 31 comprising a number of intake lines 311.

In similar manner, the enclosed space 31 can be provided in the lid configured as a hatch in the sidewall- or in the bottom of the reactor (not shown).

In configurations described above the porous substrate 10 is at least partly incorporated inside the enclosed space 31, provided that the surface 10A of said substrate to be coated is exposed to reactive fluid 12 arriving at said surface from the reaction chamber 101.

Figs 3B and 3C illustrate configurations alternative to those shown on Figs. 1A B and 2, accordingly. Hereby, the fluid-permeable substrate 10 is disposed entirely in the reaction chamber 101, as being attached to an inner surface of the reaction vessel (Fig. 3B) or the lid (Fig. 3C). A number of retainers or connectors, including, but not limited to pins, pegs, screw connectors, adhesives and/or support materials, such as meshes or nets (the latter — provided on the side of the reaction chamber) can be adapted to hold the substrate 10 in place.

Configurations shown on Figs. 1A, 1B and 2 may include an optional inert fluid escape line 312 configured to withdraw inert fluid 11 from the volume defined by the enclosed N space 31. The inert fluid escape line 312 can be further connected, via a separate route or N 25 routes (not shown), to the pump 104 or to an additional pump or any other appropriate 3 appliance configured for evacuation of exhaust flow. The enclosed space 31, as shown on & Figs. 1A, 1B and 2 is thus configured to mediate the flow of inert fluid 11 therethrough Ek by means of the additional inert fluid escape line 312. Whether provision of the escape o line 312 is omitted (Figs. 4A, 4B), inert fluid 11 that enters the reaction chamber 101 via 3 30 — the fluid-permeable substrate 10 is discharged from the reaction space via the central S evacuation line 103. Alternatively, a single fluid connection, provided as the intake line 311, for example, can be adopted to transfer fluids in both directions, as controlled by an appropriate regulating appliance (e.g. an appliance 33 described further below).

Reference is made to Figs. 4A and 4B that illustrate the reactor 100 according to further exemplary configurations. The reactor shown on Figs. 4A, 4B comprises the enclosed section 31 essentially inside the reaction chamber 101. Fig. 4A shows a layout for coating an individual substrate 10, whereas Fig. 4B shows a layout for coating a plurality of individual substrates. The inert fluid intake arrangement shown on Figs. 4A, 4B, comprises the enclosed section 31 and the associated inert fluid intake line 311. The enclosed section 31 is hereby configured as a substrate holder for substrate(s) made of the fluid-permeable material. A single substrate or multiple (at least two) substrates can be positioned into the reaction chamber 101 at a time. Inert fluid 11 is received, via the intake line 311, into the enclosed section 31 configured as the substrate holder, therefrom inert fluid 11 is further directed, through the substrate or substrates made of porous material 10, into the reaction chamber. The substrate(s) 10 can be placed and/or secured on the substrate holder (Figs. 4A, 4B). Alternatively, the substrate(s) 10 can be at least partly incorporated into said substrate — holder (Fig. 4A). Configuration depicted on Fig. 4A allows for accommodating an individual substrate, whose ultimate size measure is limited only by dimensions of the reaction chamber. The reactor of Fig. 4A advantageously provides for coating the individual substrates shaped as sheets, slabs, discs, and the like; said substrates having essentially smooth or patterned surfaces.

Fig. 4B depicts an exemplary configuration for the enclosed section 31 configured as the substrate holder and comprising a number of protrusions capped with essentially cup- shaped (concave from inside) substrates made of porous material 10. At capped ends the protrusions are open to allow unrestricted flow of inert fluid through the porous material. Precursor(s) are deposited along an entire surface of the porous substrate exposed to the flow of reactive fluid 12 in the reactive space. Therefore, configuration depicted on Fig.

N 4B allows for coating distinct (separate from one another) porous substrates of any shape, N including complex, three-dimensional structures. Mentioned structures can be secured on 3 the substrate holder 31 by means of the aforesaid protrusions or by any other appropriate & holding appliances provided that unhindered flow of inert fluid 11 is allowed through the x 30 porous portions. 3 Each substrate, as depicted on Fig. 4B can be further provided as a body made of porous 3 material and comprising at least one opening or a pathway (blunt-ended or a path-through) o therein. Thus, configuration shown on Fig. 4B allows for applying deposition coatings on surfaces, such as inner- and outer surfaces, of essentially tubular members made of porous material. In some instances, the porous substrate 10 is thus provided as at least one essentially tubular member or a pipe-like structure (flow-through or blunt end), with a crosscut selected from a variety of geometric shapes (circle, semicircle, ellipse, rectangle, pentagon, and the like). Deposition coating can be applied, at least partly, onto an outer surface of said structure and, additionally or alternatively, onto an inner surface of said — structure. Configuration shown on Fig. 4B allows for applying deposition coatings on surfaces of sensing / detecting devices made of porous materials, such as a variety of gas sensors (e.g. cup-shaped gas sensors). Configuration shown on Fig. 4B allows for applying deposition coatings on surfaces of — various medical devices and/or parts thereof. In some configurations, the medical device is provided as an essentially tubular member made of fluid-permeable material. In some particular configurations, the medical device is provided as a catheter, a stent or an endoscopic device. The reactor assembly disclosed hereby enables applying deposition coatings onto the — substrates mentioned above, such as medical devices or parts thereof, with high precision, by targeting chemical reaction(s) onto the surfaces of said devices to a reguired / desired depth, by limiting the distance (depth resolution) to which reactive chemicals flow into the substrate material. A configuration shown on Fig. 3D addresses partial exposure of said devices or parts — thereof to the flow of reactive fluid, whereby provision of deposition coating can be limited to predetermined areas of said devices, such as tips (e.g. endoscope head). Partial exposure can be attained by placing the substrates 10 or parts thereof into the reaction chamber by means of a suitable substrate retainer 314, such as a feed-through substrate _ retainer. Configuration shown on Fig. 3D allows for preserving the substrates, at least S 25 — partly, outside the reach of elevated temperatures typical for the reaction space 101. A Distance measure, to which reactive chemical is allowed to flow into an interior of the 2 essentially tubular substrate 10 (away from the reaction space 101) can be controlled by N the regulating device 33 via reversing flow of inert fluid 11, for example.

I a c The substrate holder depicted on Figs. 4A and 4B can be configured detachable from the LO 30 intake line(s) 311 and replaceable.

S o A number of heating elements 313A can be further provided in conjunction with the enclosed section 31 (e.g. in theintermediate space 110 and/or incorporated into the wall(s)

of an enclosure forming the section 31). Figs. 1B, 3B and 4A illustrate, in a non-limiting manner, disposition of the heating elements 313 A within the reactor.

Additionally or alternatively, pre-heated fluid, such as gas, can be directed into the reaction chamber 101 via said enclosed section 31 and/or the intake line(s) 311. In some configurations, at least one heating element 313A (Fig. 1B, 4A) adjoins to, encompasses, or is integrated into wall(s) of the intake line 311, whereupon inert fluid 11 directed via said line 311 and the enclosed section 31 into the reaction chamber has higher temperatures in comparison to fluid(s) in the reaction chamber 101. In embodiments, the reactor assembly 100 further comprises at least one device 33 — configured to alter the flow of inert fluid 11 at predetermined points of time.

The device 33 can be configured as a controlled switch valve connected to an associated control module (not shown). It is emphasized that the appliances 21, 23 and the appliances 31, 311, 33 are configured to mediate delivery of reactive fluid and delivery of inert fluid, accordingly, into the — reaction chamber independently, in a highly coordinated manner.

Therefore, a number of functional modules can be established, in which the appliances that mediate fluid delivery function are arranged according to varying layouts, dependent on an embodiment.

For clarity purposes, graphical indication for some features, related embodiments and configurations are given only with reference to particular drawings (1B, 3A-3D). It is assumed that the skilled reader shall be able to perceive the abovementioned configurations also for Figs. 1A, 2, 4A, 4B and 7, based on the teachings of Figs. 1B, 3A-3D and related description.

The enclosed section or space 31 allows for connecting a number of reactors 100 to a _ common source of inert fluid 11 (not shown). In such configurations, centralized O 25 — regulation of inert fluid supply via a device or devices 33 can be realized. 3 The reactor 100 (Figs. 1, 2, 4, 7) is preferably configured as an ALD device.

Further & configurations advantageously include photo-assisted ALD device(s) and Plasma Ek Enhanced Atomic Layer Deposition (PEALD) device(s). The reactor 100 can still be o adjusted for other chemical deposition processes, such as MLD, CVD and modifications 3 30 — thereof. £ o A concept that underlies the method of operation of the reactor assembly 100 disclosed hereinabove is illustrated by Figs.

SA and 5B.

Fig. 5A illustrates formation of a coating 121 on the target surface 10A of the individual porous substrate made of essentially solid, fluid-permeable material 10 in the reactor 100 implemented according to any one of the configurations depicted on Figs. 1-3 and 4A, wherein the coating 121 is established along the entire target surface 10A of said substrate.

Fig 5B illustrates formation of the coating 121 on a plurality of individual fluid- permeable substrates 10 having target surfaces 10A (see a leftmost substrate that is depicted uncoated). The cup-shaped substrates 10 sit on the open-end protrusions arranged at the enclosed section 31 configured as the substrate holder.

Reactive fluid 12 is directed into the reaction chamber accommodating, at least partly, the — substrate 10. The substrate (target) surface 10A on which the coating shall be deposited is the surface of the substrate exposed to the flow of the reactive fluid 12. In the method, the reactive fluid 12 delivered into the reaction chamber comprises a predetermined precursor compound.

Inert fluid 11 is directed, in turn, through the porous material (substrate) 10 towards the — target surface 10A in such a way that at said surface the flow of inert fluid 11 encounters the flow of reactive fluid 12 thus preventing reactive fluid 12 from penetrating inside the porous substrate 10. The reactive fluid 12 is thus deposited exclusively onto the target surface 10A in the form of the coating 121. In some instances, inert fluid 11 can be directed into the reaction space in a continuous, uninterrupted manner.

Applied to a typical ALD deposition process, an interrupted flow of inert fluid 11 through the porous material 10, via the enclosed section 31, can be implemented throughout the entire ALD cycle.

By continuously directing inert fluid 11 through the porous material towards the target surface 10A, penetration of reactive fluid N 12, in particular, of precursor(s) contained in said reactive fluid, inside the porous material N 25 10is sustained or prevented.

In such an event it is advantageous to thoroughly adjust the 3 inert fluid flow speed to allow precursor molecules contacting the target surface 10A.

The & coating 121 is thus formed at an utmost surface layer of the substrate 10. The procedure Ek is advantageous when formation of a thin coating layer, 0,1 — 100 nm, for example, is - desired. = O 30 In some instances, it is preferred that precursor contained in reactive fluid 12 is allowed O to flow into the porous substrate to a predetermined depth (depth resolution). The depth to which reactive fluid 12 penetrates into the porous material 10 can be regulated by altering the flow of inert fluid 11 at predetermined points of time by means of the inert fluid flow regulating device 33 (Figs. 1-4). Applied to an exemplary ALD deposition process, in some preferred configurations the device 33 can be set-up to alter (e.g. discontinue) the flow of inert fluid 11 at an exemplary time point 1, at which the precursor 12-X, as carried in the reactive fluid 12, shall allegedly reach the target surface 10A. In such an event the device 33 and/or the associated control module (not shown) registers a time point 0, at which precursor is injected into carrier fluid 11A via the valve 23 (Figs. 1, 2, 4), and initiates the time point 1 upon expiration of a predetermined time period 0-1 during which said precursor, as — carried in the reactive fluid 12, shall allegedly pass the feedline 21 and the reaction chamber 101 to arrive at the target surface 10A. Duration of the time period 0-1 is calculated such, as to allow the precursor to contact the target surface. The flow of inert fluid 11 through the substrate material 10 is resumed at a time point 2, wherein duration of a time period 1-2 is determined based on a reguired / desired measure of precursor — penetration depth into the porous substrate 10. In practice, duration of each time period 0-1, 1-2 may vary within a range of 0,001 s — 100 s. In some configurations, duration of each said time period constitutes 0,1 s. Mentioned time periods are a subject of adjustment dependent on the reactor design, substrate material, precursor chemicals, fluid flow velocity, reguired / desired depth — resolution and other parameters. The abovementioned action (interruption of inert fluid flow at the time point 1) can be further associated with actuating an inert fluid reverse flow. In such an event, at the time point 1, at which precursor allegedly reaches the target surface 10A, the flow of inert fluid _ 11 is discontinued and reversed, whereby reactive fluid 12 is forced to absorb into the S 25 — porous material 10. Reverse flow of inert fluid (away from the target surface 10A) is A maintained during the predetermined period 1-2. At the time point 2, the flow of inert 2 fluid 11 is restored back into a direction towards to target surface 10A.

N Ek In some alternative configurations, the device 33 can be set-up to pause the flow of inert o fluid at the time point 0, in accordance to what is disclosed hereinabove, and to resume x 30 — the flow of said inert fluid 11 at an exemplary time point 1, at which said precursor, as S carried in the reactive fluid 12, shall allegedly reach the target surface 10A. Duration of the period 0-1 is calculated such, as to allow precursor molecules contacting the target surface 10A.

It is preferred that control over operational functions of the devices 33 and 23 (regulating the flow of inert fluid 11 and regulating injection of precursor(s) 12-X into the inert carrier 11A, respectively; Figs. 1, 3, 4) is realized in an independent, highly coordinated manner.

Thus, it is preferred that the reactor 100 further comprises a central control module (not shown) provided as an integrated or a standalone CPU solution with a user interface, and associated software. Software management functions preferably include implementing local and/or remote control(s), monitoring a number of reactor assemblies at a time, emergency power control(s) and the like.

In the embodiments, the coating 121 is a thin film, layer or sheet established on the target surface 10A in a single ALD cycle.

A reference is made to Fig. 6 being illustrative of the coating method according to some embodiments. The method depicted on Fig. 6 exploits the principles of atomic layer deposition and provides for sequential, temporally separated delivery of at least two different precursors 12-1, 12-2 into the reaction space. Precursors 12-1, 12-2 are preferably distinct chemicals selected such, as to form a preselected compound or composition 121 (hereby, the coating) on a surface of a porous substrate. Deposition half- reactions are indicated by Roman numerals (i) and (ii).

Inert fluid 11 is directed into the reaction chamber in a controlled manner, whereby the flow of inert fluid is adjustable by the device 33 in a manner described hereinabove.

In the method, reactive fluid 12 comprising a first predetermined precursor 12-1 is delivered (step i; left side) into the reaction chamber and a precursor sublayer is deposited at the target surface 10A by adjusting counter-flow of inert fluid 11 towards said target surface through the porous substrate in such a manner, that precursor molecules 12-1 are _ allowed to contact said surface 10A. The first precursor 12-1 enters a chemical reaction S 25 — or reactions, typically by chemisorption, with the substrate 10 resulting on formation of A the sublayer (step 1; right side). Thereafter, the reaction chamber is purged with the inert 2 carrier 11A, thereupon excess precursors and reaction products are evacuated with the N exhaust flow (13, Figs. 1, 2, 4). During purge, inert carrier fluid 11A (containing no z precursor) is directed into the reaction chamber via the valve 23 (Figs. 1, 2, 4). The purge © 30 step can be accompanied by directing the flow of inert fluid 11, through the porous 3 substrate and the sublayer 12-1, in direction of the reaction chamber. S The method continues at ii (Fig. 6), whereupon the reactive fluid 12 comprising a second predetermined precursor 12-2 is delivered into the reaction chamber. The second precursor 12-2 undergoes a chemical reaction or reactions with the first precursor 12-1 provided as a related sublayer (step ii; left side). Counter-flow of inert fluid 11 towards the target surface 10A and the reaction space is adjusted such, as to allow precursor molecules 12-2 contacting the sublayer formed at step i. During deposition of the second precursor 12-2, the precursor compounds 12-1 and 12-2 react with one another to form the compound 121, distinct from any one of 12-1 and 12- 2 (ii, right). Step ii is followed by purging the reaction chamber with the inert carrier 11A, as mentioned with regard to step i. Said purge step can be accompanied by directing the flow of inert fluid 11, through the porous substrate and the established coating layer 121, in — direction of the reaction chamber. Inert fluid 11 propagating into the reaction chamber 101 through the porous material 10 and inert fluid 11A used as a carrier for precursor(s) 12-X, 12-1, 12-2 are preferably same media, e.g. gaseous nitrogen (Nz) or argon. In some instances, use of different non- reactive media 11, 11A is not excluded. In the embodiment, the flow of inert fluid 11 through the substrate 10 can be adjusted in such a way that at least one purge step can be implemented by using solely inert fluid 11 (i.e. in an absence of (inert) carrier fluid 11A). Thus, during purging, the flow of inert fluid 11 (through the substrate 10) into the reaction space can replace the flow of carrier fluid 11A via the feedline 21. Replacing the “purge flow” 11A by the flow of inert fluid 11 can be realized after at least one half-reaction within the ALD cycle. Once the coating(s) 121 is established, a number of additional ALD cycles can be run n times, optionally in an absence of the inert counter-flow 11 via the porous substrate 10, to establish a number of additional coating layers 121n on the target surface, whereby N multilayer (stack) structures can be produced.

N s 25 Fluidic flow through the fluid-permeable material 10 can be controlled by pressure © difference generated across said material 10 by the evacuation pump 104 and a number - of regulating devices, such as 25, 33, for example. The latter can be configured as switch & valves eguipped with mass-flow controller(s) and/or gas flow meter(s). Other control 3 means include conventional appliances, such as gas- and pressure sensors. The reactor

LO S 30 assembly 100 advantageously comprises an (automated) control system, implemented as o a computer unit, for example, and comprising at least one processor and a memory with an appropriate computer program or software.

A number of non-limiting examples based on ALD techniques are presented hereinbelow. Example 1. Formation of aluminum oxide (Al203) coating 121 on porous substrates, such as graphene, silicon oxide etc., from trimethylaluminum (TMA, AI(CH3)3) used as precursor 12-1 and water used as precursor 12-2. Example 2. Deposition of a platinum (Pt) coating 121 on porous substrates, such as silicon substrates, for example, from platinum (II) acetylacetonate (Pt(acac)2; precursor 12-1) and ozone (Os; precursor 12-2). Example 3. Deposition of an aluminum nitride (AIN) coating 121 on porous substrates, such as silicon substrates, for example, using aluminum chloride (AICl3) or TMA as precursor 12-1 and ammonia (NH3) as precursor 12-2. Example 4. Deposition of a chromium (IV) oxide coating 121 having thickness of 0,3-0,4 nm on porous substrates, such as ceramic substrates, for example, using chromyl chloride (CrO>Cl>) vapor as precursor 12-1 and water or hydrogen peroxide HO» as precursor 12-

1. Example 5. Deposition of a titanium oxide coating 121 having thickness of about 0,1 nm on porous substrates, such as ceramic substrates, for example, using titanium tetrachloride (TiCl4) vapor as precursor 12-1 and water as precursor 12-1. Example 6. Deposition of a silicon oxide coating 121 having thickness of about 0,1 nm on porous substrates, such as ceramic substrates, for example, using H2Si[N(C2H5)2]2 (commercially supplied by Air Liquide under the product name SAM.24) vapor as precursor 12-1 and ozone (Os) as precursor 12-1. _ Each of the exemplary reactions described above usually produce a 0,03 — 0,4 nm thick O layer per deposition cycle (depending on the deposition conditions), with typical AN (precursor) pulse duration being 0,1 —1 s per chemical, each pulse being alternated with 2 25 an about 10 s purge. Each pulse results in deposition of a sublayer; whereas the coating N layer 121 is deposited in a deposition cycle comprising a number of pulse-purge z sequences. In order to deposit a layer with thickness 10 — 100 nm, the deposition © procedure may be completed within a time range of about 10 minutes to about 20 hours, 2 depending on a number of cycles required and duration of each cycle. In similar manner, O . . N 30 — the coating 121 can be established from three or more precursors.

N The method described above is particularly advantageous for manufacturing solid-state catalysts on porous supports. In such an event, the coating 121 is provided as a catalytic compound established in the course of sequential reactions i, ii, in accordance to what is described hereinabove. The layer 121 established by catalytic compounds is thus supported on the surface 10A of the porous material 10. A variety of solid-state catalysts comprising catalytic coatings supported on the surfaces of porous materials can be provided for assisting the processes including, but not limited to conversion, addition and condensation. In particular, solid-state catalysts for polymerization of alkenes (olefins) with carbon number 2-12 can be provided. In particular, solid-state catalysts for polymerization of lower olefins (C2-C4), such as ethylene and propylene, for example, can be provided. Non-limiting examples include catalysts based on platinum-group metals, such as platinum, palladium and ruthenium, for example, and/or modified Phillips-type catalysts. In some instances, the coating 121 can be established from a single precursor compound. The procedure advantageously exploits the principles of photo-assisted atomic layer deposition (hereby, photo-ALD), wherein surface film deposition reactions are triggered — by photons delivered onto the target surface 10A via exposing the latter to electromagnetic radiation of at least one wavelength within a predetermined wavelength range. Ultraviolet radiation (100-400 nm), visible light (400-800 nm), or infrared radiation (over 800 nm) can be utilized. In described configuration, the reactor 100 may further comprise at least one radiation source 32 (shown on Figs. 4A, 4B; electromagnetic energy is indicated by FE), configured to emit radiation of at least one wavelength within the predetermined wavelength range. Additionally or alternatively, the radiation source 32 can be provided outside the reaction chamber (not shown). In such an event, the reactor assembly further comprises an appliance or appliances to deliver electromagnetic energy (£), such as electromagnetic radiation, to the target surface 10A and to the subsequently formed film

121. Such appliance(s) may be a window (e.g. in the lid), or an antenna device, for N example. Due to high temperatures, such as 300 *C in case of ruthenium (Ru) deposition, N for example, in the reaction chamber, external disposition of the radiation source, with 3 regard to the reaction chamber, is preferred. It is should be appreciated that configurations & depicted on Figs. 1-3 and 7 can include the electromagnetic source or sources 32, as x 30 — discussed hereinabove. 3 Fig. 7 shows an embodiment of the reactor assembly 100, according to the present 3 invention, said reactor assembly being rendered for formation of coatings on the fluid- O permeable substrate 10 configured as the particulate substrate, such as powder- and/or fibrous substrate, for example. The particulate substrate 10 is formed by particles, fibers or any other related particulate matter.

The reactor comprises the enclosed section 31 configured to receive, at least partly, said particulate substrate 10. In configuration shown on Fig. 7 the enclosed section 31 is configured as an essentially tubular member loadable with said substrate. The enclosed section is preferably configured to pass through the reaction chamber 101 (the reaction space). In the reaction space 101, the substrate 10 is exposed to the flow of reactive fluid 12 within a predetermined area defined with at least one aperture 31A within the enclosed section 31. The aperture 31A thus defines the area across the enclosed section 31 (i.e. a volume), where particles, viz. particulate substrate 10, are exposed to the flow of reactive fluid 12. The target surface or surfaces 10A is/are established by surfaces of particles — residing essentially in these exposed area(s) (volume(s), when viewed in a three- dimensional coordinate system). The at least one aperture 31A can be an opening, optionally covered by a support material, such as a mesh, a net or a porous filter or a membrane, for example, in order to prevent the particulate substrate 10 from escaping the enclosed section 31.

— Similar to what is disclosed on Fig. 3A, the enclosed section can be established by the fluid intake line configured to convey inert fluid 11 towards the target surfaces 10A. In the embodiment of Fig. 7, intake of inert fluid is accompanied by conveying particulate matter 10 via the enclosed space by a conveyor device 34.

The reactor assembly further comprises a first auxiliary enclosed section 31-1 and a — second auxiliary enclosed section 31-2, each said section comprising loading- or unloading devices, respectively. The sections 31-1, 31-2 are disposed at both sides of the enclosed space 31.

An exemplary loading device 35, configured as a conventional silo, for example, can be provided in the first auxiliary enclosed section 31-1. Particulate matter 10 loaded into the = 25 reactor assembly 100 via the loading device 35 is conveyed, via the tubular enclosed space S 31, into the reaction chamber 101, by means of the conveyor device 34. Said conveyor s device can be extended throughout the entire length of the enclosed space 31 or, O alternatively, the conveyor device can be provided within the auxiliary section 31-1. E Intake of inert fluid 11 into the enclosed section 31, via the first auxiliary section 31-1, is © 30 preferably implemented via a separate arrangement (not shown). Said inert fluid intake 2 arrangement can be further configured to enable reverse flow (dashed arrow, enclosure ä 31-1).

An exemplary unloading device 36, configured as a container to collect coated particulate material 10, can be provided in the second auxiliary enclosed section 31-2. In similar manner as described for the 31-1, intake of inert fluid 11 into the enclosed section 31, via the second auxiliary section 31-2, is implemented via the separate arrangement (not shown); said arrangement being further configured to enable reverse flow (dashed arrow, enclosure 31-2). Flow of inert fluid 11 entering the tubular enclosure 31 from both auxiliary enclosures 31-1 and 31-2 can be synchronized, in terms of at least flow velocity, time and fluidic pressure.

By such an arrangement propagation of reactive fluid 12 inside the tubular enclosure 31 can be controlled.

The conveyor device 34 can be configured as a conveyor belt, a compression conveyor with a piston, a screw conveyor, or as a conveyor equipped with vibration means.

The — conveyor device can be optionally inclined to make use of the gravity flow.

The auxiliary enclosed sections 31-1, 31-2 are preferably configured to have adjustable volume.

Additionally or alternatively to the inert fluid flow regulating device 33 described hereinabove, a number of auxiliary control devices can be provided within the sections 31-1, 31-2, including, but not limited with mass-flow meters and/or pressure sensors. — Altogether, mentioned regulating appliances provide high-precision control over the flow of particulate matter 10 and over the flow of inert fluid 11 through the enclosed space 31 towards either or both auxiliary enclosures 31-1, 31-2, by actuating time-controlled reverse flow, for example.

The flow of inert fluid 11 is thus mediated through the particulate substrate 10 along the essentially tubular enclosed section 31 towards the reaction chamber 101 (and towards the aperture 31A) such, that when the particulate reaches the reaction chamber, namely a predetermined area/volume in the enclosure 31 exposed to the flow of reactive fluid 12 (that enters the enclosure 31 via the aperture 31A), the flow of inert fluid 11 flowing through the enclosure 31 encounters the flow of reactive fluid 12 (the latter arriving into = 25 — the reaction chamber). This causes formation of coating at the surfaces of particulate S substrate within said exposed area. 3 O As a result, the coating layer 121 deposited onto the target surface 10A of the particulate N substrate 10 can be extended to any desired depth resolution across the particulate volume = passing the aperture 31A. 2 30 Fluid flow through the particulate substrate 10 (Fig. 7) can be further enhanced by means S of a vibration appliance or appliances that generate vibrational (e.g. shaking) movement and transfer that movement onto the substrate 10. Vibration appliances can be configured as mechanical vibrations sources, ultrasound generating sources, sources configured to induce vibration via wireless induction, and the like. The inventor has described relevant vibrational means in the International Application Publication WO 2018/050954. The reactor further comprises containers 36 for collecting particulate material and conveying particulate material out from the reaction space. In similar manner to what is described hereinabove, at least one heating element (not shown) can be provided adjoining to- or being integrated into the enclosed section 31 and/or any one of the auxiliary enclosed sections 31-1, 31-2. The reactor 100 and the associated deposition method, as disclosed hereinabove, advantageously provide for manufacturing coated items made of essentially fluid- permeable material and having at least one surface 10A on which the coating layer 121 is formed. The reactor 100 allows for manufacturing a single coated item at a time or for manufacturing a batch of coated items at a time, wherein the batch comprises at least two substrates to be coated. Coated items can be provided, in which the porous material 10 is porous metal, porous ceramics or porous polymers. In some instances, the porous material provided in the coated item(s) can be established by particulate substrates, such as powder substrates or fibrous substrates. Additionally, porous composites and semiconductor materials (e.g. silicon) can be coated. It shall be appreciated by those skilled in the art that the embodiments set forth in the — present disclosure may be adapted and combined as desired. The disclosure is thus intended to encompass any possible modifications of the device and the deposition method, recognizable by those of ordinary skill in the art, within a scope of appended claims.

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Claims (20)

1. A reactor assembly (100) configured for formation of coatings on surfaces of particulate substrates by chemical deposition, comprising: - a reaction chamber (101); - at least one reactive fluid intake line (21) configured to mediate a flow of reactive fluid (12) into the reaction chamber, - an inert fluid delivery arrangement with at least one enclosed section (31) provided as an essentially tubular member configured to pass through the reaction chamber (101) and loadable with the particulate substrate (10), said tubular member comprising at least one aperture (31A) defining a volume, where the particulate substrate within the enclosed section (31) is exposed to the flow of reactive fluid (12), wherein, said enclosed section is configured to mediate a flow of inert fluid (11) through the particulate substrate (10) towards the reaction chamber (101) such, that within the volume exposed to the flow of reactive fluid (12), the flow of inert fluid (11) encounters the flow of reactive fluid (12), whereby a coating is formed at the surfaces of particulate substrate within said volume.

2. The reactor assembly (100) of claim 1, wherein the enclosed section (31) is arranged separate from the reaction chamber (101) and wherein fluid flow between the enclosed section and the reaction chamber occurs solely via said particulate substrate (10).

3. The reactor assembly (100) of any one of claims 1 or 2, wherein the aperture (31A) is covered by a support material, such as a mesh, a net, a porous filter or a membrane. = 25

4 The reactor assembly (100) of any preceding claim, further comprising a loading N device (35) for loading the particulate substrate to be coated into the reactor assembly 3 and an unloading device (36) for collecting coated substrate. N

5. The reactor assembly (100) of any preceding claim, wherein the loading device (35) E: and the unloading device (36) are disposed at the opposite ends of the essentially O 30 tubular enclosed section (31).

LO S

6. Thereactor assembly (100) of any preceding claim, wherein the loading device (35) N and the unloading device (36) are each provided in a separate auxiliary enclosure (31- 1, 31-2).

7. The reactor assembly (100) of any preceding claim, further comprising a conveyor device (34), configured to convey particulate substrate (10) via the enclosed section (31).

8. Thereactor assembly (100) of any preceding claim, comprising the conveyor device (34) configured as any one of: a conveyor belt, a compression conveyor with a piston, a screw conveyor, or as a conveyor equipped with vibration means.

9. The reactor assembly (100) of any preceding claim, wherein intake of inert fluid (11) into the enclosed section (31) is implemented via any one of the auxiliary enclosures (31-1, 31-2).

10. The reactor assembly (100) of any preceding claim, further comprising at least one heating element adjoining to- or being integrated into the enclosed section (31) and/or any one of the auxiliary enclosures (31-1, 31-2).

11. The reactor assembly (100) of any preceding claim, further comprising a number of control devices configured to control the flow of inert fluid (11) and/or the flow of particulate substrate (10) through the enclosed space (31) towards any one of the auxiliary enclosures (31-1, 31-2).

12. The reactor assembly (100) of any preceding claim, further comprising at least one reactive fluid flow regulating device (23) configured to control the flow of reactive fluid (12) in the at least one reactive fluid intake line (21). —

13. The reactor assembly (100) of any preceding claim configured as an atomic layer deposition (ALD) device, optionally, as a plasma- or photo-assisted ALD device. -

14. A method for coating surfaces of particulate substrates by chemical deposition, O characterized in that the method comprises: od - obtaining a chemical deposition reactor (100) with a reaction chamber (101) and

O © 25 an inert fluid delivery arrangement with at least one enclosed section (31) N provided as an essentially tubular member configured to pass through the reaction

I = chamber (101) and loadable with the particulate substrate (10) with surfaces to be O coated, said tubular member comprising at least one aperture (31A) defining a 3 volume, where the particulate substrate within the enclosed section (31) is N 30 exposed to the flow of reactive fluid (12), N . . . . . . - directing reactive fluid (12) into the reaction chamber, and

- directing inert fluid (11) through the particulate substrate (10) loaded into the essentially tubular enclosed section (31) towards the reaction chamber (101) such, that within the volume exposed to the flow of reactive fluid (12), the flow of inert fluid (11) encounters the flow of reactive fluid (12), whereby a coating is formed at the surfaces of particulate substrate within said volume.

15. The method of claim 14, wherein inert fluid (11) is directed through the particulate substrate via the inert fluid delivery arrangement with at least one enclosed section (31) arranged separate from the reaction chamber (101) such that fluid flow between the enclosed section (31) and the reaction chamber (101) occurs solely via the particulate substrate (10).

16. The method of any one of claims 14 or 15, wherein the depth to which reactive fluid (12) penetrates into the particulate substrate (10) is regulated by altering the flow of inert fluid (11) and/or the flow of particulate substrate (10) through the enclosed space (31) at predetermined points of time, optionally accompanied by actuating time- controlled reverse flow.

17. The method of any preceding claims 14-16, in which reactive fluid (12) delivered into the reaction chamber comprises a predetermined precursor compound or compounds (12-1, 12-2).

18. The method of any preceding claims 14-17, in which a number of predetermined precursors (12-1, 12-2) is delivered into the reaction chamber in sequential order, and in which delivery of each precursor is followed by rinsing the reaction chamber (101), said rinsing being implemented by directing inert fluid, into said reaction chamber, via the at least one reactive fluid intake line (21). N

19. A coated item of particulate material (10), characterized in that the coated item has N 25 surfaces comprising a coating formed by the method according to any one of claims co <Q 14-18. ©

N I

20. The coated item of claim 19, wherein the particulate material (10) is powder and/or - fibers. © co

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