BR8900664A - Processo para o condicionamento de um substrato nao condutor - Google Patents

Processo para o condicionamento de um substrato nao condutor

Info

Publication number
BR8900664A
BR8900664A BR898900664A BR8900664A BR8900664A BR 8900664 A BR8900664 A BR 8900664A BR 898900664 A BR898900664 A BR 898900664A BR 8900664 A BR8900664 A BR 8900664A BR 8900664 A BR8900664 A BR 8900664A
Authority
BR
Brazil
Prior art keywords
conditioning
processing
conductive substrate
conductive
substrate
Prior art date
Application number
BR898900664A
Other languages
English (en)
Inventor
Robert William Johnson
William Howell Lawrence
Gary Kevin Lemon
Roy Harvey Magnuson
Voya Rista Markovich
Ralph Elliott Parsons
Carlos Juan Sambucetti
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of BR8900664A publication Critical patent/BR8900664A/pt

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/184—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/381—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703—Plating
    • H05K2203/0716—Metallic plating catalysts, e.g. for direct electroplating of through holes; Sensitising or activating metallic plating catalysts
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1152—Replicating the surface structure of a sacrificial layer, e.g. for roughening
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/14—Related to the order of processing steps
    • H05K2203/1407—Applying catalyst before applying plating resist
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)
BR898900664A 1988-02-16 1989-02-15 Processo para o condicionamento de um substrato nao condutor BR8900664A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/156,519 US4948707A (en) 1988-02-16 1988-02-16 Conditioning a non-conductive substrate for subsequent selective deposition of a metal thereon

Publications (1)

Publication Number Publication Date
BR8900664A true BR8900664A (pt) 1989-10-10

Family

ID=22559902

Family Applications (1)

Application Number Title Priority Date Filing Date
BR898900664A BR8900664A (pt) 1988-02-16 1989-02-15 Processo para o condicionamento de um substrato nao condutor

Country Status (7)

Country Link
US (1) US4948707A (pt)
EP (1) EP0328944B1 (pt)
JP (1) JPH01219168A (pt)
BR (1) BR8900664A (pt)
CA (1) CA1332885C (pt)
DE (1) DE68917748T2 (pt)
ES (1) ES2059578T3 (pt)

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US5260170A (en) * 1990-01-08 1993-11-09 Motorola, Inc. Dielectric layered sequentially processed circuit board
US5506091A (en) * 1990-04-20 1996-04-09 Nisshinbo Industries, Inc. Photosensitive resin composition and method of forming conductive pattern
EP0467199A3 (en) * 1990-07-19 1992-11-25 Learonal, Inc. Preparation of printed circuit boards by metallization
US5667934A (en) * 1990-10-09 1997-09-16 International Business Machines Corporation Thermally stable photoimaging composition
US5310580A (en) * 1992-04-27 1994-05-10 International Business Machines Corporation Electroless metal adhesion to organic dielectric material with phase separated morphology
US5509557A (en) * 1994-01-24 1996-04-23 International Business Machines Corporation Depositing a conductive metal onto a substrate
US5508146A (en) * 1994-03-04 1996-04-16 Eastman Kodak Company Imaging element overcoat for reductive laser-imaging
US5506093A (en) * 1994-03-04 1996-04-09 Eastman Kodak Company Imaging element for reductive laser-imaging
TW312079B (pt) 1994-06-06 1997-08-01 Ibm
DE4438799A1 (de) * 1994-10-18 1996-04-25 Atotech Deutschland Gmbh Verfahren zum Beschichten elektrisch nichtleitender Oberflächen mit Metallstrukturen
EP0747507B1 (en) * 1994-12-27 2001-02-14 Ibiden Co., Ltd. Pretreatment solution for electroless plating, electroless plating bath and electroless plating method
US6207351B1 (en) 1995-06-07 2001-03-27 International Business Machines Corporation Method for pattern seeding and plating of high density printed circuit boards
US5866237A (en) * 1996-08-23 1999-02-02 International Business Machines Corporation Organic electronic package and method of applying palladium-tin seed layer thereto
DE69735999T2 (de) 1997-04-07 2007-05-03 Okuno Chemical Industries Co., Ltd. Verfahren zur elektrobeschichtung eines nichtleitenden geformten kunststoffgegenstands
US6136513A (en) * 1997-06-13 2000-10-24 International Business Machines Corporation Method of uniformly depositing seed and a conductor and the resultant printed circuit structure
US6141870A (en) * 1997-08-04 2000-11-07 Peter K. Trzyna Method for making electrical device
US6580061B2 (en) 2000-02-01 2003-06-17 Trebor International Inc Durable, non-reactive, resistive-film heater
US6544583B2 (en) 2000-02-01 2003-04-08 Trebor International, Inc. Method for adjusting resistivity of a film heater
US6433319B1 (en) 2000-12-15 2002-08-13 Brian A. Bullock Electrical, thin film termination
US7081602B1 (en) 2000-02-01 2006-07-25 Trebor International, Inc. Fail-safe, resistive-film, immersion heater
US6674053B2 (en) 2001-06-14 2004-01-06 Trebor International Electrical, thin film termination
US6663914B2 (en) 2000-02-01 2003-12-16 Trebor International Method for adhering a resistive coating to a substrate
DE10015214C1 (de) * 2000-03-27 2002-03-21 Infineon Technologies Ag Verfahren zur Metallisierung eines Isolators und/oder eines Dielektrikums
TW529090B (en) * 2001-04-04 2003-04-21 Koninkl Philips Electronics Nv Back-end metallisation process
US6645557B2 (en) 2001-10-17 2003-11-11 Atotech Deutschland Gmbh Metallization of non-conductive surfaces with silver catalyst and electroless metal compositions
DE10211701A1 (de) * 2002-03-16 2003-09-25 Studiengesellschaft Kohle Mbh Verfahren zur in situ Immobilisierung von wasserlöslichen nanodispergierten Metalloxid-Kolloiden
US6858378B1 (en) * 2002-04-17 2005-02-22 Sandia National Laboratories Photoimageable composition
US7078809B2 (en) * 2003-12-31 2006-07-18 Dynacraft Industries Sdn. Bhd. Chemical leadframe roughening process and resulting leadframe and integrated circuit package
US8357616B2 (en) * 2005-04-14 2013-01-22 President And Fellows Of Harvard College Adjustable solubility in sacrificial layers for microfabrication
US20090056994A1 (en) * 2007-08-31 2009-03-05 Kuhr Werner G Methods of Treating a Surface to Promote Metal Plating and Devices Formed
US20090056991A1 (en) * 2007-08-31 2009-03-05 Kuhr Werner G Methods of Treating a Surface to Promote Binding of Molecule(s) of Interest, Coatings and Devices Formed Therefrom
US8873912B2 (en) 2009-04-08 2014-10-28 International Business Machines Corporation Optical waveguide with embedded light-reflecting feature and method for fabricating the same
KR101730983B1 (ko) 2010-07-06 2017-04-27 나믹스 코포레이션 인쇄회로기판에서 사용하기 위한 유기 기판에의 접착을 향상시키는 구리 표면의 처리 방법
RU2543518C1 (ru) * 2013-10-03 2015-03-10 Общество с ограниченной ответственностью "Компания РМТ"(ООО"РМТ") Способ изготовления двусторонней печатной платы
US9023560B1 (en) * 2013-11-05 2015-05-05 Eastman Kodak Company Electroless plating method using non-reducing agent
TWI752186B (zh) * 2017-03-23 2022-01-11 日商東京威力科創股份有限公司 鍍膜處理方法、鍍膜處理裝置及記憶媒體
CN109811332B (zh) * 2019-02-21 2021-03-23 深圳市天熙科技开发有限公司 一种用于非导电基材表面化学镀的活化液及其再生方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3506482A (en) * 1967-04-25 1970-04-14 Matsushita Electric Ind Co Ltd Method of making printed circuits
US3982045A (en) * 1974-10-11 1976-09-21 Macdermid Incorporated Method of manufacture of additive printed circuitboards using permanent resist mask
US4302530A (en) * 1977-12-08 1981-11-24 University Of Pennsylvania Method for making substance-sensitive electrical structures by processing substance-sensitive photoresist material
US4169732A (en) * 1978-01-09 1979-10-02 International Business Machines Corporation Photosensitive coating composition and use thereof
US4209331A (en) * 1978-05-25 1980-06-24 Macdermid Incorporated Electroless copper composition solution using a hypophosphite reducing agent
NL7806773A (nl) * 1978-06-23 1979-12-28 Philips Nv Additieve werkwijze voor het vervaardigen van metaal- patronen op kunststofsubstraten.
US4233344A (en) * 1978-07-20 1980-11-11 Learonal, Inc. Method of improving the adhesion of electroless metal deposits employing colloidal copper activator
US4237216A (en) * 1978-12-08 1980-12-02 International Business Machines Corporation Photosensitive patternable coating composition containing novolak type materials
US4309462A (en) * 1978-12-19 1982-01-05 Crown City Plating Co. Conditioning of caprolactam polymers for electroless plating
US4325990A (en) * 1980-05-12 1982-04-20 Macdermid Incorporated Electroless copper deposition solutions with hypophosphite reducing agent
US4526810A (en) * 1982-06-17 1985-07-02 At&T Technologies, Inc. Process for improved wall definition of an additive printed circuit
US4448804A (en) * 1983-10-11 1984-05-15 International Business Machines Corporation Method for selective electroless plating of copper onto a non-conductive substrate surface
US4640718A (en) * 1985-10-29 1987-02-03 International Business Machines Corporation Process for accelerating Pd/Sn seeds for electroless copper plating
US4701351A (en) * 1986-06-16 1987-10-20 International Business Machines Corporation Seeding process for electroless metal deposition
US4748104A (en) * 1986-11-10 1988-05-31 Macdermid, Incorporated Selective metallization process and additive method for manufactured printed circuit boards
US4782007A (en) * 1987-04-28 1988-11-01 Macdermid, Incorporated Additive method for manufacturing printed circuit boards using aqueous alkaline developable and strippable photoresists
US4735820A (en) * 1987-05-18 1988-04-05 International Business Machines Corporation Removal of residual catalyst from a dielectric substrate

Also Published As

Publication number Publication date
EP0328944B1 (en) 1994-08-31
EP0328944A3 (en) 1990-01-31
EP0328944A2 (en) 1989-08-23
DE68917748D1 (de) 1994-10-06
CA1332885C (en) 1994-11-08
DE68917748T2 (de) 1995-03-30
JPH01219168A (ja) 1989-09-01
US4948707A (en) 1990-08-14
ES2059578T3 (es) 1994-11-16
JPH021912B2 (pt) 1990-01-16

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Legal Events

Date Code Title Description
FB19 Grant procedure suspended (art. 19)
FA2 Application deemed withdrawn (art. 19(5))