EP1837721A1 - Micro-mechanical piece made from insulating material and method of manufacture therefor - Google Patents

Micro-mechanical piece made from insulating material and method of manufacture therefor Download PDF

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Publication number
EP1837721A1
EP1837721A1 EP06111727A EP06111727A EP1837721A1 EP 1837721 A1 EP1837721 A1 EP 1837721A1 EP 06111727 A EP06111727 A EP 06111727A EP 06111727 A EP06111727 A EP 06111727A EP 1837721 A1 EP1837721 A1 EP 1837721A1
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EP
European Patent Office
Prior art keywords
micro
insulating material
mechanical part
silicon
part according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP06111727A
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German (de)
French (fr)
Inventor
Thierry Conus
Marc Lipunner
Philippe Marmy
Benjamin Krähenbühl
Michael Reber
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ETA SA Manufacture Horlogere Suisse
Original Assignee
ETA SA Manufacture Horlogere Suisse
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ETA SA Manufacture Horlogere Suisse filed Critical ETA SA Manufacture Horlogere Suisse
Priority to EP06111727A priority Critical patent/EP1837721A1/en
Priority to EP07104385.5A priority patent/EP1837722B1/en
Priority to TW096109746A priority patent/TWI438588B/en
Priority to KR1020070027483A priority patent/KR20070096834A/en
Priority to CN2007100893622A priority patent/CN101042570B/en
Priority to JP2007076624A priority patent/JP5378654B2/en
Priority to US11/691,063 priority patent/US7824097B2/en
Publication of EP1837721A1 publication Critical patent/EP1837721A1/en
Priority to HK08103103.0A priority patent/HK1113948A1/en
Priority to JP2013118770A priority patent/JP5599917B2/en
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B17/00—Mechanisms for stabilising frequency
    • G04B17/04—Oscillators acting by spring tension
    • G04B17/06—Oscillators with hairsprings, e.g. balance
    • G04B17/066—Manufacture of the spiral spring
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0069—Watchmakers' or watch-repairers' machines or tools for working materials for working with non-mechanical means, e.g. chemical, electrochemical, metallising, vapourising; with electron beams, laser beams
    • G—PHYSICS
    • G04—HOROLOGY
    • G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
    • G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
    • G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
    • G04D3/0087—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment for components of the escapement mechanism, e.g. lever escapement, escape wheel

Definitions

  • the present invention relates to a micro-mechanical part made of an insulating material, and more particularly to a fixed or mobile part of a watch movement whose proximity to other parts does not disturb the operation of a moving part, directly, or indirectly by the attraction of particles.
  • Insulating materials such as silicon and its compounds, quartz, diamond, glass, ceramics or others are increasingly used to make micro-mechanical parts, whether fixed parts , such as plates or bridges, or moving parts for example part of the drive train, or the control system such as the balance spring, balance or exhaust.
  • the present invention therefore aims to provide a solution to the problem mentioned above by providing a fixed or mobile micro-mechanical part made of an insulating material whose surface treatment avoids the risk of bonding.
  • the invention relates to a micro-mechanical part made of an insulating material, such as silicon, and its compounds, diamond, glass, ceramic or other, all or part of its surface is coated with a thin metal deposit preferably less than 50 nm.
  • a thin metal deposit preferably less than 50 nm.
  • This deposit may be performed on a piece of insulating material monoblock or composite, that is to say, at least the outer surface is of insulating material.
  • the stainless and amagnetic metals such as gold, platinum, rhodium and palladium are preferably chosen. These metals can be deposited by known methods making it possible to control the thickness by adjusting the operating conditions, for example by sputtering, PVD, doping, ion implantation or by an electrolytic process.
  • said micro-mechanical part is a part of the kinematic chain of a watch movement, such as a hairspring, an anchor, an escape wheel or a toothed wheel, or any which other fixed part may for example be the bearing of the axis of a mobile.
  • a hairspring which is the most sensitive part of a watch movement.
  • the invention also relates to a timepiece incorporating such a micro-mechanical part.
  • the invention will be more particularly illustrated by a sprung-balance adjusting device represented in FIG. 1, in which the spiral 1 is produced, for example, in silicon, by adapting the micro-machining processes used in the manufacture of integrated circuits or accelerometers from a silicon wafer or other amorphous or crystalline insulating material.
  • wet chemical etching, plasma dry machining or reactive ion etching (RIE) can be carried out using masks appropriate to the desired contour for the hairspring.
  • the same silicon wafer makes it possible to manufacture a batch of spirals whose characteristics are determined by the thickness of the wafer and the shape of the masks, said characteristics being calculated for operation of the spiral in a plane.
  • FIG. 2 whose cross-sectional representation is limited to the hairspring 1 and to the cock 9, the behavior of the turns 11 is shown in the left-hand part after a certain operating time when the hairspring 1 n has undergone no treatment.
  • the turns 11 deviate from their normal position shown in dotted lines by being attracted by the cock 9 and can even stick to it, which obviously disturbs the normal walking, that is to say to say a march having only movements of extension / contraction in a plane.
  • the metal used is preferably a stainless and amagnetic metal such as gold, platinum, rhodium, palladium.
  • This deposition can be carried out by means of various known methods, such as sputtering, PVD deposition, ion implantation or electroplating.
  • a gold deposit of 15 nm has been carried out by "sputtering", that is to say by performing a cathodic sputtering under vacuum, with a gold target, by applying a voltage of 60 mA for 15 seconds.
  • a silicon spiral has just been described, but other non-conductive amorphous or crystalline materials may also be used, as indicated above, and be treated with a surface metallization avoiding the risk of attraction or sticking.
  • a composite material to produce, for example, a hairspring having a silicon core and a thick coating of silicon dioxide on which the very low metal deposition will be performed.
  • a “composite material” may also include a metal core embedded in an insulating material.
  • the invention is not limited to a hairspring and can be applied to other moving parts such as an anchor, an escape wheel or a toothed wheel, as well as to fixed parts.

Abstract

The hairspring (1) has coils (11) , and a silicon dioxide covering formed on a core and with a thickness of 50 nanometers, where the hairspring is made of an insulating material chosen among silicon, silicon composites, diamond, glass and ceramics. A conductive metallic deposit is formed on the covering and has a thickness ranging between 10-20 nanometers, where the deposit is obtained from a non-magnetic and stainless metal e.g. platinum. An independent claim is also included for a method of fabricating a micro-mechanical piece.

Description

Domaine techniqueTechnical area

La présente invention concerne une pièce de micro-mécanique réalisée en un matériau isolant, et plus particulièrement une pièce fixe ou mobile d'un mouvement horloger dont la proximité d'autres pièces ne perturbe pas le fonctionnement d'une pièce mobile, directement, ou indirectement par l'attraction de particules.The present invention relates to a micro-mechanical part made of an insulating material, and more particularly to a fixed or mobile part of a watch movement whose proximity to other parts does not disturb the operation of a moving part, directly, or indirectly by the attraction of particles.

Arrière plan technologiqueTechnological background

Les matériaux isolants, tels que le silicium et ses composés, le quartz, le diamant, le verre, la céramique ou autres sont de plus en plus utilisés pour réaliser des pièces de micro-mécanique horlogère, qu'il s'agisse de pièces fixes, telles que des platines ou des ponts, ou de pièces mobiles faisant par exemple partie de la chaîne cinématique, ou du système réglant telles que le spiral, le balancier ou l'échappement.Insulating materials, such as silicon and its compounds, quartz, diamond, glass, ceramics or others are increasingly used to make micro-mechanical parts, whether fixed parts , such as plates or bridges, or moving parts for example part of the drive train, or the control system such as the balance spring, balance or exhaust.

On a observé, en particulier sur un spiral totalement isolé des autres pièces par exemple par pitonnage et collage au moyen d'une colle non conductrice, que l'emploi du silicium avait un inconvénient. En effet au bout d'un certain temps de fonctionnement, un certain nombre de spires situées entre la courbe à l'extérieur et la courbe à l'intérieur du spiral a tendance à venir se coller au coq, ce qui nuit forcément à l'isochronisme du système réglant. Le même phénomène pourrait être observé avec d'autres pièces réalisées en silicium ou en un autre matériau isolant, ce qui aurait également au final un effet néfaste sur l'isochronisme.It has been observed, in particular on a spiral completely isolated from other parts for example by pitting and gluing by means of a non-conductive glue, that the use of silicon had a disadvantage. Indeed, after a certain period of operation, a number of turns located between the curve on the outside and the curve inside the spiral tends to stick to the cock, which necessarily adversely affects the isochronism of the regulating system. The same phenomenon could be observed with other parts made of silicon or another insulating material, which would also ultimately have a detrimental effect on isochronism.

Résumé de l'inventionSummary of the invention

La présente invention vise donc à apporter une solution au problème évoqué ci-dessus en procurant une pièce de micro-mécanique fixe ou mobile réalisée en un matériau isolant dont un traitement de surface permet d'éviter le risque de collage.The present invention therefore aims to provide a solution to the problem mentioned above by providing a fixed or mobile micro-mechanical part made of an insulating material whose surface treatment avoids the risk of bonding.

A cet effet l'invention a pour objet une pièce de micro-mécanique réalisée en un matériau isolant, tel que le silicium, et ses composés, le diamant, le verre, la céramique ou autres, dont tout ou une partie de sa surface est revêtue d'un mince dépôt métallique de préférence inférieur à 50 nm. Ce très mince dépôt invisible à l'oeil nu, mais décelable par les moyens d'analyse actuels permet de supprimer les risques d'attraction et de collage par une pièce voisine, cette attraction pouvant être due à des frottements ou des tensions susceptible de créer dans la pièce des charges électrostatiques.For this purpose the invention relates to a micro-mechanical part made of an insulating material, such as silicon, and its compounds, diamond, glass, ceramic or other, all or part of its surface is coated with a thin metal deposit preferably less than 50 nm. This very thin deposit invisible to the naked eye, but detectable by the current means of analysis eliminates the risk of attraction and sticking by a neighboring room, this attraction may be due to friction or tension likely to create in the room electrostatic charges.

Ce dépôt peut être effectué sur une pièce en matériau isolant monobloc ou composite, c'est-à-dire dont au moins la surface extérieure est en matériau isolant.This deposit may be performed on a piece of insulating material monoblock or composite, that is to say, at least the outer surface is of insulating material.

Parmi les matériaux permettant d'atteindre le but sus-indiqué on choisit de préférence les métaux inoxydables et amagnétiques tels que l'or, le platine, , le rhodium, le palladium. Ces métaux peuvent être déposés par des procédés connus permettant de contrôler l'épaisseur en ajustant les conditions opératoires, par exemple par sputtering, PVD, dopage, implantation ionique ou par un procédé électrolytique.Among the materials making it possible to achieve the above-mentioned purpose, the stainless and amagnetic metals such as gold, platinum, rhodium and palladium are preferably chosen. These metals can be deposited by known methods making it possible to control the thickness by adjusting the operating conditions, for example by sputtering, PVD, doping, ion implantation or by an electrolytic process.

Dans un mode d'application préféré, ladite pièce de micro-mécanique est une pièce de la chaîne cinématique d'un mouvement horloger, telle qu'un spiral, une ancre, une roue d'échappement ou une roue dentée, ou n'importe quelle autre pièce fixe pouvant par exemple constituer le palier de l'axe d'un mobile. Dans la description détaillée qui va suivre, l'invention sera plus particulièrement illustrée par un spiral qui est la pièce la plus sensible d'un mouvement horloger.In a preferred embodiment, said micro-mechanical part is a part of the kinematic chain of a watch movement, such as a hairspring, an anchor, an escape wheel or a toothed wheel, or any which other fixed part may for example be the bearing of the axis of a mobile. In the following detailed description, the invention will be more particularly illustrated by a hairspring which is the most sensitive part of a watch movement.

L'invention concerne également une pièce d'horlogerie intégrant une telle pièce de micro-mécanique.The invention also relates to a timepiece incorporating such a micro-mechanical part.

Brève description des dessinsBrief description of the drawings

D'autres caractéristiques et avantages de la présente invention apparaîtront plus clairement dans la description qui suit d'un exemple de réalisation, donné à titre illustratif et non limitatif, en référence aux dessins annexés dans lesquels :

  • la figure 1 représente en vue de dessus partiellement arrachée un balancier-spiral pourvu d'un spiral traité selon l'invention, et
  • la figure 2 est une représentation en coupe selon la ligne II-II de la figure 1, avec représentation de la partie arrachée.
Other features and advantages of the present invention will appear more clearly in the following description of an example embodiment, given by way of nonlimiting illustration, with reference to the appended drawings in which:
  • FIG. 1 is a partially cut-away top view of a sprung balance provided with a spiral processed according to the invention, and
  • Figure 2 is a sectional representation along the line II-II of Figure 1, with representation of the part torn off.

Description détaillée de l'inventionDetailed description of the invention

L'invention sera plus particulièrement illustrée par un dispositif réglant balancier-spiral représenté à la figure 1, dans lequel le spiral 1 est réalisé, à titre d'exemple, en silicium, en adaptant les procédés de micro-usinage employés dans la fabrication de circuits intégrés ou d'accéléromètres à partir d'une plaquette de silicium ou de tout autre matériau isolant amorphe ou cristallin. On peut par exemple effectuer une attaque chimique par voie humide, un usinage à sec par plasma ou une gravure ionique réactive (RIE) en utilisant des masques appropriés au contour souhaité pour le spiral.The invention will be more particularly illustrated by a sprung-balance adjusting device represented in FIG. 1, in which the spiral 1 is produced, for example, in silicon, by adapting the micro-machining processes used in the manufacture of integrated circuits or accelerometers from a silicon wafer or other amorphous or crystalline insulating material. For example, wet chemical etching, plasma dry machining or reactive ion etching (RIE) can be carried out using masks appropriate to the desired contour for the hairspring.

Compte tenu des petites dimensions, une même plaquette de silicium permet de fabriquer un lot de spiraux dont les caractéristiques sont déterminées par l'épaisseur de la plaquette et la forme des masques, lesdites caractéristiques étant calculées pour un fonctionnement du spiral dans un plan.Given the small dimensions, the same silicon wafer makes it possible to manufacture a batch of spirals whose characteristics are determined by the thickness of the wafer and the shape of the masks, said characteristics being calculated for operation of the spiral in a plane.

En se référant maintenant à la figure 2, dont la représentation en coupe est limitée au spiral 1 et au coq 9, on a représenté dans la partie gauche le comportement des spires 11 au bout d'un certain temps de fonctionnement lorsque le spiral 1 n'a subi aucun traitement. Comme on peut le voir, les spires 11 s'écartent de leur position normale représentée en pointillés en étant attirées par le coq 9 et peuvent même venir coller à celui-ci, ce qui perturbe évidemment la marche normale, c'est-à-dire une marche n'ayant que des mouvements d'extension/contraction dans un plan.Referring now to FIG. 2, whose cross-sectional representation is limited to the hairspring 1 and to the cock 9, the behavior of the turns 11 is shown in the left-hand part after a certain operating time when the hairspring 1 n has undergone no treatment. As can be seen, the turns 11 deviate from their normal position shown in dotted lines by being attracted by the cock 9 and can even stick to it, which obviously disturbs the normal walking, that is to say to say a march having only movements of extension / contraction in a plane.

Dans la partie droite on a représenté le spiral 1 après traitement, la ligne en pointillés représentant la position qu'occuperaient les spires 11 en absence de traitement. Comme on le voit le spiral reste parfaitement dans un plan. On s'est en effet aperçu de façon surprenante qu'en effectuant un traitement consistant en un très faible dépôt métallique sur tout ou partie de la surface des spires, on annihilait l'effet néfaste précédemment décrit, sans pour autant modifier les propriétés mécaniques intrinsèques du spiral. Par "très faible dépôt", on entend un dépôt ayant une épaisseur inférieure à 50 nm de préférence comprise entre 10 et 20nm. Lorsque le dépôt est inférieur à 50 nm, les propriétés mécaniques intrinsèques de la pièce ne sont pas modifiées et le dépôt est invisible à l'oeil nu, mais néanmoins décelable par les techniques actuelles d'analyse. Le métal utilisé est de préférence un métal inoxydable et amagnétique tel que l'or, le platine, le rhodium, le palladium, . Ce dépôt peut être effectué au moyen de divers procédés connus, tels que le sputtering, le dépôt PVD, l'implantation ionique ou le dépôt électrolytique.In the right part is shown spiral 1 after treatment, the dotted line representing the position that would occupy the turns 11 in the absence of treatment. As we see the spiral stays perfectly in a plane. Surprisingly, it has been found that by carrying out a treatment consisting of a very small metal deposition on all or part of the surface of the turns, the adverse effect described above is annihilated, without modifying the intrinsic mechanical properties. of the spiral. "Very low deposition" means a deposit having a thickness of less than 50 nm, preferably between 10 and 20 nm. When the deposit is less than 50 nm, the intrinsic mechanical properties of the part are not modified and the deposit is invisible to the naked eye, but nevertheless detectable by the current analysis techniques. The metal used is preferably a stainless and amagnetic metal such as gold, platinum, rhodium, palladium. This deposition can be carried out by means of various known methods, such as sputtering, PVD deposition, ion implantation or electroplating.

A titre d'exemple on a effectué un dépôt d'or de 15 nm par "sputtering", c'est-à-dire en effectuant une métallisation par pulvérisation cathodique sous vide, avec une cible en or, en appliquant une tension de 60 mA pendant 15 secondes.By way of example, a gold deposit of 15 nm has been carried out by "sputtering", that is to say by performing a cathodic sputtering under vacuum, with a gold target, by applying a voltage of 60 mA for 15 seconds.

On vient de décrire un spiral en silicium, mais d'autres matériaux amorphes ou cristallins non conducteurs peuvent également être utilisés, tels qu'indiqués précédemment, et être traités avec une métallisation superficielle évitant les risques d'attraction ou de collage.A silicon spiral has just been described, but other non-conductive amorphous or crystalline materials may also be used, as indicated above, and be treated with a surface metallization avoiding the risk of attraction or sticking.

Il est également possible d'utiliser un matériau composite pour réaliser par exemple un spiral ayant une âme en silicium et un revêtement épais en dioxyde de silicium sur lequel sera effectué le très faible dépôt métallique.It is also possible to use a composite material to produce, for example, a hairspring having a silicon core and a thick coating of silicon dioxide on which the very low metal deposition will be performed.

Un "matériau composite" peut également comprendre une âme métallique noyée dans un matériau isolant.A "composite material" may also include a metal core embedded in an insulating material.

De même l'invention n'est pas limitée à un spiral et peut s'appliquer à d'autres pièces en mouvement telles qu'une ancre, une roue d'échappement ou une roue dentée, ainsi qu'à des pièces fixes.Similarly, the invention is not limited to a hairspring and can be applied to other moving parts such as an anchor, an escape wheel or a toothed wheel, as well as to fixed parts.

Claims (11)

Pièce de micro-mécanique réalisée en au moins un matériau isolant, et destinée à être intégrée dans la chaîne cinématique d'un mouvement horloger, caractérisée en ce qu'elle est revêtue sur tout ou partie de sa surface d'un dépôt métallique conducteur.Micro-mechanical part made of at least one insulating material, and intended to be integrated into the kinematic chain of a watch movement, characterized in that it is coated on all or part of its surface with a conductive metal deposit. Pièce de micro-mécanique selon la revendication 1, caractérisée en ce que le dépôt métallique a une épaisseur inférieure à 50 nm, de préférence comprise entre 10 et 20nm.Micro-mechanical part according to claim 1, characterized in that the metal deposit has a thickness less than 50 nm, preferably between 10 and 20 nm. Pièce de micro-mécanique selon la revendication 1, caractérisée en ce que le matériau isolant est choisi parmi le silicium et ses composés, le diamant, le verre et la céramique.Micro-mechanical part according to claim 1, characterized in that the insulating material is selected from silicon and its compounds, diamond, glass and ceramic. Pièce de micro-mécanique selon la revendication 3, caractérisée en ce qu'elle comporte une âme en silicium sur laquelle est formé un revêtement de dioxyde de silicium ayant une épaisseur supérieure à 50 nm.Micro-mechanical part according to claim 3, characterized in that it comprises a silicon core on which is formed a coating of silicon dioxide having a thickness greater than 50 nm. Pièce de micro-mécanique selon la revendication 1, caractérisée en ce que le métal utilisé pour effectuer le dépôt est un métal inoxydable et amagnétique.Micromechanical part according to Claim 1, characterized in that the metal used for depositing is a stainless and non-magnetic metal. Pièce de micro-mécanique selon la revendication 5, caractérisée en ce que le métal est choisi parmi l'or, le platine le rhodium et le palladium.Micro-mechanical part according to Claim 5, characterized in that the metal is chosen from gold, platinum, rhodium and palladium. Pièce de micro-mécanique selon la revendication 1, caractérisée en ce qu'elle consiste en un composant de l'échappement ou du système balancier-spiral tel que un spiral, une ancre, une roue d'échappement ou une roue dentée, ou toute autre pièce fixe ou mobile.Micro-mechanical part according to Claim 1, characterized in that it consists of a component of the escapement or the balance spring system such as a hairspring, an anchor, an escape wheel or a toothed wheel, or any other fixed or mobile part. Pièce d'horlogerie comportant une pièce de micro-mécanique selon une quelconque des revendications précédentes.Timepiece comprising a micro-mechanical part according to any one of the preceding claims. Procédé de fabrication d'une pièce de micro-mécanique selon une quelconque des revendications précédentes, caractérisé en ce qu'il comporte les étapes consistant à : - usiner une pièce ou un lot de pièces dans une plaque de matériau isolant, et - effectuer sur tout ou partie de la surface de la pièce un dépôt de métal conducteur en ajustant les conditions opératoires pour obtenir l'épaisseur désirée. A method of manufacturing a micro-mechanical part according to any one of the preceding claims, characterized in that it comprises the steps of: machining a part or a batch of parts in a plate of insulating material, and - Perform on all or part of the surface of the part a conductive metal deposit by adjusting the operating conditions to obtain the desired thickness. Procédé selon la revendication 9, caractérisé en ce que le dépôt métallique est effectué par sputtering, PVD, dopage, implantation ionique, par un procédé électrolytique, ou tout autre procédé permettant d'obtenir un tel dépôt.Process according to Claim 9, characterized in that the metal deposition is carried out by sputtering, PVD, doping, ion implantation, by an electrolytic process, or any other method making it possible to obtain such a deposit. Procédé selon la revendication 9, caractérisé en ce que le matériau isolant est du silicium recouvert de silicium et le métal est de l'or.Process according to claim 9, characterized in that the insulating material is silicon coated silicon and the metal is gold.
EP06111727A 2006-03-24 2006-03-24 Micro-mechanical piece made from insulating material and method of manufacture therefor Withdrawn EP1837721A1 (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
EP06111727A EP1837721A1 (en) 2006-03-24 2006-03-24 Micro-mechanical piece made from insulating material and method of manufacture therefor
EP07104385.5A EP1837722B1 (en) 2006-03-24 2007-03-19 Micro-mechanical component in an insulating material and method of manufacture thereof
TW096109746A TWI438588B (en) 2006-03-24 2007-03-21 Micro-mechanical part made of insulating material and method of manufacturing the same
KR1020070027483A KR20070096834A (en) 2006-03-24 2007-03-21 Micro-mechanical part made of insulating material and method of manufacturing the same
CN2007100893622A CN101042570B (en) 2006-03-24 2007-03-23 Micro-mechanical piece made from insulating material and method of manufacture therefor
JP2007076624A JP5378654B2 (en) 2006-03-24 2007-03-23 Micromechanical part made of insulating material and method of manufacturing the same
US11/691,063 US7824097B2 (en) 2006-03-24 2007-03-26 Micro-mechanical part made of insulating material and method of manufacturing the same
HK08103103.0A HK1113948A1 (en) 2006-03-24 2008-03-18 Micro-mechanical part made of insulating material and method of manufacturing the same
JP2013118770A JP5599917B2 (en) 2006-03-24 2013-06-05 Micro mechanical parts incorporated into the clockwork mechanism

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EP06111727A EP1837721A1 (en) 2006-03-24 2006-03-24 Micro-mechanical piece made from insulating material and method of manufacture therefor

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EP1837721A1 true EP1837721A1 (en) 2007-09-26

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WO2014023584A1 (en) * 2012-08-07 2014-02-13 Eta Sa Manufacture Horlogere Suisse Oscillating system for clock movement
EP2804054A1 (en) * 2013-05-17 2014-11-19 ETA SA Manufacture Horlogère Suisse Anti-adhesion device of a spiral on a bridge
US10274897B2 (en) 2015-06-15 2019-04-30 Citizen Watch Co., Ltd. Speed governor for timepiece
EP3667433A1 (en) 2018-12-12 2020-06-17 Nivarox-FAR S.A. Spring and method for manufacturing same

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