EP3765424A1 - Glass-ceramic plate for fireplace insert and manufacturing process - Google Patents
Glass-ceramic plate for fireplace insert and manufacturing processInfo
- Publication number
- EP3765424A1 EP3765424A1 EP19717530.0A EP19717530A EP3765424A1 EP 3765424 A1 EP3765424 A1 EP 3765424A1 EP 19717530 A EP19717530 A EP 19717530A EP 3765424 A1 EP3765424 A1 EP 3765424A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- metal nitride
- layers
- stack
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/007—Other surface treatment of glass not in the form of fibres or filaments by thermal treatment
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24B—DOMESTIC STOVES OR RANGES FOR SOLID FUELS; IMPLEMENTS FOR USE IN CONNECTION WITH STOVES OR RANGES
- F24B1/00—Stoves or ranges
- F24B1/18—Stoves with open fires, e.g. fireplaces
- F24B1/191—Component parts; Accessories
- F24B1/192—Doors; Screens; Fuel guards
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24B—DOMESTIC STOVES OR RANGES FOR SOLID FUELS; IMPLEMENTS FOR USE IN CONNECTION WITH STOVES OR RANGES
- F24B1/00—Stoves or ranges
- F24B1/18—Stoves with open fires, e.g. fireplaces
- F24B1/191—Component parts; Accessories
- F24B1/193—Grates; Irons
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24C—DOMESTIC STOVES OR RANGES ; DETAILS OF DOMESTIC STOVES OR RANGES, OF GENERAL APPLICATION
- F24C15/00—Details
- F24C15/004—Windows not in a door
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24C—DOMESTIC STOVES OR RANGES ; DETAILS OF DOMESTIC STOVES OR RANGES, OF GENERAL APPLICATION
- F24C15/00—Details
- F24C15/005—Coatings for ovens
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24C—DOMESTIC STOVES OR RANGES ; DETAILS OF DOMESTIC STOVES OR RANGES, OF GENERAL APPLICATION
- F24C15/00—Details
- F24C15/02—Doors specially adapted for stoves or ranges
- F24C15/04—Doors specially adapted for stoves or ranges with transparent panels
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24C—DOMESTIC STOVES OR RANGES ; DETAILS OF DOMESTIC STOVES OR RANGES, OF GENERAL APPLICATION
- F24C15/00—Details
- F24C15/16—Shelves, racks or trays inside ovens; Supports therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/281—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
- C03C2217/948—Layers comprising indium tin oxide [ITO]
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
Definitions
- the present invention relates to the field of glass-ceramics. More specifically, it relates to a glass-ceramic plate for devices subjected to high temperatures, in particular a plate intended to equip a device such as fireplace insert, stove, fireplace, boiler, heater, fireplace or the like, and / or to serve firewall (or flame arrestor), said plate generally constituting the front window of said apparatus, said plate may optionally be curved or folded and may optionally be provided with accessories or additional elements, decorative or functional , required for its use.
- the present invention also relates to a method of manufacturing said plate.
- a glass-ceramic is originally a glass, said precursor glass or mother glass or green-glass, whose specific chemical composition can cause by suitable heat treatments, called ceramization, a controlled crystallization. This specific partly crystallized structure gives the glass ceramic unique properties.
- glass-ceramic plates are used as hotplates, but they can also be used in other applications, for example to form chimney inserts.
- this window may in particular be glass or glass ceramic, these materials having a good temperature resistance and a low coefficient of thermal expansion.
- this window may in particular be glass or glass ceramic, these materials having a good temperature resistance and a low coefficient of thermal expansion.
- the same functions in terms of vision and protection can also be provided by a flame arrestor in one of these materials.
- glazed parts When using these devices or installations, glazed parts in particular can reach temperatures up to 600 ° C.
- heat reflecting coatings ie thermal / infrared radiation
- coatings based on metal oxides such as coatings based on metal oxides.
- tin oxide coatings in particular doped, or tin oxide and indium oxide (or indium oxide doped with tin), etc., these layers usually having a thickness of a few hundred nanometers.
- Such a coating reflecting the infrared radiation on said glazed portions has multiple advantages such as the reduction of the perceptible temperature on said parts and in their immediate environment, the increase of the comfort and the safety of the users. improvement and optimization of the combustion, the reduction of the number of fine particles in the air, the reduction of the fouling of the panes by pyrolytic effect, etc.
- these coatings on glass-ceramics can cause problems when said glass-ceramics are bent, for example, the addition of these coatings before bending and ceramization is generally not possible because these coatings can be destroyed during ceramization, and their addition after ceramization posing problems in obtaining a uniform thickness.
- the present invention has therefore sought to develop improved glass-ceramic products, in particular new vitroceramic plates. intended for use in installations or devices subject to high temperatures, in particular for fitting appliances such as chimney insert, stove, chimney, boiler, furnace, fireplace or equivalent and / or for use as a firewall these plates do not have these aging problems and effectively reflect infrared radiation (thermal radiation) without degradation of their low-emissive properties under conditions of high temperatures and time, and without harming the other properties sought for them.
- thermal radiation infrared radiation
- the plate according to the invention intended to equip devices such as fireplace insert, stove, fireplace, boiler, heater, fireplace or the like and / or serve as a firewall, said plate being formed of at least (or at least including) a glass-ceramic substrate coated in at least one of its faces with the following stack of layers:
- ITO indium tin oxide
- a second layer of metal nitride with a thickness in a range from 10 nm to 100 nm (inclusive).
- the oxygen content in each of said first metal nitride layer and second metal nitride layer is furthermore less than 1% by weight.
- the level of oxygen in the layer is evaluated by microanalysis, in particular by secondary ionisation mass spectrometry (SIMS method), using in particular a TQF SIMS 5 reference spectrometer marketed by IONTOF.
- the order of the layers is advantageously the order in which the layers are cited, ie 1/2/3, this order being more that of the layers starting from the substrate to the outside (in other words, the layer 1 is that of the three nearest layers substrate).
- the layer 1 is in direct contact with the layer 2, and the layer 2 in direct contact with the layer 3; in other words, the layer 3 is (deposited), directly (without intermediate layer), on the layer 2, and the layer 2 is itself (deposited), directly (without intermediate layer), on the layer 1.
- no oxide layer is present between layers 1 and 2 and layers 2 and 3.
- the aforementioned stack of layers (or the coating formed at least of said stack) is preferably on the outside face of the plate, that is to say the face intended to be turned towards the outside of the device in front of integrate the plate, this face not being in direct contact with the heat source during operation of the device.
- the glass-ceramic substrate is advantageously coated on the whole of said face.
- the invention also relates to a method of manufacturing said plate, formed of at least one glass-ceramic substrate, in which is deposited successively by magnetron sputtering, on at least one face of said substrate, in the following order:
- a second layer of metal nitride with a thickness in a range of 10 nm to 100 nm.
- the deposition of the first metal nitride layer and the deposition of the second metal nitride layer are each under a pressure of at most 3.5 pbar.
- the atmosphere (consisting of plasma gas such as argon and nitrogen) during the deposition of each of said first layer of metal nitride and second layer of metal nitride (in each chamber where these deposits are made) includes less 1% by volume of oxygen (may be residual in the chamber or possibly provided), or is devoid of oxygen.
- the flow of oxygen during the deposition of each of said first metal nitride layer and second metal nitride layer is zero.
- the present invention also relates to a device (apparatus or installation) of the type of fireplace insert or stove or fireplace or boiler or heater or fireplace or firewall or equivalent, this device comprising at least one plate according to the present invention.
- This plate is preferably located on the front face of the device, for example integrated into a door allowing access to the fireplace or integrated into the device as a window, or possibly removable, particularly in the case of a plate coupled to a flame-resistant fireplace .
- the substrate provided with the aforementioned stack selected according to the invention reflects the infrared radiation effectively under high temperature conditions without undergoing degradation of its low-emissive properties over time.
- the layer based on indium and tin oxide is preferably essentially (at least 90% by weight), or even (only) consisting of such an oxide (with the exception of any impurities present).
- the atomic percentage of Sn is preferably in a range from 5 to 70%, especially from 6 to 60%, advantageously from 8 to 12%.
- the thickness of the ITO layer is preferably in a range from 10 to less than 100 nm, in particular from 30 to 80 nm, in particular from 40 to 70 nm, in particular may be less than 50 nm.
- the ITO layer less than 100 nm thick of the above-mentioned stack constitutes the only ITO layer present in the entire coating or stack which includes said stack (and other layer (s) where appropriate as indicated later), that is to say that there are no other layers of ITO throughout said coating / total stack).
- the term "metal nitrides” means both metalloid nitrides such as silicon, and metal nitrides.
- the metal nitride layer is based on (and preferably consists of) silicon nitride or aluminum nitride, and particularly preferably based on silicon nitride Si 3 N 4 , in particular is essentially consisting of Si 3 N 4 silicon nitride.
- silicon nitride does not prejudge the presence of other atoms than silicon and nitrogen, or the actual stoichiometry of the layer.
- the silicon nitride in fact preferably comprises a small amount of one or more atoms, typically aluminum or boron, added as dopants in the silicon targets used in order to increase their electronic conductivity and to facilitate thus, magnetron sputtering deposition, the dopant (s) content (such as aluminum) in the target used, as well as in the layer, being preferably less than 15% by weight, the silicon targets used comprising for example advantageously from 3 to 15% by weight of aluminum by weight.
- the dopant (s) content such as aluminum
- the thickness of the first layer 1) of metal nitride is between 5 and 50 nm, in particular between 10 and 45 nm, and the thickness of the layer 3) is between 10 and 100 nm, in especially between 15 and 90 nm.
- the ITO layer is in contact (direct) on one of its faces (main faces) with the layer 1) and in contact (direct) on its opposite side with the layer 3).
- the ITO layer 2) is non-contact with any other oxide layer, in particular is devoid of contact with any silicon oxide layer (such as SiO 2 ), in particular and for example in the case where such oxide layers are added to the aforementioned stack (1/2/3) according to the invention.
- the above-mentioned stack according to the invention is the following stack: Si 3 N 4 / ITO / Si 3 N 4 , having the thicknesses of layers defined according to the invention.
- the coating of the substrate including the aforementioned stack may optionally include other layers on either side of the aforementioned stack.
- It may for example comprise, between the substrate and the aforementioned stack, at least one layer, or a stack of layers, influencing, for example, the reflection aspect of the plate or which may serve to block a possible migration of ions or which can serve as an adhesion layer, etc., for example a refractive index layer between the refractive index of the substrate and the refractive index of the ITO layer (such as a layer of oxynitride).
- the coating of the substrate including the aforementioned stack does not include, however, another layer between the substrate and the aforementioned stack.
- the aforementioned stack may also be coated with one or more other layers (atmosphere side). It may be coated in particular with a layer based on silicon oxide, advantageously a layer of silica, for example to reduce the light reflection of the stack, the silica possibly being doped (for example by aluminum or boron atoms to facilitate its deposition by sputtering methods), the thickness of the silicon oxide layer being preferably in a range from 1 to 50 nm.
- a layer based on titanium oxide or TiZrO x or ZrO 2 preferably a layer made of titanium oxide, the presence of this layer making it possible in particular to reduce the sensitivity to the scratch of the stack, the thickness of this layer being preferably less than 10 nm, in particular in a range from 1 to 5 nm.
- the stack of thin layers may be constituted successively starting from the substrate of the only 1/2/3 stack defined according to the invention, or it may consist, successively starting from the substrate, of said stack and an oxide layer.
- TiO x titanium for example TiO 2
- TiO 2 may consist, successively starting from the substrate, of a high-index layer and then a low-index layer, of the aforementioned 1/2/3 stack, and of a titanium oxide layer, or it may consist, successively starting from the substrate, of a high-index layer and then of a low-index layer, of the 1/2/3 stack defined according to FIG. invention, a silicon oxide layer and a titanium oxide layer.
- the formulas given do not prejudge the actual stoichiometry of the layers, nor any doping.
- the silicon nitride and / or the silicon oxide is generally doped, for example with aluminum, as indicated previously.
- the oxides and nitrides may not be stoichiometric (they may however be), the actual stoichiometry and / or doping may be different from one layer to another (for example between the two layers of Si 3 N 4 ).
- the total thickness of the coating (including the 1/2/3 stack mentioned above) is preferably between 70 and 300 nm.
- the coating used according to the present invention (in the case of the aforementioned 1/2/3 stack) or is chosen so as to have (in the case where other layers are added) the following colorimetric coordinates (in reflection on the coating side): -7 ⁇ a * ⁇ 5, -25 ⁇ b * ⁇ 5, 25 ⁇ L * ⁇ 50, these coordinates being defined in the CIE colorimetric system and being evaluated in a known manner, in particular using a reference spectrophotometer CM-3700A with integrating sphere marketed by Minolta.
- the substrate forming the plate according to the invention and on which the stack is deposited is a glass-ceramic plate of generally geometric shape, in particular rectangular, even square, or even circular or oval, etc., and generally has a face (generally smooth) turned to the user in the use position (or visible or external or external face), another face (usually smooth) generally hidden in the use position (or inner face), and a slice (or edge or thickness).
- This substrate is, in the simplest way, generally flat or flat, but it can also be curved or folded according to the envisaged applications (for example to serve as firewall or stove window).
- This substrate may be based on any glass ceramic and advantageously has a zero or virtually zero CTE, in particular lower (in absolute value) at 30 ⁇ 10 7 K 1 between 20 and 700 ° C., in particular less than 15 ⁇ 10 7 K 1 , or even less at 5.10 7 K 1 between 20 and 700 ° C.
- this substrate is transparent (that is to say it has an adequate transmission in the visible zone so as to be able to look through), in particular it has at least one TL light transmission greater than 70% (for a thickness of 4 mm), particularly preferably greater than 80%, or even greater than 90%, the light transmission TL being measured according to the standard EN 410 using the illuminant D65, and being the total transmission (notably integrated in the domain of the visible and weighted by the sensitivity curve of the human eye), taking into account both the direct transmission and the possible diffuse transmission, the measurement being made for example using a spectrophotometer provided with of an integrating sphere (in particular with the spectrophotometer marketed by Perkin Elmer under the reference Lambda 950). It can optionally be dyed in the mass, or decorated for example with enamel. The use of a so-called translucent or even opaque substrate may also be envisaged, the vision of the active fire may, however, be reduced in this case.
- the thickness of the glass-ceramic substrate is generally at least 2 mm, in particular at least 2.5 mm, and is advantageously less than 6 mm, in particular is of the order of 3 to 4.5 mm.
- the aforementioned stack is coated on its outer face (where appropriate only) of the aforementioned stack; it is not excluded however to add by example another coating such as an enamel for example to form a decor (especially on the outside also) or to coat the other side of another stack (or even the same stack) or coating.
- another coating such as an enamel for example to form a decor (especially on the outside also) or to coat the other side of another stack (or even the same stack) or coating.
- a glass-ceramic substrate of the above-mentioned stack according to the invention comprising a layer of ITO coated on its two opposite faces with a layer of metal nitride on the outer face makes it possible to reflect towards the focus a large amount of infra-red radiation. -red without degradation of low-emissive properties under high temperature and time conditions unlike substrates coated with stacks, however, close but not meeting the selection criteria of the invention.
- the plate obtained does not pose any maintenance problems, scratches or abrasion and retains good impact properties.
- the present invention also relates to a method of manufacturing the plate according to the invention, as previously described.
- the coating or the stack is deposited on the substrate already ceramized and the assembly is subjected to a heat treatment (annealing) or laser to make active and functional the ITO layer.
- each layer of the stack is (successively) deposited by magnetron cathode sputtering, the ITO layer and the silicon nitride layers being easily deposited by magnetron sputtering with a good yield and a good deposition rate.
- a plasma is created under a high vacuum in the vicinity of a target (or cathode) comprising the chemical elements to be deposited or comprising elements that can react chemically with the gas contained in the plasma to form the desired layer (process said "reagent").
- the active species of the plasma by bombarding the target, tear off said elements, which are deposited on the substrate forming the desired thin layer and / or react with the gas contained in the plasma to form said layer.
- This method makes it possible to deposit on the same line the stack of layers sought according to the invention by successively moving the substrate under different targets, generally in a single device comprising several chambers (or enclosures) under vacuum, each comprising a target. given. Depending on the thickness of the layer and the deposition speed, it may also be necessary to use several successive chambers to deposit one and the same layer. Deposition is preferably on the unheated substrate.
- the sputtering is preferably of AC (alternating current), DC (direct current) or pulsed DC type, depending on the type of generator used to polarize the cathode.
- Targets may be planar, or preferentially tubular (in the form of rotating tubes).
- each of the layers of metal nitride is made in particular using a target of the metal in question in an atmosphere consisting of plasma gas (usually argon) and nitrogen.
- a silicon target generally doped with aluminum or boron, is preferably used to increase its electronic conductivity, in an atmosphere consisting of argon and silicon. 'nitrogen.
- the atmosphere (consisting of plasma gas) during each of these deposits, in each chamber where these deposits are made comprises less than 1% by volume of oxygen (which may be residual in the chamber or possibly provided), or is devoid of oxygen.
- oxygen flow rate during the deposition of each of said first metal nitride layer and second metal nitride layer is zero.
- the deposition pressure (or during the deposition) of each of the metal nitride layers is at most 3.5 pbar, preferably lies in a range from 2.4 pbar to 3 pbar.
- deposition pressure is meant the pressure prevailing in the chamber where the deposition of this layer is performed.
- the application of the selected pressure in the deposit chamber or chambers also contributes to obtaining a stack whose emissivity remains particularly stable at high temperature and for a long time.
- the laying power of the layers is also preferably in a range from 0.5 to 4 kW / linear meter of target, during the deposition of said layers, and the speed of travel of the substrate under the different targets is preferably comprised in a range from 0.5 to 3 m / min.
- the coated glass-ceramic substrate is advantageously subjected to a heat treatment (annealing) or laser after deposition of the above-mentioned stack / coating in order to activate the ITO layer.
- a heat treatment annealing
- laser after deposition of the above-mentioned stack / coating
- the coated glass-ceramic substrate is advantageously subjected to a heat treatment (annealing) or laser after deposition of the above-mentioned stack / coating in order to activate the ITO layer.
- annealing melting of I ⁇ TO to increase and improve its electrical properties
- a heat treatment at a temperature above 600 ° C for a few minutes to tens of minutes (or even up to a few hours), in particular the order of 650 ° C to 850 ° C for 5 to 10 min, this activation by annealing on the glass-ceramic substrate (which may coincide with the annealing treatment occurring if appropriate in the case where an enamel coating is also present, for example for decorative purposes)
- Magnetron sputtering was deposited on one side of a 4 mm thick transparent glass-ceramic substrate (in the form of a plate) marketed under the reference Keralite by Eurokera, the following stack:
- the silicon nitride layer was deposited using aluminum-doped silicon targets under an argon plasma with the addition of nitrogen and without the addition of oxygen at a pressure of 2.4 to 3 pbar, in a atmosphere comprising less than 1% by volume of oxygen.
- the ITO layer was deposited using ITO targets (In / Sn targets).
- the coated glass ceramic was then heat treated (annealed) at 650 ° C for 10 minutes to activate the ITO layer.
- the various coated substrates were placed in an oven at a temperature of 650 ° C for 100 h (corresponding to about 10 years of use).
- the reflectivity (expressed in%) calculated from the spectra obtained by visible-infrared spectroscopy on the spectral band 250 nm -10 pm, using a reference spectrometer L950) marketed by the Perkin Elmer company; and a Spectrum 100 reference FTIR spectrometer sold by Perkin Elmer, standardized by the emission spectrum of the black body at 500 ° C. (reflectivity R N 500 ° C.) or at 1200 ° C. respectively (reflectivity R N 120 ° C. )
- the square resistance (of the stack) R sq (expressed in Ohms) and the electrical resistivity p (of the ITO layer) (expressed in pOhms.cm), calculated from the measurement of the square resistance and the thickness of the (ITO) layer, the square resistance of the stack being measured in a known manner using a non-contact measuring device (profilometer) of the Dektak reference type SRM-12 marketed by the Naguy, the emissivity being closely correlated with the square resistance (the square resistance being more easy to measure as emissivity).
- the substrate coated according to the invention does not undergo in particular significant degradation of its properties, in particular of its low-emissive properties, under conditions of high temperatures and over time (the reflectivity in particular remaining advantageously high and the square strength of the stack and the electrical resistivity of the ITO layer remaining advantageously low after aging), unlike the substrates coated with stacks, however, close but not meeting the selection criteria according to the invention which For their part, they undergo significant degradation and, if necessary, also have initial properties (notably low-emissivity) which are less advantageous.
- the articles according to the invention can in particular be used with advantage to produce a new range of plates intended to equip devices such as chimney inserts, stoves, fireplaces, boilers, heaters, fireplaces or the like, and / or to serve as firewall, etc.
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
- Induction Heating Cooking Devices (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1852203A FR3078964B1 (en) | 2018-03-14 | 2018-03-14 | VITROCERAMIC PLATE FOR FIREPLACE INSERT AND MANUFACTURING METHOD |
PCT/FR2019/050560 WO2019175506A1 (en) | 2018-03-14 | 2019-03-14 | Glass-ceramic plate for fireplace insert and manufacturing process |
Publications (1)
Publication Number | Publication Date |
---|---|
EP3765424A1 true EP3765424A1 (en) | 2021-01-20 |
Family
ID=62751036
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19717530.0A Pending EP3765424A1 (en) | 2018-03-14 | 2019-03-14 | Glass-ceramic plate for fireplace insert and manufacturing process |
Country Status (6)
Country | Link |
---|---|
US (1) | US11866363B2 (en) |
EP (1) | EP3765424A1 (en) |
JP (1) | JP7330995B2 (en) |
CN (1) | CN111788160A (en) |
FR (1) | FR3078964B1 (en) |
WO (1) | WO2019175506A1 (en) |
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FR2657079B1 (en) * | 1990-01-12 | 1993-04-09 | Corning France | VITROCERAMIC PRECURSOR GLASSES, PROCESS FOR CONVERTING THESE VERY LOW OR NULL DILATION VITROCERAMIC GLASSES AND VITROCERAMIC MATERIALS OBTAINED. |
EP1362834A1 (en) * | 2002-05-06 | 2003-11-19 | Glaverbel | Transparent substrate comprising a conductive coating |
CN100528784C (en) * | 2003-05-30 | 2009-08-19 | Ppg工业俄亥俄公司 | Appliance with coated transparency |
FR2873791B1 (en) | 2004-07-30 | 2006-11-03 | Eurokera | GLASS MATERIAL PLATE FOR DEVICE TYPE INSERT OF CHIMNEY OR STOVE. |
DE102008030825A1 (en) * | 2008-06-30 | 2009-12-31 | Schott Ag | Device for reflecting heat radiation, a method for its production and its use |
US8815059B2 (en) * | 2010-08-31 | 2014-08-26 | Guardian Industries Corp. | System and/or method for heat treating conductive coatings using wavelength-tuned infrared radiation |
ES2742508T3 (en) * | 2010-02-26 | 2020-02-14 | Guardian Glass Llc | Articles that include anti-condensation and / or low emissivity coatings and / or methods to manufacture them |
FR2987618B1 (en) * | 2012-03-05 | 2014-02-28 | Saint Gobain | ANTICONDENSATION GLAZING |
KR20140130694A (en) * | 2012-03-05 | 2014-11-11 | 쌩-고벵 글래스 프랑스 | Sheet with coating which reflects thermal radiation |
FR2988387B1 (en) * | 2012-03-21 | 2017-06-16 | Saint Gobain | GLAZING OF SOLAR CONTROL |
FR3010074B1 (en) * | 2013-09-05 | 2019-08-02 | Saint-Gobain Glass France | METHOD FOR MANUFACTURING A MATERIAL COMPRISING A SUBSTRATE HAVING A FUNCTIONAL LAYER BASED ON TIN OXIDE AND INDIUM |
CN107140827B (en) * | 2013-09-13 | 2020-06-05 | 康宁股份有限公司 | Scratch resistant articles with retained optical properties |
FR3012133B1 (en) * | 2013-10-17 | 2021-01-01 | Saint Gobain | PROCESS FOR OBTAINING A SUBSTRATE COATED BY A STACK CONTAINING A TRANSPARENT CONDUCTIVE OXIDE LAYER |
FR3021966B1 (en) * | 2014-06-04 | 2016-05-27 | Saint Gobain | GLAZING FOR SOLAR PROTECTION WITH THIN FILM COATINGS |
US10392689B2 (en) * | 2017-02-23 | 2019-08-27 | Guardian Glass, LLC | Heat treatable coated article having zirconium nitride and ITO based IR reflecting layers |
-
2018
- 2018-03-14 FR FR1852203A patent/FR3078964B1/en active Active
-
2019
- 2019-03-14 JP JP2020546365A patent/JP7330995B2/en active Active
- 2019-03-14 EP EP19717530.0A patent/EP3765424A1/en active Pending
- 2019-03-14 CN CN201980017294.XA patent/CN111788160A/en active Pending
- 2019-03-14 US US16/976,096 patent/US11866363B2/en active Active
- 2019-03-14 WO PCT/FR2019/050560 patent/WO2019175506A1/en unknown
Also Published As
Publication number | Publication date |
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WO2019175506A1 (en) | 2019-09-19 |
CN111788160A (en) | 2020-10-16 |
US20200399172A1 (en) | 2020-12-24 |
JP7330995B2 (en) | 2023-08-22 |
FR3078964B1 (en) | 2020-03-27 |
US11866363B2 (en) | 2024-01-09 |
JP2021517080A (en) | 2021-07-15 |
FR3078964A1 (en) | 2019-09-20 |
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