EP3578692A4 - Tin alloy plating solution - Google Patents

Tin alloy plating solution Download PDF

Info

Publication number
EP3578692A4
EP3578692A4 EP17895170.3A EP17895170A EP3578692A4 EP 3578692 A4 EP3578692 A4 EP 3578692A4 EP 17895170 A EP17895170 A EP 17895170A EP 3578692 A4 EP3578692 A4 EP 3578692A4
Authority
EP
European Patent Office
Prior art keywords
plating solution
alloy plating
tin alloy
tin
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP17895170.3A
Other languages
German (de)
French (fr)
Other versions
EP3578692A1 (en
Inventor
Kouji Tatsumi
Tsukasa Yasoshima
Takuma KATASE
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority claimed from PCT/JP2017/044668 external-priority patent/WO2018142776A1/en
Publication of EP3578692A1 publication Critical patent/EP3578692A1/en
Publication of EP3578692A4 publication Critical patent/EP3578692A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/60Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/30Electroplating: Baths therefor from solutions of tin
    • C25D3/32Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/12Semiconductors
EP17895170.3A 2017-01-31 2017-12-13 Tin alloy plating solution Withdrawn EP3578692A4 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017015219 2017-01-31
JP2017222433A JP6432667B2 (en) 2017-01-31 2017-11-20 Tin alloy plating solution
PCT/JP2017/044668 WO2018142776A1 (en) 2017-01-31 2017-12-13 Tin alloy plating solution

Publications (2)

Publication Number Publication Date
EP3578692A1 EP3578692A1 (en) 2019-12-11
EP3578692A4 true EP3578692A4 (en) 2020-12-09

Family

ID=63110055

Family Applications (1)

Application Number Title Priority Date Filing Date
EP17895170.3A Withdrawn EP3578692A4 (en) 2017-01-31 2017-12-13 Tin alloy plating solution

Country Status (6)

Country Link
US (1) US20190390357A1 (en)
EP (1) EP3578692A4 (en)
JP (1) JP6432667B2 (en)
KR (1) KR102174876B1 (en)
CN (1) CN110249076A (en)
TW (1) TWI681084B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7243002B2 (en) * 2018-07-20 2023-03-22 三菱マテリアル株式会社 Tin plating solution and tin alloy plating solution
US20240116861A1 (en) * 2019-12-12 2024-04-11 Mitsubishi Materials Corporation Dithiapolyether diol, method for producing same, snag plating solution containing dithiapolyether diol, and method for forming plating film with use of snag plating solution
CN111188069A (en) * 2019-12-31 2020-05-22 大连长丰实业总公司 Tin-plated bismuth alloy solution and preparation method thereof
CN112981459A (en) * 2021-03-12 2021-06-18 昆明理工大学 Method for electrolytic refining of coarse soldering tin

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11269691A (en) * 1998-01-21 1999-10-05 Ishihara Chem Co Ltd Silver and silver alloy plating bath
US7628903B1 (en) * 2000-05-02 2009-12-08 Ishihara Chemical Co., Ltd. Silver and silver alloy plating bath

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3718790B2 (en) 1998-12-24 2005-11-24 石原薬品株式会社 Silver and silver alloy plating bath
JP3433291B2 (en) * 1999-09-27 2003-08-04 石原薬品株式会社 Tin-copper-containing alloy plating bath, tin-copper-containing alloy plating method, and article formed with tin-copper-containing alloy plating film
JP4756886B2 (en) * 2005-03-22 2011-08-24 石原薬品株式会社 Non-cyan tin-silver alloy plating bath
JP4162246B2 (en) 2005-08-12 2008-10-08 石原薬品株式会社 Cyanide-free silver-based plating bath, plated body and plating method
EP2221396A1 (en) * 2008-12-31 2010-08-25 Rohm and Haas Electronic Materials LLC Lead-Free Tin Alloy Electroplating Compositions and Methods
JP2016148085A (en) * 2015-02-12 2016-08-18 ユケン工業株式会社 Tin-copper plating liquid and conductive member
JP6631348B2 (en) * 2015-03-26 2020-01-15 三菱マテリアル株式会社 Plating solution using phosphonium salt

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11269691A (en) * 1998-01-21 1999-10-05 Ishihara Chem Co Ltd Silver and silver alloy plating bath
US7628903B1 (en) * 2000-05-02 2009-12-08 Ishihara Chemical Co., Ltd. Silver and silver alloy plating bath

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2018142776A1 *

Also Published As

Publication number Publication date
TW201833391A (en) 2018-09-16
JP6432667B2 (en) 2018-12-05
US20190390357A1 (en) 2019-12-26
JP2018123421A (en) 2018-08-09
EP3578692A1 (en) 2019-12-11
TWI681084B (en) 2020-01-01
KR20190103460A (en) 2019-09-04
CN110249076A (en) 2019-09-17
KR102174876B1 (en) 2020-11-05

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