EP2935659A2 - Method for the metallation of a workpiece and a layer structure made up of a workpiece and a metal layer - Google Patents

Method for the metallation of a workpiece and a layer structure made up of a workpiece and a metal layer

Info

Publication number
EP2935659A2
EP2935659A2 EP13828908.7A EP13828908A EP2935659A2 EP 2935659 A2 EP2935659 A2 EP 2935659A2 EP 13828908 A EP13828908 A EP 13828908A EP 2935659 A2 EP2935659 A2 EP 2935659A2
Authority
EP
European Patent Office
Prior art keywords
workpiece
microstructures
tool
metal layer
layer structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP13828908.7A
Other languages
German (de)
French (fr)
Inventor
Roman Ostholt
Robin Alexander Krüger
Bernd Rösener
Eugen Haumann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LPKF Laser and Electronics AG
Original Assignee
LPKF Laser and Electronics AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LPKF Laser and Electronics AG filed Critical LPKF Laser and Electronics AG
Publication of EP2935659A2 publication Critical patent/EP2935659A2/en
Withdrawn legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B44DECORATIVE ARTS
    • B44FSPECIAL DESIGNS OR PICTURES
    • B44F3/00Designs characterised by outlines
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1607Process or apparatus coating on selected surface areas by direct patterning
    • C23C18/1608Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • C23C18/165Multilayered product
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2013Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by mechanical pretreatment, e.g. grinding, sanding
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2026Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by radiant energy
    • C23C18/204Radiation, e.g. UV, laser
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0296Conductive pattern lay-out details not covered by sub groups H05K1/02 - H05K1/0295
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0011Working of insulating substrates or insulating layers
    • H05K3/0014Shaping of the substrate, e.g. by moulding
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/381Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1803Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
    • C23C18/1824Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
    • C23C18/1837Multistep pretreatment
    • C23C18/1841Multistep pretreatment with use of metal first
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2073Multistep pretreatment
    • C23C18/208Multistep pretreatment with use of metal first
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/30Activating or accelerating or sensitising with palladium or other noble metal
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/20Details of printed circuits not provided for in H05K2201/01 - H05K2201/10
    • H05K2201/2072Anchoring, i.e. one structure gripping into another
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01Tools for processing; Objects used during processing
    • H05K2203/0104Tools for processing; Objects used during processing for patterning or coating
    • H05K2203/0113Female die used for patterning or transferring, e.g. temporary substrate having recessed pattern

Definitions

  • the invention relates to a method for the at least partial and adherent metallization of a non-conductive workpiece. Furthermore, the invention relates to a layer structure comprising a workpiece and an adherent metal layer connected thereto by means of structuring.
  • ABS acrylonitrile-butadiene-styrene
  • thermoplastics which can be thermally loaded even higher, such as, for example, Polyetherimide (PI), polyphenylene sulfide (PPS), polyetherether ketone (PEEK) or liquid crystal polymer (LCP), for the purpose of functional and / or decorative surface refinement adhesive metallize.
  • PI Polyetherimide
  • PPS polyphenylene sulfide
  • PEEK polyetherether ketone
  • LCP liquid crystal polymer
  • pretreatment of plastic surfaces prior to their metallization can be subdivided into the process steps of conditioning, germination and activation.
  • the process step of conditioning is of decisive importance for adherent metallization.
  • the literature describes a whole range of different chemical and physical methods for surface pretreatment of plastic surfaces.
  • the chemical processes are often tailored to the nature of the plastic surface.
  • Essential in all these methods is the unlocking of the plastic substrate surface in order to generate the necessary primer for the metal layer to be deposited.
  • the chemical process is achieved by pickling or swelling and dissolution of certain components of the plastic, the formation of caverns open to the surface, due to the undercuts for provide the so-called "push button effect" and thus lead to an adherent metallization.
  • patent application DE 100 54 544 A1 discloses a process for the chemical metalation of surfaces, in particular surfaces of acrylonitrile-butadiene-styrene copolymers (ABS) and their mixtures (blends) with other polymers, by dissolving their surfaces in highly concentrated solutions of Cr (VI) ions are pickled in sulfuric acid. It belongs to the general understanding of the skilled worker that the aggressive attack of these pickles oxidizes the butadiene component from the ABS substrate matrix superficially and removes the oxidation products selectively from the surface, thus giving rise to a porous, cavernous substrate surface suitable for the subsequent Edelmetallbekeimung and chemical metallization ensures good adhesion due to the "push button effect".
  • ABS acrylonitrile-butadiene-styrene copolymers
  • V Cr
  • ABS acrylonitrile-butadiene-styrene
  • EP 0 146 724 B1 discloses, for the pretreatment of the surface of polyamide moldings prior to electroless plating, treatment in a mixture of halides of group IA or IIA elements of the periodic table with sulfates, nitrates or chlorides of groups I NA, HIB, IVA , IVB, VIA and VIIA or of non-noble metals of group VIIIA of the periodic table in a non-corrosive, organic swelling or solvent and a metal-organic Komplexvoritati of elements of group IB or VIIIA of the Periodic Table.
  • the object of the pretreatment of plastics and especially of polyamides prior to chemical metallization is also the subject of document DE 10 2005 051632 B4 with a method in which the plastic surfaces are treated with a halide-containing and / or nitrate-containing solution of Na, Mg, Al, Si, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Ca or Zn ions containing pickling solution, said solution containing a soluble fluoride in the form of a coordination compound of the general formula M1 (HF2) ,
  • HF2 general formula M1
  • a seeding, activation and subsequent electroless metallization of the surface without the above-described conditioning of the plastic surface although also forms a metal layer, but this is due to the low adhesion to the Substrate unusable for technical or decorative purposes.
  • Chromosulphuric acid is also a highly toxic, carcinogenic and fertility-damaging substance. The safe treatment of all surfaces to be metallized with chromosulfuric acid
  • microstructures mentioned arise in the laser irradiation of metals with high intensity and short pulse length ( ⁇ 100 ns) as a result of the photon-phonon interaction in a self-organizing process.
  • the exact surface topography can not be predicted or can not be predicted with reasonable effort before the laser irradiation.
  • the exact position of a survey or a valley can not currently or not predict at reasonable cost.
  • microstructures have the structural features described above. These structural features make it expedient for the person skilled in the art to make use of a description of the periodic self-organizing structures by means of-optionally medium-wavelength and amplitude.
  • microstructures In addition to the periodic repetition of specific surface topographies, all these microstructures share the characteristic that the mean wavelength of the microstructures is usually many times smaller than the dimensions commonly used for the interaction zone between laser radiation and material surface, so that it is clear to the person skilled in the art that the expression of the Microstructures can not influence by the choice of the beam diameter, but of course can limit to the irradiated area.
  • the nature of the microstructures is determined by the fluence present.
  • the self-organized laser-induced microstructures described are already being used in a number of applications. Thus, CLPs can be used to increase the absorption of electromagnetic radiation.
  • DE 10 2010 034 085 A1 describes a method for the production of embossing tools, which consist of a substrate, in the surface of which embossed structures are introduced for microstructure elements, such as holograms, nanostructures or the like.
  • the embossed structures are introduced into the surface of the substrate for the microstructure elements by means of ultrashort laser pulses of polarized electromagnetic waves or polarized electromagnetic radiation.
  • a method of surface structuring is used to produce embossing tools for microstructure elements.
  • US 2003/0135998 A1 discloses a method for producing an electrical connection element, characterized by the following method steps: a) providing a substrate made of a plastically deformable polymeric material, b) mechanical deformation of the substrate by an embossing tool, so that there substantially channel-like recesses are formed where tracks are to be formed, c) coating the substrate with an electrically conductive layer, d) plating the substrate until the recesses are filled, and e) removing conductor material until those locations of the substrate are free of a metal coating, which should have no conductive surface.
  • the channel-shaped depression describes the outer geometry of the later conductor track.
  • the invention has for its object to provide an economical and environmentally friendly way to particular selective and adherent metallization of a non-conductive workpiece surface. Furthermore, the object of the invention is to create a corresponding layer structure comprising a workpiece and a metal layer.
  • the first object is achieved by a method according to the features of claim 1.
  • the further embodiment of the invention can be found in the dependent claims.
  • the invention is based on the surprising finding that a firmly adhering metallization on non-conductive workpieces is also due to micromachined on the workpiece surface.
  • Roregalen which are free of undercuts, so without the so-called "push button effect” get done, can be achieved.
  • These undercut-free periodic microstructures can preferably be produced by an impression.
  • a method is provided for the at least partially adherent metallization of nonconductive workpieces, in which microstructures are introduced into the workpiece in the areas to be metallized by molding a microstructured tool, which are preferably free of undercuts and nevertheless lead to an increase in the adhesive strength.
  • microstructures required for adherent metallization are produced by molding microstructures of a tool.
  • the periodic microstructures refer to the surface to be metallized later. Accordingly, these are microstructured regions enclosed by metallization boundary lines.
  • the term "microstructures" does not define the absolute size of the metallized area but the properties within the metallized area.
  • the impression can be made by microstructuring both a forming and a forming tool. It is obvious to the person skilled in the art that such an impression of the microstructures can only produce structures which, according to the present invention, have substantially no undercuts.
  • the microstructure is generated in the tools by means of laser radiation.
  • Self-organizing laser-induced microstructures have proven to be particularly favorable microstructures in the tool.
  • Those skilled in the art are familiar with such structures as “Cone Like Protrusions” (CLP), “Spikes”, “Nanoripples” or “Nanospheres”.
  • CLPs are preferred according to the invention when a particularly high adhesive strength is required, nanoripples or nanospheres are preferred when decorative, so particularly smooth metal surfaces are sought.
  • the geometry of the CLPs is usually direction-independent, so that the wavelength of the structure is approximately constant in any two orthogonal spatial directions.
  • CLPs usually have a mean wavelength of about 5-30 ⁇ and a structural height ⁇ 100 ⁇ , in particular ⁇ 50 ⁇ on.
  • Nanoripples have an orientation that depends on the direction of polarization of the laser radiation, meaning that they are only meaningfully described in one spatial direction by one wavelength. This mean wavelength of nanoripples is ⁇ 5 ⁇ , typically ⁇ 1 ⁇ .
  • the amplitude of the nanoripples is usually ⁇ 5 ⁇ m, typically ⁇ 2 ⁇ m.
  • the nanospheres in turn result from irradiation with circularly polarized laser radiation and have a nearly spherical surface section with a diameter ⁇ 1 ⁇ m.
  • the microstructures (6) preferably have an average structure height (peak-to-valley) of less than 50 ⁇ m.
  • the ratio of the average structure height (peak-to-valley) of the microstructures (6) to the mean wavelength of the microstructures (6) is preferably more than 0.3, in particular more than 0.5, preferably more than 1.
  • the microstructured tool according to the invention preferably has a microstructured region, at least in a partial region of the surface which is intended for the molding of the workpiece. a region which has elevations or depressions as microstructures.
  • the entire surface of the microstructured tool, which is provided for the molding of the workpiece such a microstructured area.
  • this microstructured area only makes up at most 90%, more preferably at most 80%, of that surface of the microstructured tool which is intended for the impression of the workpiece.
  • a workpiece is then produced whose surface also has a microstructured (partial) region, but as a negative contour, i. Microstructural elevations in the tool surface are shaped as microstructural depressions in the workpiece surface and vice versa.
  • the preferred embodiments described below are defined such that the tool surface has depressions and corresponding elevations are formed in the workpiece surface.
  • a person skilled in the art will recognize that this preferred embodiment ments apply analogously to the reverse case, in which the tool surface has elevations, which are formed in the workpiece surface as depressions.
  • the microstructured (partial) region of the tool surface or the microstructured (partial) region of the molded workpiece surface has a main extension surface to which orthogonal recesses or elevations are arranged.
  • this main extension surface is essentially a planar plane. In another preferred embodiment, this main extension surface is curved, for example convex or concave.
  • the microstructures cause an increase in the surface area of the microstructured (partial) area of the tool surface or workpiece surface in comparison to the non-microstructured, i. essentially smooth surface.
  • this increase in surface area is at least 40% or at least 50%, more preferably at least 60% or at least 70%, even more preferably at least 80% or at least 100%, most preferably at least 150% or at least 200% and especially at least 250% or at least 300 %.
  • Methods for determining the surface are known to a person skilled in the art, for example by measuring the BET adsorption isotherm in accordance with DIN ISO 9277: 2003-05.
  • any non-conductive materials can be processed.
  • Particularly relevant to the metallization according to the present method are materials whose main component is a polymer or a polymer mixture. It is obvious to the person skilled in the art that the method according to the invention is not limited to certain plastics. Rather, in contrast to the prior art metallization processes, the process can process both thermoplastic and thermoset materials, which can be etchable or non-etchable.
  • the workpiece surface into which the microstructures according to the invention are introduced comprises a thermoplastic.
  • the thermoplastic is preferably selected from the group consisting of polyamide, polyester (eg, polylactate, polyethylene terephthalate, polybutylene terephthalate), polyurethane, polycarbonate, polyacrylonitrile, polymethyl methacrylate, polyolefin (eg polyethylene, polypropylene, polymethylphenyls, polybutene), polystyrene, Acrylonitrile butadiene styrene, polyvinyl chloride, polyetherimide, poly phenylene sulfide, polyether ether ketone, liquid crystal polymer and their copolymers and / or mixtures thereof.
  • the workpiece surface according to the invention into which the microstructures according to the invention are introduced, comprises acrylonitrile-butadiene-styrene (ABS), then the butadiene component is preferably still completely present since, according to the invention, the microstructures are not produced by etching the workpiece surface.
  • ABS acrylonitrile-butadiene-styrene
  • the workpiece surface into which the microstructures according to the invention are introduced comprises a duroplastic.
  • the thermoset is selected from the group consisting of aminoplasts, phenolic resins, polyurethanes, epoxy resins and crosslinked polyacrylates.
  • the method according to the invention allows the at least selective metallization of a non-conductive workpiece with locally different adhesive strengths, so that predetermined breaking points, etc. can be formed in this way.
  • the metal layer preferably has an adhesive strength according to ASTM D1876-08 of at least 3 N / cm, more preferably at least 5 N / cm, even more preferably at least 8 N / cm and in particular at least 11 N / cm.
  • microstructure is mapped multiple times by means of the tool on the workpiece surface of the same workpiece. Repeated use of the tool thus achieves a multiple imaging of the microstructures, which can be supplemented to a total metal structure during the subsequent metallization.
  • the effort for the production of the tool is reduced by only one tool has to be produced for matching microstructures.
  • several identical or different tools can be modularly added to a combination tool, so as to enable a flexible use and the possibility for reuse in other applications.
  • the workpiece surface is to be enriched either with catalytically active nuclei at least in the areas of later adherent metallization or provided with a thin conductive starting layer.
  • a thin conductive layer could be created by vaporization of metals or by chemical vapor deposition (CVD). More promising is the germination of the surface with, for example, palladium or silver, as in the Prior art is known, and a subsequent galvanic metallization, as is also known in the art.
  • a simple post-germination washing step can limit the enrichment of the catalytically active nuclei to the regions of the microstructures while efficiently and obviously removing them in non-microstructured regions.
  • the selective metallization according to the method of the invention could be used to produce MID (Molded Interconnect Devices) or to produce decorative metallic patterns.
  • the adherent metal layer is preferably applied to the workpiece surface in distinct patterns, in particular conductor tracks or decorative patterns.
  • the workpiece is thermally treated in the course of the process according to the invention.
  • the further object to provide a corresponding layer structure of a workpiece and a metal layer is inventively achieved in that the structuring is formed essentially by microstructures, which are introduced free of undercuts in the workpiece.
  • the invention is based on the knowledge, which is surprising for the person skilled in the art, that adherent metallization on non-conductive workpieces is possible in which the workpiece has microstructures in the metallized regions which are largely free from undercuts. With the method according to the invention, any non-conductive materials can be processed.
  • Particularly relevant to the metallization according to the present method are materials whose main component is a polymer, wherein the layer structure is not limited to certain plastics, but may include both thermoplastic and thermosetting constituents.
  • an injection molding tool made of tool steel 1.2343 is selectively structured with CLPs by means of picosecond laser radiation (laser power 12 W, wavelength 515 nm, scanning speed 50 mm / s, beam diameter in the alternating Effective zone 30 ⁇ ).
  • the structured tool is used to injection mold polyamide (PA) samples.
  • PA injection mold polyamide
  • the injection-molded samples are then immersed for one minute in a 50 ° C silver nitrate solution (10 g of silver nitrate dissolved in 800 ml of water). After washing with deionized water and drying the sample, the sample is thermally post-treated in a 120 ° C oven for 20 minutes. The sample is then metallized in an electroless plating bath.
  • the sample is galvanically post-amplified to a thickness of about 25 pm.
  • an adhesion strength of more than 10 N / cm is measured according to ASTM D1876-08.
  • an embossing stamp with the method mentioned in the first embodiment is selectively structured with CLP and molded onto a sample of PC + ABS blend. The sample is then steamed with gold. Due to the continuous conductive starting layer, this sample is metallized directly by electroplating. On the sample thus prepared, an adhesion strength of more than 15 N / cm is measured according to ASTM D1876-08.
  • a polybutylene terephthalate (PBT) workpiece structured according to the above procedure is etched for 10 minutes at 60 ° C. in an alkaline solution of 45 g sodium hydroxide and 45 g potassium permanganate in one liter of water to chemically functionalize the surface and thus for loading to prepare with palladium ions. Subsequently, the workpiece is washed with deionized water and incubated for 10 minutes in a solution of 200 mg of palladium chloride in 20 ml of water.
  • the surface is wetted directly with a solution of 1 g of the sodium salt of 9,10-anthraquinone-2,6-disulfonic acid in 10 ml of glycol and irradiated for 10 minutes with a commercial laboratory UV lamp. After washing with water, copper is deposited at the sites treated in a chemical metallization. An adhesion strength according to ASTM D1876-0B of greater than 12 N / cm is measured on the sample produced in this way.
  • FIGS. 4 to 12 show each in a schematic diagram in
  • FIG. 1 shows an example of the introduction of structures into a substrate according to the prior art
  • FIG. 2 shows the introduction of cavities into the substrate by means of an etching method according to the prior art
  • FIG. 3 shows a metal layer connected to the substrate by undercuts in the cavities in the prior art
  • 4 shows conical microstructures according to the invention without undercuts
  • 5 shows the introduction according to the invention of microstructures (depressions) into a tool surface of an embossing tool
  • FIG. 6 shows a negative contour introduced according to the invention into a workpiece surface by means of the embossing tool, relative to the microstructure shown in FIG. 5;
  • FIG. 7 shows the workpiece surface provided with metal nuclei according to the invention
  • FIG. 8 shows a workpiece surface provided with a metal layer according to the invention
  • 9 shows a scanning electron micrograph of a tool surface according to the invention, on which microstructures Cone Like Protrusions can be recognized;
  • FIG. 10 shows a scanning electron micrograph of a tool surface according to the invention, on which nanoripples can be recognized as microstructures;
  • FIG. 11 shows a scanning electron micrograph of a device according to the invention
  • Fig. 12 is a provided with microstructures workpiece.
  • FIGS. 1 to 3 the process sequence for introducing microstructures into a substrate by means of an etching process according to the prior art is shown in FIGS. 1 to 3.
  • certain constituents contained in the workpiece shown laterally in cross section
  • FIGS. 1 to 3 certain constituents contained in the workpiece are broken up by removing the workpiece surface and subsequently released chemically from the workpiece by means of the etching process.
  • Figure 4 shows a schematic representation of the different shape of the inventively produced microstructures and the metal layer applied thereto.
  • the microstructures have a tapered shape in the direction of the metal layer, as can be realized, for example, by conical or pyramidal shapes.
  • the invention is not limited to regular structures.
  • the microstructures can be introduced as a negative contour in such a way that the workpiece surface is removed only in the region of the microstructures to be produced.
  • the microstructures emerge from the surrounding workpiece surface. For this purpose, the workpiece surface recessed from the microstructures is removed over a large area.
  • microstructures 6 are introduced as substantially regular elevations and depressions in a first method step by means of a laser beam 5 into the tool surface 1.
  • the laser beam 5 carries material from the tool surface 1, resulting in depressions. Those areas of the tool surface 1 at which the laser beam 5 does not remove any material or less material remain as elevations relative to the depressions.
  • elevations and depressions are transferred to the workpiece surface 3 in a subsequent method step by partially transforming the workpiece surface 3 by means of the tool 2 designed as an embossing tool and the microstructures 6 as a negative contour 7 on the workpiece surface 3 within a surface enclosed by boundary lines and subsequently to be metallized be imaged.
  • This is followed by seeding of the negative contour 7 with metal nuclei 8, in particular palladium seeds, which adhere only in the region of the negative contour 7 and can be easily removed in the remaining regions.
  • the metal nuclei 8 penetrate into the workpiece surface 3, so that a flat or linear metal layer 9 is produced by a subsequent metallization starting from the metal nuclei 8.
  • FIGS. 9 to 11 different manifestations of the microstructures on the workpiece are illustrated by means of scanning electron micrographs of the tool surface.
  • FIG. 9 shows Cone Like Protrusions
  • FIG. 10 nanoripples shows nanospheres as microstructures according to the invention on the tool surface.
  • FIG. 11 shows nanospheres as microstructures according to the invention on the tool surface.
  • the workpiece 2 embodied as a printed circuit board is shown by way of example in a plan view, wherein a surface treatment of the tool surface 1 has taken place in the region of the printed conductors to be produced.
  • the microstructures 6 are to be seen as substantially regular elevations and depressions within a surface enclosed by boundary lines 10 and subsequently to be metallized, which have been introduced by molding the microstructured tool 2 shown in FIG.

Abstract

The invention relates to a method for the metallation of a workpiece surface. The workpiece surface is provided, in the regions to be metallized, with periodic microstructures (6) that are preferably transfered to the workpiece surface by forming or molding a tool (2) microstructured by means of laser radiation (5). Then at least the microstructured regions of the workpiece surface are metallized in an adhesive manner in order to produce the layer structure.

Description

Verfahren zur Metallisierung eines Werkstückes sowie ein Schichtaufbau  Method for metallizing a workpiece and a layer structure
aus einem Werkstück und einer Metallschicht Die Erfindung betrifft ein Verfahren zur zumindest abschnittsweisen und haftfesten Metallisierung eines nichtleitenden Werkstückes. Weiterhin betrifft die Erfindung einen Schichtaufbau umfassend ein Werkstück und eine mittels einer Strukturierung mit dieser verbundenen haftfesten Metallschicht. Seitdem es Anfang der Sechzigerjahre des letzten Jahrhunderts erstmals gelang, spritzgegossene Kunststoffteile aus ABS (Acrylnitril-Butadien-Styrol) haftfest nasschemisch zu metallisieren, hat es eine Fülle von Verfahrensentwicklungen gegeben, auch weitere technische Kunststoffe, wie z.B. Polyamide (PA), Polybutylenterephthalat (PBT) oder Polycarbonat (PC) mit Dauergebrauchstemperaturen bis ca. 150 °C und thermisch noch höher belastbare Hoch- leistungskunststoffe, wie z.B. Polyetherimid (PI), Polyphenylensulfid (PPS), Polyetherether- keton (PEEK) oder Liquid Crystal Polymer (LCP), zum Zwecke der funktionellen und/oder dekorativen Oberflächenveredelung haftfest zu metallisieren.  The invention relates to a method for the at least partial and adherent metallization of a non-conductive workpiece. Furthermore, the invention relates to a layer structure comprising a workpiece and an adherent metal layer connected thereto by means of structuring. Since the beginning of the sixties of the last century, for the first time, it has been possible to metallize injection-molded plastic parts made of ABS (acrylonitrile-butadiene-styrene) in an adherent wet-chemical manner, there have been a great number of process developments, including other engineering plastics, e.g. Polyamides (PA), polybutylene terephthalate (PBT) or polycarbonate (PC) with continuous use temperatures up to approx. 150 ° C and high-performance thermoplastics, which can be thermally loaded even higher, such as, for example, Polyetherimide (PI), polyphenylene sulfide (PPS), polyetherether ketone (PEEK) or liquid crystal polymer (LCP), for the purpose of functional and / or decorative surface refinement adhesive metallize.
Verallgemeinernd kann man die Vorbehandlung von Kunststoffoberflächen vor ihrer Metalli- sierung in die Prozessschritte Konditionierung, Bekeimung und Aktivierung unterteilen. In general, the pretreatment of plastic surfaces prior to their metallization can be subdivided into the process steps of conditioning, germination and activation.
Für eine haftfeste Metallisierung ist dabei insbesondere der Verfahrensschritt der Konditionierung von entscheidender Bedeutung. In der Fachliteratur werden eine ganze Reihe unterschiedlicher chemischer und physikalischer Methoden zur Oberflächenvorbehandlung von Kunststoffoberflächen beschrieben. Insbesondere die chemischen Verfahren sind oftmals auf die Natur der Kunststoffoberfläche abgestimmt. Wesentlich bei all diesen Methoden ist das Aufschließen der Kunststoff-Substratoberfläche, um den erforderlichen Haftgrund für die abzuscheidende Metallschicht zu generieren. Bei den chemischen Verfahren erreicht man durch Beizen oder Quellen und Herauslösen von bestimmten Bestandteilen des Kunststoffes die Bildung von zur Oberfläche offenen Kavernen, die aufgrund der Hinterschneidungen für den sogenannten "Druckknopfeffekt" sorgen und damit zu einer haftfesten Metallisierung führen. In particular, the process step of conditioning is of decisive importance for adherent metallization. The literature describes a whole range of different chemical and physical methods for surface pretreatment of plastic surfaces. In particular, the chemical processes are often tailored to the nature of the plastic surface. Essential in all these methods is the unlocking of the plastic substrate surface in order to generate the necessary primer for the metal layer to be deposited. In the chemical process is achieved by pickling or swelling and dissolution of certain components of the plastic, the formation of caverns open to the surface, due to the undercuts for provide the so-called "push button effect" and thus lead to an adherent metallization.
So offenbart die Patentanmeldung DE 100 54 544 A1 ein Verfahren zum chemischen Metal- lisieren von Oberflächen, insbesondere von Oberflächen aus Acrylnitril-Butadien-Styrol- Copolymerisaten (ABS) und deren Mischungen (Blends) mit anderen Polymeren, indem deren Oberflächen in hochkonzentrierten Lösungen von Cr(VI)-lonen in Schwefelsäure gebeizt werden. Es gehört zum allgemeinen Verständnis des Fachmannes, dass der aggressive Beizangriff dieser Lösungen die Butadien-Komponente aus der ABS-Substratmatrix oberflächlich oxida- tiv abbaut sowie die Oxidationsprodukte selektiv aus der Oberfläche herauslöst und so eine poröse, mit Kavernen behaftete Substratoberfläche entstehen lässt, die für die anschließende Edelmetallbekeimung und chemische Metallisierung für eine gute Haftfestigkeit infolge des "Druckknopfeffektes" sorgt. Zusätzlich führt die Beize der ABS-Oberfläche zu einer chemischen Funktionalisierung mit OH- und COOH-Gruppen. Größe, Position und relative Anordnung der Kavitäten zueinander sind somit nicht frei wählbar, sondern durch die spezifische Zusammensetzung des eingesetzten Acrylnitril-Butadien-Styrols (ABS) festgelegt. Die Patentschrift EP 0 146 724 B1 offenbart zur Vorbehandlung der Oberfläche von Formteilen aus Polyamid vor der stromlosen Metallisierung die Behandlung in einem Gemisch von Halogeniden der Elemente der Gruppe IA oder IIA des Periodensystems mit Sulfaten, Nitraten oder Chloriden der Gruppen I NA, H I B, IVA, IVB, VIA und VIIA oder von Nichtedelmetallen der Gruppe VIIIA des Periodensystems in einem nicht ätzenden, organischen Quell- oder Lö- sungsmittel und einer metallorganischen Komplexvorbindung von Elementen der Gruppe IB oder VIIIA des Periodensystems. For example, patent application DE 100 54 544 A1 discloses a process for the chemical metalation of surfaces, in particular surfaces of acrylonitrile-butadiene-styrene copolymers (ABS) and their mixtures (blends) with other polymers, by dissolving their surfaces in highly concentrated solutions of Cr (VI) ions are pickled in sulfuric acid. It belongs to the general understanding of the skilled worker that the aggressive attack of these pickles oxidizes the butadiene component from the ABS substrate matrix superficially and removes the oxidation products selectively from the surface, thus giving rise to a porous, cavernous substrate surface suitable for the subsequent Edelmetallbekeimung and chemical metallization ensures good adhesion due to the "push button effect". In addition, the stain of the ABS surface leads to a chemical functionalization with OH and COOH groups. Size, position and relative arrangement of the cavities to each other are therefore not arbitrary, but determined by the specific composition of the acrylonitrile-butadiene-styrene used (ABS). EP 0 146 724 B1 discloses, for the pretreatment of the surface of polyamide moldings prior to electroless plating, treatment in a mixture of halides of group IA or IIA elements of the periodic table with sulfates, nitrates or chlorides of groups I NA, HIB, IVA , IVB, VIA and VIIA or of non-noble metals of group VIIIA of the periodic table in a non-corrosive, organic swelling or solvent and a metal-organic Komplexvorbindung of elements of group IB or VIIIA of the Periodic Table.
Der Aufgabe der Vorbehandlung von Kunststoffen und speziell von Polyamiden vor der chemischen Metallisierung widmet sich auch die Schrift DE 10 2005 051632 B4 mit einem Ver- fahren, bei dem die Kunststoffoberflächen mit einer Halogenid enthaltenden und/oder nitrat- haltigen Lösung von Na, Mg, AI, Si, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Ca oder Zn-Ionen enthaltenden Beizlösung behandelt wird, wobei diese Lösung ein lösliches Fluorid in Form einer Koordinationsverbindung der allgemeinen Formel M1 (HF2) enthält. Bei einer Bekeimung, Aktivierung und anschließenden außenstromlosen Metallisierung der Oberfläche ohne die zuvor beschriebene Konditionierung der Kunststoffoberfläche bildet sich zwar ebenfalls eine Metallschicht aus, diese ist allerdings aufgrund der geringen Haftung am Substrat für technische bzw. dekorative Zwecke unbrauchbar. Zudem ist Chromschwefelsäure ein hochgiftiger, karzinogener und fruchtbarkeitsschädigender Stoff. Die sichere Behandlung aller zu metallisierenden Oberflächen mit Chromschwefelsäure ist daher mit erheblichen ökonomischen und ökologischen Kosten verbunden. The object of the pretreatment of plastics and especially of polyamides prior to chemical metallization is also the subject of document DE 10 2005 051632 B4 with a method in which the plastic surfaces are treated with a halide-containing and / or nitrate-containing solution of Na, Mg, Al, Si, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Ca or Zn ions containing pickling solution, said solution containing a soluble fluoride in the form of a coordination compound of the general formula M1 (HF2) , In a seeding, activation and subsequent electroless metallization of the surface without the above-described conditioning of the plastic surface, although also forms a metal layer, but this is due to the low adhesion to the Substrate unusable for technical or decorative purposes. Chromosulphuric acid is also a highly toxic, carcinogenic and fertility-damaging substance. The safe treatment of all surfaces to be metallized with chromosulfuric acid is therefore associated with considerable economic and environmental costs.
Durch den Stand der Technik ist bekannt, dass durch Bestrahlung von vorzugsweise Metallen mit sehr kurzer, intensiver Laserstrahlung, wie sie beispielsweise durch moderne Ultrakurzpulslaser zur Verfügung steht, selbstorganisierende periodische Strukturen auf der Oberfläche hergestellt werden können. In der Literatur sind drei Arten von laserinduzierten und selbstorganisierenden Strukturen bekannt: "Cone-like structures" oder auch "Spikes" (Fig. 9), "Laser induced periodic surface structures" (Fig. 10) und nicht näher bezeichnete Nanosphä- ren, die entstehen, wenn die Oberfläche mittels zirkulär polarisierter Laserstrahlung bestrahlt wird (Fig. 11). Die genannten Mikrostrukturen entstehen bei der Laserbestrahlung von Metallen mit hoher Intensität und kurzer Pulslänge (< 100 ns) infolge der Photon- Phonon- Wechselwirkung in einem sich selbst organisierenden Prozess. Vor der Laserbestrahlung lässt sich nach derzeitigem Kenntnisstand die exakte Oberflächentopographie nicht oder nicht mit vertretbarem Aufwand vorhersagen. Insbesondere lässt sich die exakte Position einer Erhebung bzw. eines Tales derzeit nicht bzw. nicht mit vertretbarem Aufwand vorhersagen. It is known from the prior art that self-organizing periodic structures can be produced on the surface by irradiation of preferably metals with very short, intensive laser radiation, as is available, for example, by modern ultrashort pulse lasers. Three types of laser-induced and self-organizing structures are known in the literature: "cone-like structures" or "spikes" (FIG. 9), "laser induced periodic surface structures" (FIG. 10) and unspecified nanospheres, which arise when the surface is irradiated by means of circularly polarized laser radiation (FIG. 11). The microstructures mentioned arise in the laser irradiation of metals with high intensity and short pulse length (<100 ns) as a result of the photon-phonon interaction in a self-organizing process. According to the current state of knowledge, the exact surface topography can not be predicted or can not be predicted with reasonable effort before the laser irradiation. In particular, the exact position of a survey or a valley can not currently or not predict at reasonable cost.
Dennoch weisen die Mikrostrukturen die zuvor beschriebenen Strukturmerkmale auf. Diese Strukturmerkmale lassen den Fachmann sinnvollerweise auf eine Beschreibung der periodischen selbstorganisierenden Strukturen mittels - gegebenenfalls mittlerer - Wellenlänge und Amplitude zurückgreifen. Nevertheless, the microstructures have the structural features described above. These structural features make it expedient for the person skilled in the art to make use of a description of the periodic self-organizing structures by means of-optionally medium-wavelength and amplitude.
Neben der periodischen Wiederholung spezifischer Oberflächentopographien teilen alle genannten Mikrostrukturen die Eigenschaft, dass die mittlere Wellenlänge der Mikrostrukturen üblicherweise um ein Vielfaches kleiner ist als die üblicherweise genutzten Dimensionen der Wechselwirkungszone zwischen Laserstrahlung und Materialoberfläche, sodass dem Fach- mann klar ist, dass man die Ausprägung der Mikrostrukturen nicht durch die Wahl des Strahldurchmessers beeinflussen, aber selbstverständlich auf den bestrahlten Bereich begrenzen kann. Die Ausprägung der Mikrostrukturen wird vielmehr durch die vorliegenden Fluenz bestimmt. Die beschriebenen selbstorganisierten laserinduzierten Mikrostrukturen werden bereits in einer Reihe von Anwendung eingesetzt. So können CLPs genutzt werden, um die Absorption elektromagnetischer Strahlung zu erhöhen. Des Weiteren ist bekannt, dass das entspre- chende Negativ der selbstorganisierten laserinduzierten Mikrostrukturen durch Abformung auf eine Kunststoffoberfläche übertragen werden kann, um z.B. Licht aus einem Lichtwellenleiter zu koppeln oder um als Sicherheitsmerkmal genutzt zu werden. So beschreibt die DE 10 2010 034 085 A1 ein Verfahren zur Herstellung von Prägewerkzeugen, die aus einem Substrat bestehen, in dessen Oberfläche Prägestrukturen für Mikrostruk- turelemente, wie Hologramme, Nanostrukturen oder dergleichen, eingebracht werden. Die Prägestrukturen werden für die Mikrostrukturelemente in die Oberfläche des Substrates mittels ultrakurzer Laserpulse aus polarisierten elektromagnetischen Wellen bzw. polarisierter elektromagnetischer Strahlung eingebracht. Es wird somit ein Verfahren der Oberflächen- strukturierung benutzt, um Prägewerkzeuge für Mikrostrukturelemente herzustellen. Damit kann die Originalstruktur direkt auf die Oberfläche eines Prägewerkzeuges übertragen und davon Folienabzüge angefertigt werden. Die US 2003/0135998 A1 offenbart hingegen ein Verfahren zur Herstellung eines elektrischen Verbindungselementes, gekennzeichnet durch die folgenden Verfahrensschritte: a) zur Verfügung Stellen eines Substrates aus einem plastisch verformbaren polymeren Werkstoff, b) mechanisches Verformen des Substrates durch ein Prägewerkzeug, sodass dort im Wesentlichen kanalförmige Vertiefungen entstehen, wo Leiterbahnen entstehen sollen, c) Beschichtung des Substrates mit einer elektrisch leitfähigen Schicht, d) Galvanisieren des Substrates, bis die Vertiefungen aufgefüllt sind, und e) Abtragen von Leitermaterial, bis diejenigen Stellen des Substrates frei von einer Metallbeschichtung sind, die keine leitende Oberfläche aufweisen sollen. Die kanalförmige Vertiefung beschreibt die äußere Geometrie der späteren Leiterbahn. In addition to the periodic repetition of specific surface topographies, all these microstructures share the characteristic that the mean wavelength of the microstructures is usually many times smaller than the dimensions commonly used for the interaction zone between laser radiation and material surface, so that it is clear to the person skilled in the art that the expression of the Microstructures can not influence by the choice of the beam diameter, but of course can limit to the irradiated area. The nature of the microstructures is determined by the fluence present. The self-organized laser-induced microstructures described are already being used in a number of applications. Thus, CLPs can be used to increase the absorption of electromagnetic radiation. Furthermore, it is known that the corresponding ing negative of the self-organized laser-induced microstructures can be transferred by molding on a plastic surface, for example, to couple light from an optical waveguide or to be used as a security feature. Thus, DE 10 2010 034 085 A1 describes a method for the production of embossing tools, which consist of a substrate, in the surface of which embossed structures are introduced for microstructure elements, such as holograms, nanostructures or the like. The embossed structures are introduced into the surface of the substrate for the microstructure elements by means of ultrashort laser pulses of polarized electromagnetic waves or polarized electromagnetic radiation. Thus, a method of surface structuring is used to produce embossing tools for microstructure elements. Thus, the original structure can be transferred directly to the surface of a stamping tool and made of it slide prints. In contrast, US 2003/0135998 A1 discloses a method for producing an electrical connection element, characterized by the following method steps: a) providing a substrate made of a plastically deformable polymeric material, b) mechanical deformation of the substrate by an embossing tool, so that there substantially channel-like recesses are formed where tracks are to be formed, c) coating the substrate with an electrically conductive layer, d) plating the substrate until the recesses are filled, and e) removing conductor material until those locations of the substrate are free of a metal coating, which should have no conductive surface. The channel-shaped depression describes the outer geometry of the later conductor track.
Der Erfindung liegt die Aufgabe zugrunde, eine wirtschaftliche und umweltschonende Möglichkeit zur insbesondere selektiven und haftfesten Metallisierung einer nichtleitenden Werkstückoberfläche zu schaffen. Weiterhin liegt der Erfindung die Aufgabe zugrunde, einen dementsprechenden Schichtaufbau aus einem Werkstück und einer Metallschicht zu schaf- fen. The invention has for its object to provide an economical and environmentally friendly way to particular selective and adherent metallization of a non-conductive workpiece surface. Furthermore, the object of the invention is to create a corresponding layer structure comprising a workpiece and a metal layer.
Die erstgenannte Aufgabe wird erfindungsgemäß mit einem Verfahren gemäß den Merkmalen des Anspruches 1 gelöst, Die weitere Ausgestaltung der Erfindung ist den Unteransprüchen zu entnehmen. The first object is achieved by a method according to the features of claim 1. The further embodiment of the invention can be found in the dependent claims.
Die Erfindung beruht auf der überraschenden Erkenntnis, dass eine haftfeste Metallisierung auf nichtleitenden Werkstücken auch durch auf der Werkstückoberfläche eingebrachte Mik- rostrukturen, die frei von Hinterschneidungen sind, also ohne den sogenannten "Druckknopfeffekt" auskommen, erreicht werden kann. Diese hinterschneidungsfreien periodischen Mikrostrukturen lassen sich vorzugsweise durch eine Abformung herstellen. Erfindungsgemäß ist also ein Verfahren zur zumindest abschnittsweisen, haftfesten Metallisierung von nichtleitenden Werkstücken vorgesehen, bei dem in das Werkstück in den zu metallisierenden Bereichen Mikrostrukturen durch Abformung eines mikrostrukturierten Werkzeuges eingebracht werden, die vorzugsweise frei von Hinterschneidungen sind und dennoch zu einer Steigerung der Haftfestigkeit führen. Dabei werden die zur haftfesten Me- tallisierung erforderlichen Mikrostrukturen durch eine Abformung von Mikrostrukturen eines Werkzeuges erzeugt. Wesentlich für das Verständnis der Erfindung ist, dass sich die periodischen Mikrostrukturen auf die später zu metallisierende Fläche beziehen. Demnach handelt es sich um solche von Begrenzungslinien der Metallisierung eingeschlossene mikrostrukturierte Bereiche. Somit definiert der Begriff "Mikrostrukturen" nicht die absolute Größe der metallisierten Fläche, sondern die Eigenschaften innerhalb der metallisierten Fläche. The invention is based on the surprising finding that a firmly adhering metallization on non-conductive workpieces is also due to micromachined on the workpiece surface. Rostrukturen, which are free of undercuts, so without the so-called "push button effect" get done, can be achieved. These undercut-free periodic microstructures can preferably be produced by an impression. According to the invention, therefore, a method is provided for the at least partially adherent metallization of nonconductive workpieces, in which microstructures are introduced into the workpiece in the areas to be metallized by molding a microstructured tool, which are preferably free of undercuts and nevertheless lead to an increase in the adhesive strength. In this case, the microstructures required for adherent metallization are produced by molding microstructures of a tool. Essential for the understanding of the invention is that the periodic microstructures refer to the surface to be metallized later. Accordingly, these are microstructured regions enclosed by metallization boundary lines. Thus, the term "microstructures" does not define the absolute size of the metallized area but the properties within the metallized area.
Die Abformung kann durch eine Mikrostrukturierung sowohl eines urformenden als auch eines umformenden Werkzeuges geschehen. Für den Fachmann ist es offensichtlich, dass durch eine solche Abformung der Mikrostrukturen nur Strukturen erzeugt werden können, die, der vorliegenden Erfindung entsprechend, im Wesentlichen keine Hinterschneidungen aufweisen. The impression can be made by microstructuring both a forming and a forming tool. It is obvious to the person skilled in the art that such an impression of the microstructures can only produce structures which, according to the present invention, have substantially no undercuts.
Vorzugsweise wird die Mikrostruktur in den Werkzeugen mittels Laserstrahlung erzeugt. Als besonders günstige Mikrostrukturen im Werkzeug haben sich selbstorganisierende laserin- duzierte Mikrostrukturen erwiesen. Dem Fachmann sind solche Strukturen bekannt unter den Bezeichnungen "Cone Like Protrusions" (CLP), "Spikes", "Nanoripples" oder "Nanosphären". Preferably, the microstructure is generated in the tools by means of laser radiation. Self-organizing laser-induced microstructures have proven to be particularly favorable microstructures in the tool. Those skilled in the art are familiar with such structures as "Cone Like Protrusions" (CLP), "Spikes", "Nanoripples" or "Nanospheres".
CLPs sind erfindungsgemäß bevorzugt, wenn eine besonders große Haftfestigkeit erforderlich ist, Nanoripples oder Nanosphären sind bevorzugt, wenn dekorative, also besonders glatte Metalloberflächen angestrebt werden. CLPs are preferred according to the invention when a particularly high adhesive strength is required, nanoripples or nanospheres are preferred when decorative, so particularly smooth metal surfaces are sought.
Die Geometrie der CLPs ist üblicherweise richtungsunabhängig, sodass die Wellenlänge der Struktur in zwei beliebige orthogonal zueinander angeordnete Raumrichtungen näherungsweise konstant ist. CLPs weisen üblicherweise eine mittlere Wellenlänge von ca. 5-30 μηι und eine Strukturhöhe < 100 μηι, insbesondere < 50 μηι auf. Nanoripples haben eine von der Polarisationsrichtung der Laserstrahlung abhängige Ausrichtung, sodass sie nur in einer Raumrichtung sinnvoll durch eine Wellenlänge beschrieben werden. Diese mittlere Wellenlänge von Nanoripples beträgt < 5 μηι, typischerweise < 1 μηι. Die Amplitude der Nanoripples beträgt üblicherweise < 5 Mm, typischerweise < 2 Mm. The geometry of the CLPs is usually direction-independent, so that the wavelength of the structure is approximately constant in any two orthogonal spatial directions. CLPs usually have a mean wavelength of about 5-30 μηι and a structural height <100 μηι, in particular <50 μηι on. Nanoripples have an orientation that depends on the direction of polarization of the laser radiation, meaning that they are only meaningfully described in one spatial direction by one wavelength. This mean wavelength of nanoripples is <5 μηι, typically <1 μηι. The amplitude of the nanoripples is usually <5 μm, typically <2 μm.
Die Nanosphären entstehen wiederum bei einer Bestrahlung mit zirkularpolarisierter Laserstrahlung und haben einen nahezu sphärischen Oberflächenabschnitt mit einem Durchmesser < 1 μητι. Bevorzugt weisen die Mikrostrukturen (6) des Werkstückes in Richtung des Werkstückes einen monoton steigenden, insbesondere einen streng monoton steigenden Querschnitt auf. The nanospheres in turn result from irradiation with circularly polarized laser radiation and have a nearly spherical surface section with a diameter <1 μm. Preferably, the microstructures (6) of the workpiece in the direction of the workpiece on a monotonically increasing, in particular a strictly monotonically increasing cross-section.
Bevorzugt weisen die Mikrostrukturen (6) eine mittlere Strukturhöhe (Peak-to-Valley) von kleiner 50 Mm auf. Bevorzugt beträgt das Verhältnis der mittleren Strukturhöhe [Peak-to- Valley) der Mikrostrukturen (6) zur mittleren Wellenlänge der Mikrostrukturen (6) mehr als 0,3, insbesondere mehr als 0,5, bevorzugt mehr als 1. The microstructures (6) preferably have an average structure height (peak-to-valley) of less than 50 μm. The ratio of the average structure height (peak-to-valley) of the microstructures (6) to the mean wavelength of the microstructures (6) is preferably more than 0.3, in particular more than 0.5, preferably more than 1.
Das mikrostrukturierte Werkzeug weist erfindungsgemäß bevorzugt wenigstens in einem Teilbereich der Oberfläche, welche zur Abformung des Werkstückes vorgesehen ist, einen mikrostrukturierten Bereich auf, d.h. einen Bereich, welcher Erhebungen bzw. Vertiefungen als Mikrostrukturen aufweist. In einer bevorzugten Ausführungsform weist die gesamte Oberfläche des mikrostrukturierten Werkzeuges, welche zur Abformung des Werkstückes vorgesehen ist, einen solchen mikrostrukturierten Bereich auf. In einer anderen bevorzugten Ausführungsform macht dieser mikrostrukturierte Bereich lediglich höchstens 90%, bevorzugter höchstens 80 % derjenigen Oberfläche des mikrostrukturiertes Werkzeuges aus, welche zur Abformung des Werkstückes vorgesehen ist. The microstructured tool according to the invention preferably has a microstructured region, at least in a partial region of the surface which is intended for the molding of the workpiece. a region which has elevations or depressions as microstructures. In a preferred embodiment, the entire surface of the microstructured tool, which is provided for the molding of the workpiece, such a microstructured area. In another preferred embodiment, this microstructured area only makes up at most 90%, more preferably at most 80%, of that surface of the microstructured tool which is intended for the impression of the workpiece.
Durch Abformung des Werkstückes mittels dieses mikrostrukturierten Werkzeuges wird dann ein Werkstück erzeugt, dessen Oberfläche ebenfalls einen mikrostrukturierten (Teil-) Bereich aufweist, allerdings als Negativkontur, d.h. mikrostrukturelle Erhebungen in der Werkzeugoberfläche sind als mikrostrukturelle Vertiefungen in der Werkstückoberfläche abgeformt und umgekehrt. By molding the workpiece by means of this microstructured tool, a workpiece is then produced whose surface also has a microstructured (partial) region, but as a negative contour, i. Microstructural elevations in the tool surface are shaped as microstructural depressions in the workpiece surface and vice versa.
Die nachfolgend beschriebenen bevorzugten Ausführungsformen sind so definiert, dass die Werkzeugoberfläche Vertiefungen aufweist und in der Werkstückoberfläche entsprechend Erhöhungen abgeformt werden. Da die Auffassung einer Mikrostruktur als Vertiefung oder Erhöhung letztlich willkürlich ist, erkennt ein Fachmann, dass diese bevorzugten Ausfüh- rungsformen analog auch für den umgekehrten Fall gelten, bei dem die Werkzeugoberfläche Erhöhungen aufweist, welche in der Werkstückoberfläche als Vertiefungen abgeformt werden. Bevorzugt weist der mikrostrukturierte (Teil-)Bereich der Werkzeugoberfläche bzw. der mikrostrukturierte (Teil-) Bereich der abgeformten Werkstückoberfläche eine Haupter- streckungsfläche auf, zu der orthogonal Vertiefungen bzw. Erhebungen angeordnet sind. The preferred embodiments described below are defined such that the tool surface has depressions and corresponding elevations are formed in the workpiece surface. As the view of a microstructure as a deepening or an increase is ultimately arbitrary, a person skilled in the art will recognize that this preferred embodiment ments apply analogously to the reverse case, in which the tool surface has elevations, which are formed in the workpiece surface as depressions. Preferably, the microstructured (partial) region of the tool surface or the microstructured (partial) region of the molded workpiece surface has a main extension surface to which orthogonal recesses or elevations are arranged.
In einer bevorzugten Ausführungsform ist diese Haupterstreckungsfläche im Wesentlichen eine planare Ebene. In einer anderen bevorzugten Ausführungsform ist diese Haupterstreckungsfläche gewölbt, beispielsweise konvex oder konkav. In a preferred embodiment, this main extension surface is essentially a planar plane. In another preferred embodiment, this main extension surface is curved, for example convex or concave.
Bevorzugt bewirken die Mikrostrukturen eine Zunahme der Oberfläche des mikrostrukturierten (Teil-) Bereiches der Werkzeugoberfläche bzw. Werkstückoberfläche im Vergleich zur nicht mikrostrukturierten, d.h. im Wesentlichen glatten Oberfläche. Bevorzugt beträgt diese Zunahme der Oberfläche mindestens 40 % oder mindestens 50 %, bevorzugter mindestens 60 % oder mindestens 70 %, noch bevorzugter mindestens 80 % oder mindestens 100 %, am bevorzugtesten mindestens 150 % oder mindestens 200 % und insbesondere mindestens 250 % oder mindestens 300 %. Methoden zur Bestimmung der Oberfläche sind einem Fachmann bekannt, beispielsweise durch Messung der BET Adsorptionsisotherme gemäß DIN ISO 9277:2003-05. Preferably, the microstructures cause an increase in the surface area of the microstructured (partial) area of the tool surface or workpiece surface in comparison to the non-microstructured, i. essentially smooth surface. Preferably, this increase in surface area is at least 40% or at least 50%, more preferably at least 60% or at least 70%, even more preferably at least 80% or at least 100%, most preferably at least 150% or at least 200% and especially at least 250% or at least 300 %. Methods for determining the surface are known to a person skilled in the art, for example by measuring the BET adsorption isotherm in accordance with DIN ISO 9277: 2003-05.
Mit dem erfindungsgemäßen Verfahren können beliebige nichtleitende Werkstoffe verarbeitet werden. Besonders relevant für die Metallisierung nach dem vorliegenden Verfahren sind Werkstoffe, deren Hauptbestandteil ein Polymer oder eine Polymermischung ist. Hierbei ist für den Fachmann offensichtlich, dass das erfindungsgemäße Verfahren nicht auf bestimmte Kunststoffe eingeschränkt ist. Vielmehr können, im Gegensatz zu den Metallisierungsverfahren aus dem Stand der Technik, mit dem Verfahren sowohl thermoplastische als auch duroplastische Werkstoffe verarbeitet werden, welche ätzbar oder nicht ätzbar sein können. With the method according to the invention, any non-conductive materials can be processed. Particularly relevant to the metallization according to the present method are materials whose main component is a polymer or a polymer mixture. It is obvious to the person skilled in the art that the method according to the invention is not limited to certain plastics. Rather, in contrast to the prior art metallization processes, the process can process both thermoplastic and thermoset materials, which can be etchable or non-etchable.
In einer bevorzugten Ausführungsform umfasst die Werkstückoberfläche, in welche die erfindungsgemäßen Mikrostrukturen eingebracht werden, ein Thermoplast. Bevorzugt ist der Thermoplast ausgewählt aus der Gruppe bestehend aus Polyamid, Polyester (z.B. Po- lylactat, Polyethylenterephthalat, Polybutylenterephthalat), Polyurethan, Polycarbonat, Poly- acrylnitril, Polymethylmethacrylat, Polyolefin (z.B. Polyethylen, Polypropylen, Polymethylpen- ten, Polybuten), Polystyrol, Acrylnitril-Butadien-Styrol, Polyvinylchlorid, Polyetherimid, Poly- phenylensulfid, Polyetheretherketon, Liquid Crystal Polymer sowie deren Copolymerisate und/oder deren Mischungen. In a preferred embodiment, the workpiece surface into which the microstructures according to the invention are introduced comprises a thermoplastic. The thermoplastic is preferably selected from the group consisting of polyamide, polyester (eg, polylactate, polyethylene terephthalate, polybutylene terephthalate), polyurethane, polycarbonate, polyacrylonitrile, polymethyl methacrylate, polyolefin (eg polyethylene, polypropylene, polymethylphenyls, polybutene), polystyrene, Acrylonitrile butadiene styrene, polyvinyl chloride, polyetherimide, poly phenylene sulfide, polyether ether ketone, liquid crystal polymer and their copolymers and / or mixtures thereof.
Umfasst die erfindungsgemäße Werkstückoberfläche, in welche die erfindungsgemäßen Mikrostrukturen eingebracht werden, Acrylnitril-Butadien-Styrol (ABS), so ist die Butadien- Komponente vorzugsweise noch vollständig vorhanden, da die Mikrostrukturen erfindungsgemäß nicht durch Ätzen der Werkstückoberfläche erzeugt werden. If the workpiece surface according to the invention, into which the microstructures according to the invention are introduced, comprises acrylonitrile-butadiene-styrene (ABS), then the butadiene component is preferably still completely present since, according to the invention, the microstructures are not produced by etching the workpiece surface.
In einer anderen bevorzugten Ausführungsform umfasst die Werkstückoberfläche, in welche die erfindungsgemäßen Mikrostrukturen eingebracht werden, ein Duroplast. Bevorzugt ist der Duroplast ausgewählt aus der Gruppe bestehend aus Aminoplasten, Phenoplasten, Polyurethane, Epoxidharzen und vernetzten Polyacrylaten. In another preferred embodiment, the workpiece surface into which the microstructures according to the invention are introduced comprises a duroplastic. Preferably, the thermoset is selected from the group consisting of aminoplasts, phenolic resins, polyurethanes, epoxy resins and crosslinked polyacrylates.
Ebenso erlaubt das erfindungsgemäße Verfahren die zumindest selektive Metallisierung ei- nes nichtleitenden Werkstückes mit lokal unterschiedlichen Haftfestigkeiten, sodass auf diese Weise Sollbruchstellen etc. ausgebildet werden können. Likewise, the method according to the invention allows the at least selective metallization of a non-conductive workpiece with locally different adhesive strengths, so that predetermined breaking points, etc. can be formed in this way.
Bevorzugt weist die Metallschicht eine Haftfestigkeit nach ASTM D1876-08 von mindestens 3 N/cm, bevorzugter mindestens 5 N/cm, noch bevorzugter mindestens 8 N/cm und insbe- sondere mindestens 11 N/cm auf. The metal layer preferably has an adhesive strength according to ASTM D1876-08 of at least 3 N / cm, more preferably at least 5 N / cm, even more preferably at least 8 N / cm and in particular at least 11 N / cm.
Dabei ist besonders Erfolg versprechend, wenn die Mikrostruktur mittels des Werkzeuges mehrfach auf die Werkstückoberfläche desselben Werkstückes abgebildet wird. Durch wiederholten Einsatz des Werkzeuges wird so eine mehrfache Abbildung der Mikrostrukturen erreicht, die bei der späteren Metallisierung zu einer Gesamtmetallstruktur ergänzt werden können. Der Aufwand für die Herstellung des Werkzeuges wird dadurch reduziert, indem für übereinstimmende Mikrostrukturen nur ein einziges Werkzeug hergestellt werden muss. Darüber hinaus können auch mehrere gleiche oder unterschiedliche Werkzeuge modular zu einem Kombinationswerkzeug ergänzt werden, um so einen flexiblen Einsatz und die Mög- lichkeit zur Wiederverwendung bei anderen Anwendungszwecken zu ermöglichen. It is particularly promising, if the microstructure is mapped multiple times by means of the tool on the workpiece surface of the same workpiece. Repeated use of the tool thus achieves a multiple imaging of the microstructures, which can be supplemented to a total metal structure during the subsequent metallization. The effort for the production of the tool is reduced by only one tool has to be produced for matching microstructures. In addition, several identical or different tools can be modularly added to a combination tool, so as to enable a flexible use and the possibility for reuse in other applications.
Für die galvanische oder außenstromlose Metallisierung in einer an sich bekannten Weise ist die Werkstückoberfläche zumindest in den Bereichen der späteren haftfesten Metallisierung entweder mit katalytisch wirksamen Keimen anzureichern oder mit einer dünnen leitfähigen Startschicht zu versehen. Eine dünne leitfähige Schicht könnte z.B. durch ein Verdampfen von Metallen oder über das "Chemical Vapor Deposition" (CVD) erzeugt werden. Vielversprechender ist die Bekeimung der Oberfläche mit z.B. Palladium oder Silber, wie sie im Stand der Technik bekannt ist, und eine anschließende galvanische Metallisierung, wie sie ebenfalls im Stand der Technik bekannt ist. For the galvanic or external electroless metallization in a manner known per se, the workpiece surface is to be enriched either with catalytically active nuclei at least in the areas of later adherent metallization or provided with a thin conductive starting layer. For example, a thin conductive layer could be created by vaporization of metals or by chemical vapor deposition (CVD). More promising is the germination of the surface with, for example, palladium or silver, as in the Prior art is known, and a subsequent galvanic metallization, as is also known in the art.
Hierbei hat sich für den Fachmann überraschend gezeigt, dass eine nicht nur haftfeste son- dem auch verblüffend einfache selektive Metallisierung mit hoher Auflösung und ohne Fremdabscheidungen auf nicht gewünschten Bereichen erreicht werden kann. In this case, it has surprisingly been apparent to the person skilled in the art that a not only adherent but also surprisingly simple selective metallization can be achieved with high resolution and without foreign deposits on undesired areas.
Durch einen einfachen Waschschritt nach der Bekeimung kann die Anreicherung der kataly- tisch wirksamen Keime auf die Bereiche der Mikrostrukturen beschränkt werden, während sie in nicht mikrostrukturierten Bereichen effizient und offensichtlich sehr wirkungsvoll entfernt werden. Die selektive Metallisierung nach dem erfindungsgemäßen Verfahren könnte eingesetzt werden, um MID (Molded interconnect devices) herzustellen oder dekorative metallische Muster zu erzeugen. Bevorzugt wird die haftfeste Metallschicht in distinkten Mustern, insbesondere Leiterbahnen oder dekorativen Mustern, auf die Werkstückoberfläche aufgebracht. A simple post-germination washing step can limit the enrichment of the catalytically active nuclei to the regions of the microstructures while efficiently and obviously removing them in non-microstructured regions. The selective metallization according to the method of the invention could be used to produce MID (Molded Interconnect Devices) or to produce decorative metallic patterns. The adherent metal layer is preferably applied to the workpiece surface in distinct patterns, in particular conductor tracks or decorative patterns.
Bevorzugt wird das Werkstück im Laufe des erfindungsgemäßen Verfahrens thermisch behandelt. Die weitere Aufgabe, einen dementsprechenden Schichtaufbau aus einem Werkstück und einer Metallschicht zu schaffen, wird erfindungsgemäß dadurch gelöst, dass die Strukturierung im Wesentlichen durch Mikrostrukturen gebildet ist, die frei von Hinterschneidungen in dem Werkstück eingebracht sind. Dabei liegt der Erfindung die für den Fachmann überraschende Erkenntnis zugrunde, dass eine haftfeste Metallisierung auf nichtleitenden Werkstü- cken möglich ist, bei der das Werkstück in den metallisierten Bereichen Mikrostrukturen aufweist, die weitestgehend frei von Hinterschneidungen sind. Mit dem erfindungsgemäßen Verfahren können beliebige nichtleitende Werkstoffe verarbeitet werden. Preferably, the workpiece is thermally treated in the course of the process according to the invention. The further object to provide a corresponding layer structure of a workpiece and a metal layer is inventively achieved in that the structuring is formed essentially by microstructures, which are introduced free of undercuts in the workpiece. In this case, the invention is based on the knowledge, which is surprising for the person skilled in the art, that adherent metallization on non-conductive workpieces is possible in which the workpiece has microstructures in the metallized regions which are largely free from undercuts. With the method according to the invention, any non-conductive materials can be processed.
Besonders relevant für die Metallisierung nach dem vorliegenden Verfahren sind Werkstoffe, deren Hauptbestandteil ein Polymer ist, wobei der Schichtaufbau nicht auf bestimmte Kunststoffe beschränkt ist, sondern sowohl thermoplastische als auch duroplastische Bestandteile umfassen kann. Particularly relevant to the metallization according to the present method are materials whose main component is a polymer, wherein the layer structure is not limited to certain plastics, but may include both thermoplastic and thermosetting constituents.
Ausführungsbeispiel 1 Embodiment 1
In einem ersten Ausführungsbeispiel wird ein Spritzgusswerkzeug aus dem Werkzeugstahl 1.2343 mittels Pikosekundenlaserstrahlung selektiv mit CLPs strukturiert (Laserleistung 12 W, Wellenlänge 515 nm, Scangeschwindigkeit 50 mm/s, Strahldurchmesser in der Wechsel- Wirkungszone 30 μιη). Mit dem strukturierten Werkzeug werden Proben aus Polyamid (PA) spritzgegossen. Die spritzgegossenen Proben werden anschließend für eine Minute in eine 50 °C warme Silbernitratlösung (10 g Silbernitrat gelöst in 800 ml Wasser) eingetaucht. Nach einem Waschschritt mit deionisiertem Wasser und Trocknung der Probe wird die Probe für 20 min in einem Ofen mit 120 °C thermisch nachbehandelt. Die Probe wird anschließend in einem außenstromlosen Metallisierungsbad metallisiert. Hierbei zeigt sich eine sehr selektive Metallisierung der mikrostrukturierten Bereiche ohne Fremdabscheidungen. Zur Messung der Haftfestigkeit wird die Probe auf eine Dicke von ca. 25 pm galvanisch nachverstärkt. An der so hergestellten Probe wird eine Haftfestigkeit nach ASTM D1876-08 von größer 10 N/cm gemessen. In a first exemplary embodiment, an injection molding tool made of tool steel 1.2343 is selectively structured with CLPs by means of picosecond laser radiation (laser power 12 W, wavelength 515 nm, scanning speed 50 mm / s, beam diameter in the alternating Effective zone 30 μιη). The structured tool is used to injection mold polyamide (PA) samples. The injection-molded samples are then immersed for one minute in a 50 ° C silver nitrate solution (10 g of silver nitrate dissolved in 800 ml of water). After washing with deionized water and drying the sample, the sample is thermally post-treated in a 120 ° C oven for 20 minutes. The sample is then metallized in an electroless plating bath. This shows a very selective metallization of the microstructured areas without foreign deposits. To measure the adhesive strength, the sample is galvanically post-amplified to a thickness of about 25 pm. On the sample thus prepared, an adhesion strength of more than 10 N / cm is measured according to ASTM D1876-08.
Ausführungsbeispiel 2 Embodiment 2
Im zweiten Beispiel wird ein Prägestempel mit dem im ersten Ausführungsbeispiel genannten Verfahren selektiv mit CLP strukturiert und auf eine Probe aus PC+ABS Blend abge- formt. Die Probe wird an schließend mit Gold bedampft. Aufgrund der durchgehenden leitfähigen Startschicht wird diese Probe direkt galvanisch metallisiert. An der so hergestellten Probe wird eine Haftfestigkeit nach ASTM D1876-08 von größer 15 N/cm gemessen.  In the second example, an embossing stamp with the method mentioned in the first embodiment is selectively structured with CLP and molded onto a sample of PC + ABS blend. The sample is then steamed with gold. Due to the continuous conductive starting layer, this sample is metallized directly by electroplating. On the sample thus prepared, an adhesion strength of more than 15 N / cm is measured according to ASTM D1876-08.
Ausführungsbeispiel 3 Embodiment 3
Ein nach obigem Verfahren strukturiertes Werkstück aus Polybutylenterephthalat (PBT) wird für zehn Minuten bei 60 °C in einer alkalischen Lösung aus 45 g Natriumhydroxid und 45 g Kaliumpermanganat in einem Liter Wasser angeätzt, um die Oberfläche chemisch zu funk- tionalisieren und damit für eine Beladung mit Palladiumionen vorzubereiten. Anschließend wird das Werkstück mit entionisiertem Wasser gewaschen und für 10 Minuten in einer Lö- sung aus 200 mg Palladiumchlorid in 20 ml Wasser inkubiert. Darauf folgend wird die Oberfläche direkt mit einer Lösung aus 1 g des Natriumsalzes der 9,10-Anthrachinon-2,6- disulfonsäure in 10 ml Glykol benetzt und 10 Minuten mit einer handelsüblichen Labor-UV- Lampe bestrahlt. Nach Waschen mit Wasser scheidet sich an den so behandelten Stellen in einer chemischen Metallisierung Kupfer ab. An der so hergestellten Probe wird eine Haftfes- tigkeit nach ASTM D1876-0B von größer 12 N/cm gemessen. A polybutylene terephthalate (PBT) workpiece structured according to the above procedure is etched for 10 minutes at 60 ° C. in an alkaline solution of 45 g sodium hydroxide and 45 g potassium permanganate in one liter of water to chemically functionalize the surface and thus for loading to prepare with palladium ions. Subsequently, the workpiece is washed with deionized water and incubated for 10 minutes in a solution of 200 mg of palladium chloride in 20 ml of water. Subsequently, the surface is wetted directly with a solution of 1 g of the sodium salt of 9,10-anthraquinone-2,6-disulfonic acid in 10 ml of glycol and irradiated for 10 minutes with a commercial laboratory UV lamp. After washing with water, copper is deposited at the sites treated in a chemical metallization. An adhesion strength according to ASTM D1876-0B of greater than 12 N / cm is measured on the sample produced in this way.
Die Erfindung lässt verschiedene Ausführungsformen zu. Zur weiteren Verdeutlichung ihres Grundprinzips ist eine davon in den Figuren 4 bis 12 dargestellt und wird nachfolgend beschrieben. Die Figuren zeigen jeweils in einer Prinzipskizze in The invention allows for various embodiments. To further clarify its basic principle, one of them is shown in FIGS. 4 to 12 and will be described below. The figures show each in a schematic diagram in
Fig. 1 ein Beispiel für das Einbringen von Strukturen in ein Substrat gemäß dem Stand der Technik; Fig. 2 das Einbringen von Kavitäten in das Substrat mittels eines Ätzverfahrens gemäß dem Stand der Technik; Fig. 3 eine durch Hinterschneidungen in den Kavitäten mit dem Substrat verbundene Metallschicht beim Stand der Technik; 1 shows an example of the introduction of structures into a substrate according to the prior art; FIG. 2 shows the introduction of cavities into the substrate by means of an etching method according to the prior art; FIG. 3 shows a metal layer connected to the substrate by undercuts in the cavities in the prior art;
Fig. 4 erfindungsgemäße konische Mikrostrukturen ohne Hinterschneidungen; Fig. 5 das erfindungsgemäße Einbringen von Mikrostrukturen (Vertiefungen) in eine Werkzeugoberfläche eines Prägewerkzeuges; 4 shows conical microstructures according to the invention without undercuts; 5 shows the introduction according to the invention of microstructures (depressions) into a tool surface of an embossing tool;
Fig. 6 eine mittels des Prägewerkzeuges in eine Werkstückoberflache erfindungsgemäß eingebrachte Negativkontur zu der in Figur 5 gezeigten Mikrostruktur; FIG. 6 shows a negative contour introduced according to the invention into a workpiece surface by means of the embossing tool, relative to the microstructure shown in FIG. 5; FIG.
Fig. 7 die mit Metallkeimen versehene erfindungsgemäße Werkstückoberfläche; FIG. 7 shows the workpiece surface provided with metal nuclei according to the invention; FIG.
Fig. 8 eine mit einer Metallschicht versehene erfindungsgemäße Werkstückoberflache; Fig. 9 eine rasterelektronenmikroskopische Aufnahme einer erfindungsgemäßen Werkzeugoberfläche, auf welcher als Mikrostrukturen Cone Like Protrusions erkennbar sind; 8 shows a workpiece surface provided with a metal layer according to the invention; 9 shows a scanning electron micrograph of a tool surface according to the invention, on which microstructures Cone Like Protrusions can be recognized;
Fig. 10 zeigt eine rasterelektronenmikroskopische Aufnahme einer erfindungsgemäßen Werkzeugoberfläche, auf welcher als Mikrostrukturen Nanoripples erkennbar sind; 10 shows a scanning electron micrograph of a tool surface according to the invention, on which nanoripples can be recognized as microstructures;
Fig. 11 zeigt eine rasterelektronenmikroskopische Aufnahme einer erfindungsgemäßen11 shows a scanning electron micrograph of a device according to the invention
Werkzeugoberfläche, auf welcher als Mikrostrukturen Nanosphären erkennbar sind; Fig. 12 ein mit Mikrostrukturen versehenes Werkstück. Tool surface on which nanospheres are recognizable as microstructures; Fig. 12 is a provided with microstructures workpiece.
Zum leichteren Verständnis ist in den Figuren 1 bis 3 der Verfahrensablauf beim Einbringen von Mikrostrukturen in ein Substrat mittels eines Ätzverfahrens nach dem Stand der Technik dargestellt. Wie zu erkennen ist, werden mittels des Ätzverfahrens bestimmte in dem Werk- stück (seitlich im Querschnitt abgebildete) enthaltene Bestandteile durch Abtragen der Werkstückoberfläche aufgeschlossen und anschließend chemisch aus dem Werkstück gelöst. Dadurch entstehen die beim Stand der Technik gewünschten Kavitäten, die ausgehend von der Werkstückoberfläche in tieferliegenden Schichten erweitert sind, wie dies in Figur 2 erkennbar ist. Diese eignen sich somit optimal zur Ausbildung von Hinterschneidungen für die in Figur 3 dargestellte Metallschicht, die dadurch haftfest mit dem Werkstück verbunden ist. Demgegenüber zeigt Figur 4 in einer Prinzipdarstellung die unterschiedliche Gestalt der erfindungsgemäß hergestellten Mikrostrukturen sowie der darauf aufgebrachten Metallschicht. Wie zu erkennen ist, weisen die Mikrostrukturen eine in Richtung der Metallschicht verjüngte Form auf, wie sie beispielsweise durch Kegel- oder Pyramidenformen realisiert werden kann. Dabei ist die Erfindung selbstverständlich nicht auf regelmäßige Strukturen beschränkt. Wie im linken Teil der Figur 4 zu erkennen, können die Mikrostrukturen als Negativkontur derart eingebracht werden, dass die Werkstückoberfläche lediglich im Bereich der zu erzeugenden Mikrostrukturen abgetragen wird. Im rechten Teil der Figur treten die Mikrostrukturen gegenüber der sie umgebenden Werkstückoberfläche hervor. Hierzu wird die von den Mikrostrukturen ausgesparte Werkstückoberfläche großflächig abgetragen. For ease of understanding, the process sequence for introducing microstructures into a substrate by means of an etching process according to the prior art is shown in FIGS. 1 to 3. As can be seen, certain constituents contained in the workpiece (shown laterally in cross section) are broken up by removing the workpiece surface and subsequently released chemically from the workpiece by means of the etching process. This results in the desired in the prior art cavities, starting from the workpiece surface are expanded in deeper layers, as can be seen in Figure 2. These are thus optimally suitable for the formation of undercuts for the metal layer shown in Figure 3, which is thereby adhesively bonded to the workpiece. In contrast, Figure 4 shows a schematic representation of the different shape of the inventively produced microstructures and the metal layer applied thereto. As can be seen, the microstructures have a tapered shape in the direction of the metal layer, as can be realized, for example, by conical or pyramidal shapes. Of course, the invention is not limited to regular structures. As can be seen in the left part of FIG. 4, the microstructures can be introduced as a negative contour in such a way that the workpiece surface is removed only in the region of the microstructures to be produced. In the right part of the figure, the microstructures emerge from the surrounding workpiece surface. For this purpose, the workpiece surface recessed from the microstructures is removed over a large area.
Das erfindungsgemäße Verfahren zur Oberflächenbearbeitung einer Werkzeugoberfläche 1 eines Werkzeuges 2 und der Bearbeitung einer Werkstückoberfläche 3 auf einem Werkstück 4 mittels des Werkzeuges 2 wird nachstehend anhand der Figuren 5 bis 8 näher erläutert. Dabei werden in einem ersten Verfahrensschritt mittels eines Laserstrahles 5 in die Werk- zeugoberfläche 1 Mikrostrukturen 6 als im Wesentlichen regelmäßige Erhebungen und Vertiefungen eingebracht. Dabei trägt der Laserstrahl 5 Material von der Werkzeugoberfläche 1 ab, wodurch Vertiefungen entstehen. Diejenigen Bereiche der Werkzeugoberfläche 1 , an denen der Laserstrahl 5 kein Material oder weniger Material abträgt, bleiben als Erhebungen relativ zu den Vertiefungen bestehen. Diese Erhebungen und Vertiefungen werden in einem nachfolgenden Verfahrensschritt auf die Werkstückoberfläche 3 übertragen, indem mittels des als Prägewerkzeug ausgeführten Werkzeuges 2 die Werkstückoberfläche 3 partiell umgeformt wird und die Mikrostrukturen 6 als Negativkontur 7 auf die Werkstückoberfläche 3 innerhalb einer durch Begrenzungslinien eingeschlossenen, nachfolgend zu metallisierenden Fläche abgebildet werden. Anschließend findet eine Bekeimung der Negativkontur 7 mit Me- tallkeimen 8, insbesondere Palladiumkeimen statt, die nur im Bereich der Negativkontur 7 anhaften und in den übrigen Bereichen problemlos entfernt werden können. Dabei dringen die Metallkeime 8 in die Werkstückoberfläche 3 ein, sodass durch eine anschließende Metallisierung ausgehend von den Metallkeimen 8 eine flächige oder linienförmige Metallschicht 9 erzeugt wird. Auf diese Weise wird eine schnell und einfach reproduzierbare Möglichkeit zur Erzeugung der den Mikrostrukturen 6 entsprechenden Negativkontur 7 in der Werkstückoberfläche 3 erreicht, bei der eine direkte Einwirkung des Lasers auf die Werkstückoberfläche 3 entbehrlich ist und daher auch solche Werkstückmaterialien eingesetzt werden kön- nen, die für die Laserbearbeitung ungeeignet sind. Vielmehr setzt die Übertragung der Mikrostrukturen 6 auf die Werkstückoberflache 3 lediglich deren Formbarkeit voraus, sodass das erfindungsgemäße Verfahren bei einer Vielzahl von Materialien und Werkstoffarten erfolgreich einsetzbar ist. Zudem wird eine eindeutige Reproduzierbarkeit sichergestellt, sodass Bearbeitungsfehler weitgehend ausgeschlossen sind. The inventive method for surface treatment of a tool surface 1 of a tool 2 and the machining of a workpiece surface 3 on a workpiece 4 by means of the tool 2 will be explained in more detail below with reference to FIGS 5 to 8. In this case, microstructures 6 are introduced as substantially regular elevations and depressions in a first method step by means of a laser beam 5 into the tool surface 1. In this case, the laser beam 5 carries material from the tool surface 1, resulting in depressions. Those areas of the tool surface 1 at which the laser beam 5 does not remove any material or less material remain as elevations relative to the depressions. These elevations and depressions are transferred to the workpiece surface 3 in a subsequent method step by partially transforming the workpiece surface 3 by means of the tool 2 designed as an embossing tool and the microstructures 6 as a negative contour 7 on the workpiece surface 3 within a surface enclosed by boundary lines and subsequently to be metallized be imaged. This is followed by seeding of the negative contour 7 with metal nuclei 8, in particular palladium seeds, which adhere only in the region of the negative contour 7 and can be easily removed in the remaining regions. In this case, the metal nuclei 8 penetrate into the workpiece surface 3, so that a flat or linear metal layer 9 is produced by a subsequent metallization starting from the metal nuclei 8. In this way, a fast and easily reproducible possibility for generating the microstructure 6 corresponding negative contour 7 is achieved in the workpiece surface 3, in which a direct action of the laser on the workpiece surface 3 is unnecessary and therefore such workpiece materials can be used. which are unsuitable for laser processing. Rather, the transfer of the microstructures 6 on the workpiece surface 3 only requires their moldability, so that the inventive method is successfully used in a variety of materials and types of materials. In addition, a clear reproducibility is ensured, so that processing errors are largely excluded.
In den Figuren 9 bis 11 werden noch verschiedene Ausprägungen der Mikrostrukturen auf dem Werkstück anhand rasterelektronenmikroskopischer Aufnahmen der Werkzeugoberfläche verdeutlicht. Darin zeigt Figur 9 Cone Like Protrusions, Figur 10 Nanoripples sowie die Figur 11 Nanosphären als erfindungsgemäße Mikrostrukturen auf der Werkzeugoberfläche. In FIGS. 9 to 11, different manifestations of the microstructures on the workpiece are illustrated by means of scanning electron micrographs of the tool surface. FIG. 9 shows Cone Like Protrusions, FIG. 10 nanoripples, and FIG. 11 shows nanospheres as microstructures according to the invention on the tool surface.
In Figur 12 ist beispielhaft das als Leiterplatte ausgeführte Werkstück 2 in einer Draufsicht dargestellt, wobei im Bereich der zu erzeugenden Leiterbahnen eine Oberflächenbearbeitung der Werkzeugoberfläche 1 erfolgt ist. Die Mikrostrukturen 6 sind dabei als im Wesentli- chen regelmäßige Erhebungen und Vertiefungen innerhalb einer durch Begrenzungslinien 10 eingeschlossenen, nachfolgend zu metallisierenden Fläche zu erkennen, die durch Abfor- mung des in Figur 5 dargestellten mikrostrukturierten Werkzeuges 2 eingebracht worden sind. In FIG. 12, the workpiece 2 embodied as a printed circuit board is shown by way of example in a plan view, wherein a surface treatment of the tool surface 1 has taken place in the region of the printed conductors to be produced. In this case, the microstructures 6 are to be seen as substantially regular elevations and depressions within a surface enclosed by boundary lines 10 and subsequently to be metallized, which have been introduced by molding the microstructured tool 2 shown in FIG.

Claims

PATE N TAN SPRÜ C H E PATE N TAN SPRU C H E
Verfahren zur zumindest abschnittsweisen und haftfesten Metallisierung eines nichtleitenden Werkstückes (4), dadurch gekennzeichnet, dass in das Werkstück (4) in den zu metallisierenden Bereichen periodische Mikrostrukturen (6) innerhalb einer durch eine oder mehrere Begrenzungslinien (10) eingeschlossenen, zu metallisierenden Fläche durch Abformung eines entsprechend den zu metallisierenden Bereichen innerhalb einer Abformfläche mikrostrukturierten Werkzeuges (2) eingebracht werden. Method for the at least partial and adherent metallization of a non-conductive workpiece (4), characterized in that in the workpiece (4) in the areas to be metallized periodic microstructures (6) within a by one or more boundary lines (10) enclosed, to be metallized surface Impression of a corresponding to the areas to be metallized within a molding surface microstructured tool (2) are introduced.
Verfahren nach Anspruch 1 , dadurch gekennzeichnet, dass als Werkzeug (2) ein urformendes metallisches Werkzeug (2) eingesetzt wird. A method according to claim 1, characterized in that as a tool (2) a urformendes metallic tool (2) is used.
Verfahren nach Anspruch 1 , dadurch gekennzeichnet, dass als Werkzeug (2) ein umformendes metallisches Werkzeug (2) eingesetzt wird. A method according to claim 1, characterized in that as a tool (2) a forming metallic tool (2) is used.
Verfahren nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Mikrostrukturen (6) des Werkzeuges (2) durch eine Laserstrahlung (5) erzeugt werden. Method according to at least one of the preceding claims, characterized in that the microstructures (6) of the tool (2) are generated by a laser radiation (5).
Verfahren nach Anspruch 4, dadurch gekennzeichnet, dass die Pulslänge der Laserstrahlung (5) kleiner als eine Nanosekunde ist. A method according to claim 4, characterized in that the pulse length of the laser radiation (5) is smaller than a nanosecond.
Verfahren nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Mikrostrukturen (6) im Werkzeug (2) als sogenannte "Cone Like Protrusions" erzeugt werden. Method according to at least one of the preceding claims, characterized in that the microstructures (6) in the tool (2) are produced as so-called "Cone Like Protrusions".
Verfahren nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Metallschicht (9) eine Haftfestigkeit nach ASTM D1876-08 von mindestens 3 N/cm, insbesondere von 5 N/cm aufweist. Method according to at least one of the preceding claims, characterized in that the metal layer (9) has an adhesive strength according to ASTM D1876-08 of at least 3 N / cm, in particular of 5 N / cm.
8. Verfahren nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass ein Bestandteil des nichtleitenden Werkstückes (6) ein Polymer ist. 8. The method according to at least one of the preceding claims, characterized in that a component of the non-conductive workpiece (6) is a polymer.
9. Verfahren nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Werkstückoberfläche (3) partiell mit Mikrostrukturen (6) unterschiedlicher Ausprägung versehen wird. 9. The method according to at least one of the preceding claims, characterized in that the workpiece surface (3) is partially provided with microstructures (6) of different characteristics.
10. Verfahren nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass das Werkstück (4) im Laufe des Verfahrens thermisch behandelt wird. 10. The method according to at least one of the preceding claims, characterized in that the workpiece (4) is thermally treated in the course of the process.
11. Verfahren nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Mikrostrukturen (6) mittels des Werkzeuges (2) mehrfach auf die Werkstückoberfläche (3) desselben Werkstückes (4) abgebildet werden. 11. The method according to at least one of the preceding claims, characterized in that the microstructures (6) by means of the tool (2) multiple times on the workpiece surface (3) of the same workpiece (4) are mapped.
12. Verfahren nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die haftfeste Metallschicht (9) in distinkten Mustern, insbesondere Leiterbahnen oder dekorativen Mustern, auf die Werkstückoberfläche (3) aufgebracht wird. 12. The method according to at least one of the preceding claims, characterized in that the adherent metal layer (9) in distinct patterns, in particular conductor tracks or decorative patterns, on the workpiece surface (3) is applied.
13. Verfahren nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Mikrostrukturen (6) eine mittlere Wellenlänge von größer 1 μπι und kleiner 200 μπι aufweisen. 13. The method according to at least one of the preceding claims, characterized in that the microstructures (6) have a mean wavelength of greater than 1 μπι and less than 200 μπι.
14. Verfahren nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Mikrostrukturen (6) eine mittlere Strukturhöhe (Peak-to-Valley) von größer 5 μιη und kleiner 200 μιη aufweisen. 14. The method according to at least one of the preceding claims, characterized in that the microstructures (6) have a mean structure height (peak-to-valley) of greater than 5 μιη and less than 200 μιη.
15. Verfahren nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass das Verhältnis der mittleren Strukturhöhe (Peak-to-Valley) der Mikrostrukturen (6) zur mittleren Wellenlänge der Mikrostrukturen (6) größer als 0,3, insbesondere größer als 0,5 beträgt. 15. Method according to claim 1, characterized in that the ratio of the average structure height (peak-to-valley) of the microstructures (6) to the mean wavelength of the microstructures (6) is greater than 0.3, in particular greater than 0, 5 is.
16. Verfahren nach zumindest einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Mikrostrukturen (6) des Werkstückes (4) in Richtung des Werkstückes (4) einen monoton steigenden, insbesondere einen streng monoton steigenden Querschnitt aufweisen. 16. The method according to at least one of the preceding claims, characterized in that the microstructures (6) of the workpiece (4) in the direction of the workpiece (4) have a monotonically increasing, in particular a strictly monotonically increasing cross section.
17. Schichtaufbau umfassend ein nicht leitendes Werkstück (4) und eine haftfest verbundene Metallschicht (9), wobei die Grenzfläche zwischen nichtleitendem Werkstück und Metallschicht Mikrostrukturen (6) aufweist, dadurch gekennzeichnet, dass die Mikrostrukturen (6) des Werkstückes (4) innerhalb einer von zumindest einer Begrenzungslinie (10) eingeschlossenen, zu metallisierenden Fläche periodisch ausgeführt sind und in Richtung des Werkstückes (4) einen monoton steigenden, insbesondere einen streng monoton steigenden Querschnitt aufweisen. 17. A layer structure comprising a nonconducting workpiece (4) and a firmly adhering metal layer (9), wherein the interface between the nonconductive workpiece and the metal layer has microstructures (6), characterized in that the microstructures (6) of the workpiece (4) within a Periodically executed by at least one boundary line (10) enclosed, to be metallized surface and in the direction of the workpiece (4) have a monotonically increasing, in particular a strictly monotonically increasing cross-section.
18. Schichtaufbau nach Anspruch 17, dadurch gekennzeichnet, dass ein Bestandteil des Werkstückes (6) ein nichtleitendes Polymer ist. 18. Layer structure according to claim 17, characterized in that a component of the workpiece (6) is a non-conductive polymer.
19. Schichtaufbau nach Anspruch 17 oder 18, dadurch gekennzeichnet, dass die haftfeste Metallschicht (9) in distinkten Mustern, insbesondere Leiterbahnen oder dekorativen Mustern, auf die Werkstückoberfläche (3) des Werkstückes (4) aufgebracht ist. 19. A layer structure according to claim 17 or 18, characterized in that the adherent metal layer (9) in distinct patterns, in particular conductor tracks or decorative patterns, on the workpiece surface (3) of the workpiece (4) is applied.
20. Schichtaufbau nach zumindest einem der Ansprüche 17 bis 19, dadurch gekennzeichnet, dass die Mikrostrukturen (6) eine mittlere Strukturhöhe (Peak-to-Valley) von größer 5 μηπ und kleiner 200 μηι aufweisen. 20. Layer structure according to at least one of claims 17 to 19, characterized in that the microstructures (6) have a mean structure height (peak-to-valley) of greater than 5 μηπ and less than 200 μηι.
21. Schichtaufbau nach zumindest einem der Ansprüche 17 bis 20, dadurch gekennzeichnet, dass das Verhältnis der mittleren Strukturhöhe (Peak-to-Valley) der Mikrostrukturen (6) zur mittleren Wellenlänge der Mikrostrukturen (6) größer als 0,3, insbesondere größer als 0,5 beträgt. 21 layer structure according to at least one of claims 17 to 20, characterized in that the ratio of the average structure height (peak-to-valley) of the microstructures (6) to the average wavelength of the microstructures (6) greater than 0.3, in particular greater than 0.5.
22. Schichtaufbau nach zumindest einem der Ansprüche 17 bis 21 , dadurch gekennzeichnet, dass die Metallschicht (9) eine Haftfestigkeit nach ASTM D1876-08 von mindestens 3 N/cm, insbesondere von 5 N/cm aufweist. 22 layer structure according to at least one of claims 17 to 21, characterized in that the metal layer (9) has an adhesive strength according to ASTM D1876-08 of at least 3 N / cm, in particular of 5 N / cm.
23. Schichtaufbau nach zumindest einem der Ansprüche 17 bis 22, dadurch gekennzeichnet, dass die Mikrostrukturen (6) der Negativform sogenannten "Cone Like Protrusions" gleichen. 23 layer structure according to at least one of claims 17 to 22, characterized in that the microstructures (6) of the negative mold so-called "Cone Like Protrusions" same.
EP13828908.7A 2012-12-18 2013-12-03 Method for the metallation of a workpiece and a layer structure made up of a workpiece and a metal layer Withdrawn EP2935659A2 (en)

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US20160037650A1 (en) 2016-02-04
CN104838046B (en) 2017-11-14
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WO2014094729A3 (en) 2014-08-14
US9924601B2 (en) 2018-03-20
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CN104838046A (en) 2015-08-12
WO2014094729A2 (en) 2014-06-26

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