EP1561089A1 - Hochempfindliche spektrometeranordnung mit eintrittsspaltarray und detektorarray - Google Patents
Hochempfindliche spektrometeranordnung mit eintrittsspaltarray und detektorarrayInfo
- Publication number
- EP1561089A1 EP1561089A1 EP03785504A EP03785504A EP1561089A1 EP 1561089 A1 EP1561089 A1 EP 1561089A1 EP 03785504 A EP03785504 A EP 03785504A EP 03785504 A EP03785504 A EP 03785504A EP 1561089 A1 EP1561089 A1 EP 1561089A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- array
- slit
- highly sensitive
- gap
- arrangement according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000001228 spectrum Methods 0.000 claims abstract description 44
- 238000011156 evaluation Methods 0.000 claims abstract description 12
- 239000006185 dispersion Substances 0.000 claims abstract description 4
- 230000003287 optical effect Effects 0.000 claims abstract description 3
- 239000000284 extract Substances 0.000 claims abstract 2
- 230000035945 sensitivity Effects 0.000 claims description 6
- 238000007493 shaping process Methods 0.000 claims description 3
- 238000005286 illumination Methods 0.000 claims description 2
- 238000000605 extraction Methods 0.000 claims 1
- 230000003595 spectral effect Effects 0.000 abstract description 12
- 230000001186 cumulative effect Effects 0.000 abstract 1
- 238000005259 measurement Methods 0.000 description 14
- 238000003491 array Methods 0.000 description 7
- 238000009826 distribution Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000000701 chemical imaging Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- IQFVPQOLBLOTPF-HKXUKFGYSA-L congo red Chemical compound [Na+].[Na+].C1=CC=CC2=C(N)C(/N=N/C3=CC=C(C=C3)C3=CC=C(C=C3)/N=N/C3=C(C4=CC=CC=C4C(=C3)S([O-])(=O)=O)N)=CC(S([O-])(=O)=O)=C21 IQFVPQOLBLOTPF-HKXUKFGYSA-L 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012806 monitoring device Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000013598 vector Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/2846—Investigating the spectrum using modulation grid; Grid spectrometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/04—Slit arrangements slit adjustment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/2803—Investigating the spectrum using photoelectric array detector
Definitions
- the invention relates to a highly sensitive spectrometer arrangement according to the preamble of the claims.
- Spectrometers with multi-slit arrangements are known, for example, from DE 198 13 558 C2, DE 198 15 079 AI, DE 198 15 080 Cl.
- the basic goal of the known multi-slit arrangements is the measurement of one spectrum with increased resolution or several spectra with normal resolution.
- a high-resolution spectrum is obtained by combining several normal-resolution spectra images from the different columns
- the object of the present invention is now to determine the parameters of a spectrum which are characteristic of a specific application, such as e.g. the strength or intensity of one or more basic spectra present in this spectrum or e.g. also determine the width or position of a contained spectral line with high accuracy.
- the light to be examined When measuring spectra using spectrometers equipped with a grating or a similar dispersion element, the light to be examined must first pass through a gap at the entrance of the spectrometer. The narrower this gap, the better, apart from diffraction or imaging-limited conditions, the better the resolution and thus the more detailed the measured spectrum. On the other hand, in a large number of applications it is not possible to couple any amount of the actually available light into the gap, since the second principle of thermodynamics prohibits concentration in a diffuse form of light beyond a certain level. This means that the amount of light that can be used is limited by the available slit area multiplied by the aperture ratio of the spectrometer.
- the gap and the detector elements can be made as long as possible and, for example, a beam former based on optical fibers can be used, which illuminates the entire gap.
- a beam former based on optical fibers can be used, which illuminates the entire gap.
- this procedure is limited on the one hand by the imaging errors increasing with increasing slit length and on the other hand by the available detector length.
- the beam shaping optics is a not to be neglected cost factor and also an additional optical element, which due to possible fluorescence effects in the fibers, strong damping effects in certain wavelength ranges and last but not least the minimum diameter of the fibers, which should correspond to the slit width, is not for suitable for all applications.
- a grating spectrometer with a single slit can measure any spectrum it is offered, regardless of the application, according to its resolution data in this respect a universal spectral sensor.
- the information contained in the spectrum can be extracted objectively or subjectively from the measured spectral data of the spectrometer using an evaluation unit.
- it is often not necessary to be able to measure any spectra since only individual parameters, such as the position or width of a spectral line or certain basic spectra in a possibly varying composition, have to be determined anyway.
- the application of the invention results in only a single, scalar value, which is extracted by the evaluation device from the intensity distribution applied to the detector array.
- the use of the slit array enables a higher light throughput, a higher resolution and thus a higher accuracy than a single slit.
- the spectra images caused by the columns of the slit array generally overlap almost completely and give rise to a corresponding sum signal in the detector array.
- the use of at least one fixed slit pattern does not require switching during the measurement. Instead, a pattern is selected which particularly well fulfills the task, for example the distinction between two different signals.
- a suitable slit pattern identically designed individual slits are arranged in a fixed grid in the slit array level, with certain grid spaces remaining free depending on the task, that is to say no slit is preserved.
- these positions can also be referred to as closed columns and those with columns accordingly as open columns.
- a pattern that maximizes the square deviation can now be determined, for example, by a full search across all possible column arrays - ie all possible combinations of open and closed columns. It is also possible to determine a suitable pattern by means of a heuristic, incomplete search if the number of different possible patterns becomes too large, since it is not necessary for the invention to use exactly the best pattern.
- a further increase in performance of the spectra arrangement according to the invention is possible if a shift in the slit positions relative to the associated raster positions is permitted when searching for a suitable pattern.
- the pattern can be optimized in the same way for a maximum minimum distance of the images of the signals to be differentiated. If, on the other hand, a certain property of a individual signals, for example their half-width or center position are determined as precisely as possible, the first derivative of the spectra image is to be maximized according to the parameter of the property to be determined to the maximum square-mean deviation from the zero line. The sum of the squares of the deviations of two signals with different parameters is thus maximized again, these signals differing only infinitesimally.
- the criteria for the production of optimal samples may have to be modified somewhat, but the procedure remains the same. It is also possible to dynamically adapt the pattern to a changing task.
- the spectra image created on the detector array corresponds in a first approximation to the spectra image of an infinitely narrow single slit, folded with the transmission function caused by the slit array, that is to say the slit pattern.
- some Fourier components of the spectrum generated by the slit array are greatly weakened or even canceled, while others are exaggerated.
- the latter components are optimally those in which the different signals to be detected differ most.
- the increase in the number of slits compared to the grating spectrometer with a single slit serves to increase the light throughput.
- Maximum sensitivity is achieved if all available light is concentrated on as few gaps as possible, provided that the slit pattern is optimized in the above sense.
- a fiber-optic beam former can ensure that only open gaps in the slit array are actually illuminated, so that ideally all the available light is used. If fiber-optic beam shaping is not used, make sure that the open gaps are illuminated with the highest possible intensity; because there is no point in expanding the available light in order to be able to illuminate an even larger number of gaps.
- gaps of different widths cause a loss of different high-frequency signal components responsible for the resolution
- a combination of different gap widths can ensure that none of these signal components is suppressed or lost, so that in principle the same result as when using significantly narrower, equally wide gaps can be achieved.
- narrow gaps lead to increased diffraction losses.
- FIG. 2 shows an individual slit and the slit arrays according to the invention corresponding to it
- FIG. 3 summation diagrams for the intensity as a function of the number of slits
- FIG. 5 shows a slit array according to the invention with a slit pattern
- FIG. 6 shows the gain achieved with the slit array according to FIG. 5
- FIG. 7 shows a gap array according to the invention with two gap patterns
- FIG. 8 shows the gain achieved with the gap array according to FIG. 7
- FIG. 9 shows a gap array with gaps of different widths.
- a spectrometer arrangement 10 shown in FIG. 1 has a primary or secondary light source 11, the light 12 of which is to be examined spectrally.
- the light 10 enters a monochromator 14 through a slit array 13, which essentially has a dispersing element 15 and generates a spectral image of the slit array 13 on a detector array 16.
- the detector array 16 outputs measurement signals 17 to camera electronics 18, which in turn outputs image data 19 to an evaluation device 20.
- the camera electronics 18 and the detector array 16 receive control information from this evaluation device.
- the evaluation device 20 evaluates the data and information obtained and displays the extracted parameters, stores them or forwards them to a monitoring device (not shown).
- the gaps in the gap array 13 can be combined in one or more gap patterns arranged one above the other and parallel to one another; they can have the same or different widths.
- the slits can be arranged in a grid with the same or changing grid constant.
- the grid constants of two gap patterns arranged on a gap array can also be different. Basically, as many spectra are generated overlapping on the detector array 16 as there are gaps in each slit pattern of a slit array 13 are.
- the gap array 13 can be replaced in accordance with the respective measurement task.
- FIG. 2 shows a series of uniform gap arrangements 131 to 135. These are gaps which each have dimensions of 15 ⁇ m in width and up to 2 mm in length.
- a single slit which is used for comparison with a conventional spectrometer, and slit arrays with 2, 4, 10 and 48 columns are shown in detail. In the array with 48 columns, the outer columns are adapted to the circular illumination of the spectrometer input and are therefore somewhat shorter than the inner column.
- the sum signals shown in FIG. 3 were measured on a dye spectrum (Congo red). The wavelength specification only refers to the measurement with the single slit.
- the sensitivity when determining the intensity of the broad background signal could be about four or ten times and the sensitivity when determining the amplitude of the narrow peak at about 650 nm could be about two- or three times higher than the measurement with a single slit.
- FIG. 4 shows three diagrams a, b and c, in which the intensity I is plotted over a path x in the plane of the detector array.
- a contains the intensity distribution generated by a single slit
- b shows intensity distributions with a slit pattern m which has three single slits, the intensity distributions 22, 23, 24 being shown offset from one another.
- the sum spectrum 25 can be seen in c, as actually results from the spectral imaging of the three individual columns in the plane of the detector array.
- the gap array 13 according to FIG. 5 has a gap pattern 26 with 32 grid positions, 19 of which are occupied by gaps.
- the slit array maximizes the spectrometer throughput, but at the same time does not suppress any signal component, so that it is also possible to reconstruct the spectral image of a spectrometer with a single slit from the measurement data of the multislit spectrometer.
- the associated diagram in FIG. 6 shows the gain in sensitivity over the spatial frequency, ie for each individual Fourier component of any spectrum to be measured. It can be seen that the gain for all Fourier components is greater than one. The minimum of the gain is a factor of 1.18, the maximum is 19 for the direct component of the measured signal (spatial frequency 0), corresponding to the number of open columns in the split pattern. An average profit of 3.62 is achieved.
- the width of a Gaussian spectral line it is possible to precisely determine the width of a Gaussian spectral line, the approximate width of which is known.
- Such a width determination is usually carried out by adapting a synthetic Gauss line to the measured spectrum. If a multi-slit arrangement were used, a Gauss line of variable width multiplied according to the slit pattern would have to be adjusted accordingly.
- the first derivative of the Gaussian line based on the width parameter for the mean or most likely line width is used as the quadratic difference signal.
- the resulting gap array is then particularly well suited for determining line widths around this underlying mean width value, but can also bring a noticeable gain even with widely differing widths.
- the number of columns used depends on the bundling ability of the light to be measured.
- the gap patterns are given below as sequences of zeros and ones, with a zero for a closed gap and a one stands for an open gap.
- a profit is given for each slit array or slit pattern. This specifies the factor by which the detector noise in the case of the multi-slit arrangement can be higher than that with a single slit in order to be able to determine the sought parameter with the same accuracy.
- the gain in accuracy with regard to the parameter generally depends non-linearly on the noise and is therefore not so easy to specify. For example, it is possible that a line width can still be determined to 10% for a certain detector noise, but that the line width can no longer be determined for a noise that is five times as high.
- a slit pattern for the optimization of the measurement of the line width of an approximately 2 pixel wide Gauss line has the following appearance with a pattern width of 128 columns:
- Pattern width 32 columns in the following distribution: 101010101010100101010101010101 Profit: 5.08047 (16 open positions)
- the above-optimized gap patterns consist of a series of groups of open columns with an approximately proportional number of individual columns to the line width.
- the gap groups are separated by gaps of approximately the same extent as that of the gap groups.
- a slit pattern is sought which brings maximum advantage for any line width in a certain area in the spectral imaging and evaluation.
- the slit pattern is optimized so that the minimum of the profit, that is, the profit with the worst-working line width, becomes maximum. It results With this procedure, exactly the gap pattern that would be optimal for a line width determination with the smallest possible line width. For example, if the possible line widths were between 0.5 and four pixels and the width of the slit pattern was 32, the optimal slit pattern for a medium line width of 0.5 pixels wide would be 101010101010100101010101010101 and the profit would be at least 5,08047 for all line widths.
- FIG. 9 is an example of how narrow slits can be replaced by a combination of wider slits with different slit widths and thus minimizing diffraction losses.
- a two-dimensional gap array with gaps of single and double gap width is shown.
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Spectrometry And Color Measurement (AREA)
Abstract
Description
Claims
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2002153058 DE10253058A1 (de) | 2002-11-11 | 2002-11-11 | Hochempfindliche Spektrometeranordnung |
DE10253058 | 2002-11-11 | ||
PCT/DE2003/003767 WO2004044536A1 (de) | 2002-11-11 | 2003-11-11 | Hochempfindliche spektrometeranordnung mit eintrittssaltarray und detektorarray |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1561089A1 true EP1561089A1 (de) | 2005-08-10 |
Family
ID=32185646
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP03785504A Withdrawn EP1561089A1 (de) | 2002-11-11 | 2003-11-11 | Hochempfindliche spektrometeranordnung mit eintrittsspaltarray und detektorarray |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP1561089A1 (de) |
DE (1) | DE10253058A1 (de) |
WO (1) | WO2004044536A1 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7830507B2 (en) | 2006-02-13 | 2010-11-09 | Optopo Inc. | Spatially patterned substrates for chemical and biological sensing |
DE102014108138B4 (de) | 2014-06-10 | 2016-12-29 | Ernst-Abbe-Fachhochschule Jena | Spektralsensor zur spektralen Analyse einfallenden Lichts |
CN106769898B (zh) * | 2016-12-29 | 2024-01-26 | 同方威视技术股份有限公司 | 多分辨率光谱仪 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5627639A (en) * | 1995-06-06 | 1997-05-06 | Lockheed Missiles & Space Company, Inc. | Coded aperture imaging spectrometer |
DE19815079A1 (de) * | 1998-04-06 | 1999-10-07 | Inst Physikalische Hochtech Ev | Steuerbare Mikrospaltzeile |
DE19821127A1 (de) * | 1998-05-12 | 1999-11-18 | Inst Physikalische Hochtech Ev | Steuerbare Mikrocodezeile, insbesondere für Spektrometer |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5050989A (en) * | 1989-09-21 | 1991-09-24 | The United States Of America As Represented By The Secretary Of The Air Force | Single Hadamard mask spectrograph system |
DE19815080C1 (de) * | 1998-04-06 | 1999-09-09 | Inst Physikalische Hochtech Ev | Anordnung zur Erhöhung der spektralen Ortsauflösung eines Spektrometers |
-
2002
- 2002-11-11 DE DE2002153058 patent/DE10253058A1/de not_active Ceased
-
2003
- 2003-11-11 WO PCT/DE2003/003767 patent/WO2004044536A1/de active Application Filing
- 2003-11-11 EP EP03785504A patent/EP1561089A1/de not_active Withdrawn
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5627639A (en) * | 1995-06-06 | 1997-05-06 | Lockheed Missiles & Space Company, Inc. | Coded aperture imaging spectrometer |
DE19815079A1 (de) * | 1998-04-06 | 1999-10-07 | Inst Physikalische Hochtech Ev | Steuerbare Mikrospaltzeile |
DE19821127A1 (de) * | 1998-05-12 | 1999-11-18 | Inst Physikalische Hochtech Ev | Steuerbare Mikrocodezeile, insbesondere für Spektrometer |
Non-Patent Citations (1)
Title |
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See also references of WO2004044536A1 * |
Also Published As
Publication number | Publication date |
---|---|
DE10253058A1 (de) | 2004-05-27 |
WO2004044536A1 (de) | 2004-05-27 |
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Effective date: 20061103 |
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RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: KOPATZKI, ECKARD Inventor name: POPP, JUERGEN Inventor name: RIESENBERG, RAINER Inventor name: WUTTIG, ANDREAS Inventor name: SCHACHTZABEL, CHRISTIAN |
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RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: INSTITUT FUER PHOTONISCHE TECHNOLOGIEN E.V. Owner name: TEMPLATEC-SOFTWAREENTWICKLUNG CHRISTIAN SCHACHTZAB Owner name: CS CLEAN SYSTEMS AG |
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Effective date: 20081020 |