ES2059578T3 - Acondicionamiento de un sustrato no conductor para la posterior deposicion selectiva de un metal sobre el mismo. - Google Patents

Acondicionamiento de un sustrato no conductor para la posterior deposicion selectiva de un metal sobre el mismo.

Info

Publication number
ES2059578T3
ES2059578T3 ES89101763T ES89101763T ES2059578T3 ES 2059578 T3 ES2059578 T3 ES 2059578T3 ES 89101763 T ES89101763 T ES 89101763T ES 89101763 T ES89101763 T ES 89101763T ES 2059578 T3 ES2059578 T3 ES 2059578T3
Authority
ES
Spain
Prior art keywords
metal
selective deposition
conditioning
conductive substrate
later selective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES89101763T
Other languages
English (en)
Inventor
Robert W Johnson
William H Lawrence
Gary K Lemon
Roy H Magnuson
Voya R Markovich
Ralph E Parsons
Carlos J Sambucetti
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of ES2059578T3 publication Critical patent/ES2059578T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/184—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/381—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703—Plating
    • H05K2203/0716—Metallic plating catalysts, e.g. for direct electroplating of through holes; Sensitising or activating metallic plating catalysts
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1152—Replicating the surface structure of a sacrificial layer, e.g. for roughening
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/14—Related to the order of processing steps
    • H05K2203/1407—Applying catalyst before applying plating resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Chemically Coating (AREA)

Abstract

UN SUBSTRATO NO CONDUCTOR ES CONDICIONADO PARA ULTERIOR DEPOSICION SELECTIVA DE UN METAL EN EL, HACIENDO QUE POR LO MENOS UNA DE LAS PRINCIPALES SUPERFICIES DEL SUBSTRATO SEA DE FORMA ASPERA, PONIENDO EN CONTACTO ESTA(S) SUPRFICIE(S) CON UN CATALIZADOR DE PALADIO/ESTA/O, ACTIVANDO EL CATALIZADOR POR EMPLEO DE UNA DISOLUCION DE HIDROXIDO ALCALINO, LAMINANDO UNA COMPOSICION FOTOSENSIBLE EN LA SUPERFICIE PRINCIPAL, Y EXPONIENDO LA COMPOSICION FOTOSENSIBLE A LA LUZ ACTINICA EN UN PATRON DETERMINADO Y LUEGO DESARROLLAR PARA PROPORCIONAR EL PATRON PREDETERMINADO.
ES89101763T 1988-02-16 1989-02-02 Acondicionamiento de un sustrato no conductor para la posterior deposicion selectiva de un metal sobre el mismo. Expired - Lifetime ES2059578T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/156,519 US4948707A (en) 1988-02-16 1988-02-16 Conditioning a non-conductive substrate for subsequent selective deposition of a metal thereon

Publications (1)

Publication Number Publication Date
ES2059578T3 true ES2059578T3 (es) 1994-11-16

Family

ID=22559902

Family Applications (1)

Application Number Title Priority Date Filing Date
ES89101763T Expired - Lifetime ES2059578T3 (es) 1988-02-16 1989-02-02 Acondicionamiento de un sustrato no conductor para la posterior deposicion selectiva de un metal sobre el mismo.

Country Status (7)

Country Link
US (1) US4948707A (es)
EP (1) EP0328944B1 (es)
JP (1) JPH01219168A (es)
BR (1) BR8900664A (es)
CA (1) CA1332885C (es)
DE (1) DE68917748T2 (es)
ES (1) ES2059578T3 (es)

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US5260170A (en) * 1990-01-08 1993-11-09 Motorola, Inc. Dielectric layered sequentially processed circuit board
US5506091A (en) * 1990-04-20 1996-04-09 Nisshinbo Industries, Inc. Photosensitive resin composition and method of forming conductive pattern
EP0467199A3 (en) * 1990-07-19 1992-11-25 Learonal, Inc. Preparation of printed circuit boards by metallization
US5667934A (en) * 1990-10-09 1997-09-16 International Business Machines Corporation Thermally stable photoimaging composition
US5310580A (en) * 1992-04-27 1994-05-10 International Business Machines Corporation Electroless metal adhesion to organic dielectric material with phase separated morphology
US5509557A (en) * 1994-01-24 1996-04-23 International Business Machines Corporation Depositing a conductive metal onto a substrate
US5508146A (en) * 1994-03-04 1996-04-16 Eastman Kodak Company Imaging element overcoat for reductive laser-imaging
US5506093A (en) * 1994-03-04 1996-04-09 Eastman Kodak Company Imaging element for reductive laser-imaging
TW312079B (es) * 1994-06-06 1997-08-01 Ibm
DE4438799A1 (de) * 1994-10-18 1996-04-25 Atotech Deutschland Gmbh Verfahren zum Beschichten elektrisch nichtleitender Oberflächen mit Metallstrukturen
WO1996020294A1 (fr) * 1994-12-27 1996-07-04 Ibiden Co., Ltd. Solution de pre-traitement pour depot autocatalytique, bain et procede de depot autocatalytique
US6207351B1 (en) 1995-06-07 2001-03-27 International Business Machines Corporation Method for pattern seeding and plating of high density printed circuit boards
US5866237A (en) * 1996-08-23 1999-02-02 International Business Machines Corporation Organic electronic package and method of applying palladium-tin seed layer thereto
EP0913502B1 (en) 1997-04-07 2006-05-31 Okuno Chemical Industries Co., Ltd. Method of electroplating nonconductive plastic molded product
US6136513A (en) * 1997-06-13 2000-10-24 International Business Machines Corporation Method of uniformly depositing seed and a conductor and the resultant printed circuit structure
US6141870A (en) 1997-08-04 2000-11-07 Peter K. Trzyna Method for making electrical device
US6544583B2 (en) 2000-02-01 2003-04-08 Trebor International, Inc. Method for adjusting resistivity of a film heater
US6580061B2 (en) 2000-02-01 2003-06-17 Trebor International Inc Durable, non-reactive, resistive-film heater
US6674053B2 (en) 2001-06-14 2004-01-06 Trebor International Electrical, thin film termination
US6663914B2 (en) 2000-02-01 2003-12-16 Trebor International Method for adhering a resistive coating to a substrate
US7081602B1 (en) 2000-02-01 2006-07-25 Trebor International, Inc. Fail-safe, resistive-film, immersion heater
US6433319B1 (en) 2000-12-15 2002-08-13 Brian A. Bullock Electrical, thin film termination
DE10015214C1 (de) * 2000-03-27 2002-03-21 Infineon Technologies Ag Verfahren zur Metallisierung eines Isolators und/oder eines Dielektrikums
TW529090B (en) * 2001-04-04 2003-04-21 Koninkl Philips Electronics Nv Back-end metallisation process
US6645557B2 (en) 2001-10-17 2003-11-11 Atotech Deutschland Gmbh Metallization of non-conductive surfaces with silver catalyst and electroless metal compositions
DE10211701A1 (de) * 2002-03-16 2003-09-25 Studiengesellschaft Kohle Mbh Verfahren zur in situ Immobilisierung von wasserlöslichen nanodispergierten Metalloxid-Kolloiden
US6858378B1 (en) * 2002-04-17 2005-02-22 Sandia National Laboratories Photoimageable composition
US7078809B2 (en) * 2003-12-31 2006-07-18 Dynacraft Industries Sdn. Bhd. Chemical leadframe roughening process and resulting leadframe and integrated circuit package
CN101176040A (zh) * 2005-04-14 2008-05-07 哈佛大学 用于微制造的牺牲层中可调整的溶解度
US20090056994A1 (en) * 2007-08-31 2009-03-05 Kuhr Werner G Methods of Treating a Surface to Promote Metal Plating and Devices Formed
WO2009029871A1 (en) * 2007-08-31 2009-03-05 Zettacore, Inc. Methods of treating a surface to promote binding of molecule(s) of interest, coatings and devices formed therefrom
CN102356338B (zh) 2009-04-08 2015-03-11 国际商业机器公司 具有埋设光反射特征的光波导及其制造方法
US9345149B2 (en) 2010-07-06 2016-05-17 Esionic Corp. Methods of treating copper surfaces for enhancing adhesion to organic substrates for use in printed circuit boards
RU2543518C1 (ru) * 2013-10-03 2015-03-10 Общество с ограниченной ответственностью "Компания РМТ"(ООО"РМТ") Способ изготовления двусторонней печатной платы
US9023560B1 (en) * 2013-11-05 2015-05-05 Eastman Kodak Company Electroless plating method using non-reducing agent
TWI752186B (zh) * 2017-03-23 2022-01-11 日商東京威力科創股份有限公司 鍍膜處理方法、鍍膜處理裝置及記憶媒體
CN109811332B (zh) * 2019-02-21 2021-03-23 深圳市天熙科技开发有限公司 一种用于非导电基材表面化学镀的活化液及其再生方法

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US3506482A (en) * 1967-04-25 1970-04-14 Matsushita Electric Ind Co Ltd Method of making printed circuits
US3982045A (en) * 1974-10-11 1976-09-21 Macdermid Incorporated Method of manufacture of additive printed circuitboards using permanent resist mask
US4302530A (en) * 1977-12-08 1981-11-24 University Of Pennsylvania Method for making substance-sensitive electrical structures by processing substance-sensitive photoresist material
US4169732A (en) * 1978-01-09 1979-10-02 International Business Machines Corporation Photosensitive coating composition and use thereof
US4209331A (en) * 1978-05-25 1980-06-24 Macdermid Incorporated Electroless copper composition solution using a hypophosphite reducing agent
NL7806773A (nl) * 1978-06-23 1979-12-28 Philips Nv Additieve werkwijze voor het vervaardigen van metaal- patronen op kunststofsubstraten.
US4233344A (en) * 1978-07-20 1980-11-11 Learonal, Inc. Method of improving the adhesion of electroless metal deposits employing colloidal copper activator
US4237216A (en) * 1978-12-08 1980-12-02 International Business Machines Corporation Photosensitive patternable coating composition containing novolak type materials
US4309462A (en) * 1978-12-19 1982-01-05 Crown City Plating Co. Conditioning of caprolactam polymers for electroless plating
US4325990A (en) * 1980-05-12 1982-04-20 Macdermid Incorporated Electroless copper deposition solutions with hypophosphite reducing agent
US4526810A (en) * 1982-06-17 1985-07-02 At&T Technologies, Inc. Process for improved wall definition of an additive printed circuit
US4448804A (en) * 1983-10-11 1984-05-15 International Business Machines Corporation Method for selective electroless plating of copper onto a non-conductive substrate surface
US4640718A (en) * 1985-10-29 1987-02-03 International Business Machines Corporation Process for accelerating Pd/Sn seeds for electroless copper plating
US4701351A (en) * 1986-06-16 1987-10-20 International Business Machines Corporation Seeding process for electroless metal deposition
US4748104A (en) * 1986-11-10 1988-05-31 Macdermid, Incorporated Selective metallization process and additive method for manufactured printed circuit boards
US4782007A (en) * 1987-04-28 1988-11-01 Macdermid, Incorporated Additive method for manufacturing printed circuit boards using aqueous alkaline developable and strippable photoresists
US4735820A (en) * 1987-05-18 1988-04-05 International Business Machines Corporation Removal of residual catalyst from a dielectric substrate

Also Published As

Publication number Publication date
CA1332885C (en) 1994-11-08
EP0328944A2 (en) 1989-08-23
DE68917748T2 (de) 1995-03-30
JPH01219168A (ja) 1989-09-01
JPH021912B2 (es) 1990-01-16
EP0328944B1 (en) 1994-08-31
BR8900664A (pt) 1989-10-10
EP0328944A3 (en) 1990-01-31
DE68917748D1 (de) 1994-10-06
US4948707A (en) 1990-08-14

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