EP3578692A4 - Tin alloy plating solution - Google Patents
Tin alloy plating solution Download PDFInfo
- Publication number
- EP3578692A4 EP3578692A4 EP17895170.3A EP17895170A EP3578692A4 EP 3578692 A4 EP3578692 A4 EP 3578692A4 EP 17895170 A EP17895170 A EP 17895170A EP 3578692 A4 EP3578692 A4 EP 3578692A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- plating solution
- alloy plating
- tin alloy
- tin
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
- C25D3/32—Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017015219 | 2017-01-31 | ||
JP2017222433A JP6432667B2 (en) | 2017-01-31 | 2017-11-20 | Tin alloy plating solution |
PCT/JP2017/044668 WO2018142776A1 (en) | 2017-01-31 | 2017-12-13 | Tin alloy plating solution |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3578692A1 EP3578692A1 (en) | 2019-12-11 |
EP3578692A4 true EP3578692A4 (en) | 2020-12-09 |
Family
ID=63110055
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP17895170.3A Withdrawn EP3578692A4 (en) | 2017-01-31 | 2017-12-13 | Tin alloy plating solution |
Country Status (6)
Country | Link |
---|---|
US (1) | US20190390357A1 (en) |
EP (1) | EP3578692A4 (en) |
JP (1) | JP6432667B2 (en) |
KR (1) | KR102174876B1 (en) |
CN (1) | CN110249076A (en) |
TW (1) | TWI681084B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7243002B2 (en) * | 2018-07-20 | 2023-03-22 | 三菱マテリアル株式会社 | Tin plating solution and tin alloy plating solution |
US20240116861A1 (en) * | 2019-12-12 | 2024-04-11 | Mitsubishi Materials Corporation | Dithiapolyether diol, method for producing same, snag plating solution containing dithiapolyether diol, and method for forming plating film with use of snag plating solution |
CN111188069A (en) * | 2019-12-31 | 2020-05-22 | 大连长丰实业总公司 | Tin-plated bismuth alloy solution and preparation method thereof |
CN112981459A (en) * | 2021-03-12 | 2021-06-18 | 昆明理工大学 | Method for electrolytic refining of coarse soldering tin |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11269691A (en) * | 1998-01-21 | 1999-10-05 | Ishihara Chem Co Ltd | Silver and silver alloy plating bath |
US7628903B1 (en) * | 2000-05-02 | 2009-12-08 | Ishihara Chemical Co., Ltd. | Silver and silver alloy plating bath |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3718790B2 (en) | 1998-12-24 | 2005-11-24 | 石原薬品株式会社 | Silver and silver alloy plating bath |
JP3433291B2 (en) * | 1999-09-27 | 2003-08-04 | 石原薬品株式会社 | Tin-copper-containing alloy plating bath, tin-copper-containing alloy plating method, and article formed with tin-copper-containing alloy plating film |
JP4756886B2 (en) * | 2005-03-22 | 2011-08-24 | 石原薬品株式会社 | Non-cyan tin-silver alloy plating bath |
JP4162246B2 (en) | 2005-08-12 | 2008-10-08 | 石原薬品株式会社 | Cyanide-free silver-based plating bath, plated body and plating method |
EP2221396A1 (en) * | 2008-12-31 | 2010-08-25 | Rohm and Haas Electronic Materials LLC | Lead-Free Tin Alloy Electroplating Compositions and Methods |
JP2016148085A (en) * | 2015-02-12 | 2016-08-18 | ユケン工業株式会社 | Tin-copper plating liquid and conductive member |
JP6631348B2 (en) * | 2015-03-26 | 2020-01-15 | 三菱マテリアル株式会社 | Plating solution using phosphonium salt |
-
2017
- 2017-11-20 JP JP2017222433A patent/JP6432667B2/en active Active
- 2017-12-13 EP EP17895170.3A patent/EP3578692A4/en not_active Withdrawn
- 2017-12-13 US US16/481,959 patent/US20190390357A1/en not_active Abandoned
- 2017-12-13 KR KR1020197024869A patent/KR102174876B1/en active IP Right Grant
- 2017-12-13 CN CN201780084824.3A patent/CN110249076A/en active Pending
- 2017-12-22 TW TW106145193A patent/TWI681084B/en active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11269691A (en) * | 1998-01-21 | 1999-10-05 | Ishihara Chem Co Ltd | Silver and silver alloy plating bath |
US7628903B1 (en) * | 2000-05-02 | 2009-12-08 | Ishihara Chemical Co., Ltd. | Silver and silver alloy plating bath |
Non-Patent Citations (1)
Title |
---|
See also references of WO2018142776A1 * |
Also Published As
Publication number | Publication date |
---|---|
TW201833391A (en) | 2018-09-16 |
JP6432667B2 (en) | 2018-12-05 |
US20190390357A1 (en) | 2019-12-26 |
JP2018123421A (en) | 2018-08-09 |
EP3578692A1 (en) | 2019-12-11 |
TWI681084B (en) | 2020-01-01 |
KR20190103460A (en) | 2019-09-04 |
CN110249076A (en) | 2019-09-17 |
KR102174876B1 (en) | 2020-11-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
17P | Request for examination filed |
Effective date: 20190729 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
AX | Request for extension of the european patent |
Extension state: BA ME |
|
DAV | Request for validation of the european patent (deleted) | ||
DAX | Request for extension of the european patent (deleted) | ||
A4 | Supplementary search report drawn up and despatched |
Effective date: 20201110 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: C25D 3/56 20060101ALI20201104BHEP Ipc: C25D 7/12 20060101ALN20201104BHEP Ipc: C25D 3/60 20060101AFI20201104BHEP |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20210608 |