EP1532848B1 - Lampe a decharge gazeuse - Google Patents

Lampe a decharge gazeuse Download PDF

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Publication number
EP1532848B1
EP1532848B1 EP03792583A EP03792583A EP1532848B1 EP 1532848 B1 EP1532848 B1 EP 1532848B1 EP 03792583 A EP03792583 A EP 03792583A EP 03792583 A EP03792583 A EP 03792583A EP 1532848 B1 EP1532848 B1 EP 1532848B1
Authority
EP
European Patent Office
Prior art keywords
opening
gas discharge
discharge lamp
plasma
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP03792583A
Other languages
German (de)
English (en)
Other versions
EP1532848A1 (fr
Inventor
Dominik Vaudrevange
Klaus Bergmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of EP1532848A1 publication Critical patent/EP1532848A1/fr
Application granted granted Critical
Publication of EP1532848B1 publication Critical patent/EP1532848B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/84—Lamps with discharge constricted by high pressure
    • H01J61/86—Lamps with discharge constricted by high pressure with discharge additionally constricted by close spacing of electrodes, e.g. for optical projection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/073—Main electrodes for high-pressure discharge lamps
    • H01J61/0732—Main electrodes for high-pressure discharge lamps characterised by the construction of the electrode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/073—Main electrodes for high-pressure discharge lamps
    • H01J61/0735—Main electrodes for high-pressure discharge lamps characterised by the material of the electrode

Definitions

  • the invention relates to a gas discharge lamp for generating extreme ultraviolet and / or soft X-radiation according to the preamble of claim 1.
  • Preferred fields of application are those which require extreme ultraviolet (EUV) radiation or soft X-radiation in the wavelength range of about 1-20 nm, in particular by 13 nm, such as EUV lithography or X-ray microscopy.
  • the gas discharge lamp typically consists of an electrode system with anode and cathode, which is connected to a current pulse generator.
  • the discharge space located between the electrodes is gas-filled at pressures in the range of about 1 Pa to 100 Pa. In the discharge space is created by a pulsed current with currents in the single-digit kilo-ampere range up to max.
  • a hollow cathode plasma which is based on Fig. 1 is shown schematically.
  • the electrode system consists here of anode 1 and cathode 2, respectively
  • the discharge space 6 is located on the symmetrical axis 7 shown in phantom a plasma channel 8 before.
  • the plasma emits the radiation, which is indicated by the arrows.
  • the cathode 2 further has a cavity 9, in which charge carriers, in particular electrons, are produced by suitable means for pre-ionization.
  • the starting electrons are formed in self-breakdown.
  • the self-breakdown can be controlled by a trigger electrode in the space 9, whereby the radiation pulses can be triggered precisely in time.
  • a gas pressure of approximately 1 Pa to 100 Pa is present in the discharge space 6.
  • Gas pressure and geometry of the electrodes are chosen so that the ignition of the plasma takes place on the left branch of the Paschen curve. The ignition then takes place in the region of the long electric field lines which occur in the area of the boreholes 3 and 4, respectively.
  • an ionization of the gas takes place along the field lines in the borehole area.
  • This phase creates the conditions for the formation of a plasma in the hollow cathode, which is why we speak of a hollow cathode plasma.
  • This plasma then leads to a low-resistance channel in the electrode gap.
  • a pulsed current which is generated by the discharge of electrically stored energy in a capacitor bank 10, is sent via this channel. The current leads to the compression and heating of the plasma, so that conditions for the efficient emission of characteristic radiation of the used discharge gas in the EUV range are achieved.
  • working gas discharge lamps are, for example, in the WO 99/29145 A1 and the WO 01/01736 A1 described.
  • the latter document also provides various measures to increase the efficiency of converting the injected electrical energy into radiant energy, including choosing a non-through hole conical blank in the anode. By this geometric configuration of the anode well, the radiation efficiency should be increased.
  • the WO 02/07484 A2 discloses a gas discharge lamp in which on a symmetry axis a pinch plasma is created, which emits the radiation in the relevant spectral range.
  • the publication teaches to perform a preionization in an outdoor area by means of a pulsed sliding discharge, wherein the resulting charge carriers are to reach the discharge area via an axial aperture in one of the electrodes. It is provided here that the pre-ionization region does not optically communicate with the axis of the pinch plasma duct.
  • the invention is based on the technical problem of providing a gas discharge lamp with a plasma emitting in the EUV and / or soft X-ray wavelength range, which has an improved stability of the radiation emission.
  • the above-mentioned technical problem is solved by the provision of a gas discharge lamp in which the continuous electrode opening tapers in the direction of the outer region.
  • the diameter of the electrode opening should be larger on the side facing the discharge space than on the side facing away from the discharge space.
  • the external area is to be understood as that space area in which charge carriers can be generated, which can be transported via the through-opening into the discharge space.
  • the invention is based on the finding that an increase in the stability in the emission of radiation, ie an improved consistency in the emission from pulse to pulse, is achieved by largely decoupling the processes in the gas discharge space and in the outer area.
  • the thus improved dielectric strength of the electrode system also allows an increase in the maximum repetition frequency or the maximum repetition rate.
  • the gas discharge lamp according to the invention can be used either in the self-breakdown mode, or alternatively, additional means for pre-ionization can be provided.
  • additional means for pre-ionization can be provided.
  • the tapered cathode opening may be geometrically different. This will be in the illustrated in the illustrated preferred embodiments Fig. 2 to 7 shown an enlargement of the in Fig. 1 reproduced dashed area shown. The enlarged area is shown in the Fig. 2 to 7 across from Fig. 1 turned 90 ° counterclockwise.
  • an electrode opening that tapers in the direction of the outside area has advantages in the erosion of the electrode surface.
  • pulse energies typically several joules to several tens of J are converted. A significant proportion of this energy is concentrated in the pinch plasma, which leads to a thermal load on the electrodes.
  • the thermal load is caused by the emission of radiation and hot particles, such as ions.
  • the distance of the anode from the cathode is typically only a few Millimeters, and the diameter of the electrode opening on the discharge side is typically between 8 mm and 20 mm.
  • the cathode is designed as a hollow cathode and has the continuous, tapered opening.
  • the cavity of the hollow cathode is connected to the discharge space gaszu organizedd. This allows the ignition of a hollow cathode plasma.
  • the largest possible distance between the electrode surface and the pinch plasma would be advantageous.
  • Typical diameters for the opening of the two electrodes are in the range of a few millimeters up to several 10 millimeters. If, on the other hand, larger openings were selected, it would no longer be possible to produce a pinch plasma which emits in the desired spectral range of the EUV and / or soft X-ray radiation, because as the diameter increases, the achievable plasma temperature becomes smaller.
  • the anode opening should therefore also be chosen as large as possible, so that the decoupled from the anode opening radiation is optically accessible as well as possible from large observation angles to the pinch plasma.
  • the cathode is made in the opening area of a different material than in the other areas of the cathode.
  • the opening area may be made of a low-erosion material such as tungsten, molybdenum, or other low-erosion alloys to thereby realize less burnup and / or erosion.
  • the remaining areas of the cathode can then consist of good thermal conductivity material such as copper.
  • the anode opening has a smaller diameter than the cathode opening.
  • this causes longer electric field lines in that these field lines now extend into the opening, for example up to the step in the cathode opening according to FIG Fig. 4 .
  • This allows a reduction of the gas pressure in the Discharge space, which in turn allows an increase in the repetition frequency of the gas discharge lamp.
  • the increase in the repetition frequency leads to a higher degree of decoupled radiation energy.
  • the use of a tapered cathode opening allows a simpler operation of the gas discharge lamp.
  • the person skilled in the art has to select a total of two diameters, namely the diameter of the cathode opening on the side facing the discharge space, and additionally the diameter on the side of the cathode opening facing the outer space.
  • the person skilled in the art gains a further degree of freedom in the operation of the system, by means of which it is easier for him to select suitable operating parameters.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)
  • Incineration Of Waste (AREA)
  • Glass Compositions (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Claims (5)

  1. Lampe à décharge gazeuse pour la gamme d'ondes du rayonnement ultraviolet extrême et/ou du rayonnement X mou, avec au moins deux électrodes (1, 2) pour la génération d'un plasma (8) émettant un rayonnement dans l'espace de décharge (6) se trouvant entre celles-ci, pour laquelle l'une des électrodes (1, 2) présente une ouverture (4) débouchante vers une zone extérieure (9) contigüe, des porteurs de charge pouvant être générés dans la zone extérieure (9) avant la génération du plasma (8) émettant un rayonnement par activation d'un plasma à cathode creuse ou par des moyens prévus dans la zone extérieure pour la préionisation, lesquels peuvent être transportés par l'ouverture (4) dans l'espace de décharge (6),
    caractérisée en ce que l'ouverture d'électrode (4) se rétrécit en direction de la zone extérieure (9).
  2. Lampe à décharge gazeuse selon la revendication 1,
    caractérisée en ce que les électrodes dans la zone d'ouverture sont fabriquées en un matériau qui présente une plus faible érosion que le matériau d'électrode restant par rapport à une érosion par charge thermique.
  3. Lampe à décharge gazeuse selon la revendication 1 ou 2,
    caractérisée en ce qu'une ouverture d'électrode est prévue avec un passage continu ou échelonné.
  4. Lampe à décharge gazeuse selon l'une quelconque des revendications 1 à 3, caractérisée en ce qu'un rétrécissement se présente à l'intérieur de l'ouverture d'électrode.
  5. Lampe à décharge gazeuse selon l'une quelconque des revendications 1 à 4, caractérisée en ce que la cathode est équipée de l'ouverture débouchante se rétrécissant.
EP03792583A 2002-08-21 2003-08-11 Lampe a decharge gazeuse Expired - Lifetime EP1532848B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10238096A DE10238096B3 (de) 2002-08-21 2002-08-21 Gasentladungslampe
DE10238096 2002-08-21
PCT/IB2003/003657 WO2004019662A1 (fr) 2002-08-21 2003-08-11 Lampe a decharge gazeuse

Publications (2)

Publication Number Publication Date
EP1532848A1 EP1532848A1 (fr) 2005-05-25
EP1532848B1 true EP1532848B1 (fr) 2009-10-21

Family

ID=30469797

Family Applications (1)

Application Number Title Priority Date Filing Date
EP03792583A Expired - Lifetime EP1532848B1 (fr) 2002-08-21 2003-08-11 Lampe a decharge gazeuse

Country Status (9)

Country Link
US (1) US7323701B2 (fr)
EP (1) EP1532848B1 (fr)
JP (1) JP4563807B2 (fr)
KR (1) KR100991995B1 (fr)
AT (1) ATE446666T1 (fr)
AU (1) AU2003255933A1 (fr)
DE (1) DE10238096B3 (fr)
TW (1) TWI339402B (fr)
WO (1) WO2004019662A1 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6770895B2 (en) 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
DE10256663B3 (de) * 2002-12-04 2005-10-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungslampe für EUV-Strahlung
US6919573B2 (en) 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool
DE10359464A1 (de) * 2003-12-17 2005-07-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung
DE102005025624B4 (de) * 2005-06-01 2010-03-18 Xtreme Technologies Gmbh Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas
EP1883281B1 (fr) * 2006-07-28 2012-09-05 Sage Innovations, Inc. Un procédé de génération d'un flux pulsé de particules énergétiques, et une source de particules correspondante
US8227771B2 (en) * 2007-07-23 2012-07-24 Asml Netherlands B.V. Debris prevention system and lithographic apparatus

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0201034B1 (fr) * 1985-04-30 1993-09-01 Nippon Telegraph and Telephone Corporation Source de rayons X
DE3927089C1 (fr) * 1989-08-17 1991-04-25 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
US5504795A (en) * 1995-02-06 1996-04-02 Plex Corporation Plasma X-ray source
JP2701775B2 (ja) * 1995-03-17 1998-01-21 日本電気株式会社 プラズマ処理装置
US6232613B1 (en) * 1997-03-11 2001-05-15 University Of Central Florida Debris blocker/collector and emission enhancer for discharge sources
US6016027A (en) * 1997-05-19 2000-01-18 The Board Of Trustees Of The University Of Illinois Microdischarge lamp
DE19753696A1 (de) * 1997-12-03 1999-06-17 Fraunhofer Ges Forschung Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung
US6700326B1 (en) * 1999-06-14 2004-03-02 Osram Sylvania Inc. Edge sealing electrode for discharge lamp
DE19962160C2 (de) * 1999-06-29 2003-11-13 Fraunhofer Ges Forschung Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung
TWI246872B (en) * 1999-12-17 2006-01-01 Asml Netherlands Bv Radiation source for use in lithographic projection apparatus
RU2206186C2 (ru) * 2000-07-04 2003-06-10 Государственный научный центр Российской Федерации Троицкий институт инновационных и термоядерных исследований Способ получения коротковолнового излучения из газоразрядной плазмы и устройство для его реализации
WO2002007484A2 (fr) * 2000-07-04 2002-01-24 Lambda Physik Ag Procede de production de rayonnement a ondes courtes a partir d'un plasma a decharge de gaz et son dispositif de mise en oeuvre
DE10139677A1 (de) * 2001-04-06 2002-10-17 Fraunhofer Ges Forschung Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung
DE10151080C1 (de) * 2001-10-10 2002-12-05 Xtreme Tech Gmbh Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung
DE10256663B3 (de) * 2002-12-04 2005-10-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungslampe für EUV-Strahlung
DE102005041567B4 (de) * 2005-08-30 2009-03-05 Xtreme Technologies Gmbh EUV-Strahlungsquelle mit hoher Strahlungsleistung auf Basis einer Gasentladung

Also Published As

Publication number Publication date
EP1532848A1 (fr) 2005-05-25
ATE446666T1 (de) 2009-11-15
AU2003255933A1 (en) 2004-03-11
KR100991995B1 (ko) 2010-11-04
DE10238096B3 (de) 2004-02-19
TWI339402B (en) 2011-03-21
US7323701B2 (en) 2008-01-29
KR20050058347A (ko) 2005-06-16
JP2005536844A (ja) 2005-12-02
TW200419614A (en) 2004-10-01
US20060113498A1 (en) 2006-06-01
JP4563807B2 (ja) 2010-10-13
WO2004019662A1 (fr) 2004-03-04

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