ES532453A0 - Dispositivo y procedimiento para la deposicion galvanica de metales - Google Patents
Dispositivo y procedimiento para la deposicion galvanica de metalesInfo
- Publication number
- ES532453A0 ES532453A0 ES532453A ES532453A ES532453A0 ES 532453 A0 ES532453 A0 ES 532453A0 ES 532453 A ES532453 A ES 532453A ES 532453 A ES532453 A ES 532453A ES 532453 A0 ES532453 A0 ES 532453A0
- Authority
- ES
- Spain
- Prior art keywords
- metals
- procedure
- galvanic deposition
- galvanic
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3317970A DE3317970A1 (de) | 1983-05-13 | 1983-05-13 | Vorrichtung und verfahren zur galvanischen abscheidung von metallen |
Publications (2)
Publication Number | Publication Date |
---|---|
ES532453A0 true ES532453A0 (es) | 1985-01-16 |
ES8502486A1 ES8502486A1 (es) | 1985-01-16 |
Family
ID=6199209
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES532453A Expired ES8502486A1 (es) | 1983-05-13 | 1984-05-11 | Dispositivo y procedimiento para la deposicion galvanica de metales |
Country Status (5)
Country | Link |
---|---|
US (1) | US4560460A (es) |
EP (1) | EP0125446B1 (es) |
JP (1) | JPS59226193A (es) |
DE (2) | DE3317970A1 (es) |
ES (1) | ES8502486A1 (es) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4696729A (en) * | 1986-02-28 | 1987-09-29 | International Business Machines | Electroplating cell |
DE3804070C3 (de) * | 1988-02-10 | 1994-02-24 | Siemens Nixdorf Inf Syst | Galvanisieranlage für Leiterplatten |
DE58903911D1 (de) * | 1988-05-17 | 1993-05-06 | Stohrer Doduco Gmbh & Co | Tauchverfahren und vorrichtung zum elektrolytischen beschichten von platten, insbesondere von elektrischen leiterplatten. |
US4890727A (en) * | 1988-07-27 | 1990-01-02 | Osteo-Dyne, Inc. | Method and apparatus for plating through holes in graphite composites |
US5032235A (en) * | 1988-07-27 | 1991-07-16 | The Boeing Company | Method and apparatus for plating through holes in graphite composites |
US4871435A (en) * | 1988-10-14 | 1989-10-03 | Charles Denofrio | Electroplating apparatus |
US5279725A (en) * | 1992-03-18 | 1994-01-18 | The Boeing Company | Apparatus and method for electroplating a workpiece |
DE4430652C2 (de) | 1994-08-29 | 1997-01-30 | Metallglanz Gmbh | Galvanisches Verfahren und Vorrichtung zur Durchführung des Verfahrens sowie dessen Verwendung zum galvanischen oder chemischen Behandeln, insbesondere zum kontinuierlichen Aufbringen metallischer Schichten auf einen Körper |
DE19704369C2 (de) * | 1997-02-06 | 2001-03-15 | Schempp & Decker Praez Steile | Verfahren zum selektiven galvanischen Beschichten von elektrischen Kontaktelementen |
DE19758513C2 (de) * | 1997-02-06 | 2000-07-13 | Schempp & Decker Praezisionste | Vorrichtung zum selektiven galvanischen Beschichten von elektrischen Kontaktelementen |
US6344106B1 (en) | 2000-06-12 | 2002-02-05 | International Business Machines Corporation | Apparatus, and corresponding method, for chemically etching substrates |
US7655126B2 (en) * | 2006-03-27 | 2010-02-02 | Federal Mogul World Wide, Inc. | Fabrication of topical stopper on MLS gasket by active matrix electrochemical deposition |
BR112014013812B1 (pt) | 2011-12-08 | 2020-11-24 | Alcon Research, Llc | Circuito de aspiraqao para um sistema de fluidos |
USD698019S1 (en) | 2013-03-05 | 2014-01-21 | Alcon Research, Ltd. | Ophthalmic surgical cassette |
US9549850B2 (en) | 2013-04-26 | 2017-01-24 | Novartis Ag | Partial venting system for occlusion surge mitigation |
CN114369853B (zh) * | 2022-01-26 | 2022-09-09 | 益阳市明正宏电子有限公司 | 一种用于高频高速pcb的表面处理装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE850972C (de) * | 1950-08-15 | 1952-09-29 | Wmf Wuerttemberg Metallwaren | Vorrichtung zur Erzeugung verschieden starker galvanischer Niederschlaege auf Gegenstaenden beliebiger Art |
US2698832A (en) * | 1951-03-20 | 1955-01-04 | Standard Process Corp | Plating apparatus |
US2828255A (en) * | 1953-02-01 | 1958-03-25 | Wmf Wuerttemberg Metallwaren | Apparatus for producing galvanic coatings |
US4340449A (en) * | 1977-10-11 | 1982-07-20 | Texas Instruments Incorporated | Method for selectively electroplating portions of articles |
US4186062A (en) * | 1978-07-13 | 1980-01-29 | Micro-Plate, Inc. | Continuous tab plater and method |
US4183799A (en) * | 1978-08-31 | 1980-01-15 | Production Machinery Corporation | Apparatus for plating a layer onto a metal strip |
US4364801A (en) * | 1981-06-29 | 1982-12-21 | Northern Telecom Limited | Method of an apparatus for selectively surface-treating preselected areas on a body |
US4402800A (en) * | 1981-10-02 | 1983-09-06 | Ash James J | Apparatus and method of treating tabs of printed circuit boards and the like |
US4405410A (en) * | 1982-01-15 | 1983-09-20 | Northern Telecom Limited | Masking of elongate three dimensional objects for the exposure of preselected areas for surface treatment |
-
1983
- 1983-05-13 DE DE3317970A patent/DE3317970A1/de active Granted
-
1984
- 1984-03-29 DE DE8484103467T patent/DE3464262D1/de not_active Expired
- 1984-03-29 EP EP84103467A patent/EP0125446B1/de not_active Expired
- 1984-05-11 US US06/609,558 patent/US4560460A/en not_active Expired - Fee Related
- 1984-05-11 ES ES532453A patent/ES8502486A1/es not_active Expired
- 1984-05-14 JP JP59094789A patent/JPS59226193A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE3317970C2 (es) | 1991-11-14 |
EP0125446B1 (de) | 1987-06-16 |
JPS59226193A (ja) | 1984-12-19 |
DE3464262D1 (en) | 1987-07-23 |
US4560460A (en) | 1985-12-24 |
EP0125446A1 (de) | 1984-11-21 |
DE3317970A1 (de) | 1984-11-15 |
ES8502486A1 (es) | 1985-01-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FD1A | Patent lapsed |
Effective date: 19960603 |