EP3633361A2 - Verfahren zur erzeugung einer elementaren karte und oberflächenanalysator - Google Patents

Verfahren zur erzeugung einer elementaren karte und oberflächenanalysator Download PDF

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Publication number
EP3633361A2
EP3633361A2 EP19201511.3A EP19201511A EP3633361A2 EP 3633361 A2 EP3633361 A2 EP 3633361A2 EP 19201511 A EP19201511 A EP 19201511A EP 3633361 A2 EP3633361 A2 EP 3633361A2
Authority
EP
European Patent Office
Prior art keywords
correction
generating
specimen
elemental map
channel images
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP19201511.3A
Other languages
English (en)
French (fr)
Other versions
EP3633361A3 (de
EP3633361B1 (de
Inventor
Tatsuya Uchida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Publication of EP3633361A2 publication Critical patent/EP3633361A2/de
Publication of EP3633361A3 publication Critical patent/EP3633361A3/de
Application granted granted Critical
Publication of EP3633361B1 publication Critical patent/EP3633361B1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T5/00—Image enhancement or restoration
    • G06T5/90—Dynamic range modification of images or parts thereof
    • G06T5/92—Dynamic range modification of images or parts thereof based on global image properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/227—Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]
    • G01N23/2273—Measuring photoelectron spectrum, e.g. electron spectroscopy for chemical analysis [ESCA] or X-ray photoelectron spectroscopy [XPS]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/227—Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]
    • G01N23/2276—Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM] using the Auger effect, e.g. Auger electron spectroscopy [AES]
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T5/00—Image enhancement or restoration
    • G06T5/50—Image enhancement or restoration using two or more images, e.g. averaging or subtraction
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/40—Analysis of texture
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/401—Imaging image processing
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/10—Image acquisition modality
    • G06T2207/10056—Microscopic image
    • G06T2207/10061—Microscopic image from scanning electron microscope

Definitions

  • an elemental map (an Auger map) can be acquired by irradiating each measurement point on a specimen surface with an electron beam to scan the measurement point with the electron beam and detecting Auger electrons emitted from each measurement point.
  • an elemental map (an Auger map) indicating a distribution of elements can be acquired.
  • the surface analyzer 100 acquires an elemental map by scanning a surface of the specimen S with an electron beam, analyzing Auger electrons emitted from the specimen S with a spectrometer 40, and detecting the analyzed Auger electrons with a detector 50 having a plurality of channels capable of detecting electrons with energies that differ from one another.
  • the plurality of channeltrons 52 are arranged so that an energy interval ⁇ E between adjacent channeltrons 52 is the same. Therefore, when energy that can be detected by the ch0 channeltron 52 is denoted by E, energy that can be detected by the ch-1 channeltron 52 is denoted by E - ⁇ E, energy that can be detected by the ch-2 channeltron 52 is denoted by E - 2 ⁇ ⁇ E, and energy that can be detected by the ch-3 channeltron 52 is denoted by E - 3 ⁇ ⁇ E.
  • the image processing unit 74 performs a process of generating an elemental map. Details of the process by the image processing unit 74 will be described later in "3. Processes".
  • FIG. 5 illustrates correction channel images and an elemental map (an Auger map) obtained by measuring a standard specimen.
  • the correction channel images in FIG. 5 are images obtained by PB simultaneous measurement.
  • the effect of a positional dependence of the sensitivity of the detector 50 is manifested in brightness of the elemental map regardless of whether PB separate measurement or PB simultaneous measurement is performed.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Biochemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
EP19201511.3A 2018-10-05 2019-10-04 Verfahren zur erzeugung einer elementaren karte und oberflächenanalysator Active EP3633361B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018189983A JP6808700B2 (ja) 2018-10-05 2018-10-05 元素マップの生成方法および表面分析装置

Publications (3)

Publication Number Publication Date
EP3633361A2 true EP3633361A2 (de) 2020-04-08
EP3633361A3 EP3633361A3 (de) 2020-04-22
EP3633361B1 EP3633361B1 (de) 2022-03-23

Family

ID=68158959

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19201511.3A Active EP3633361B1 (de) 2018-10-05 2019-10-04 Verfahren zur erzeugung einer elementaren karte und oberflächenanalysator

Country Status (3)

Country Link
US (1) US11062434B2 (de)
EP (1) EP3633361B1 (de)
JP (1) JP6808700B2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11698336B2 (en) * 2019-09-30 2023-07-11 Jeol Ltd. Analysis method and analysis apparatus
JP7105261B2 (ja) * 2020-02-18 2022-07-22 日本電子株式会社 オージェ電子分光装置および分析方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017111022A (ja) 2015-12-17 2017-06-22 日本電子株式会社 分析方法および分光装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02145950A (ja) * 1988-11-26 1990-06-05 Shimadzu Corp Ｘ線光電子分析装置
JPH03165436A (ja) * 1989-11-24 1991-07-17 Shimadzu Corp 高速マッピングにおける検出信号強度の補正方法
JP2985904B2 (ja) * 1991-05-17 1999-12-06 株式会社島津製作所 Ｘ線光電子分析方法
US6528787B2 (en) * 1999-11-30 2003-03-04 Jeol Ltd. Scanning electron microscope
US6584413B1 (en) * 2001-06-01 2003-06-24 Sandia Corporation Apparatus and system for multivariate spectral analysis
US6675106B1 (en) * 2001-06-01 2004-01-06 Sandia Corporation Method of multivariate spectral analysis
US6800852B2 (en) * 2002-12-27 2004-10-05 Revera Incorporated Nondestructive characterization of thin films using measured basis spectra
JP2005140567A (ja) * 2003-11-05 2005-06-02 Jeol Ltd 表面分析装置
JP4349146B2 (ja) * 2004-02-17 2009-10-21 株式会社島津製作所 Ｘ線分析装置
JP5289665B2 (ja) * 2004-12-08 2013-09-11 株式会社日立製作所 薄膜評価方法及びその装置
JP4621098B2 (ja) * 2005-09-14 2011-01-26 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡および画像信号処理方法
US8134698B1 (en) * 2008-03-14 2012-03-13 Kla-Tencor Corporation Dynamic range extension in surface inspection systems
EP2605005A1 (de) * 2011-12-14 2013-06-19 FEI Company Clustern von multimodalen Daten
TW201432253A (zh) * 2012-12-28 2014-08-16 Hitachi High Tech Corp 帶電粒子束裝置及其缺陷分析方法
DE102015216673A1 (de) * 2015-09-01 2017-03-02 Carl Zeiss Smt Gmbh Verfahren und Vorrichtungen zum Untersuchen einer elektrisch geladenen Probenoberfläche
JP6677571B2 (ja) * 2016-05-13 2020-04-08 日本電子株式会社 電子分光装置および測定方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017111022A (ja) 2015-12-17 2017-06-22 日本電子株式会社 分析方法および分光装置

Also Published As

Publication number Publication date
EP3633361A3 (de) 2020-04-22
US20200111197A1 (en) 2020-04-09
US11062434B2 (en) 2021-07-13
JP2020060381A (ja) 2020-04-16
JP6808700B2 (ja) 2021-01-06
EP3633361B1 (de) 2022-03-23

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