ES384199A1 - Composite nickel electroplate - Google Patents
Composite nickel electroplateInfo
- Publication number
- ES384199A1 ES384199A1 ES384199A ES384199A ES384199A1 ES 384199 A1 ES384199 A1 ES 384199A1 ES 384199 A ES384199 A ES 384199A ES 384199 A ES384199 A ES 384199A ES 384199 A1 ES384199 A1 ES 384199A1
- Authority
- ES
- Spain
- Prior art keywords
- layer
- nickel
- sulfur
- electrodeposition
- intermediate layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/625—Discontinuous layers, e.g. microcracked layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrolytic Production Of Metals (AREA)
- Laminated Bodies (AREA)
Abstract
Procedure for the formation of a corrosion-resistant, three-layer nickel-containing composite coating on a metallic base surface susceptible to corroding by electrodeposition on said surface of a nickel-containing adherent bottom layer of a thickness of 0.003810 mm to 0.03810 mm and an average sulfur content of less than about 0.03%; electrodeposition on said bottom layer of an adherent intermediate layer containing nickel with a thickness of approximately 0.000127 to 0.00508 mm and an average sulfur content of approximately 0.05 to 0.3%; and electrodeposition on said intermediate layer of an adherent nickel-containing upper layer with a thickness of 0.00508 to 0.0381 mm and an average sulfur content of approximately 0.02 to 0.15%, said upper layer containing a further percentage small sulfur than said intermediate layer and a higher percentage of sulfur than said lower layer, characterized by comprising incorporating into the electrodeposition bath, from which at least the intermediate layer containing nickel, at least one compound is produced It contains sulfur selected from the group consisting of nitrile thiosulfonates and amides, as the source for the sulfur contained in said layer. (Machine-translation by Google Translate, not legally binding)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US86294269A | 1969-10-01 | 1969-10-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES384199A1 true ES384199A1 (en) | 1973-01-01 |
Family
ID=25339801
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES384199A Expired ES384199A1 (en) | 1969-10-01 | 1970-10-02 | Composite nickel electroplate |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS4840541B1 (en) |
| BE (1) | BE756432A (en) |
| CA (1) | CA918596A (en) |
| DE (1) | DE2045301B2 (en) |
| ES (1) | ES384199A1 (en) |
| FR (1) | FR2064070B1 (en) |
| GB (1) | GB1321859A (en) |
| NL (1) | NL7013991A (en) |
| SE (1) | SE375341B (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU8469875A (en) * | 1975-03-07 | 1977-03-17 | Oxy Metal Industries Corp | Thioether sulphonates |
| US4376682A (en) * | 1980-04-07 | 1983-03-15 | Tdc Technology Development Corporation | Method for producing smooth coherent metal chalconide films |
| US4411961A (en) * | 1981-09-28 | 1983-10-25 | Occidental Chemical Corporation | Composite electroplated article and process |
| JP6220359B2 (en) * | 2015-03-26 | 2017-10-25 | Ｊｘ金属株式会社 | Tab lead material for film-clad battery and manufacturing method thereof |
-
0
- BE BE756432D patent/BE756432A/en unknown
-
1970
- 1970-09-14 DE DE2045301A patent/DE2045301B2/en active Granted
- 1970-09-22 NL NL7013991A patent/NL7013991A/xx unknown
- 1970-09-22 FR FR707034252A patent/FR2064070B1/fr not_active Expired
- 1970-09-24 CA CA093979A patent/CA918596A/en not_active Expired
- 1970-09-28 GB GB4608870A patent/GB1321859A/en not_active Expired
- 1970-09-30 SE SE7013242A patent/SE375341B/xx unknown
- 1970-09-30 JP JP45085208A patent/JPS4840541B1/ja active Pending
- 1970-10-02 ES ES384199A patent/ES384199A1/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2045301B2 (en) | 1973-09-13 |
| SE375341B (en) | 1975-04-14 |
| CA918596A (en) | 1973-01-09 |
| FR2064070B1 (en) | 1974-03-01 |
| NL7013991A (en) | 1971-04-05 |
| GB1321859A (en) | 1973-07-04 |
| DE2045301A1 (en) | 1971-04-08 |
| DE2045301C3 (en) | 1974-04-25 |
| JPS4840541B1 (en) | 1973-12-01 |
| BE756432A (en) | 1971-03-22 |
| FR2064070A1 (en) | 1971-07-16 |
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