EP3645467A1 - Installation et procédé d'un traitement de l'eau - Google Patents
Installation et procédé d'un traitement de l'eauInfo
- Publication number
- EP3645467A1 EP3645467A1 EP18735262.0A EP18735262A EP3645467A1 EP 3645467 A1 EP3645467 A1 EP 3645467A1 EP 18735262 A EP18735262 A EP 18735262A EP 3645467 A1 EP3645467 A1 EP 3645467A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- water
- air
- pump
- reactor
- line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 333
- 238000000034 method Methods 0.000 title claims abstract description 126
- 238000009434 installation Methods 0.000 title 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims abstract description 184
- 239000000203 mixture Substances 0.000 claims abstract description 144
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- 239000013505 freshwater Substances 0.000 claims abstract description 67
- 230000005855 radiation Effects 0.000 claims abstract description 56
- XLYOFNOQVPJJNP-DYCDLGHISA-N deuterium hydrogen oxide Chemical compound [2H]O XLYOFNOQVPJJNP-DYCDLGHISA-N 0.000 claims abstract description 34
- 230000008569 process Effects 0.000 claims description 95
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 21
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- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
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- 238000011144 upstream manufacturing Methods 0.000 description 3
- 244000063299 Bacillus subtilis Species 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
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- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
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- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
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- 230000007306 turnover Effects 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
- 239000000273 veterinary drug Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
- C02F1/325—Irradiation devices or lamp constructions
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
- C02F1/004—Processes for the treatment of water whereby the filtration technique is of importance using large scale industrial sized filters
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/722—Oxidation by peroxides
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
- C02F2101/306—Pesticides
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
- C02F2101/36—Organic compounds containing halogen
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/007—Contaminated open waterways, rivers, lakes or ponds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/42—Nature of the water, waste water, sewage or sludge to be treated from bathing facilities, e.g. swimming pools
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/002—Construction details of the apparatus
- C02F2201/003—Coaxial constructions, e.g. a cartridge located coaxially within another
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/002—Construction details of the apparatus
- C02F2201/005—Valves
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3223—Single elongated lamp located on the central axis of a turbular reactor
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/78—Details relating to ozone treatment devices
- C02F2201/782—Ozone generators
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/78—Details relating to ozone treatment devices
- C02F2201/784—Diffusers or nozzles for ozonation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/005—Processes using a programmable logic controller [PLC]
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/02—Temperature
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/03—Pressure
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/38—Gas flow rate
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/40—Liquid flow rate
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/42—Liquid level
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/04—Flow arrangements
- C02F2301/043—Treatment of partial or bypass streams
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/04—Flow arrangements
- C02F2301/046—Recirculation with an external loop
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/22—Eliminating or preventing deposits, scale removal, scale prevention
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2305/00—Use of specific compounds during water treatment
- C02F2305/02—Specific form of oxidant
- C02F2305/023—Reactive oxygen species, singlet oxygen, OH radical
Definitions
- a plant and a process for water treatment Disclosed are a plant and a process for water treatment.
- an improvement of a device for treating water by means of ultraviolet radiation having a wavelength of about 254 nanometers and at the same time having a wavelength of about 185 nanometers by means of a single illuminant is disclosed.
- micropollutants Low molecular weight biologically heavy or non-degradable chemical compounds in the water are under the slogan "micropollutants" for more than ten years, national and international subject of technical and environmental policy debates (see, eg, the federal / state water consortium at http://wwwJawa.de/ documents / Uml24-2016_20160126_LAWA_Bericht_Mikroschad engage ⁇ e_in ⁇ GewaessernJinal 207.pdf)
- micropollutants or “micropollutants” are also used as synonyms for the term “micropollutants”.
- DBPs disinfection by-products
- Service water for example water in a pond or swimming pool as in a public swimming pool, is usually cleaned by means of a filter device and the addition of an oxidizing agent such as chlorine or hydrogen peroxide.
- an oxidizing agent such as chlorine or hydrogen peroxide.
- German patent application DE 101 29 663 discloses a process for the treatment of prepurified water by means of an ozone-enriched air stream, an activated carbon filter and UV irradiation.
- a device and a corresponding method for water treatment, in which UV light and ozone are used, are known from the Internet site www.uvox.com/das-uvox-vin.html (Berson, B., Koikurier 52 (2007) , 2, 118-121).
- the apparatus comprises a reactor having two reaction chambers, one for generating an air / ozone mixture, which is introduced into the water to be treated, and one for irradiating the water thus treated with UV light.
- Feeding the air / ozone mixture into the service Water takes place via an inlet point, for example a Venturi nozzle in a bypass branch of the feed line of the water to be treated.
- an inlet point for example a Venturi nozzle in a bypass branch of the feed line of the water to be treated.
- it would be desirable here to be more independent of pressure fluctuations in the main water circuit with respect to the suction of the air-ozone mixture (b) via the inlet point or the bypass branch with injection nozzle, in order to achieve a stable and for the application optimal suction capacity of the air. / Ozone mixture to ensure.
- the water to be treated contains or consists of process water.
- the device contains a reactor containing a UV lamp. Connected to the reactor is an inlet line for the contaminated water. Furthermore, an outlet line for the treated, treated water is connected to the reactor.
- the reactor includes a first, inner, reaction chamber having a centered UV lamp and an air inlet. The first reaction chamber is traversed by air as it is exposed to the ultraviolet radiation of the UV lamp to form ozone.
- the reactor contains an outlet for the air / ozone mixture, to which an air / ozone line is connected. Through this air-ozone line, the air-ozone mixture is fed into the inlet line for the contaminated or reprocessed water.
- the reactor contains a second reaction chamber through which the water to be treated is flowed while exposed to the ultraviolet radiation of the UV lamp.
- an apparatus for the treatment of service water with ozone and ultraviolet radiation includes a reactor containing a first and a second reaction chamber, hereinafter also referred to as a first and a second reactor chamber.
- the first reaction chamber contains a UV lamp and an air inlet.
- the first reaction chamber also contains a gas outlet for an air / ozone mixture.
- Air can flow through the reaction chamber, while this air can be exposed to ultraviolet radiation from the UV lamp to form ozone.
- an inlet pipe for the service water is connected to the second reaction chamber.
- An outlet conduit for the treated, treated water is also connected to the second reaction chamber.
- the second reaction chamber is traversed by the water to be treated, while the treated water to be treated Ultraviolet radiation of the UV lamp can be exposed.
- an air / ozone line is connected, via which the air / ozone mixture can be fed into the inlet line for the process water.
- the inlet conduit is adapted to be coupled to a water filter and a circulation pump such that the water filter is disposed between the recirculation pump and the reactor.
- a return line is provided in the device for the partial recycling of the treated water from the outlet line to the inlet line.
- the return line includes a pump configured to pump water toward the inlet line. It contains in some embodiments, either the return line, a feed point at which the air / ozone mixture can be fed into the process water, or the return line is connected via a fresh water feed point with a fresh water line in fluid communication. In the latter case, the fresh water line may contain a feed point at which the air-ozone mixture can be fed into the fresh water. In some embodiments, both the return line and the fresh water line contain a feed point to which the air / ozone mixture can be fed.
- the inlet conduit includes the recirculation pump configured to
- the inlet conduit includes a water filter. In some embodiments, the inlet conduit includes both the recirculation pump and the water filter. The water filter is then arranged between the circulation pump and the reactor.
- a second circulating pump connected in parallel with the circulation pump is provided in the device, which is designed to pump water in the direction of the reactor.
- the second circulating pump is a controllable circulating pump.
- the second, controllable circulating pump is arranged in the flow direction in front of the water filter in a bypass branch of the inlet line.
- a check valve is arranged between the circulation pump and the water filter. Also between the second, adjustable circulation pump and the water filter, a check valve is arranged.
- an apparatus for treating process water with ozone and ultraviolet radiation includes a reactor containing a first and a second reaction chamber, hereinafter also referred to as a first and a second reactor chamber.
- the first reaction chamber contains a UV lamp and an air inlet.
- the first reaction chamber also contains a gas outlet for an air / ozone mixture. Air can flow through the first reaction chamber, while this air can be exposed to ultraviolet radiation from the UV lamp to form ozone.
- an inlet pipe for the service water is connected to the second reaction chamber.
- To the second reaction chamber is also an outlet for the treated, treated, water connected.
- the second reaction chamber is traversed by the water to be treated, while the water to be treated, reprocessed, the ultraviolet radiation of the UV lamp can be exposed.
- the inlet pipe has a water filter.
- an air / ozone line is connected, via which the air / ozone mixture can be fed into the inlet line for the water to be treated.
- Inlet line includes a first circulation pump configured to pump water in the direction of the reactor.
- the water filter is disposed between the first circulation pump and the reactor.
- a second, parallel to the first circulating pump, circulating pump is provided, which is designed to pump water in the reactor direction.
- the second circulating pump is a controllable circulating pump.
- the second, controllable circulating pump is arranged in the flow direction in front of the water filter in a bypass branch of the inlet line.
- a check valve is arranged between the first circulation pump and the water filter.
- a check valve is arranged between the second, adjustable circulation pump and the water filter.
- a return line for partially returning the treated treated water from the outlet line to the inlet line.
- the return line includes a pump configured to pump water toward the inlet line. It contains in some embodiments, either the return line, a feed point at which the air / ozone mixture can be fed into the process water, or the return line is connected via a fresh water feed point with a fresh water line in fluid communication. In the latter case, the fresh water line contains a feed point at which the air-ozone mixture can be fed into the fresh water. In some embodiments, both the return line and the fresh water line contain a feed point to which the air / ozone mixture is fed.
- the second circulating pump connected in parallel with the first circulating pump is a frequency-controllable one
- variable-frequency circulation pump is coupled to a controller.
- the pump is frequency adjustable so that the suction power for the air / ozone mixture is constant.
- the first circulating pump which is arranged downstream of the water filter, is also controllable
- the first circulating pump is a controllable circulating pump
- such a controllable circulating pump is a variable-frequency circulating pump.
- the variable-frequency circulation pump is coupled to a controller.
- the pump is frequency controlled such that the intake capacity for the air / ozone mixture is constant.
- the return line contains a feed point at which the air / ozone mixture can be fed into the process water.
- the pump is typically between the port of
- Return line arranged on the outlet line and the feed point for the air / ozone mixture.
- the return line contains the return line via a fresh water feed point with a fresh water line in fluid communication.
- the fresh water line usually contains a feed point at which the air / ozone mixture can be fed into the fresh water.
- the pump is typically located in such embodiments between the connection of the return arranged on the outlet line and the fresh water feed point.
- the feed point for the air / ozone mixture is defined by a gas injector such as a nozzle. In some embodiments of the device according to the first or the second aspect, the feed point for the air / ozone mixture is defined by a Venturi nozzle.
- the return line is connected via a connection to the inlet line, which is defined by a check valve or a non-return valve.
- the return line is connected via a connection to the inlet line.
- the water filter is in such embodiments usually arranged in the inlet line in the flow direction in front of this port.
- the reactor further includes an inlet for a conduit for supplying chemicals such as H 2 O 2 , hydrochloric acid, citric acid or the like from a container with a metering pump.
- chemicals such as H 2 O 2 , hydrochloric acid, citric acid or the like from a container with a metering pump.
- the pump in the return line is a controllable pump. In some embodiments, the pump in the return line is a frequency-controlled pump.
- the container is designed as a container with metering lance and level controller.
- the inlet line includes a pressure sensor. In some embodiments of the device according to the first or the second aspect, the return line includes a pressure sensor.
- the second reaction chamber includes a temperature sensor.
- the second reaction chamber contains a UV sensor.
- the controllable circulating pump can be regulated by means of values that can be output by the pressure sensor. In some embodiments of the device according to the first or the second aspect, the controllable circulating pump is controllable by means of values that can be output by such a pressure sensor. In some embodiments of the device according to the first or the second aspect, the controllable circulating pump is controllable by means of values that can be output by the temperature sensor. In some embodiments of the device according to the first or the second aspect, the circulation pump or by means of values can be regulated, which can be output by the UV sensor. In some embodiments, the recirculation pump is controllable by both values that can be output by the UV sensor and regulated by values provided by the UV sensor
- Temperature sensor can be output.
- the air inlet of the first reaction chamber is controllable.
- the air inlet of the first reaction chamber is coupled to an air supply regulator.
- the inlet conduit may include a pressure sensor.
- the return line may include a pressure sensor.
- the second reaction chamber may also include a temperature sensor adjacent thereto.
- the air inlet may be controlled by the values output by such a pressure sensor.
- the air inlet is controllable by the values that can be output by the temperature sensor.
- the air inlet is controllable by the values that can be output by the UV sensor.
- the air inlet is controllable both by means of values which can be output by the UV sensor and by means of values which can be output by the temperature sensor.
- the return line is connected via a connection to the inlet line and the water filter is arranged in the inlet line in the flow direction before this connection.
- the pump in the return line can be a controllable pump.
- the pump in the return line is frequency adjustable so that the suction power for the air / ozone mixture is substantially constant. In some embodiments of the device according to the first or the second aspect, the pump in the return line is frequency adjustable so that the suction power for the air / ozone mixture is constant.
- the air inlet of the first reaction chamber is controllable such that the suction power for the air / ozone mixture is adaptable to the flow rate of water through the second reaction chamber of the reactor. In some embodiments of the device according to the first or the second aspect, the air inlet of the first reaction chamber is adjustable so that the amount of injected air / ozone mixture per predefined amount of water is constant.
- no filter is included in the reactor of the device.
- the reactor of the device does not contain an activated carbon filter.
- the device does not include an activated carbon filter. In some embodiments, in the reactor of the device is no
- Photocatalyst such as titanium dioxide present.
- the device does not contain a photocatalyst such as titanium dioxide.
- the inlet conduit includes a recirculation pump configured to pump water in the direction of the reactor.
- the water filter is arranged in this use between the circulation pump and the reactor.
- process water is pumped via the inlet line into the reactor by means of the circulation pump.
- air flowing through in the first reaction chamber of the reactor is exposed to the formation of ozone in relation to the ultraviolet radiation of the UV lamp.
- second reaction chamber of the reactor flowing through, enriched with an air / ozone mixture, process water exposed to the ultraviolet radiation of the UV lamp.
- the treated water is partially recycled to the process water and fed the resulting air / ozone mixture in the recirculated treated water.
- the feeding of the air / ozone mixture in the recycled water takes place before the recycled water is supplied to the process water.
- the pressure of the returned water is increased by means of the pump in the return line.
- the air / ozone mixture is fed directly into the recycle treated water in the recycle line for the partial recirculation of the treated, treated water.
- fresh water is also fed via a fresh water feed point with a fresh water line in the return line.
- the air / ozone mixture can also be fed into the fresh water.
- service water is pumped into the reactor via the bypass branch and the inlet line by means of the second variable circulation pump connected in parallel to the circulation pump.
- the inlet conduit includes a recirculation pump configured to pump water in the direction of the reactor.
- the water filter is arranged in this use between the circulation pump and the reactor.
- process water is pumped via the inlet line into the reactor by means of the circulation pump. It is also exposed in the first reaction chamber of the reactor flowing through air to form ozone to the ultraviolet radiation of the UV lamp.
- second reaction chamber of the reactor flowing through, enriched with an air / ozone mixture, hot water is exposed to the ultraviolet radiation of the UV lamp.
- service water is pumped via the bypass branch and the inlet line into the reactor by means of the second, adjustable circulating pump connected in parallel to the circulating pump.
- the treated water is partially recycled to the process water and the resulting air / ozone mixture is fed to the recycled treated water.
- the feeding of the air / ozone mixture into the recirculated water takes place before the recirculated water is supplied to the process water.
- the pressure of the returned water is increased by means of the pump in the return line.
- the air / ozone mixture is fed directly into the recycle treated water in the recycle line for partially recycling the treated water.
- fresh water is also fed via a fresh water feed point with a fresh water line in the return line.
- the air / ozone mixture may also be fed into the fresh water.
- the service water can be contaminated with germs and / or loaded with low molecular weight organic compounds and / or salts.
- the inlet line includes a circulating pump configured to carry water in Pump reactor direction.
- the water filter is arranged in this method between the circulation pump and the reactor. The procedure involves pumping process water into the reactor via the inlet line by means of a circulating pump. The method further involves allowing air to flow through the reactor's first reaction chamber while exposing that air to ultraviolet radiation from the UV lamp to form ozone.
- the process involves feeding the resulting air / ozone mixture into the process water or water to be treated.
- the process it is in some embodiments, to feed the resulting air-ozone mixture directly into the water to be treated.
- the process involves adding further water to the process water, into which the resulting air / ozone mixture is fed.
- the process also involves feeding the air / ozone mixture into the recirculated water and increasing the pressure in the recirculated water by means of a pump.
- it is part of the process to pump the service water into the reactor via the bypass branch and the inlet line by means of the second variable circulation pump connected in parallel to the circulation pump.
- the inlet conduit includes a recirculation pump configured to pump water in the direction of the reactor.
- the water filter is arranged in this method between the circulation pump and the reactor.
- the procedure involves pumping process water into the reactor via the inlet line by means of a circulating pump.
- the method further involves allowing air to flow through the reactor's first reaction chamber while exposing that air to ultraviolet radiation from the UV lamp to form ozone.
- the procedure also includes feeding the resulting air / ozone mixture into the water to be treated. It counts too
- the process it is part of the process to feed the resulting air / ozone mixture into the water to be treated.
- the process involves adding further water to the process water, into which the resulting air / ozone mixture is fed.
- the resulting air / ozone mixture in which the resulting air / ozone mixture is fed into the service water, it is part of the process to return the treated water partly in the process water.
- the method may also include feeding the air / ozone mixture into the recirculated water and increasing the pressure in the recirculated water by means of a pump.
- Fig. 1 shows a schematic flow diagram based on a known plant for the treatment of process water.
- FIG. 2 is a schematic flow diagram of one embodiment of the invention disclosed herein.
- FIG. 3 shows a schematic flow diagram of another embodiment of the device disclosed herein.
- FIG. 4 shows a schematic flow diagram of another embodiment of the device disclosed herein.
- Fig. 5 shows a control of a device disclosed herein with reference to the embodiment shown in Fig. 2.
- Fig. 6 shows the device in one embodiment with a control (214).
- Fig. 7 shows the measuring arrangement when collecting measurement data by means of the device.
- Fig. 8 shows the effect of the device on E. coli.
- Figures 9A and 9B show the effect of the device on B. subtilis spores.
- Figures 10A and 10B show the effect of two differently configured devices on B. subtilis spores.
- service water refers to water that, compared to fresh or drinking water that meets regulatory requirements in Europe or the US, significantly more contamination in the form of microorganisms and / or in the form of low molecular weight organic compounds.
- Process water can also contain significantly increased amounts of inorganic salts.
- Process water can also contain macroscopic impurities.
- Significantly increased in terms of water, when used herein, means that drinking water quality regulations for at least one contaminant are exceeded.
- the word “about” when used herein refers to a value that is within an acceptable error range for a particular value as determined by one of ordinary skill in the art, depending in part on how the particular value is determined or measured For example, “approximately” may mean within a standard deviation of 1 or more, depending on use in the particular area.
- the term “about” is also used to indicate that the amount or value may be the designated value or another value that is approximately equal, and the term is intended to express that similar values have equivalent results or effects as disclosed in this document. In this context, “about” may refer to a range of up to 10% above and / or below a certain value.
- "about” refers to a range of up to 5% above and / or below a certain value, such as about 2% above and / or below a certain value. In some embodiments, “about” refers to a range of up to 1% above and / or below a certain value. In some embodiments, “about” refers to a range of up to 0.5% above and / or below a certain value In one embodiment, “about” refers to a range of up to 0.1% above and / or below a certain value.
- water filter refers to an element comprising a material through which water can pass, such as sand, a gravel bed, ion exchange material, activated carbon, a porous polymer, e.g.
- a water filter is dimensioned and designed such that water flowing through it has a certain minimum residence time, for example a few seconds, for contact with the material acting as a sieve, at a maximum permissible flow rate in the system.
- a water filter can be a conventional drinking water filter. It exists
- a water filter can contain a material that allows the colonization of microorganisms. In this way, in addition to the filtration of coarse or fine suspended particles and the biodegradation of toxic waste by microorganisms is made possible.
- At least when preceded by a sequence of elements, are understood to refer to each of these elements.
- the known device comprises a cylindrical reactor containing a first inner and a second outer reaction chamber.
- the first inner reaction chamber includes an inlet side with an air inlet.
- the inlet side may further include a lid, an air filter and a mounting plate.
- the first inner reaction chamber further contains a radiation source for UV radiation, here referred to as a UV lamp.
- This radiation source is within a UV transmissive, e.g. transparent, surrounding wall arranged.
- the circumferential UV radiation transmissive wall is typically a quartz tube.
- the device disclosed herein typically contains a radiation source only at a central position in the reactor.
- Radiation source can be composed of several individual radiation sources, but defined in the device disclosed here, typically the only radiation source.
- Air passes through the first inner reaction chamber as it is exposed to the ultraviolet radiation of the UV lamp with a wavelength of about 185 nanometers to produce ozone from oxygen.
- the reactor contains an outlet for the formed air / ozone mixture, which is connected to an air / ozone line.
- the air / ozone mixture is fed via an inlet point, for example a Venturi nozzle, into the inlet line for the water to be treated.
- the feed takes place in a bypass branch of the inlet line for the water to be treated.
- the second, outer reaction chamber of the reactor contains an inlet pipe connected to the reactor for the water to be treated and the air / ozone mixture already fed into this reactor.
- the water to be treated consists of service water or at least contains hot water.
- This second reaction chamber is flowed through by the water to be treated, while it is exposed to the ultraviolet radiation of the UV lamp with only a wavelength range of about 250 to 260 nm, typically a wavelength of about 254 nanometers, and is thus disinfected.
- the ongoing process includes the "extended oxidation" described below and is based on the one hand on the effect of the existing ozone, on the other to the effect of UV radiation and also on in situ formed reaction products, which in the
- the reactor also contains a
- Ozone is an allotrope of the oxygen of the formula O 3 , which is formed by the action of UV light from oxygen. Ozone molecules rapidly decompose to biatomic oxygen in the dark 0 2 . Ozone is a powerful oxidant capable of killing microorganisms and degrading low molecular weight compounds. UV ozone generators usually use ultraviolet light of as narrow a wavelength range as possible to form O 3 . One revealed here
- the device uses ultraviolet light of a very narrow wavelength range, typically about 185 nm, to form O 3 . In addition, it sets light of a second very narrow wavelength range, typically about 185 nm, to form O 3 . In addition, it sets light of a second very narrow
- Wavelength range typically about 254 nm, to directly irradiate water.
- UV oxidation processes The oxidation with the help of ozone and hydrogen peroxide or an additional combination with UV irradiation (UV oxidation) is also known in professional circles as "advanced oxidation processes".
- Residual disinfectant in swimming pools can be reduced and existing in the water low molecular weight organic compounds such as disinfection by-products are reduced (http://www.demeaumed.eu/index ⁇ hp/diss/news/65-results-of-the-greywater-tech
- a device disclosed herein allows a continuous feed of higher amounts of ozone into the reactor compared to the known device (see above), without having to supply the very unstable ozone to the device from an external source. In this way, an improved oxidation effect is achieved. In particular, an increased formation of OH radicals in the second reaction chamber of the reactor is achieved.
- a device disclosed herein for treating process water with ozone and ultraviolet radiation includes a reactor containing a UV lamp.
- the reactor is comprised of a circumferential wall having first and second reaction chambers, an air inlet side, and a base.
- the circumferential wall of the reactor does not contain an interior surface facing the interior of the reactor which reflects UV radiation. In some embodiments, the peripheral wall of the reactor does not include a radiant reflective interior surface facing the interior of the reactor.
- an inlet pipe for the service water or the water to be treated is connected.
- an outlet line for the treated water is further connected.
- the reactor contains a first and a second reaction chamber.
- the first reaction chamber contains an air inlet.
- the air inlet may be provided with an air filter or coupled to an air filter. Air can flow through the first reaction chamber, while this ultraviolet radiation of the UV lamp can be exposed to form ozone.
- the second reaction chamber is traversed by the water to be treated, while it is exposed to the ultraviolet radiation of the UV lamp.
- the reactor also contains an outlet for the air / ozone mixture.
- An air / ozone line is connected to the outlet for the air / ozone mixture, through which the air / - ozone mixture can be fed into the inlet line for the water to be treated.
- the feeding of the air / ozone mixture can be done by a gas injector such as an injector coupled to an injection pump.
- a gas injector such as an injector coupled to an injection pump.
- This may be a nozzle, e.g. executed as a gas injection nozzle.
- Gas injectors are commercially available, for example, from Fortrans (NC, USA) or Bauer (Munich, DE).
- the device is configured for coupling to a water filter.
- the device includes a water filter that acts primarily as a mechanical screen.
- macroscopic contamination including algae or leaves for example, are retained by the filter, and deposits of the filter material are formed over time due to bacterial growth.
- the permeability of the water filter decreases.
- an ever increasing pressure would have to be built up to achieve a continuous flow rate through the water filter.
- the permeability of the Water filter abruptly.
- Inlet for the air / ozone mixture while the other branch contains the ball valve.
- the ball valve By opening or closing the ball valve, however, the flow of filtered process water can be changed, into which the air / ozone mixture is fed.
- a return line is provided with a pump adapted to supply treated water to the filtered water to be treated, as illustrated in FIG.
- the return line can be regarded as a return loop. It establishes a connection between the outlet line of the reactor and the inlet line of the reactor. Surprisingly, it has been observed that only one element is to be provided, which in this recirculation loop provides for flow from the outlet line of the reactor towards the inlet line of the reactor. In this way, undesired flow directions in the return line or return loop are prevented and a substantially constant flow of water is possible, which is enriched with the air / ozone mixture.
- a pump is provided, which is designed to pump water in the direction of the inlet line of the reactor.
- the pump can be a controllable pump. In this way, fluctuations in the pressure can be compensated, which can occur in particular in the inlet line of the reactor.
- a return line for the partial return of the treated water from the outlet to the inlet pipe is provided.
- This return line can contain a feed point to which the air / ozone mixture can be fed.
- Return line also contains a pump.
- the system to be watered up is a closed system such as a basin or a container, or an open system such as a water supply from a polluted water source, there may also be one
- Infeed of fresh water into the device disclosed here are integrated.
- the feed of fresh water is typically in the return line, which is adapted to supply treated water to the filtered, reprocessed water.
- Fresh water supply take place.
- a fresh water supply typically contains a A pump adapted to pump water towards the inlet line of the reactor
- a substantially constant flow of water can be generated by means of a second, adjustable circulating pump connected in parallel to the circulating pump.
- the air / ozone mixture can be fed in a return line with a pump or in a bypass branch, where it is connected in parallel to a flow control element such as a stopcock.
- the air / ozone mixture can also be fed into an additional fresh water supply, as previously stated.
- Both the first circulation pump and the second, controllable circulating pump are configured so that they pump water in the direction of the water filter, and thus the reactor. In this way, on the one hand, if necessary, build up an increased pressure on the water filter. On the other hand, the additional pressure on the water filter can be regulated.
- a non-return valve which is arranged in the two parallel arms of bypass diversion and inlet line between the corresponding circulation pump and the water filter, it can be prevented that there is an uncontrolled backward flow.
- a return line is provided for partially returning the treated water from the outlet line to the inlet line.
- This return line contains a feed point to which the air / ozone mixture can be fed.
- the return line contains a pump.
- the feed point to which the air / ozone mixture is added is typically located downstream of the pump.
- the pump is typically arranged between the connection of the return line to the outlet line and the feed point.
- the feed point is typically arranged between the pump and the connection of the return line to the inlet line.
- a check valve may be disposed at the inlet of the return line in the inlet line.
- the first reaction chamber is cylindrical.
- the second reaction chamber is concentric.
- the second reaction chamber may, for example, have the shape of a hollow cylinder.
- the center of the hollow cylinder may, in some embodiments, be defined by the first reaction chamber.
- the first and second reaction chambers may define concentric circles, of which the second reaction chamber defines an outer circle relative to the first one
- Reaction chamber defines an inner circle.
- the reactor in such embodiments may define in cross-section a circle in which the first and second reaction chambers define two concentric circles, of which the first reaction chamber defines an inner concentric circle.
- the UV lamp in such embodiments may define, in cross-section, the center of the reactor about which the concentric circles defining the first and second reaction chambers are disposed.
- the pump is disposed between the connection of the return line to the outlet line and the feed point for the air / ozone mixture.
- the feed point is formed as a Venturi nozzle.
- the return line is connected to the inlet line via a check valve.
- a return is provided for partially recycling the treated water from the outlet line to the inlet line of the prefiltered service water.
- This return line may contain an additional feed for fresh water.
- the recirculation may include a pump followed by a feed point to which the air / ozone mixture is added.
- the return may include a non-return valve.
- the reactor at the bottom of the second reaction chamber includes a port for a supply of chemical feed.
- This connection can be arranged, for example, in the base of the reactor in the second reaction chamber.
- This connection can also be arranged in a lateral wall, for example a circumferential wall of the reactor in the second reaction chamber.
- the port in a lateral wall of the reactor may be adjacent to the base, including adjacent to the base, in the second reaction chamber.
- the reactor includes a connection for a conduit for supplying chemicals such as H 2 O 2 , hydrochloric acid, citric acid or the like from a container with a metering pump.
- the reactor in the base or in the vicinity of the base, for example in a lateral wall, of the second reaction chamber contains an inlet for a feed line for supplying chemicals such as hydrogen peroxide, hydrochloric acid, citric acid or the like. from a container with a metering pump.
- the pressure increase pump is between the port of
- Return line arranged on the outlet line and the feed point for the air / ozone mixture.
- the feed point is formed as a Venturi nozzle.
- the return line is connected to the inlet line via a check valve.
- the inlet conduit includes upstream of the inlet conduit
- Feed point for the air / ozone mixture a water filter.
- the inlet line between the recirculation pump and the air / ozone mixture feed point includes a water filter.
- the pressure increase pump is frequency controllable, so that the suction performance for the air / ozone mixture is substantially constant. In some embodiments, the pressure increase pump is frequency controllable such that the
- Suction capacity for the air / ozone mixture is constant.
- the feed of the air / ozone mixture takes place in the return line of the already treated by the reactor water.
- the fresh water feed takes place before the feed of the air / ozone mixture and only then is the resulting mixture fed to the second reactor chamber of the reactor.
- the pump provides the required pressure increase for the supply of the air / ozone mixture and for the supply of fresh water before connecting the reactor for water to be treated.
- the feed point for the ozone / air mixture is designed as an injection element, for example as a Venturi nozzle.
- the pump is so Frequency-controlled, that the intake power for the air / ozone mixture is at least substantially constant and this can be optimized for the application.
- the return line is connected to the inlet line via a check valve.
- the pump is configured as a frequency-controlled pump or booster pump.
- the container is designed as a container with metering lance and level controller.
- the check valve is as
- Non-return valve formed.
- the venturi nozzle is disposed in the return line of the already processed process water.
- the fresh water feed is located prior to the feed of the air / ozone mixture.
- the pump is designed as a frequency-controlled pump.
- the venturi is equipped with a pressure sensor, for example equipped with one or two pressure gauges. In this case, the pressure difference in the line, for example in the return line upstream and downstream of the Venturi nozzle can be determined.
- any type of signal transmission, whether wireless or wired, is generally suitable.
- the pressure sensors can each be coupled to a transmitter.
- a closed-loop control for the frequency-controlled pump is provided based on a determined pressure difference.
- the container includes a metering lance and level controllers and
- a check valve is present.
- the flow of air into the first reaction chamber of the reactor and the flow of water into the second reaction chamber of the reactor can be controlled with the aid of regulators.
- the air inlet of the reactor can be regulated.
- an existing pump can be regulated.
- one or more sensors may be provided in the device.
- a UV sensor can be arranged in the interior of the first and / or the second reaction chamber.
- a temperature sensor may be arranged in the interior of the second reaction chamber.
- a temperature sensor may be arranged in the interior of the second reaction chamber.
- the feed point for the air / ozone mixture can be arranged between two pressure sensors.
- the power of an existing pump can be regulated with the aid of the values of the individual sensors.
- a specific temperature such as a temperature in the range of 16 ° C to 24 ° C or in the range of 25 ° C to 38 ° C in the second reaction chamber of the reactor can be adjusted.
- a corresponding temperature range may also be in the range of about 30 ° C to about 37 ° C.
- a device disclosed herein may be used to treat water, including microorganisms and micro-pollutants, especially low molecular weight organic compounds
- Impurities contaminated water can be used. Such water is here as Called domestic hot water.
- the irradiation of air is by means of ultraviolet radiation having a wavelength of about 185 nanometers.
- the irradiation of process water by means of ultraviolet radiation with a wavelength of about 254 nanometers takes place at the same time.
- a device described herein is used.
- One of the purposes of the process is to allow air to flow through the first reaction chamber of the reactor as it is exposed to ultraviolet radiation having a wavelength of about 185 nanometers from the UV lamp to produce ozone from oxygen.
- the UV lamp is comprised of a plurality of individual UV lamps.
- Each of these plurality of UV lamps can be arranged inside a first reaction chamber and be surrounded, for example, by a quartz tube.
- Each of these plurality of UV lamps may be disposed inside a first reaction chamber, each containing an outlet for the air-ZOzon mixture and is coupled to a gas line.
- the reactor includes two or more centrally located UV lamps, for example, four or more centrally located UV lamps. The choice of the UV lamp and the dimensions of the reactor depends on the purpose and volumes of the desired use.
- the UV lamp (s) are selected to provide UV dosage in the range of about 5 to 100 mJ / m 2 in the second reaction chamber, including in the range of about 20 to 50 mJ / m 2 . In some embodiments, the UV lamp (s) are selected to provide in the second reaction chamber a UV dosage in the range of about 5 to 30 mJ / m 2 , for example a UV dosage in the range of about 12.5 to about 50 mJ / m 2 . In some embodiments, the or a UV lamp of the reactor emits light with a power consumption of about 140 to 250 watts, including about 180 to 200 watts, at a recirculation and water temperature between 26 ° C to 37 ° C. The respective dosage of UV light is among others
- the dosage in particular a minimum dosage, also depends on the type and nature of the existing and degradable micro-contaminants.
- the air / ozone mixture is also important to feed the air / ozone mixture into the return line for partial recycling of the already processed process water or into the fresh water supplied here. Furthermore, it is the use or method to feed the thus obtained to an air / ozone mixture enriched mixture of fresh water and purified process water before the second reaction chamber of the reactor in the feed line for water to be treated.
- the second reaction chamber is flowed through by a mixture of treated process water, fresh water and process water, which is enriched with the air / ozone mixture.
- UV light of about 254 nm which is in the so-called UV-C range, is absorbed by nucleic acids, which subsequently leads to the reaction and destruction of nucleic acids and thus to the killing of microorganisms.
- UV light of 254 nm can be generated by a low pressure mercury vapor lamp.
- Even UV light of 185 nm can be generated by a low-pressure mercury vapor lamp. It can be used in both cases, the same low-pressure mercury vapor lamp.
- the feed of the air / ozone mixture is effected by means of an injection device, such as a gas nozzle.
- a controllable pump is used, for example, a frequency-controlled pump. In this way, a particularly stable and optimal for the application
- the pump may be a centrifugal pump.
- the speed of the pump can be set for the required pump power.
- the feed of the air / ozone mixture is by means of a
- the bottom of the second reaction chamber of the reactor it is one of the purposes and methods of feeding chemicals to the bottom of the second reaction chamber of the reactor.
- These chemicals may be selected to inhibit deposits such as e.g. Lime deposits on the outside of the quartz tube to dissolve, so as to ensure a constant and optimal UV radiation in the second reaction chamber.
- an additional oxidizing agent such as hydrogen peroxide, can also be introduced into the reaction chamber to increase the concentration of oxidizing agents. In this way, the processes of the Advanced Oxidation Process (AOP) explained above can also be increased.
- AOP Advanced Oxidation Process
- these system components are integrated into a compact system and can be automated, which facilitates operation and maintenance of the device.
- a device disclosed herein includes a ball valve for opening or closing the flow of water through a conduit.
- a ball valve may be arranged in the inlet line.
- a ball valve may also be arranged in the outlet line.
- the corresponding opening or closing of the water flow can, for example, be automated, for example in order to carry out a cleaning step.
- a device disclosed herein includes two ball valves, which may be automatically opened and closed, for example.
- a device disclosed herein includes a container.
- This container may contain a metering lance and a level controller.
- the container may be coupled to the reactor by means of a metering pump.
- a metering pump can be controlled automatically, for example.
- the reactor may include an additional outlet in some embodiments.
- this additional outlet may be controllably opened and closed.
- the additional outlet is a tap in some embodiments.
- a device disclosed herein includes a frequency controlled pump. This pump can be controllable. In some embodiments, one disclosed herein
- a frequency-controlled metering pump which may be controllable, for example.
- it is part of a method disclosed herein and a use disclosed herein to strip and deposit debris on the outside of the quartz tube by flushing with a chemical substance such as an inorganic acid such as hydrochloric acid, acetic acid, or formic acid or an organic acid such as citric acid remove.
- a chemical substance such as an inorganic acid such as hydrochloric acid, acetic acid, or formic acid or an organic acid such as citric acid remove.
- a stopcock such as e.g. a ball valve between the water filter and the junction of a return line in the inlet conduit, such as a check valve, be arranged.
- a stopcock such as e.g. a ball valve between the water filter and the junction of a return line in the inlet conduit, such as a check valve, be arranged.
- a check valve such as a ball valve between the water filter and the junction of a return line in the inlet conduit, such as a check valve
- Stopcock or ball valve may be arranged in the outlet line so that a connection of the return line is positioned on the outlet line between the reactor and this stopcock.
- a first stopcock e.g. a ball valve disposed in the inlet duct between the water filter and a mouth of a return duct and a second stopcock, e.g. a ball valve, may be arranged in the outlet conduit that a
- connection of the return line is positioned on the outlet line between the reactor and this stopcock.
- a cleaning step as described above can be carried out, for example, on an embodiment with such a first stopcock and such a second stopcock.
- shut-off valves for example automatically, are closed. In this way, an internal closed circuit is made possible with the pump in the return line. In advance, certain amount of liquid can be drained via a tap, the example also
- the same volume as the pre-drained amount of liquid is then from a metering pump, such as an automated metering pump, in the second
- Reaction chamber metered to be circulated for a certain time by means of the arranged in the return line pump.
- the desired amount of liquid chemical can be metered from the container by means of the metering pump in the lower region of the reactor and circulated by means disposed in the return line pump for a certain time in the internal closed circuit.
- all the liquid can be drained through an outlet of the reactor, such as a tap.
- the ball valves can be opened again and the device can be run again in normal operation.
- the container may contain hydrogen peroxide.
- Hydrogen peroxide can be filled into the container. That hydrogen peroxide can be controlled via the metering pump, for example automatically, in the lower range of the second Be pumped reaction chamber.
- the hydrogen peroxide can be mixed here with the process water and ozone and re-irradiated with UV-C light, for example at 254 nanometers. As a result, an additional oxidation effect can be achieved. Also, increasing the concentration of hydrogen peroxide effectively increases the formation of hydroxyl radicals, thereby intensifying the processes of the Advanced Oxidation Process (see above).
- FIG. 1 shows an embodiment based on a known device.
- the reactor (4) of the device contains a UV lamp (1), which usually UV light with two different
- a quartz tube (2) surrounds the UV lamp (1).
- the quartz tube is disposed in the reactor (4) where it defines a first reaction chamber (5).
- the reactor of the apparatus has an inlet side (3) which in this case may contain an air supply to the first reaction chamber (5) for air (a), a lid, an air filter and a mounting plate.
- the reactor (4) contains two separate reaction chambers: an inner cylinder (5) with the quartz tube (2) as the outer wall and the UV lamp (1) contained therein.
- the reactor further includes an outer cylinder (6) having a water inlet connection point and a water outlet connection point.
- an air / ozone mixture (b) is formed in the first reaction chamber (5) from air (a) with 20% oxygen content.
- the reactor includes an outlet for the formed air-ozone mixture (b) to which an air / ozone line (134) is coupled.
- the air / ozone line includes a check valve (22).
- the air / ozone mixture (b) is fed into the inlet line for the process water (d) via an inlet point, designed as a Venturi nozzle (21).
- a feed point (21) for the air / ozone mixture (b) designed as a Venturi nozzle with a check valve in a bypass branch is fluidly connected to an inlet line (131) which is connected to the reactor (4).
- the second outer reaction chamber (6) of the reactor (4) contains an inlet line for the service water (d) connected to the reactor (4) and the air / ozone mixture (b) already fed into this.
- This second reaction chamber (6) is flowed through by the water to be treated, while it is exposed to the ultraviolet radiation of the UV lamp (1) having a wavelength of about 254 nanometers and is thus disinfected.
- the reactor (4) also contains a connected outlet line for the treated process water (e).
- a pressure sensor (7) On the inlet line (31), a pressure sensor (7) is arranged.
- a ball valve (19) is in the
- Inlet line (31) arranged. Furthermore, a circulating pump (16) is arranged in the inlet line (31). Between the circulation pump (16) and the ball valve (19), a filter (18) is arranged, which provides filtered service water (d). Process water (e) leaves the reactor through the outlet pipe (32). The reactor is installed in the flow direction downstream of the filter (18) and the circulation pump (16) in the main water circuit.
- a nozzle e.g. a Venturi nozzle
- the ozone-air mixture is introduced in a bypass branch via a check valve (5) and a nozzle (21), e.g. a Venturi nozzle, introduced into the water cycle.
- the process water (d) and the ozone / air mixture (b) fed therein are irradiated with UV light having a wavelength of 254 nanometers. This results in an oxidation of some poorly degradable low molecular weight organic
- micropollutants such as bound chlorine, nitrite, pesticides, sulfur-containing organic compounds, hydrogen sulfide, pharmaceuticals, odors, and flavors, thus reducing their content, and further deactivating micro-organisms.
- the ozone / air mixture (b) in a bypass line of the inlet line for the service water, via a nozzle (21) as a Venturi nozzle fed.
- the feeding power of the Venturi nozzle in the bypass line is of a certain
- Pressure difference (between outlet pressure and inlet pressure of the Venturi system) and also dependent on the flow rate of the water.
- the prevailing operating pressure can be read on the pressure gauge (7) when the ball valve (19) in the inlet line for the process water at the position where the nozzle (21) is located in a bypass line, is completely open.
- the inlet pressure is increased to the venturi nozzle located in the bypass. This should be about 0.3 bar higher than the required outlet pressure to feed the desired amount of ozone / air mixture can. It is advantageous to have a feed power of ozone /
- the feed rate may be, for example, in the range of 1 liter per minute up to 2 liters per minute.
- the operating pressure (or line pressure) is typically variable because, among other things due to the degree of contamination of the filter change the pressure conditions in the main water line. When the operating pressure varies, it is only conditionally possible to adjust the flow through the bypass by manually closing or opening the ball valve (19), in which the Venturi nozzle (21) is arranged.
- the reactor may contain a plurality of first reaction chambers arranged side by side.
- a plurality of UV lamps be provided, which are each surrounded by a quartz tube and which each contain an outlet for the air / ozone mixture.
- To each of these outlets may be coupled an air / ozone line.
- the feed-in power may relate to each of the first reaction chambers.
- the feed line in such embodiments may be several times the values indicated above.
- Figure 2 shows an embodiment of the device disclosed herein.
- the device also has a reactor (4) with two separate reaction chambers.
- the first reaction chamber (5) is defined by an inner cylinder with a quartz tube (2) as the outer wall. Inside the first one
- Reaction chamber (5) is a UV lamp (1) arranged.
- the UV lamp is arranged centrally in the reactor.
- the UV lamp is arranged centrally in the first reaction chamber (5).
- the second reaction chamber (6) is defined by an outer cylinder (2).
- a UV lamp (1) is provided, which emits UV light with two different wavelengths. These are typically the wavelengths of 185 nanometers and 254 nanometers.
- the reactor of the apparatus has an inlet side (3) through which air (a) can enter the inner first reactor chamber (5).
- the second outer chamber (6) of the reactor contains a water inlet connection point and a water discharge connection point.
- An exit of the inner first reactor chamber (5) of the reactor is connected to a gas conduit (34), e.g. an ozone tube (34), which may include a check valve (22).
- a feed of the ozone / air mixture via a Venturi nozzle with check valve in a return line (33).
- the feed rate may be, for example, in the range of 1 liter per minute up to 6 liters per minute, inclusive in the range of 1 liter per minute up to 4 liters per minute. In some embodiments, the feed rate is in the range of 2 liters per minute up to 5 liters per minute.
- a pressure sensor is provided as a manometer (7), which is each provided with a transmitter. There are two pressure sensors (7) on both sides of the Venturi nozzle.
- the return line (33) in the embodiment shown here further comprises an optional flow sensor (8), which may also be provided with a transmitter.
- a fresh water supply (9) opens into the
- the return line (33) includes a frequency-controlled pump (10). To the pump, a control element (11) for the pump 10 is connected. A control can be done on the basis of the determined pressure difference. Two shut-off valves (19) are provided with which the flow in the inlet line (31) and the return line (33) can be regulated.
- the delivery rate of the frequency-controlled pump (10) can be regulated on the basis of the flow rate determined by means of the flow rate sensors (8) and / or on the basis of the pressure difference between the positions of the corresponding sensors determined by means of two pressure sensors (7).
- This regulation can be done automatically by a regulation (11). An embodiment of this regulation is illustrated in FIG. In this case, for example, the speed of the pump can be controlled.
- the supply line (15) of fresh water (f) is arranged in the flow direction in front of the pump (10).
- the ozone / air mixture is fed into the mixture of fresh water and purified process water.
- the air / ozone-added water (e ') is returned to the main water circuit, from where it is passed directly into the second reaction chamber (6).
- An additional non-return valve (20) prevents the return of the process water (d) in the direction of the feed point (21), eg a Venturi nozzle.
- the already purified by means of the reactor process water (e) and also the fresh water supplied (f) are pressed by means of the pump (10) in the direction of the Venturi nozzle (21) to feed an optimal amount of air / ozone mixture (b) to be able to.
- the feed rate of the air / ozone mixture (b) will be 2 to 6 liters per minute or more.
- the feed rate of the air / ozone mixture (b) may be 2 to 6 liters per minute or more per UV lamp.
- air / ozone mixture (b) is mixed by means of the Venturi nozzle (21) in very fine beads in the prepurified water (e) and / or the fresh water (f) and immediately before the reactor (4) in the main water circuit recycled.
- the flow through the return line (33) and / or the differential pressure before and after the feed through the Venturi nozzle (21) is kept constant.
- the difference between the value of the downstream pressure sensor and the value of the upstream pressure sensor (7) can be regulated to an at least substantially constant value.
- Such a difference may be, for example, 0.3 bar.
- the frequency of the pump (10) can be controlled continuously.
- the processed process water (e) or the fresh water (f) contain very little impurities (eg micro-particle pollutants), most of the ozone (b) will not have reacted until mixed with the process water (d) to be purified becomes. If the route of the mixing of prepurified process water (e) or of fresh water (f) and service water is selected short, as shown in Fig. 2, the majority of the ozone (b) will not have reacted until it is in the second reaction chamber (6) of the reactor (4) passes.
- the water (e, f) added with ozone (b) is irradiated in the second reaction chamber (6) by means of the UV lamp (1) with UV light having a wavelength of 254 nanometers. Most of the remaining ozone reacts to an OH radical activated and reacts according to the Advanced Oxidation Process (s.o.), because it has a very high oxidation power.
- a return of the mixture of fresh water and treated water (e ') is by means of Check valve (20) prevents, so that the fresh water supply (9) at this point in the system (9) is safely possible.
- the degradation of low molecular weight organic compounds and salts, in particular the degradation of body fluid products and humic acids by UV treatment in chlorinated water is much more expensive than the degradation of such compounds and salts in non-chlorinated water.
- the treatment of the fresh water (f) by the method disclosed here therefore allows a very efficient and premature reduction of micropollutants and thus leads to significant cost savings.
- Frequency control of the pump provides additional cost savings.
- FIG. 3 shows a further embodiment of the device disclosed here.
- the apparatus is similar to the apparatus shown in Fig. 2 and also has a reactor (4) with two separate ones
- part of the already purified process water (e) in a return line (33) is branched off and pumped back by means of the controllable pump (10) in the direction of the inlet line of the reactor.
- fresh water supplied (f) is supplied to the treated process water (e) via a feed (9).
- the air / ozone mixture (b) is fed into the fresh water (f) by means of a nozzle (21), for example a Venturi nozzle.
- the device shown in Figure 3 includes an air supply regulator (27) disposed at the air inlet (30). With the aid of this air supply regulator, it is possible to control the amount of air which enters the first reaction chamber (5) of the reactor (4) via the air inlet (30). In this way, the ratio of volume of air entering the reactor and volume of water entering the reactor can be regulated. Thus, the ratio of the volumes of air and water to be treated can be changed in order to increase or decrease the relative amount of air / ozone mixture fed into the water to be treated. In this way, even with changes in the amount of water flowing into the reactor, the relative amount of air / ozone mixture fed into the water to be treated can be kept substantially constant.
- Fig. 3 shows, inter alia, a circulation pump (16).
- This circulation pump may be an adjustable circulating pump such as a frequency-controlled circulating pump. It may be coupled to a control (17) for the pump (16), as shown for example in FIG.
- the embodiment shown in Fig. 4 also has a reactor whose second reaction chamber (6) is defined by an outer cylinder (2).
- This contains a water inlet connection point and a water spout port, a tap (15), an inlet for a supply line for supplying chemicals and a port for the return line.
- the apparatus further includes a container (14) with metering lance and level controller. Via a metering pump (13) of the container (14) via the supply line (26) to the reactor (4) is coupled.
- the second reaction chamber (6) of the reactor (4) further includes a tap (15).
- a frequency-controlled circulating pump (16) is coupled to a control (17) for the pump (16).
- the regulation can take place with the aid of a flow sensor (8).
- a filter (18) serves the
- the container (14) hydrogen peroxide is supplied. This is supplied by means of the metering pump (13) of the second reaction chamber (6) of the reactor.
- the hydrogen peroxide is here mixed with the process water and ozone and existing OH radicals and additionally irradiated with UV light (254 nanometers). This optimizes the Advanced Oxidation Process (AOP).
- AOP Advanced Oxidation Process
- An embodiment according to Figure 4 allows easy and automatic maintenance of the device without much labor.
- the treated, purified water may be collected and completely re-fed to the reactor of the apparatus.
- a device disclosed herein may be used repetitively by utilizing already treated water rather than service water.
- Fig. 5 schematically illustrates a control of an embodiment shown in Fig. 2, which may be automated.
- various measured values are determined and fed to a measuring unit (124) and made available to the control unit (125).
- the minimum UV dosage in the second reaction chamber is monitored, measured via a UV sensor (36). If the UV dosage is less than 90% but more than 70% of the setpoint, the frequency-controlled (17) circulating pump (16) is throttled via the frequency control unit (131). However, if the UV dosage falls below 70% of the setpoint, the frequency-controlled (17) circulation pump (16) and additionally the frequency-controlled (11) pump (10) are switched off via the frequency control unit (131). The meter (124) may then issue an alarm signal.
- a temperature measurement 36
- the circulation pump (16) is turned off via a switching relay (127) and in addition the frequency controlled (11) pump (10) is switched off. In this case too, the measuring device (124) can issue an alarm signal.
- An automatic supply of liquid chemicals such as hydrochloric acid can take place via the time control (126) and the metering pump (13).
- the two shut-off valves are automatically closed via the control element (129). Subsequently, both the pump (10) and the circulation pump (16) are switched off via the control element (131). Then the tap (15) is opened and closed again for a limited period of time via the control element (128) so as to discharge a certain amount of water. Via the control element (126), a certain amount of chemicals in fluid form is then pumped into the reactor via the metering pump (13). Subsequently, by means of the control element (130) via the frequency control (11), the pump (10) is turned on to activate a resulting internal water cycle. After a predetermined period of time, the pump (10) is switched off again via the control element (130) by means of the frequency control (11). Over the control element (128) then the tap (15) is opened for a predetermined period of time and closed again, so as to drain a certain amount of water. Subsequently, the device can be run again in standard operation.
- the device includes an additional second controllable circulating pump (16 ').
- This second, controllable circulating pump (16 ') is arranged in a bypass branch (31a) of the inlet line (31).
- the first circulation pump (16) is arranged in the inlet line (31). This is both Circulating pumps connected in parallel.
- a check valve (113) is arranged in the bypass branch (31a).
- a check valve (20 ') is arranged in the inlet line (31).
- the apparatus shown in Figs. 6 and 7 also includes an air supply regulator (27).
- this air supply regulator can regulate the volume of air per unit time, so for example, how many liters of air per minute, are included in the first reaction chamber (5).
- it may be advantageous to supply the amount of air / ozone mixture fed into the water to the reactor will adjust accordingly. This can be done by means of the air supply regulator (27).
- the device shown in Figs. 6 and 7 also includes a temperature sensor (117) in the second reaction chamber (6).
- a temperature sensor 117
- the device shown in Figures 6 and 7 also includes a UV sensor (36) in the second
- UV sensor By means of the UV sensor, it can be monitored whether the minimum irradiation of UV light (254 nm) for the application and thus the minimum UV dosage in mJ / cm 2 in the second reaction chamber are always ensured.
- a device disclosed herein has been tested for its effect on microorganisms and disinfection by-products in two different sized embodiments with a single UV lamp and a maximum water flow of 76 m / h and 5 m / h.
- the measuring arrangement is shown in FIG. 7.
- a device disclosed herein has been tested for inactivation of E. coli, Bacillus subtilis spores and MS2 phage in the one-way operation, ie without multiple treatment by the device disclosed herein.
- Bacillus subtilis spores (ATCC 6633) were incubated on Columbia Blood Agar Base for 44 ⁇ 2 hours prior to use at 37 ° C.
- Bacillus subtilis spores (ATCC 6633) were incubated on Columbia Blood Agar Base for 44 ⁇ 2 hours prior to use at 37 ° C.
- FIGS. 9A and 9B show that comparably rapid killing of B.subtilis spores took place at all UV dosages.
- Fig. 10A and FIG. 10B show that simple UV irradiation is less effective compared to a device disclosed herein.
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- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Water Treatments (AREA)
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Abstract
Applications Claiming Priority (2)
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DE102017114186 | 2017-06-27 | ||
PCT/EP2018/067292 WO2019002389A1 (fr) | 2017-06-27 | 2018-06-27 | Installation et procédé d'un traitement de l'eau |
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EP18735262.0A Pending EP3645467A1 (fr) | 2017-06-27 | 2018-06-27 | Installation et procédé d'un traitement de l'eau |
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US (1) | US11267734B2 (fr) |
EP (1) | EP3645467A1 (fr) |
WO (1) | WO2019002389A1 (fr) |
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EP3645467A1 (fr) | 2017-06-27 | 2020-05-06 | Berson, Barbara | Installation et procédé d'un traitement de l'eau |
US11505887B2 (en) * | 2019-03-27 | 2022-11-22 | O3Waterworks, Llc | Ozone laundry system |
US11332397B2 (en) * | 2020-04-14 | 2022-05-17 | EMG International, LLC | Treatment of acrolein and acrolein by-products in water and/or wastewater |
ES2916149A1 (es) * | 2020-12-28 | 2022-06-28 | Univ Cantabria | Filtro recirculante multimodal desactivador de patógenos en fluidos mediante fotones energéticos y equipo purificador |
DE102021116547A1 (de) * | 2021-06-25 | 2022-12-29 | Solvis GmbH | System zum Reinigen von Trinkwasser |
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DE10040566A1 (de) | 2000-08-15 | 2002-03-07 | Pichler Kunststofftechnik Gmbh | Verfahren und Vorrichtung zur Aufbereitung eines aquatischen Systems |
DE10129663A1 (de) | 2001-06-20 | 2003-01-09 | Jens Fischer | Verfahren zur biologischen und biochemischen Aufbereitung von Wasser, vorzugsweise von Poolwasser und Reaktor zur Durchführung des Verfahrens |
DE102008048071A1 (de) * | 2008-09-19 | 2010-04-08 | Walter Polak | Anlage und Verfahren zur chemischen und physikalischen Aufbereitung von Wasser mittels UV-Strahlung |
DE102009035076A1 (de) * | 2009-07-28 | 2011-02-03 | Sol-Uv Technologie & Entwicklungs-Gmbh | Verfahren und Vorrichtung zur Aufbereitung von Badewasser |
WO2012142140A1 (fr) * | 2011-04-12 | 2012-10-18 | Aardvark Ip Holding, Llc | Systèmes de traitement d'eau et méthode utilisant des rayonnements uv |
JP2013255862A (ja) * | 2012-06-09 | 2013-12-26 | Hydro Sana Co Ltd | 被処理水に含まれる不純物の分解、吸着若しくは分解吸着又は被処理水の腐敗抑制の為の装置 |
EP3645467A1 (fr) | 2017-06-27 | 2020-05-06 | Berson, Barbara | Installation et procédé d'un traitement de l'eau |
-
2018
- 2018-06-27 EP EP18735262.0A patent/EP3645467A1/fr active Pending
- 2018-06-27 WO PCT/EP2018/067292 patent/WO2019002389A1/fr unknown
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US11267734B2 (en) | 2022-03-08 |
US20210139357A1 (en) | 2021-05-13 |
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17Q | First examination report despatched |
Effective date: 20230118 |