ES455588A1 - Photosensitive compositions - Google Patents

Photosensitive compositions

Info

Publication number
ES455588A1
ES455588A1 ES455588A ES455588A ES455588A1 ES 455588 A1 ES455588 A1 ES 455588A1 ES 455588 A ES455588 A ES 455588A ES 455588 A ES455588 A ES 455588A ES 455588 A1 ES455588 A1 ES 455588A1
Authority
ES
Spain
Prior art keywords
carbon atoms
group
formula
compound
substituted coumarin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES455588A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of ES455588A1 publication Critical patent/ES455588A1/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/04—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring
    • C07D311/06—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2
    • C07D311/08—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring
    • C07D311/16—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring substituted in position 7
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/695—Compositions containing azides as the photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/60—Processes for obtaining vesicular images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Materials For Photolithography (AREA)

Abstract

A method of preparing a photosensitive material including a 3-substituted coumarin compound, which method comprises sensitizing a photosensitive composition comprising a radiation-sensitive unsaturated material or a photopolymerizable azide material, by incorporating into the composition of a compound of 3-substituted coumarin having an absorption maximum of 250 to 550 nm and responding to the formula: ** (Formula) ** where Q is CN or -Z-R1 and where R1 is an alkyl group or alkoxy group having from 1 to 10 carbon atoms, an aryl group or an aryloxy group having from 6 to 12 carbon atoms or a heterocyclic group having from 5 to 15 nuclear carbon atoms and heteroatoms. (Machine-translation by Google Translate, not legally binding)
ES455588A 1976-02-02 1977-02-02 Photosensitive compositions Expired ES455588A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65448576A 1976-02-02 1976-02-02
US68866476A 1976-05-21 1976-05-21

Publications (1)

Publication Number Publication Date
ES455588A1 true ES455588A1 (en) 1978-07-16

Family

ID=27096757

Family Applications (1)

Application Number Title Priority Date Filing Date
ES455588A Expired ES455588A1 (en) 1976-02-02 1977-02-02 Photosensitive compositions

Country Status (10)

Country Link
JP (1) JPS5942684B2 (en)
AU (1) AU513012B2 (en)
BR (1) BR7700555A (en)
DE (1) DE2704368A1 (en)
ES (1) ES455588A1 (en)
FI (1) FI770367A (en)
FR (1) FR2339881A1 (en)
GB (1) GB1578662A (en)
IT (1) IT1076960B (en)
NL (1) NL185872C (en)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6026122B2 (en) * 1977-01-20 1985-06-21 富士写真フイルム株式会社 Photopolymerizable composition
JPS5815503A (en) * 1981-07-20 1983-01-28 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS6088005A (en) * 1983-10-21 1985-05-17 Agency Of Ind Science & Technol Photocurable resin composition
JPH0676444B2 (en) * 1986-05-08 1994-09-28 ユニチカ株式会社 Photopolymerizable composition
EP0277915B1 (en) * 1987-02-02 1991-09-04 Ciba-Geigy Ag Photoinitiator mixture containing a titanocene and a 3-ketocoumarin
JP2640470B2 (en) * 1987-08-19 1997-08-13 旭化成工業株式会社 New photosensitive composition
DE3832032A1 (en) * 1988-09-21 1990-03-22 Hoechst Ag PHOTOPOLYMERIZABLE MIXTURE AND RECORDING MATERIAL MANUFACTURED THEREOF
JPH02144539A (en) * 1988-11-28 1990-06-04 Sumitomo Bakelite Co Ltd Photosensitive resin composition
JPH02281895A (en) * 1989-04-24 1990-11-19 Nissin Electric Co Ltd Building management system
DE59007720D1 (en) * 1989-10-27 1994-12-22 Ciba Geigy Ag Method for tuning the radiation sensitivity of photopolymerizable compositions.
JP3141517B2 (en) 1992-05-14 2001-03-05 ブラザー工業株式会社 Photocurable composition
US5738974A (en) 1994-09-05 1998-04-14 Mitsubishi Chemical Corporation Photopolymerizable composition and photosensitive lithographic printing plate
DE69620723T2 (en) 1995-12-22 2002-12-05 Mitsubishi Chem Corp Photopolymerizable composition for a color filter, color filter and liquid crystal display device
DE19620747A1 (en) * 1996-05-23 1997-11-27 Hoechst Ag Process for the preparation of 3- (7-diethylamino-2-oxo-2H-chromen-3-yl) -3-oxopropionic acid (1-methoxy-2-propyl ester)
EP0889361B1 (en) * 1997-06-30 2002-01-23 Siemens Aktiengesellschaft Initiators for cationic polymerization
WO2005111707A1 (en) 2004-04-26 2005-11-24 Mitsubishi Chemical Corporation Blue color composition for color filter, color filter, and color image display device
JP2006065074A (en) 2004-08-27 2006-03-09 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate
JP5089866B2 (en) 2004-09-10 2012-12-05 富士フイルム株式会社 Planographic printing method
WO2006134633A1 (en) 2005-06-13 2006-12-21 Toshiba Tec Kabushiki Kaisha Inkjet ink, method of inkjet recording, method of evaluating inkjet ink, and process for producing inkjet ink
JP4701042B2 (en) 2005-08-22 2011-06-15 富士フイルム株式会社 Photosensitive planographic printing plate
WO2007057346A2 (en) * 2005-11-18 2007-05-24 Agfa Graphics Nv Method of making a lithographic printing plate
DE602005013399D1 (en) * 2005-11-18 2009-04-30 Agfa Graphics Nv Process for the preparation of a lithographic printing plate
WO2007057347A1 (en) * 2005-11-18 2007-05-24 Agfa Graphics Nv Method of making a lithographic printing plate
ES2322908T3 (en) * 2005-11-18 2009-07-01 Agfa Graphics N.V. METHOD OF MANUFACTURE OF A LITHOGRAPHIC PRINT IRON.
TW200807104A (en) 2006-04-19 2008-02-01 Mitsubishi Chem Corp Color image display device
JP4890408B2 (en) 2007-09-28 2012-03-07 富士フイルム株式会社 Polymerizable composition, lithographic printing plate precursor using the same, alkali-soluble polyurethane resin, and method for producing diol compound
WO2009099211A1 (en) 2008-02-07 2009-08-13 Mitsubishi Chemical Corporation Semiconductor light emitting device, backlighting device, color image display device and phosphor used for those devices
JP5264427B2 (en) 2008-03-25 2013-08-14 富士フイルム株式会社 Preparation method of lithographic printing plate
JP5228631B2 (en) 2008-05-29 2013-07-03 富士フイルム株式会社 Lithographic printing plate developing treatment solution and method for preparing a lithographic printing plate
JP5248203B2 (en) 2008-05-29 2013-07-31 富士フイルム株式会社 Lithographic printing plate developing treatment solution and method for preparing a lithographic printing plate
CN102132218A (en) 2008-08-22 2011-07-20 富士胶片株式会社 Process for producing lithographic printing plate
JP5405141B2 (en) 2008-08-22 2014-02-05 富士フイルム株式会社 Preparation method of lithographic printing plate
JP5171483B2 (en) 2008-08-29 2013-03-27 富士フイルム株式会社 Preparation method of lithographic printing plate
JP5714544B2 (en) 2011-09-15 2015-05-07 富士フイルム株式会社 Recycling process waste liquid
JP5819275B2 (en) 2011-11-04 2015-11-24 富士フイルム株式会社 Recycling process waste liquid
ITVA20120041A1 (en) 2012-10-22 2014-04-23 Lamberti Spa 3-CHETOCUMARINE FOR PHOTOPOLYMERIZATIONS THROUGH LED
EP3147335A1 (en) 2015-09-23 2017-03-29 BYK-Chemie GmbH Colorant compositions containing wettting and/or dispersing agents with low amine number
CN111344319B (en) 2017-11-15 2022-12-23 毕克化学有限公司 Block copolymer
US20200347171A1 (en) 2017-11-15 2020-11-05 Byk-Chemie Gmbh Block co-polymer

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2732301A (en) * 1952-10-15 1956-01-24 Chxcxch
US3615452A (en) * 1968-09-09 1971-10-26 Gaf Corp Dye-sensitized photopolymerization process
DE1949010C3 (en) * 1969-09-27 1979-11-29 Bayer Ag, 5090 Leverkusen Use of halogen methylated benzophenones as photopolymerization initiators
GB1310936A (en) * 1970-03-17 1973-03-21 Minnesota Mining & Mfg Light-sensitive imaging sheet and method of using

Also Published As

Publication number Publication date
GB1578662A (en) 1980-11-05
DE2704368C2 (en) 1988-05-11
FI770367A (en) 1977-08-03
BR7700555A (en) 1977-10-04
NL185872C (en) 1990-08-01
NL185872B (en) 1990-03-01
AU2187177A (en) 1978-08-10
NL7701089A (en) 1977-08-04
FR2339881A1 (en) 1977-08-26
IT1076960B (en) 1985-04-27
DE2704368A1 (en) 1977-08-11
JPS5942684B2 (en) 1984-10-17
AU513012B2 (en) 1980-11-06
FR2339881B1 (en) 1979-03-02
JPS52112681A (en) 1977-09-21

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