EP0497126A1 - Circuit pour allumer et faire fonctionner une décharge d'arc à cathode évidée - Google Patents

Circuit pour allumer et faire fonctionner une décharge d'arc à cathode évidée Download PDF

Info

Publication number
EP0497126A1
EP0497126A1 EP92100408A EP92100408A EP0497126A1 EP 0497126 A1 EP0497126 A1 EP 0497126A1 EP 92100408 A EP92100408 A EP 92100408A EP 92100408 A EP92100408 A EP 92100408A EP 0497126 A1 EP0497126 A1 EP 0497126A1
Authority
EP
European Patent Office
Prior art keywords
anode
power switching
cathode tube
switching element
current source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP92100408A
Other languages
German (de)
English (en)
Other versions
EP0497126B1 (fr
Inventor
Werner Grimm
Wilfried Naumann
Rüdiger Wilberg
Horst Hermann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
VTD Vakuumtechnik Dresden GmbH
Original Assignee
Hochvakuum Dresden VEB
VTD Vakuumtechnik Dresden GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hochvakuum Dresden VEB, VTD Vakuumtechnik Dresden GmbH filed Critical Hochvakuum Dresden VEB
Publication of EP0497126A1 publication Critical patent/EP0497126A1/fr
Application granted granted Critical
Publication of EP0497126B1 publication Critical patent/EP0497126B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H05H1/481—Hollow cathodes

Definitions

  • the invention relates to a circuit arrangement for igniting and operating a hollow cathode arc discharge, in particular for industrial use with a relatively high output.
  • a particular area of application has developed in vacuum coating technology.
  • the hollow cathode arc is particularly suitable for the evaporation of the coating material with simultaneous intensive plasma formation with the resultant ionization of the various gases and vapors in the coating chamber.
  • a first current source for resistance heating ie the heating of the hollow cathode
  • a second current source for operating the hollow cathode itself.
  • Both current sources are power current sources which are switched alternately according to the technological requirement.
  • the realization of two power sources is technically very complex. Since the two current sources are regulated independently of one another, only as a function of secondary parameters, ignition problems of the hollow cathode discharge also sometimes arise.
  • the invention is therefore based on the object of specifying a circuit for igniting and operating a hollow cathode, which considerably reduces the technical outlay for the provision of energy and ensures reliable ignition and operation of the hollow cathode arc discharge.
  • the invention solves the problem in such a way that only one power current source is used, connected to a special circuit arrangement.
  • One end of the cathode tube is connected to the negative pole of the power source.
  • the other end of the cathode tube is connected to an anode within the vacuum chamber via a power switching element.
  • the anode is in contact with the positive pole of the current source.
  • an ammeter is arranged, the outputs of which are connected to the inputs of a differential element.
  • the output of the differential element controls a switching unit to open the circuit breaker.
  • a special evaporator crucible with the evaporation material is additionally arranged as an anode within the vacuum chamber.
  • a power switching element is arranged between the chamber wall and the evaporator crucible and is actuated in the same way by the same switching unit as the power switching element between the cathode tube and the anode for opening.
  • the circuit arrangement works in the following way.
  • the power switching elements are closed at the beginning of the ignition phase of the hollow cathode arc discharge, since no signals come to the switching unit for opening the power switch via the differential element. If the current flow is initiated from the current source, then flow at 30 to 50 V to 200 A short-circuited over the hollow cathode. This is designed accordingly so that the hollow cathode tube, itself and advantageously another external heating coil connected in series, is heated by resistance heating becomes.
  • the hollow cathode is usually made of tungsten. Thermal electron emission begins at a temperature of approx. 2500 0C.
  • the arc discharge ignites in the hot zone of the hollow cathode and burns from there in the carrier gas which flows through the hollow cathode.
  • the energy flow is dissipated into the vacuum chamber via the anode.
  • no significant difference values reach the differential element and the circuit breakers are closed, this changes when the arc discharge is ignited.
  • a significant current flow is conducted to the anode via the arc discharge, the plasma stream.
  • the ammeter in the anode - positive pole of the current source measures a higher current.
  • the differential element shows a difference between the two ammeters and controls the switching unit to open the circuit breaker.
  • the circuit breaker When the circuit breaker is open, the direct current flow through the hollow cathode and the heating coil, if present, is interrupted, and thus the resistance heating of the same.
  • the current flows exclusively from the cathode via the arc discharge to the anode.
  • the hollow cathode is constantly kept at the required temperature by the arc discharge.
  • the arc is usually placed on a special anode within the vacuum chamber and the vacuum chamber is separated from the special anode and connected to ground via a second power switching element.
  • the second power switching element is driven in parallel to the first between the cathode and the anode.
  • the special anode is the evaporator crucible, but it can also be a non-evaporating anode if it is only important to maintain the arc discharge and thus the plasma formation. If the arc discharge burns against an evaporator crucible, this leads to a strong concentration of the charge carriers in a small area and to the melting or evaporation of the evaporation material, with simultaneous partial ionization of the evaporated particles.
  • the drawing shows a vacuum chamber with a hollow cathode arc evaporator device with a circuit arrangement according to the invention.
  • a hollow cathode 2 and an evaporator crucible 3 are arranged within a vacuum chamber 1.
  • a substrate carrier 4 with the substrates to be coated is installed above the evaporator crucible 3.
  • the hollow cathode 2 consists of a cathode tube 6 and a heating coil 5.
  • the cathode tube 6 is mounted insulated in the vacuum chamber 1 and is flowed through by argon, as the carrier gas for the arc discharge.
  • the outer end of the cathode tube 6 is connected to the negative pole of the power source 7, and the tip of the cathode tube is contacted with the heating coil 5.
  • the heating coil can be connected to the positive pole of the current source 7 via two power switching elements 8 and 9 connected in series.
  • the cathode tube 6 and the heating coil 5 are heated by resistance heating during the passage of current.
  • heating coil 5 it is advantageous to dimension the heating coil 5 such that a voltage drop of about 20 V across the heating coil 5 occurs when the end temperature is reached.
  • the metallic wall of the vacuum chamber 1 is electrically connected to the connecting line of the two power switching elements 8 and 9 lying in series.
  • the anodic evaporation crucible 3 is connected to the positive pole of the current source 7 and the power switching element 9.
  • an ammeter 11 and 12 is integrated, the ammeter 12 recording the entire current fed in by the current source 7 and only using the ammeter 11 the current flowing through the heating coil 5.
  • the measured value outputs of the two ammeters 11 and 12 are connected to the inputs of a differential element 13.
  • the output is connected to a trigger input of a switching unit 14, which in turn controls the power switching elements 8 and 9.
  • the two power switching elements 8 and 9 are closed.
  • the current from the current source 7 is regulated at 24 V to approximately 240 A.
  • the current flows directly through the hollow cathode tube 6, the heating coil 5 and the power switching elements 8 and 9 back to the current source 7.
  • the hollow cathode tube 6 is designed in the area of the hot zone and in coordination with the heating coil 5 so that a voltage drop of about 20 V occurs . This area is quickly and intensively heated to a temperature of approx. 2500 0C by resistance heating. Thereby the thermal electron emission occurs.
  • An arc discharge ignites, which burns via the carrier gas argon, which is passed through the hollow cathode 2, to the large-area anodic chamber wall 1 and the anodic crucible 3.
  • the current of 240 A emitted by the current source 7 is split up because part of it is discharged via the arc discharge. This divided current is measured on ammeters 11 and 12.
  • the total current is measured on the ammeter 12, i. H. the current that already flows through the ammeter 11 and additionally the current that flows through the arc discharge through the vacuum chamber 1 and the evaporator crucible 3.
  • the difference between the measured current values is evaluated in the differential element 13. If in the example the difference value, that is to say the plasma current is 60 A, then the power switching elements 8 and 9 are controlled and opened via the switching unit 14. At this moment the current flow through the heating coil 5 and also from the vacuum chamber 1 is interrupted. The entire current flows essentially exclusively via the arc discharge to the evaporator 3.
  • the material to be evaporated melts and evaporates.
  • the hollow cathode 2 is constantly kept at the required temperature by the arc discharge. Should the arc discharge go out, the differential element 13 no longer measures a sufficient difference in the current values at the ammeters 11 and 12 and the power switching elements 8 and 9 are closed again. If in the meantime the current at the current source 7 has not been switched off, the ignition process is repeated. This circuit arrangement works very stably and the technical effort is relatively low.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
EP92100408A 1991-01-29 1992-01-13 Circuit pour allumer et faire fonctionner une décharge d'arc à cathode évidée Expired - Lifetime EP0497126B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4102554 1991-01-29
DE4102554A DE4102554A1 (de) 1991-01-29 1991-01-29 Schaltungsanordnung zum zuenden und betreiben einer hohlkatodenbogenentladung

Publications (2)

Publication Number Publication Date
EP0497126A1 true EP0497126A1 (fr) 1992-08-05
EP0497126B1 EP0497126B1 (fr) 1994-12-28

Family

ID=6423915

Family Applications (1)

Application Number Title Priority Date Filing Date
EP92100408A Expired - Lifetime EP0497126B1 (fr) 1991-01-29 1992-01-13 Circuit pour allumer et faire fonctionner une décharge d'arc à cathode évidée

Country Status (2)

Country Link
EP (1) EP0497126B1 (fr)
DE (2) DE4102554A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7544998B2 (en) 2003-06-11 2009-06-09 Nxp B.V. Prevention of parasitic channel in an integrated SOI process
CN103928286A (zh) * 2014-04-25 2014-07-16 哈尔滨工业大学 一种实现多个空心阴极稳定并联的工作电路及该工作电路的工作方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4409761B4 (de) * 1994-03-22 2007-12-27 Vtd Vakuumtechnik Dresden Gmbh Einrichtung zur plasmagestützten Verdampfung in einem Bogenentladungsplasma
DE19801427C1 (de) * 1998-01-16 1999-10-07 Forschungszentrum Juelich Gmbh Verfahren und Anordnung zur Erzeugung von Ionen
DE10224991A1 (de) * 2002-06-05 2004-01-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Einrichtung zur Reduzierung der Zündspannung von Plasmen

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE213497C (fr) *
US4149024A (en) * 1974-07-23 1979-04-10 Asea Aktiebolag Arc furnace for reducing metal oxides and method for operating such a furnace
DE2949844A1 (de) * 1979-12-12 1981-06-19 Veb Hochvakuum Dresden, Ddr 8020 Dresden Verfahren zur zuendung einer hohlkatodenbogenentladung
DE2648575C2 (de) * 1975-11-06 1984-10-18 ASEA AB, Västeraas Verfahren zum Betrieb eines mit Gleichstrom gespeisten Lichtbogenofens

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU515003B2 (en) * 1977-07-12 1981-03-12 Commonwealth Scientific And Industrial Research Organisation Grass mower
US4863581A (en) * 1987-02-12 1989-09-05 Kawasaki Steel Corp. Hollow cathode gun and deposition device for ion plating process

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE213497C (fr) *
US4149024A (en) * 1974-07-23 1979-04-10 Asea Aktiebolag Arc furnace for reducing metal oxides and method for operating such a furnace
DE2648575C2 (de) * 1975-11-06 1984-10-18 ASEA AB, Västeraas Verfahren zum Betrieb eines mit Gleichstrom gespeisten Lichtbogenofens
DE2949844A1 (de) * 1979-12-12 1981-06-19 Veb Hochvakuum Dresden, Ddr 8020 Dresden Verfahren zur zuendung einer hohlkatodenbogenentladung

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7544998B2 (en) 2003-06-11 2009-06-09 Nxp B.V. Prevention of parasitic channel in an integrated SOI process
CN103928286A (zh) * 2014-04-25 2014-07-16 哈尔滨工业大学 一种实现多个空心阴极稳定并联的工作电路及该工作电路的工作方法

Also Published As

Publication number Publication date
DE4102554A1 (de) 1992-09-03
EP0497126B1 (fr) 1994-12-28
DE4102554C2 (fr) 1993-06-17
DE59201038D1 (de) 1995-02-09

Similar Documents

Publication Publication Date Title
DE2136532A1 (de) Anlage zur auftragung von metallueberzuegen im vakuum
DE202013012714U1 (de) Leistungsversorgungssystem mit einem Leistungswandler
EP2164309B1 (fr) Procédé et dispositif pour commander une décharge à cathode creuse
EP0607599B1 (fr) Procédé et circuit pour alimenter de façon stable une lampe à sodium haute-pression
DE1515295B1 (de) Vorrichtung zum Aufbringen dünner Schichten aus dem Material einer Zerstäubungskathode auf eine senkrecht zu einer Anode angeordnete Unterlage
DE1673273B2 (de) Selektiver Detektor für chromatographische Zwecke
EP0497126B1 (fr) Circuit pour allumer et faire fonctionner une décharge d'arc à cathode évidée
DE3814331A1 (de) Vorrichtung zur beschleunigung von projektilen
DE19546827A1 (de) Einrichtung zur Erzeugung dichter Plasmen in Vakuumprozessen
DE2718166C3 (de) Schaltröhre und ihre Verwendung
EP0612859A1 (fr) Evaporateur à décharge d'arc à basse tension ayant un dispositif d'alimentation et procédé utilisant l'évaporateur
DE102008028166B4 (de) Vorrichtung zur Erzeugung eines Plasma-Jets
DE3780675T2 (de) Vorrichtung, insbesondere duoplasmatron, zur ionisierung eines gases und verfahren zur benutzung dieser vorrichtung.
DE2239526C3 (de) Metalldampf-Lichtbogen-Schaltvorrichtung
DE19600993A1 (de) Vorrichtung und Verfahren zur anodischen Verdampfung eines Materials mittels einer Vakuumlichtbogenentladung
DE69915606T2 (de) Schaltung für entladungslampe
DE670931C (de) Entladungsroehre fuer Relaiszwecke mit selbstaendiger Glimmentladung zwischen den Hauptelektroden und mit einer lichtelektrisch empfindlichen, mit der Hauptkathode in elektrisch leitender Verbindung stehenden Elektrode
DE29608484U1 (de) Plasmaerzeugungseinrichtung mit einer Hohlkathode
DE3110810C2 (fr)
DE19627004C2 (de) Strahlungsquelle sowie Glühkathode für den Einsatz in einer Strahlungsquelle
EP0484704A1 (fr) Echauffement de substrat par décharge en arc à basse tension et champ magnétique variable
DE3222327A1 (de) Einrichtung zur vakuumbedampfung
EP3133634B1 (fr) Dispositif d'amorçage d'une decharge en arc sous vide et son procede d'utilisation
DD280338A1 (de) Verfahren zum Betreiben eines Vakuum-Bogenentladungsverdampfers
DE19539961C1 (de) Verfahren zum thermischen Verdampfen von elektrisch leitfähigen Materialien

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): CH DE FR GB IT LI

17P Request for examination filed

Effective date: 19921228

17Q First examination report despatched

Effective date: 19940214

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: VTD-VAKUUMTECHNIK DRESDEN GMBH

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): CH DE FR GB IT LI

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRE;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED.SCRIBED TIME-LIMIT

Effective date: 19941228

REF Corresponds to:

Ref document number: 59201038

Country of ref document: DE

Date of ref document: 19950209

ET Fr: translation filed
GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)

Effective date: 19950301

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed
PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20010215

Year of fee payment: 10

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20010220

Year of fee payment: 10

REG Reference to a national code

Ref country code: GB

Ref legal event code: IF02

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20020113

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: CH

Payment date: 20020124

Year of fee payment: 11

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20020113

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20020930

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20030131

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20030131

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20090318

Year of fee payment: 18

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20100803