EP1432972A1 - Procede de traitement du signal destine a la surveillance, in situ, des particules par un faisceau d'exploration - Google Patents
Procede de traitement du signal destine a la surveillance, in situ, des particules par un faisceau d'explorationInfo
- Publication number
- EP1432972A1 EP1432972A1 EP02798193A EP02798193A EP1432972A1 EP 1432972 A1 EP1432972 A1 EP 1432972A1 EP 02798193 A EP02798193 A EP 02798193A EP 02798193 A EP02798193 A EP 02798193A EP 1432972 A1 EP1432972 A1 EP 1432972A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- pulse
- process according
- pulses
- particle
- measurement volume
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000002245 particle Substances 0.000 title claims abstract description 107
- 238000011065 in-situ storage Methods 0.000 title description 7
- 238000012544 monitoring process Methods 0.000 title description 6
- 238000003672 processing method Methods 0.000 title description 4
- 238000000034 method Methods 0.000 claims abstract description 72
- 230000008569 process Effects 0.000 claims description 54
- 238000005259 measurement Methods 0.000 claims description 42
- 238000012545 processing Methods 0.000 claims description 33
- 238000001514 detection method Methods 0.000 claims description 12
- 238000001914 filtration Methods 0.000 claims 2
- 238000004458 analytical method Methods 0.000 abstract description 3
- 235000012431 wafers Nutrition 0.000 description 10
- 230000003287 optical effect Effects 0.000 description 8
- 230000002596 correlated effect Effects 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 238000004364 calculation method Methods 0.000 description 5
- 238000013459 approach Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000000149 argon plasma sintering Methods 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 238000012805 post-processing Methods 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 230000007812 deficiency Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 229920013636 polyphenyl ether polymer Polymers 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000005315 distribution function Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000000827 velocimetry Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/02—Investigating particle size or size distribution
- G01N15/0205—Investigating particle size or size distribution by optical means
- G01N15/0211—Investigating a scatter or diffraction pattern
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/02—Investigating particle size or size distribution
- G01N15/0205—Investigating particle size or size distribution by optical means
- G01N15/0211—Investigating a scatter or diffraction pattern
- G01N2015/0216—Investigating a scatter or diffraction pattern from fluctuations of diffraction pattern
Definitions
- This invention relates to the field of semiconductor wafer processing, and more particularly to a method for analyzing the signals resulting from a scanned beam particle monitor.
- ISPM sensors can provide continuous monitoring of particulate contamination levels during key semiconductor process operations. Based upon light-scattering detection techniques, ISPM sensors are typically installed downstream of the process chamber, such as to a pump-line, and provide real-time measurement of variations in particle concentration and size during wafer processing.
- a particle depositing on a processed wafer cannot be measured with the sensor in the pump-line configuration.
- ISPM sensor applications often produce poor correlation with the number of particles that deposit directly on the product wafer surface.
- the particle detection volume for ISPM sensors is also limited by the small cross-sectional area of the laser beam which is illuminating the particle (s).
- an advanced above wafer in-situ particle monitoring (hereinafter AWISPM) sensor has been developed.
- AWISPM advanced above wafer in-situ particle monitoring
- U.S. Patent No. 5,943,130 the entire contents of which are herein incorporated by reference
- an AWISPM sensor is capable of monitoring particulate contamination levels within the process chamber.
- the sensor incorporates a scanned laser beam to create a large detection volume compared to stationary laser beam systems previously known to ISPM sensor technologies. Since the detection volume is only approximately 4 mm above the wafer surface, the capture rate of the AWISPM sensor is enhanced for particles that will deposit directly upon the wafer surface. The capture rate for particulate contamination is also improved by the larger detection volume, which provides a significant increase in the volumetric sampling rate.
- the AWISPM sensor provides information regarding the actual count, size, and velocity (speed) of the detected particles.
- a scanned laser beam is used to detect the presence of the particle (s)
- a particle will be detected multiple times as it passes through the measurement volume, if the particle drift velocity is small compared with the laser beam velocity at the sample volume.
- Laser scanning is accomplished using either a resonant scanner or a rotating polygonal mirror. Either optical device results in a precisely defined period (e.g., frequency) associated with the scanned beam. This defined period forms the basis of the present invention, allowing the detection and isolation of particle-pulse-envelopes (PPE's) from the continuous stream of low level electronic and optical noise (stray light) that is typically included in the observed signal.
- PPE's particle-pulse-envelopes
- the principle contribution of the signal-processing algorithm is a substantial decrease in the level of false alarm counts at the minimum particle size detectability limit. Since the data stream is analyzed in the time domain relative to the scan frequency, PPE detection at or near signal-to-noise ratios of one can be accomplished.
- PPE particle pulse envelope
- the light pulse that is scattered by each scanned particle crossing through the measurement volume is initially detected by a photo- multiplier.
- the electrical current output from the photo-multiplier is then converted by conventional means into a voltage pulse, which is subsequently amplified such as for example, by means of a high-speed, two stage analog amplifier.
- a level- triggering device such as a discriminator, eliminates those signals that do not exceed a minimum threshold value.
- the pulse train exiting the discriminator is analyzed with a peak-detector to determine the maximum value of the pulse.
- This value, as well as the pulse time stamp (micro-second resolution) is stored, for example, on a computer hard disk or in the memory of a microprocessor, for post processing using a preferred signal- processing technique which is described below.
- the signal processing method of the present invention is comprised of three primary functions: 1) noise removal through analysis in the time domain; 2) identification of particle-pulse envelopes (PPEs) through forward and reverse autocorrelation; and 3) Gaussian fitting to each particle-pulse envelope for particle size and speed estimates.
- PPE identification through forward and reverse autocorrelation is particularly important since it facilitates identification of singular particle scattering events. Achieving these count statistics is a primary objective of AWISPM sensor measurement.
- An individual pulse can be confirmed as being either signal or noise by determining whether or not it is part of a PPE. This determination is accomplished by looking ahead and behind the pulse (in the time domain) for a second pulse that lags or leads within the scanner frequency.
- the signal-processing algorithm begins searching for PPE's.
- An autocorrelation calculation in the forward and reverse directions is used to identify the beginning and end of an individual PPE.
- the autocorrelation is high in the forward direction and zero in the reverse autocorrelation.
- autocorrelation is high in the reverse direction and zero in the forward direction.
- a Gaussian fitting routine is applied. The algorithm begins with an assumed Gaussian mean, width, and amplitude. Each of these values are subsequently iterated to produce minimum error between the peak pulse amplitudes and the value of the Gaussian fit.
- the Gaussian fit is crucial to the determination of particle characteristics, such as size and velocity. Once the fit of an envelope is obtained, the peak amplitude of the Gaussian fit is used to determine particle size while the slope of the Gaussian fit coupled with the diameter of the laser beam at the measurement volume together are used to determine particle velocity.
- FIG. 1 is a pictorial representation of a known in situ particle measurement system
- FIG. 2 is a pictorial representation of an in situ particle measurement system made in accordance with the present invention
- FIG. 3 is a partial sectioned side elevational view of a particle detecting system made in accordance with the invention
- FIG. 4 is a graphical representation of multiple light scattering events as detected using the particle detecting system of FIGS. 2 and 3;
- FIG. 5 is a graphical representation of typical pulse-particle envelopes detected using the system of FIGS. 2 and 3;
- FIG. 6 is an enlarged graphical representation of a pulse-particle envelope using the processing method of the present invention.
- FIG. 7 is a graphical representation of filtered and non-filtered noise pulses in the time domain
- FIG. 8 is a typical pulse envelope and forward and reverse autocorrelation so as to identify the start and end of the pulse particle envelope
- FIG. 9 is a typical pulse particle envelope and an associated Gaussian fit adjusted for mean, width, and amplitude adjustments, respectively thereof;
- FIG. 10 is a graphical representation of a series of scattering pulse amplitude distributions.
- FIG. 11 is a flowchart indicating the method in accordance with an embodiment according to the present invention. Detailed Description
- the system 10 includes a laser diode 14 which emits a fixed collimated light beam 24 across a measurement volume, such as a pump line 22.
- a beam dump 18 disposed oppositely from the laser diode 14 is used to collect the resulting light beam 24 in order to minimize background light.
- Particles 37 crossing the measurement volume cause the light beam 24 to back, forward or side scatter with the resulting light 31 being detected by an orthogonally arranged detector assembly 30 having a photocell 34 which receives focused scattered light through an collection optical system 32. Peak detection is employed on resulting voltage spikes from the scattered fixed beam to count particles over a preset threshold.
- FIG. 2 there is pictorially shown an ISPM particle sensor assembly 40 in accordance with the present invention which can be used in conjunction with a semiconductor processing apparatus.
- the above assembly 40 includes a transmitter 44 and a receiver 48.
- the transmitter 44 includes a laser diode 52 as well as a scanning mirror 56 which is oscillated by a motor (not shown) wherein a resulting scanning laser beam 60 exits into a measurement volume, such as a pump line 66.
- the laser beam 60 sweeps the pump line 66 at a predetermined frequency.
- the receiver 48 is arranged oppositely from the transmitter 44 and is arranged to receive the scanned laser beam 60.
- the receiver 48 includes a beam stop 70 that collects direct laser light. Particles 78 within the measurement volume scatter light from the scanned laser beam 60, shown as 80, which is directed through an set of collecting optics 74 to a photo-multiplier tube 68. As opposed to the previously illustrated detection system, particles can be impinged many times by the scanned laser beam 60, depending upon the particle's size and velocity.
- Fig. 3 illustrates a more detailed version of the pictorial particle detector assembly of Fig. 2 in accordance with a preferred embodiment of the invention.
- the detector assembly 100 includes three interconnected major sections comprising a transmitter 104, a receiver 108 and a spool section 112 which interface with a processing tool (not shown).
- the spool section 112 is a cylindrical hollow pipe-like portion which includes flanges 116, 118 permitting the section to be attached to respective portions of the pump line of the processing tool. As shown herein, particles exiting from the tool's processing chamber (not shown) enter the pump line (not shown) and are directed through the spool section 112 as depicted by arrow 120.
- the transmitter 104 includes a laser 124, such as a laser diode, which is arranged within a housing 128 as well as a scanning element 132, such as a rotating mirror, which is driven by a motor (not shown).
- a laser 124 such as a laser diode
- a scanning element 132 such as a rotating mirror
- Other optical means can be provided in lieu of a rotating mirror, such as a resonant scanner or other known means in order to create a scanned beam having a desired shape and orientation.
- the resulting laser beam 136 is scanned at 8 kHz, though it should be readily apparent that the scanner frequency and period of scan can easily be varied.
- the scanned laser beam 136 exits the transmitter 104 through a window 140 provided in the spool section 112.
- the receiver 108 includes a beam stop or dump 148 which is disposed along an optical path arranged diametrically opposite from the transmitter window 140.
- the receiver 108 also is defined by a housing 156 which includes a beam dump 148 and an adjacent window 152 which collects only scattered light from the laser beam 136 and directs same through a set of collection optics 160, including a spectral filter 161, toward a highly sensitive photo-multiplier tube 168 that is disposed adjacent to a proximal end of the receiver housing along with a suitable power supply 170.
- the light which is scattered from particles that are present in the measurement volume is therefore directed upwardly (according to Fig. 3) toward the photo-multiplier tube 168 while the majority of the remaining light not scattered by particles moving in the measurement volume is collected by the beam dump 148.
- the scan velocity of the laser beam is considered high compared to the typical speed of a particle passing through the measurement volume, a typical particle will cause several pulses of scattered light while in the measurement volume.
- the scan period of the laser is about 250 microseconds at 4kHz.
- FIG. 4 depicts the various events that can occur with time being represented on the x-axis and photomultiplier voltage being expressed along the y- axis.
- Those events which can occur include electronic background noise, as caused by a myriad of sources such as vibration, optical noise (RF plasma) and optical interference due to the windows, among others, and particle scattering.
- Particles vary with speed and size, and therefore produce different light scattering pulse envelopes, such as 200 and 202. For example, it is difficult to discern between among the envelope of a medium sized high speed particle 202 and certain forms of noise, represented as 207.
- a scattered light pulse train was empirically derived from an actual measurement using a sensor instrument such as that shown in Fig. 3, which is installed on a semi-conductor processing tool. Under these tool conditions, the worst case standard deviation of the background noise level was 50 mN, and the discrimination level was set to three times the background noise level (i.e. at 150 mN). The frequency of all of the scattering pulses rising above the discrimination level (defined as ) empirically from data collected early in the process tool's maintenance cycle and near the close of the maintenance cycle. Based upon this data, the range offs ⁇ was found to lie between:
- this false count rate also includes valid particle signals that will also survive the signal-processing algorithm. Consequently, this calculated false count rate is a worst case assessment of the impact from background noise levels.
- the present signal-processing algorithm accepts any pulse which correlates to another pulse within 250 ⁇ 10 ⁇ s which as noted above is the period of the scanning mirror. Calculating the area under the Poisson curve between 245 ⁇ s and 255 ⁇ s (and normalizing it with the total area under the curve) yields the probability of two noise pulses correlating together at the scanner frequency (P 0 ), given as:
- fs ⁇ The frequency of correlated noise pulses over the discrimination level (which is set at three times the background noise level), fs ⁇ , is given by:
- the maximum false count rate is less than three false counts per lot ( ⁇ 0.1 false counts per wafer), when the discrimination level is set at three times the standard deviation of the background noise level (e.g., at a 3:1 signal-to-noise level). If the discrimination level is raised even higher (from 150 mV to 300 mV), the resulting false alarm rate is predicted to decrease by over two orders of magnitude. Alternately, the false alarm rate can be improved by nearly three orders of magnitude, by requiring at least three correlated pulses to be detected (versus two correlated pulses) for a particle count to be discriminated from the background noise levels.
- a discriminator setting of four times the standard deviation of the noise will provide sufficient protection against false alarms. This can be more easily accomplished by setting the discriminator with respect to the highest observed standard deviation for the entire process (typically this is the chamber clean) at the expense of size sensitivity. However, to maintain maximum sensitivity over the entire process, it will be necessary to periodically auto-set the discriminator. This can be easily accomplished by temporarily reducing the discriminator, taking a sample of the noise, calculating the standard deviation and setting the discriminator to four times the measured standard deviation. This technique will account for all changes in noise, whatever the cause (RF, dirty windows, electronics problems, etc).
- a method according to the invention is described according to the flowchart shown in Fig. 11.
- the light pulses that are scattered by each scanned particle crossing through the measurement volume are initially detected by a photo-multiplier 168, step 236.
- the electrical current output from the photo-multiplier 168 is then converted by conventional means into a voltage pulse, which is subsequently amplified such as for example, by means of a high-speed, two stage analog amplifier.
- a level-triggering device, such as a discriminator, step 240 eliminates those signals that do not exceed a minimum threshold value, step 238.
- the affect of this algorithm is illustrated in Figure 7.
- the upper data window of this figure illustrates a discriminated pulse stream, in which noise pulses failing to reach a predetermined threshold value (e.g. 100 mN) having been filtered from consideration.
- the lower window of this figure depicts the data as it has been filtered in the time domain. The only data that remains in the lower window is that replicated at the 4 kHz scan rate.
- the pulse train exiting the discriminator is analyzed with a peak-detector, each contained within the processor 178 to determine the maximum value of the pulse, step 244. Details for performing this operation are well known in the field and require no further discussion herein.
- This value, as well as the pulse time stamp (micro-second resolution) is stored, step 246, for example, on a computer hard disk or in the memory of a microprocessor of the processor 178, for post processing using a preferred signal-processing technique which is described below.
- the present method determines whether the pulse is representative of a particle in the scanned measurement volume by determining whether or not the pulse is part of a PPE (a pulse-particle envelope) and generating the envelope if one does exist. This determination is accomplished by looking either ahead and/or behind a representative first pulse which has been time-stamped and then utilizing the microprocessor to evaluate the scattered light distribution to locate a second pulse that lags and/or leads the first pulse by substantially the scanner period for a particular time period window. After the removal of noise pulses, the signal-processing algorithm begins searching for PPE's. According to the present method, Fig.
- an autocorrelation calculation is performed in the forward and reverse directions (again in the time domain), step 248, in order to identify the beginning and end of an individual PPE using the microprocessor.
- the 4kHz scanner frequency is selected having a 250 ⁇ s period (+/- 10 ⁇ s) in order to perform the autocorrelation.
- the autocorrelation is high in the forward direction and zero in the reverse autocorrelation.
- autocorrelation is high in the reverse direction and zero in the forward direction.
- the autocorrelation calculation must be performed over a time period that avoids inclusion of subsequent particle scattering envelopes. In this particular instance, a two milliseconds (0.002 sec) time period was selected. The selection of an appropriate period is somewhat arbitrary and can be tailored to particle concentration and data rate.
- PPE PPE
- a set of typical PPEs are illustrated in Fig. 5. As shown in this Fig, these envelopes can take on different forms, depending on the speed (e.g., velocity) of the particle as well as the size thereof. As shown, an envelope for a relatively small and slow moving particle is shown as 220, with a medium sized and faster moving particle having a much narrower profile 224 (envelope) and a particle having a larger size (diameter) and moderate speed such as 228 being shown for contrast.
- step 254 a Gaussian fitting routine is applied. Specific details relating to performing this type of statistical fit are known in the field.
- the algorithm begins with an assumed Gaussian mean, width, and amplitude. Each of these values are subsequently iterated to produce minimum error between the peak pulse amplitudes and the value of the Gaussian fit.
- the fitting procedure for the mean, width and amplitude is illustrated in Figure 9. The deficiency of the above algorithm is that it only finds the local minimum error.
- the Gaussian fit once obtained on each of the particle-pulse envelopes, can lead to a valid determination of particle size and velocity, step 258.
- the peak amplitude 230 of the Gaussian fit is used to determine particle size while the width 240 of the envelope is determinative of speed as shown in Fig. 6. More particularly, the slope of the Gaussian fit as coupled with the diameter of the laser beam at the sample volume is used to determine particle speed.
- One known technique for determining speed using a Gaussian fit is disclosed for example, in Holve, D.J. entitled : “Transit Timing Velocimetry (TTV) for Two-Phase Reacting Flows", Combustion and Flame, 48:105 (1982), the entire contents of which are herein incorporated by reference.
- step 260 a determination is made as to whether the pulse amplitude exceeds four times the background level to be distinguished as a single pulse event (a particle), step 264. If yes, step 268, the data is stored and the particle is validly counted, step 270. If no, step 272, then the data is • discarded, step 276.
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Abstract
La présente invention concerne un nouveau procédé qui permet d'analyser le train d'impulsions produit par un détecteur de surveillance de particules à faisceau d'exploration. Le procédé améliore le rapport signal sur bruit et réduit significativement le taux de fausse alarme des particules. Lorsque le procédé est mis en oeuvre dans le domaine temporel, il permet de filtrer les impulsions de bruit qui ne se produisent pas à la fréquence du dispositif d'exploration. L'analyse permet également d'identifier les enveloppes des impulsions des particules (EPP) au moyen d'une autocorrélation avant et arrière. Des ajustements gaussiens sont ensuite appliqués aux enveloppes des impulsions des particules pour déterminer les caractéristiques des particules, telles que la taille et la vitesse.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US31807301P | 2001-09-07 | 2001-09-07 | |
US318073P | 2001-09-07 | ||
PCT/US2002/028698 WO2003023368A1 (fr) | 2001-09-07 | 2002-09-09 | Procede de traitement du signal destine a la surveillance, in situ, des particules par un faisceau d'exploration |
Publications (1)
Publication Number | Publication Date |
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EP1432972A1 true EP1432972A1 (fr) | 2004-06-30 |
Family
ID=23236516
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02798193A Withdrawn EP1432972A1 (fr) | 2001-09-07 | 2002-09-06 | Procede de traitement du signal destine a la surveillance, in situ, des particules par un faisceau d'exploration |
Country Status (5)
Country | Link |
---|---|
US (1) | US6906799B2 (fr) |
EP (1) | EP1432972A1 (fr) |
JP (2) | JP4090433B2 (fr) |
KR (1) | KR100934057B1 (fr) |
WO (1) | WO2003023368A1 (fr) |
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US8159670B2 (en) | 2007-11-05 | 2012-04-17 | Abbott Laboratories | Method and apparatus for rapidly counting and identifying biological particles in a flow stream |
KR100968352B1 (ko) * | 2008-01-31 | 2010-07-08 | 정철우 | 수중 조명등 제어장치 |
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- 2002-09-06 EP EP02798193A patent/EP1432972A1/fr not_active Withdrawn
- 2002-09-09 JP JP2003527394A patent/JP4090433B2/ja not_active Expired - Fee Related
- 2002-09-09 KR KR1020047003298A patent/KR100934057B1/ko not_active IP Right Cessation
- 2002-09-09 WO PCT/US2002/028698 patent/WO2003023368A1/fr active Application Filing
- 2002-09-09 US US10/237,458 patent/US6906799B2/en not_active Expired - Fee Related
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2007
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Non-Patent Citations (1)
Title |
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See references of WO03023368A1 * |
Also Published As
Publication number | Publication date |
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US20030076494A1 (en) | 2003-04-24 |
JP2008122395A (ja) | 2008-05-29 |
WO2003023368A8 (fr) | 2004-07-01 |
JP2005502875A (ja) | 2005-01-27 |
KR100934057B1 (ko) | 2009-12-24 |
JP4090433B2 (ja) | 2008-05-28 |
KR20040047806A (ko) | 2004-06-05 |
WO2003023368A1 (fr) | 2003-03-20 |
US6906799B2 (en) | 2005-06-14 |
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