EP1532294A2 - Method for producing a foam metallic structure, metallic foam, and arrangement consisting of a carrier substrate and metallic foam - Google Patents
Method for producing a foam metallic structure, metallic foam, and arrangement consisting of a carrier substrate and metallic foamInfo
- Publication number
- EP1532294A2 EP1532294A2 EP03790658A EP03790658A EP1532294A2 EP 1532294 A2 EP1532294 A2 EP 1532294A2 EP 03790658 A EP03790658 A EP 03790658A EP 03790658 A EP03790658 A EP 03790658A EP 1532294 A2 EP1532294 A2 EP 1532294A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- substrate
- conductive particles
- metal
- metal layer
- adhesion promoter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/2086—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1644—Composition of the substrate porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
- C25D5/56—Electroplating of non-metallic surfaces of plastics
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
- Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
- Y10T428/12063—Nonparticulate metal component
Definitions
- the invention relates to a method for producing a foam-shaped metal structure, a metal foam and an arrangement of a carrier substrate and a metal foam.
- a known manufacturing process consists of foaming aluminum to about 1.5 times its volume.
- the resulting foam-shaped metal structure is closed-pore, ie has a large number of pores per unit volume.
- the production of this foam-like metal structure from aluminum is extremely expensive and is also questionable for ecological reasons.
- Another known method is to vapor-coat a non-conductive plastic substrate, which has a foamed, ie pore-like, structure with metal.
- the plastic substrate must be in plate form and must not exceed 1 - 2 mm in thickness.
- the vapor deposition takes place from both opposite main sides of the substrate. Only with this small thickness is it ensured that the surface of the plastic substrate can also be provided with a metal layer in the interior.
- the plastic substrate pretreated in this way is introduced into a galvanizing device, as a result of which the thin metal layer on the surface of the foamed substrate is galvanically reinforced. Because of the extraordinarily large manufacturing effort Because of its high cost, the foam-like metal structure produced in this way is currently not widely used in industrial use.
- a particular disadvantage is that the thickness and the shape (plate shape) of the plastic substrate is limited due to the production technology.
- the object of the present invention is therefore to provide a method for producing a foam-shaped metal structure, which allows the production of an inexpensive and arbitrarily designed metal foam. Furthermore, a metal foam and an arrangement of a carrier substrate and a metal foam are to be specified, which can have any shape and are suitable for use in a wide variety of industrial applications.
- the inventive method for producing a foam-shaped metal structure is indicated by the features of claim 1.
- the metal foam according to the invention is described by the features of claim 21.
- the arrangement of a carrier substrate and a metal foam according to the invention is represented by the features of claim 33.
- a galvanizing process is used to produce the foam-like metal structure. This means, before the electroplating step can be carried out, the surface of a non-conductive substrate with foamed, i. H. Porous structure have been provided with a conductive surface.
- the process according to the invention enables one to produce a homogeneous, conductive surface in interior areas even if the substrate has a large thickness or an otherwise arbitrary shape.
- the method according to the invention creates a possibility with which galvanization in the inner regions of the substrate with a foamed structure can be reliably achieved.
- the method according to the invention for producing a foam-like metal structure no longer has these restrictions and comprises the following steps:
- the substrate can be a commercially available foam, e.g. B. made of polyurethane.
- the substrate can be in the form of an endless product, a plate product or any shape.
- the conductive particles are preferably fixed to the surface of the substrate by means of an adhesion promoter which is applied to the entire surface of the substrate before the step of applying the conductive particles.
- An adhesive is preferably used as the adhesion promoter, which is thin enough that it penetrates into the pores of the substrate and covers the surface of each individual pore web there.
- the adhesion promoter can be applied to the substrate, for example, by soaking it in the adhesion promoter. So that the pores of the substrate are not completely filled with the adhesion promoter, which would prevent the conductive particles from accumulating on the surface in the pores of the substrate, the adhesion promoter not adhering to the surface of the substrate is preferably removed again. This can be done, for example, in a simple manner by pressing out the initially flexible, non-conductive substrate.
- Adhesion promoter adhering to the substrate is dried or at least dried. In this case too, however, it must be ensured that the adhesive properties of the adhesion promoter remain undiminished, so that the conductive particles applied later can be fixed to the surface of the substrate via the adhesion promoter.
- the conductive particles which can be, for example, copper, silver, any other conductive material, an alloy or a polymer, are applied, for example, by inflation (for example by means of a nozzle) or by using an adhesion promoter provided substrate is immersed in a container with conductive particles. If the substrate is a flat substrate, the conductive particles can be applied from one main side or from two opposite main sides simultaneously or in succession. If it is an arbitrarily shaped substrate with a three-dimensional shape, it is advantageous to apply the conductive particles from different sides to ensure that conductive particles enter each pore.
- the conductive particles are fixed to the adhesion promoter when they are applied.
- the further applied (eg inflated) conductive particles no longer adhere to the surface of the substrate, but remain "exposed” in the pores.
- part of the conductive particles is thus fixed to the adhesion promoter, while another part is embedded in the pores of the substrate in a free-lying or freely movable manner. The latter are referred to below as further conductive particles.
- Metal layer takes place, it can be advantageous to carry out a pressing of the substrate after the application of the conductive particles, through which at least some of the further conductive particles are removed from the substrate and through which another part is brought into intimate contact with the adhesion promoter.
- the other part of the conductive particles is due to the ones already adhering to the substrate Particles and some of the "exposed" particles are formed.
- the pressing out of the substrate can be accomplished by rollers that are guided over the substrate, or by knocking or squeezing out.
- This step is intended on the one hand to better mechanically fix part of the substrate conductive particles are achieved with the adhesion promoter, on the other hand it should be ensured that the pores of the substrate are not or not completely filled with further conductive particles that are not fixed with the adhesion promoter.
- the proportion of the exposed, further conductive particles in the pores of the substrate can saturate the electrolyte the inner regions of the substrate can be controlled. How many of the conductive particles should remain exposed in the pores ultimately depends on the metallization process used and also an optimization process.
- the conductive particles are applied in such a way that there is an excess of further conductive particles, which are not bound to the adhesion promoter, in the inner region of the substrate and can be ionized in the electroplating device.
- the further conductive particles can be dispensed with.
- the term “entire surface” is not only to be understood as the visible part of the substrate. Since the substrate has a foamed structure, that is has a large number of pores formed by pore webs, the “entire surface” is thus formed by surfaces of all pores. The “entire surface” thus also includes all undercuts that are not externally visible.
- a first variant it can be generated by electroless metallization with a metal deposit on the conductive particles by reduction.
- the substrate is thus immersed in a chemical bath, whereby a reductive chemical deposit, e.g. from Cu or Ni.
- a reductive chemical deposit e.g. from Cu or Ni.
- the homogeneous metal layer can be produced by electroless metallization using an ion exchange process.
- base ions e.g. Cu ions
- noble ions e.g. from Ag.
- the metal layer can be done very quickly with this method, however, no large layer thicknesses are possible.
- galvanic metallization can also be carried out using a current source.
- the pretreated substrate described above with conductive and further conductive - ie exposed, particles not fixed to the adhesion promoter or the surface of the substrate - is introduced into a galvanizing device in which the conductive particles fixed to the surface of the substrate via the adhesion promoter are electroplated should be strengthened.
- the electroplating device can be carried out in a conventional manner and has at least one anode device which is located in an electrolyte is.
- the electrolyte can be acidic or cyanide.
- the substrate provided with the conductive particles is switched cathodically, so that ions separated from the anode device initially accumulate on the outer regions of the substrate and galvanically reinforce the conductive particles fixed on the surface via the adhesion promoter.
- the electrolyte in the interior of the substrate becomes poor, so that the ions deposited by the anode device do not contribute to galvanic amplification in the inner region of the substrate.
- the further conductive particles (not fastened to the adhesion promoter) in the inner regions of the substrate dissolve in the acidic or cyanide electrolyte during the electroplating process and immediately thereafter to the conductive ones fixed to the adhesion promoter or substrate Accumulate particles.
- the desired galvanic reinforcement of the conductive particles fixed to the adhesion promoter takes place in the inner regions of the substrate.
- the conductive particles exposed in the pores of the substrate thus saturate the electrolyte again and are immediately deposited again on the cathodically connected conductive particles fixed to the coupling agent. The electrolyte thus self-accumulates.
- the electrolyte of the galvanizing device is adapted to the material of the conductive particles.
- the conductive particles consist of copper, for example, then a copper electrolyte should also be used, because here the exposed copper particles are converted into copper sulfate in a bath such as sulfuric acid and can therefore be deposited as an elemental metal in ion form.
- current can be applied to the electrodes continuously.
- galvanic metallization with a current source is also conceivable, which is switched in the pulse method.
- the self-enrichment of the electrolyte can be dispensed with by placing the substrate in a relative movement with respect to the electrolyte at predetermined intervals.
- the relative movement moves the inner regions of the substrate from regions with depleted electrolytes to regions with sufficiently enriched electrolytes.
- the relative movement can be brought about by a movement of the substrate in the electrolyte or a flow of the electrolyte generated at regular intervals through the substrate.
- the relative movement should take place during the currentless phase of the electroplating process, so that the electrolyte can accumulate inside the substrate.
- the thickness of the homogeneous metal layer then formed can be controlled.
- the method according to the invention enables the production of any foam-shaped metal structure in a simple manner, regardless of the configuration of the non-conductive starting substrate.
- the thickness of the homogeneous metal layer that then arises and the speed with which the metal layer is produced can be controlled.
- the foam-like metal structure can be produced extremely inexpensively and quickly using the method specified.
- a further metal layer is applied to the substrate provided with a homogeneous metal layer which extends over the entire surface. The application of the further metal layer brings about a further improvement in the mechanical stability of the metal foam.
- the thickness of the metal layer could also be produced by means of the currentless or current-carrying methods, as described above, it is easier and cheaper to produce a further metal layer by immersing the substrate in a melt of the further metal.
- the other metal is preferably made of aluminum, since this ensures high mechanical stability with a low weight.
- the use of any other metal or alloy is also conceivable.
- An advantage of this further process step is that the additional metal layer is inexpensive because a large layer thickness can be produced in the shortest possible time. Immersing the substrate in a molten metal has only become possible by providing the non-heat-resistant substrate made of a non-conductive material (e.g. polyurethane) with a heat-resistant, homogeneous metal layer. If it is possible to produce a foam-shaped substrate from a heat-resistant material, the method step described could of course also be used without first producing a metal layer on the surface of the substrate.
- a non-conductive material e.g. polyurethane
- the substrate provided with the adhesion promoter is placed on a carrier substrate, for. B. made of a metal, an alloy or a non-conductive plastic, and then carried out from the side facing away from the carrier substrate, the step of applying the conductive particles.
- This process step creates an arrangement of a carrier substrate and a metal foam in which the metal foam is firmly connected to the carrier substrate by the galvanization.
- the substrate is first fixed on the carrier substrate via the adhesion promoter.
- the conductive particles When the conductive particles are applied, they stick to the adhesion promoter on or in the non-conductive substrate with a foamed structure and also to the surface of the carrier substrate.
- a homogeneous metal layer is formed which forms both on the carrier substrate and on and in the non-conductive substrate with a foamed structure. Due to the homogeneity of the metal layer, a unit is created between the carrier substrate and the metal foam that is then produced. If necessary, the additional metal layer can also be produced by immersing it in a molten metal.
- Such arrangements of a carrier substrate and a metal foam can be used, for example, in the automotive industry for back-foaming molded parts, for. B. bumpers, fenders or the like can be used.
- Such an arrangement is mechanically extremely resilient, while at the same time being lightweight.
- the manufacture as is apparent from the previous description, is extremely easy to implement, as a result of which the costs can be kept low.
- such arrangements in the area of motor vehicle parts also have a noise-insulating function.
- the metal foam is arranged between two carrier substrates for insulation and stabilization purposes.
- the arrangement can be used as a wall.
- the process can be varied in such a way that a firm connection to the two opposite carrier substrates is ensured.
- the surface of the substrate is provided with conductive particles on which a homogeneous metal layer is arranged.
- the substrate is preferably open-pore and has a maximum of 50 ppi (pores per inch).
- the metal foam can have any shape, which depends in particular on the shape of the underlying substrate. In particular, the substrate can have a thickness of more than 3 mm.
- the conductive particles are attached to the substrate via an adhesion promoter, which may be an adhesive, for example.
- the conductive particles can be arranged on the substrate or the adhesion promoter with or without an embedding compound surrounding them.
- the embedding compound is preferably dispensed with.
- the conductive particles are embedded in the surface of the substrate. This could be done, for example, by introducing the conductive particles into the starting material of the substrate to be manufactured. After manufacturing the foam
- the conductive particles are embedded in the substrate, at least some of which are located on the surface.
- the conductive particles are preferably arranged in a scale-like manner with respect to one another, whereby on the one hand an approximately before the thickness of the layer formed by the particles results and on the other hand the desired electrical contact between the particles is established. This enables a particularly uniform, homogeneous metal layer.
- the layer formed by the conductive particles preferably has a thickness of less than 5 ⁇ m.
- a further metal layer is arranged on the metal layer, which can, but does not have to, consist of another metal.
- the arrangement according to the invention consists of a carrier substrate and a metal foam, in which the metal foam is firmly connected to the carrier substrate via the homogeneous metal layer which is produced during the production of the metal foam.
- the carrier substrate can be made of any material, e.g. a metal, an alloy or a non-conductive material.
- the carrier substrate can have any shape, in particular have a flat or any curved three-dimensional surface.
- FIG. 1 shows a substrate with a foamed structure that can be used as a basis for the method according to the invention
- FIGS. 2, 2a show an enlarged detail from the substrate of FIG. 1,
- FIG. 3 shows an electroplating device with which the method according to the invention can be carried out
- Figure 4 shows an arrangement of a carrier substrate and a metal foam in a first embodiment
- Figure 5 shows an arrangement of a carrier substrate and a metal foam in a second embodiment.
- FIG. 1 shows a flat, non-conductive substrate 10 which comprises a foamed, i.e. H. Pore-containing structure.
- the substrate is made of polyurethane, for example, but can in principle be made of any non-conductive material.
- the reference numeral 11 designates pores as they occur with any foamed structure. The size of the pores can be determined by the manufacture of the non-conductive substrate. Substrates with a foamed structure are roughly divided into open- or closed-pore foams.
- the invention uses open-pore foams as the starting material, preferably with a maximum of 50 ppi. Such substrates can be manufactured in endless or plate form.
- the method according to the invention can be used regardless of the size of the pores of the substrate and the configuration of the substrate. This means that the cuboid or plate-like shape of the substrate 10 shown in FIG. 1 with two opposite main sides 13, 14 is not absolutely necessary.
- FIG. 2 shows an enlarged detail from the substrate 10 of FIG. 1.
- FIG. 2 shows the substrate 10 after the application of an adhesion promoter 15, which is arranged along the entire surface 12 of each individual pore 11, and after the application of the conductive particles 16 and further conductive particles 16a.
- the reference numeral 16 denotes those conductive particles which are fixed to the adhesion promoter 15, which may be an adhesive, for example.
- the reference numeral 16a denotes those conductive particles which are located freely in the interior of the pores 11. In particular, the conductive particles 16a are not fixed to the adhesion promoter 15. This distinction is important in the case of galvanic metallization with a current source, since the substrate pretreated according to FIG. 2 is connected cathodically after being introduced into a galvanizing device (FIG. 3).
- inner regions denotes those regions of the substrate 10 which are not located in the region of a main side 13 or any other side of the substrate 10. Accordingly, those pores which are adjacent to the main side 13 or another main side of the substrate 10 are referred to as “outer regions” of the substrate.
- the distinction is made because the galvanic reinforcement in the outer regions of the substrate is carried out by the ions deposited by the anode device 32 and accumulation on the conductive particles 16. If there were no further conductive particles 16a in the inner regions of the substrate 10, the electrolyte would become poor immediately in the transition region from the outer regions to the inner regions, so that galvanic reinforcement would not be possible in the inner regions.
- the further conductive particles 16a now serve to compensate for this depletion of the electrolyte 34 and instead to ensure a temporary saturation of the electrolyte in the inner regions. The saturation takes place due to the dissolution of the further conductive particles 16a.
- the ions that form are deposited directly on the conductive particles 16 in the inner regions of the substrate 10 and thus provide the desired galvanic reinforcement.
- the result is a homogeneous metal layer along the surface 12 of the substrate 10.
- a thicker or thinner homogeneous metal layer 17 can be achieved.
- Further parameters for controlling the thickness of the metal layer 17 are the current intensity applied to the anode device 32 and the selection of the electrolyte 34.
- the described method can be combined with an electroless metallization with precipitation by reduction or with an electroless metallization with ion exchange methods, these methods then being carried out before the galvanization described.
- the production of the homogeneous metal layer is of course also only possible with the two methods just mentioned.
- the production of the homogeneous metal layer can also be achieved by using a pulse process.
- the depleted electrolyte is exchanged for enriched electrolyte by causing the substrate to move relative to the electrolyte. The relative movement always takes place when the electrodes are not supplied with current.
- the metal foam already present can be immersed in a metal melt, for example made of aluminum. Due to the metallization of the substrate, the substrate can easily withstand the high temperatures of the melt. After the dipping process, a further metal layer 18 is formed on the metal layer 17, which brings about an even better stability of the metal foam. Which material is used as the basis for the further metal layer depends, among other things, on how well it combines with the material of the metal layer.
- the further metal layer 18 is shown in FIG. 2a only for illustration in some of the pores 11.
- the schematic galvanizing device 30 shown in FIG. 3 consists in a conventional manner of a trough 31 which is filled with an electrolyte 34.
- An anode device 32 is arranged in the electrolyte 34, which in the present exemplary embodiment consists of two opposite anodically connected plates, between which the pretreated substrate according to FIG. 2 is arranged. As already described, the pretreated substrate 10 is switched cathodically. It is advantageous if the electrolyte 34 can be set in a flow so that the substrate 10 can be exposed to a flowing electrolyte 34. However, the invention also works when the electrolyte is static.
- FIGS. 4 and 5 schematically show two arrangements of a carrier substrate and a metal foam, in which the metal foam is firmly connected to the carrier substrate via the homogeneous metal layer by the galvanization.
- the arrangement can be planar (FIG. 4) or three-dimensional (FIG. 5).
- the firm connection between the substrate 10 and the carrier substrate 20 arises from the fact that the substrate 10 was first provided with an adhesion promoter and then applied to the carrier substrate 20.
- the conductive particles which can be present, for example, in powder form, are now applied from the side 20 facing away from the carrier substrate. The application can take place, for example, by means of inflation. The conductive particles thus not only stick to the surfaces of the substrate 10 provided with the adhesion promoter, but also in the areas of the carrier substrate 20 which are wetted with the adhesion promoter.
- a homogeneous metal layer is thus formed, which extends along the surface of the carrier substrate 20 extends to the surface of the substrate 10.
- Such arrangements can preferably be used in the automotive industry for back-foaming molded parts (e.g. bumpers or fenders).
- the arrangements produced in this way are extremely robust, light, inexpensive to produce and also lead to insulation protection.
Abstract
Description
Claims
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10238284A DE10238284B4 (en) | 2002-08-21 | 2002-08-21 | Method for producing a foam-shaped metal structure, metal foam and arrangement from a carrier substrate and a metal foam |
DE10238284 | 2002-08-21 | ||
PCT/DE2003/002560 WO2004020696A2 (en) | 2002-08-21 | 2003-07-30 | Method for producing a foam metallic structure, metallic foam, and arrangement consisting of a carrier substrate and metallic foam |
Publications (1)
Publication Number | Publication Date |
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EP1532294A2 true EP1532294A2 (en) | 2005-05-25 |
Family
ID=31501839
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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EP03790658A Withdrawn EP1532294A2 (en) | 2002-08-21 | 2003-07-30 | Method for producing a foam metallic structure, metallic foam, and arrangement consisting of a carrier substrate and metallic foam |
Country Status (6)
Country | Link |
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US (2) | US7192509B2 (en) |
EP (1) | EP1532294A2 (en) |
JP (1) | JP2005536643A (en) |
DE (1) | DE10238284B4 (en) |
TW (1) | TWI240007B (en) |
WO (1) | WO2004020696A2 (en) |
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DE112011103087T5 (en) * | 2010-09-15 | 2013-10-24 | Sumitomo Electric Industries, Ltd. | Process for producing an aluminum structure and aluminum structure |
US20180171093A1 (en) * | 2015-02-25 | 2018-06-21 | Universität Bayreuth | Metallized open-cell foams and fibrous substrates |
KR102166464B1 (en) * | 2016-11-30 | 2020-10-16 | 주식회사 엘지화학 | Preparation method for metal foam |
KR102218856B1 (en) | 2016-11-30 | 2021-02-23 | 주식회사 엘지화학 | Preparation method for metal foam |
KR102218854B1 (en) * | 2016-11-30 | 2021-02-23 | 주식회사 엘지화학 | Preparation method for metal foam |
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KR102184386B1 (en) * | 2017-09-15 | 2020-11-30 | 주식회사 엘지화학 | Preparation method for composite material |
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JP3151801B2 (en) * | 1995-06-19 | 2001-04-03 | 住友電気工業株式会社 | Battery electrode substrate and method of manufacturing the same |
JP3386634B2 (en) * | 1995-07-31 | 2003-03-17 | 松下電器産業株式会社 | Alkaline storage battery |
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LU90640B1 (en) * | 2000-09-18 | 2002-05-23 | Circuit Foil Luxembourg Trading Sarl | Method for electroplating a strip of foam |
DE10145750A1 (en) * | 2001-09-17 | 2003-04-24 | Infineon Technologies Ag | Process for producing a metal layer on a carrier body and carrier body with a metal layer |
DE10145749A1 (en) | 2001-09-17 | 2003-04-24 | Infineon Technologies Ag | Process for producing a structured metal layer on a carrier body and carrier body with a structured metal layer |
-
2002
- 2002-08-21 DE DE10238284A patent/DE10238284B4/en not_active Expired - Fee Related
-
2003
- 2003-07-30 JP JP2004531429A patent/JP2005536643A/en active Pending
- 2003-07-30 WO PCT/DE2003/002560 patent/WO2004020696A2/en active Application Filing
- 2003-07-30 EP EP03790658A patent/EP1532294A2/en not_active Withdrawn
- 2003-07-30 TW TW092120924A patent/TWI240007B/en not_active IP Right Cessation
-
2005
- 2005-02-18 US US11/062,318 patent/US7192509B2/en not_active Expired - Fee Related
-
2006
- 2006-12-05 US US11/566,856 patent/US20070099020A1/en not_active Abandoned
Non-Patent Citations (1)
Title |
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See references of WO2004020696A2 * |
Also Published As
Publication number | Publication date |
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US7192509B2 (en) | 2007-03-20 |
US20050194259A1 (en) | 2005-09-08 |
TW200409824A (en) | 2004-06-16 |
DE10238284A1 (en) | 2004-03-11 |
WO2004020696A3 (en) | 2005-01-20 |
US20070099020A1 (en) | 2007-05-03 |
TWI240007B (en) | 2005-09-21 |
WO2004020696A2 (en) | 2004-03-11 |
JP2005536643A (en) | 2005-12-02 |
DE10238284B4 (en) | 2004-11-18 |
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