ES2171891T3 - Procedimiento para separacion de las soluciones organicas de proceso que provienen de la fabricacion de circuitos impresos. - Google Patents
Procedimiento para separacion de las soluciones organicas de proceso que provienen de la fabricacion de circuitos impresos.Info
- Publication number
- ES2171891T3 ES2171891T3 ES97906988T ES97906988T ES2171891T3 ES 2171891 T3 ES2171891 T3 ES 2171891T3 ES 97906988 T ES97906988 T ES 97906988T ES 97906988 T ES97906988 T ES 97906988T ES 2171891 T3 ES2171891 T3 ES 2171891T3
- Authority
- ES
- Spain
- Prior art keywords
- procedure
- manufacture
- come
- separation
- printed circuits
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title abstract 7
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000926 separation method Methods 0.000 title 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 abstract 3
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000002699 waste material Substances 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/025—Reverse osmosis; Hyperfiltration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/145—Ultrafiltration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/147—Microfiltration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/36—Pervaporation; Membrane distillation; Liquid permeation
- B01D61/362—Pervaporation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/58—Multistep processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
Landscapes
- Engineering & Computer Science (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Environmental & Geological Engineering (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)
- Polyethers (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
LA PRESENTE INVENCION SE REFIERE A UN PROCEDIMIENTO DE FILTRADO DE DISOLUCIONES ORGANICAS PROCEDENTES DE LA FABRICACION DE PLACAS DE CIRCUITO IMPRESO, QUE TIENE AL MENOS UN PASO DE FILTRADO FINO (7, 10). EN EL PROCEDIMIENTO DE LA INVENCION, LAS SUSTANCIAS DISUELTAS EN LAS DISOLUCIONES DEL PROCESO SE SEPARAN DE LOS DISOLVENTES ORGANICOS DEL PROCESO, COMO POR EJEMPLO EL ETILENGLICOL, MEDIANTE UN ULTRAFILTRADO (7) POR EJEMPLO, PARA HACER POSIBLE SU REUTILIZACION. LAS VENTAJAS DEL PROCEDIMIENTO DE LA INVENCION SON LA POSIBILIDAD DE AHORRAR UNA ELEVADA CANTIDAD DE MATERIALES Y ENERGIA Y QUE ADEMAS LOS DESECHOS PUEDEN DISMINUIRSE EN GRAN PARTE O INCLUSO EVITARSE POR COMPLETO.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19600967A DE19600967C2 (de) | 1996-01-12 | 1996-01-12 | Verfahren zum Auftrennen von aus der Leiterplattenherstellung stammenden organischen Prozeßlösungen |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2171891T3 true ES2171891T3 (es) | 2002-09-16 |
Family
ID=7782634
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES97906988T Expired - Lifetime ES2171891T3 (es) | 1996-01-12 | 1997-01-09 | Procedimiento para separacion de las soluciones organicas de proceso que provienen de la fabricacion de circuitos impresos. |
Country Status (11)
Country | Link |
---|---|
US (1) | US6180009B1 (es) |
EP (1) | EP0876195B1 (es) |
JP (1) | JP2000508572A (es) |
KR (1) | KR19990077182A (es) |
CN (1) | CN1115189C (es) |
AT (1) | ATE213967T1 (es) |
AU (1) | AU1922797A (es) |
CA (1) | CA2242162A1 (es) |
DE (2) | DE19600967C2 (es) |
ES (1) | ES2171891T3 (es) |
WO (1) | WO1997025127A1 (es) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0891950A1 (de) * | 1997-07-17 | 1999-01-20 | PPG Industries Lacke GmbH | Verfahren zur Aufbereitung von lösemittelhaltigen Prozessflüssigkeiten |
JP2000237562A (ja) * | 1999-02-23 | 2000-09-05 | Kanebo Ltd | 分子ふるい炭素膜およびその製造法、並びに浸透気化分離方法 |
DE19939697A1 (de) * | 1999-08-21 | 2001-02-22 | Georg Haertel | Membranverfahren für die Aufbereitung von Metallsalzextrakten |
US20030226807A1 (en) * | 2002-05-01 | 2003-12-11 | Jeff Watson | Method and apparatus for treating aqueous process baths and their associated waste streams |
JP2004101999A (ja) * | 2002-09-11 | 2004-04-02 | Mitsubishi Chemical Engineering Corp | 現像液のリサイクル供給装置 |
JP2006210751A (ja) * | 2005-01-31 | 2006-08-10 | Mitsubishi Chemical Engineering Corp | シンナーのリサイクル供給装置 |
KR100732719B1 (ko) * | 2006-12-06 | 2007-06-27 | 김민수 | 폐유기용제의 재생방법 |
US8083947B2 (en) * | 2009-02-24 | 2011-12-27 | Eastman Kodak Company | Polymer-containing solvent purifying process |
DE112010001432T5 (de) * | 2009-03-31 | 2012-10-25 | Kurita Water Industries, Ltd. | Vorrichtung und Verfahren zur Aufbereitung einer Ätzlösung |
TWI535494B (zh) * | 2011-12-23 | 2016-06-01 | 友達光電股份有限公司 | 光阻剝離液的供應系統及其供應方法 |
CN103631099A (zh) * | 2012-08-22 | 2014-03-12 | 财团法人印刷工业技术研究中心 | 适用水冲洗式版材的环保冲版机 |
EP3364251A1 (fr) * | 2017-02-17 | 2018-08-22 | GS Trading SA | Procede de gravure de plaques photopolymeres |
CN110668529A (zh) * | 2018-07-02 | 2020-01-10 | 陈俊吉 | 显影液再生***及其正负型光刻胶分离装置 |
CN111372369B (zh) | 2018-12-25 | 2023-07-07 | 奥特斯科技(重庆)有限公司 | 具有部件屏蔽的部件承载件及其制造方法 |
CN113210143A (zh) * | 2021-06-08 | 2021-08-06 | 惠州市成泰自动化科技有限公司 | 一种电路板生产用药水再生装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5827963B2 (ja) | 1979-05-17 | 1983-06-13 | 日東電工株式会社 | 選択性透過膜の製造方法 |
JPS56161803A (en) * | 1980-05-17 | 1981-12-12 | Nitto Electric Ind Co Ltd | Treatment of resin containing organic solution |
DE3143106A1 (de) | 1981-10-30 | 1983-05-11 | Basf Ag, 6700 Ludwigshafen | Verfahren und vorrichtung zur regenerierung waessrigerauswaschloesungen von wasserentwickelbaren photosensitiven aufzeichnungsmaterialien |
JPS59115795A (ja) * | 1982-12-24 | 1984-07-04 | Sanyo Kokusaku Pulp Co Ltd | パルプ蒸解排液の処理方法 |
US4788043A (en) * | 1985-04-17 | 1988-11-29 | Tokuyama Soda Kabushiki Kaisha | Process for washing semiconductor substrate with organic solvent |
KR950014323B1 (ko) * | 1986-07-23 | 1995-11-24 | 스미도모쥬기가이고오교오 가부시기가이샤 | 포토레지스트 폐액의 처리방법 |
US5039421A (en) * | 1989-10-02 | 1991-08-13 | Aligena Ag | Solvent stable membranes |
US5091296A (en) * | 1990-06-26 | 1992-02-25 | Eastman Kodak Company | Polymer co-precipitated coupler dispersion |
US5167826A (en) | 1991-07-03 | 1992-12-01 | Stanadyne Automotive Corp. | Engine collant recycling apparatus and process |
IL102810A (en) | 1991-08-30 | 1996-06-18 | Membrane Products Kiryat Wiezm | Stable membranes in solvents, made of silicone derivatives. |
DE4236713A1 (en) | 1991-11-21 | 1993-05-27 | Labocontrol Ag | Photochemical recovery - using membrane filter for high flow rates and low concns. and second membrane with low flow at high concn. with return of retained matter to collection tank |
ATE116696T1 (de) * | 1992-08-07 | 1995-01-15 | Wack O K Chemie Gmbh | Reinigungsmittel. |
JPH06226245A (ja) | 1993-01-27 | 1994-08-16 | Dr Ok Wack Chem Gmbh | すすぎ浴剤に溶解している液剤の再生方法 |
DE29517588U1 (de) | 1995-11-06 | 1996-02-08 | Cimatec GmbH Produkte für Leiterplatten, 67292 Kirchheimbolanden | Maschine zur Flüssigkeitsbehandlung von Gegenständen, insbesondere Platinen in der Leiterplattenfertigung |
-
1996
- 1996-01-12 DE DE19600967A patent/DE19600967C2/de not_active Expired - Fee Related
-
1997
- 1997-01-09 AT AT97906988T patent/ATE213967T1/de not_active IP Right Cessation
- 1997-01-09 CA CA002242162A patent/CA2242162A1/en not_active Abandoned
- 1997-01-09 AU AU19227/97A patent/AU1922797A/en not_active Abandoned
- 1997-01-09 JP JP9524747A patent/JP2000508572A/ja not_active Ceased
- 1997-01-09 KR KR1019980705323A patent/KR19990077182A/ko not_active Application Discontinuation
- 1997-01-09 EP EP97906988A patent/EP0876195B1/de not_active Expired - Lifetime
- 1997-01-09 US US09/101,095 patent/US6180009B1/en not_active Expired - Fee Related
- 1997-01-09 DE DE59706554T patent/DE59706554D1/de not_active Expired - Fee Related
- 1997-01-09 CN CN97191669A patent/CN1115189C/zh not_active Expired - Fee Related
- 1997-01-09 ES ES97906988T patent/ES2171891T3/es not_active Expired - Lifetime
- 1997-01-09 WO PCT/DE1997/000022 patent/WO1997025127A1/de not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
US6180009B1 (en) | 2001-01-30 |
DE59706554D1 (de) | 2002-04-11 |
KR19990077182A (ko) | 1999-10-25 |
CA2242162A1 (en) | 1997-07-17 |
JP2000508572A (ja) | 2000-07-11 |
DE19600967A1 (de) | 1997-07-17 |
EP0876195A1 (de) | 1998-11-11 |
DE19600967C2 (de) | 1998-06-04 |
AU1922797A (en) | 1997-08-01 |
CN1115189C (zh) | 2003-07-23 |
ATE213967T1 (de) | 2002-03-15 |
EP0876195B1 (de) | 2002-03-06 |
CN1208362A (zh) | 1999-02-17 |
WO1997025127A1 (de) | 1997-07-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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