EP0209651A2 - Process for manufacturing spinneret plates - Google Patents
Process for manufacturing spinneret plates Download PDFInfo
- Publication number
- EP0209651A2 EP0209651A2 EP86105992A EP86105992A EP0209651A2 EP 0209651 A2 EP0209651 A2 EP 0209651A2 EP 86105992 A EP86105992 A EP 86105992A EP 86105992 A EP86105992 A EP 86105992A EP 0209651 A2 EP0209651 A2 EP 0209651A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- channels
- layer
- resist material
- funnel
- electroplating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 239000000463 material Substances 0.000 claims abstract description 49
- 230000005855 radiation Effects 0.000 claims abstract description 22
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 10
- 238000009713 electroplating Methods 0.000 claims description 20
- 239000006096 absorbing agent Substances 0.000 claims description 6
- 239000000945 filler Substances 0.000 claims description 6
- 239000007787 solid Substances 0.000 claims 5
- 230000001678 irradiating effect Effects 0.000 claims 3
- 230000007704 transition Effects 0.000 abstract description 5
- 239000007788 liquid Substances 0.000 description 7
- 239000000835 fiber Substances 0.000 description 5
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000009969 flowable effect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/08—Perforated or foraminous objects, e.g. sieves
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49428—Gas and water specific plumbing component making
- Y10T29/49432—Nozzle making
Definitions
- the invention relates to a method for producing spinneret plates according to the preamble of claim 1.
- spinneret plates are required for the production of fibers, the raw material of organic or inorganic material in a flowable state being pressed through a large number of spinneret channels in the plates.
- the spinneret channels consist of nozzle capillaries through which the material emerges as a fiber, and significantly more preliminary channels to which the material to be spun is fed.
- the pre-channels are often in the form of funnels which taper towards the nozzle capillaries in order to eventually merge into the latter.
- the invention has for its object to show a method of the generic type by which a continuous transition from the pre-channels to the nozzle capillaries is ensured.
- nozzle capillaries can also be produced in the form of tubular approaches using the same solution principle.
- Spinneret plates with tubular nozzle capillaries are used particularly advantageously as components for the production of spinneret devices for the production of hollow or multicomponent fibers.
- Such spinneret devices generally consist of a plurality of spinneret plates arranged one above the other.
- nozzle capillaries can be manufactured with extreme precision and uniformity both in their individual cross-section and in their mutual position according to the method according to the invention and the mutual adjustment of several relatively large spinneret plates for assembling the spinneret devices is not a major problem, the production of hollow or Multi-component fibers with any cross-section and structure possible. This makes it possible to produce fibers with new and unusual uses.
- Claim 3 shows how to proceed if the metallic plate with the funnel-shaped pre-channels is to be produced by deep lithographic-galvanic means.
- the continuous transition from the pre-channels to the nozzle capillaries that can be achieved with the invention is not only with circular cross sections, but also with profiled, e.g. Star-shaped cross sections of the nozzle capillaries possible.
- the pre-channels 144 are then filled with a removable filling material 152 which connects to the regions 145 (FIG. 2).
- columnar negative shapes 151 of the nozzle capillaries are formed on the plate 141.
- an electroplating layer 162 including the negative molds 151 is produced on the metallic plate 141 serving as the electroplating electrode (FIG. 3).
- the filling material 152 and the negative molds 151 of the nozzle capillaries are removed after the electroplating layer 162 has been leveled, so that a spinneret plate 163 consisting of the parts 141 and 162 is formed, in which the nozzle capillaries 161 connect seamlessly to the funnel-shaped pre-channels 144 (FIG. 4).
- the irradiated areas 142b are first coated with a liquid developer removed ( Figure 2a) and then the removed areas and the pre-channels 144 filled with a removable filler 152a, which is less soluble than the positive resist material of the layer 142a ( Figure 2b). Then the non-irradiated areas of the layer 142a are removed, so that columnar negative shapes 151a of the nozzle capillaries are also formed in this case on the metallic plate 141 according to FIG. 2c.
- the further steps incrementating and leveling the electroplating layer 162, FIG. 3a, removing the filling material 152a) correspond to those described above, so that a spinneret plate 163 is also produced in this case, as is shown schematically in FIG.
- the method according to the invention can also be used for the production of spinneret plates with tubular nozzle capillaries.
- the metallic plate 141 with the pre-channels 144 is used as an irradiation mask (FIG. 5), whereupon the layer 142 is again partially irradiated from the opposite side.
- a mask is used for the irradiation with the high-energy radiation 181 (FIG. 6), the absorber structures 182 of which correspond to the outer diameters of the tubular attachments of the nozzle capillaries, so that the irradiated areas 174 and 175 are non-irradiated tubular areas 183 Wrap layer 142.
- the irradiated areas corresponding to the interior of the nozzle capillaries are first removed with a liquid developer and replaced by a radiation-insensitive filling material 191a, which also fills the pre-channels 144 (FIG. 6a). Then there is repeated partial irradiation of the layer 142a with high-energy radiation 181 via a mask, the absorber structures 182a of which have openings 182b which correspond to the outer diameters of the tubular attachments for the nozzle capillaries.
- tubular, irradiated areas 183a are formed between the filling material 191a and the non-irradiated resist material of the layer 142a, which are removed with a liquid developer, so that tubular cavities 192a are formed (FIG. 7a).
- the further treatment is carried out analogously to the description of FIGS. 8 and 9.
- a layer 121 made of a negative resist material is applied to a plate 12 serving as a galvanic electrode.
- This layer 121 is partially irradiated with parallel X-ray radiation 123 from an electron synchrotron via a mask 122 arranged at a short distance.
- the unit consisting of mask 122, resist layer 121 and plate 12 executes a wobble movement (arrows) relative to the beam direction.
- the openings 125 in the absorber structure of the mask 122 have a cross section that corresponds to that of the nozzle capillaries.
- the radiation 123 creates areas 124 in the resist layer 121 with a funnel-shaped cross section widening to form the plate 12, which are more difficult to dissolve due to the radiation compared to the non-irradiated areas of the layer 121.
- negative forms 131 of the funnel-shaped pre-channels are formed on the plate 12.
- the plate 12 and the negative molds 131 are removed, so that a metallic plate 141 according to FIG. 12 is provided with funnel-shaped pre-channels 144.
- the metallic plate with funnel-shaped pre-channels can also be produced by deep lithographic-galvanic means when using a positive resist material.
- the areas which have been created during the irradiation with a wobble movement according to FIG. 10 are removed and replaced by a filler material.
- After removing the remaining resist material with egg A developer thus obtains negative forms of the funnel-shaped pre-channels from the filling material, which are processed further in accordance with FIGS. 11 and 12.
- a wobble movement can take the place of a wobble movement.
- PMMA is used as the positive resist material, which after the irradiation is dissolved in a liquid developer of butyl diglycol, morpholine, ethanolamine and water.
- the negative resist material is based on polystyrene, the developer required for this consists of a mixture of ketones and higher alcohols.
- the galvanic deposition of metal takes place in a chloride-free nickel sulfamate bath at a temperature of 52 ° C.
- the removable radiation-insensitive filling material consists of a mixture of an epoxy resin and an internal release agent.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Spinning Methods And Devices For Manufacturing Artificial Fibers (AREA)
- Micromachines (AREA)
- Electroplating Methods And Accessories (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Building Environments (AREA)
- Seasonings (AREA)
Abstract
Die Erfindung betrifft ein Verfahren zum Herstellen von Spinndüsenplatten mit trichterförmigen Vorkanälen und sich hieran anschließenden Düsenkapillaren unter Anwendung tiefenlithographischer und galvanischer Methoden. Durch die erfindungsgemäße Verwendung von mit trichterförmigen Vorkanälen versehenen metallischen Platten als Bestrahlungsmaske wird ein versatzfreier, fluchtender Übergang von den Vorkanälen zu den Düsenkapillaren erzielt, wobei als strahlungsempfindliches Material sowohl ein Negativ-Resist als auch ein Positiv-Resist eingesetzt werden kann.The invention relates to a method for producing spinneret plates with funnel-shaped pre-channels and adjoining nozzle capillaries using deep lithographic and galvanic methods. Through the use according to the invention of metallic plates provided with funnel-shaped pre-channels as the radiation mask, an offset-free, aligned transition from the pre-channels to the nozzle capillaries is achieved, wherein both a negative resist and a positive resist can be used as the radiation-sensitive material.
Description
Die Erfindung betrifft ein Verfahren zum Herstellen von Spinndüsenplatten nach dem Oberbegriff von Anspruch 1.The invention relates to a method for producing spinneret plates according to the preamble of claim 1.
Ein Verfahren dieser Art ist in der Patentanmeldung P 35 17 730.6 beschrieben und dargestellt.A method of this type is described and shown in patent application P 35 17 730.6.
Derartige Spinndüsenplatten werden für die Herstellung von Fasern benötigt, wobei der Ausgangsstoff aus organischem oder anorganischem Material in fließfähigem Zustand durch eine Vielzahl von Spinndüsenkanälen in den Platten hindurchgepreßt wird. Die Spinndüsenkanäle bestehen in den meisten Fällen aus Düsenkapillaren, durch die das Material als Faser austritt, und wesentlich weiteren Vorkanälen, denen das zu verspinnende Material zugeführt wird. Die Vorkanäle haben häufig die Form von Trichtern, die sich zu den Düsenkapillaren hin verjüngen, um schließlich in letztere überzugehen. Bei der getrennten Herstellung von Vorkanälen und Düsenkapillaren besteht die Gefahr, daß am Übergang in der Trennfuge ein unerwünschter Versatz auftritt.Such spinneret plates are required for the production of fibers, the raw material of organic or inorganic material in a flowable state being pressed through a large number of spinneret channels in the plates. In most cases, the spinneret channels consist of nozzle capillaries through which the material emerges as a fiber, and significantly more preliminary channels to which the material to be spun is fed. The pre-channels are often in the form of funnels which taper towards the nozzle capillaries in order to eventually merge into the latter. When pre-channels and nozzle capillaries are manufactured separately, there is a risk that an undesired offset occurs at the transition in the parting line.
Der Erfindung liegt die Aufgabe zugrunde, bei einem Verfahren der gattungsgemäßen Art einen Weg aufzuzeigen, durch den ein kontinuierlicher Übergang von den Vorkanälen zu den Düsenkapillaren sichergestellt wird.The invention has for its object to show a method of the generic type by which a continuous transition from the pre-channels to the nozzle capillaries is ensured.
Diese Aufgabe wird mit den im Kennzeichen von Anspruch 1 enthaltenen Maßnahmen gelöst. Durch die Verwendung der mit den trichterförmigen Vorkanälen versehenen metallischen Platte als Bestrahlungsmaske wird ein versatzfreier, fluchtender Übergang erzielt, wobei als strahlungsempfindliches Material sowohl ein Negativ-Resist als auch ein Positiv-Resist eingesetzt werden kann. In Anspruch 2 wird gezeigt, daß nach demselben Lösungsprinzip auch Düsenkapillaren in Form von rohrförmigen Ansätzen hergestellt werden können. Spinndüsenplatten mit rohrförmigen Düsenkapillaren werden besonders vorteilhaft als Bauteile für die Herstellung von Spinndüsenvorrichtungen für die Erzeugung von Hohl- oder Mehrkomponentenfasern eingesetzt. Solche Spinndüsenvorrichtungen bestehen im allgemeinen aus mehreren übereinander angeordneten Spinndüsenplatten. Da nach dem erfindungsgemäßen Verfahren die Düsenkapillaren sowohl in ihrem Einzelquerschnitt als auch in ihrer gegenseitigen Lage mit äußerster Präzision und Gleichmäßigkeit gefertigt werden können und die gegenseitige Justierung von mehreren relativ großen Spinndüsenplatten zum Zusammensetzen der Spinndüsenvorrichtungen kein größeres Problem darstellt, ist die Herstellung von Hohl- oder Mehrkomponentenfasern mit beliebigem Querschnitt und Aufbau möglich. Hierdurch lassen sich Fasern mit neuen und ungewöhnlichen Verwendungszwecken herstellen. Anspruch 3 zeigt, wie vorzugehen ist, wenn auch die metallische Platte mit den trichterförmigen Vorkanälen auf tiefenlithographisch-galvanischem Wege hergestellt werden soll.This object is achieved with the measures contained in the characterizing part of claim 1. By using the with the metallic plate provided with the funnel-shaped pre-channels as the radiation mask, an offset-free, aligned transition is achieved, wherein both a negative resist and a positive resist can be used as the radiation-sensitive material. In claim 2 it is shown that nozzle capillaries can also be produced in the form of tubular approaches using the same solution principle. Spinneret plates with tubular nozzle capillaries are used particularly advantageously as components for the production of spinneret devices for the production of hollow or multicomponent fibers. Such spinneret devices generally consist of a plurality of spinneret plates arranged one above the other. Since the nozzle capillaries can be manufactured with extreme precision and uniformity both in their individual cross-section and in their mutual position according to the method according to the invention and the mutual adjustment of several relatively large spinneret plates for assembling the spinneret devices is not a major problem, the production of hollow or Multi-component fibers with any cross-section and structure possible. This makes it possible to produce fibers with new and unusual uses. Claim 3 shows how to proceed if the metallic plate with the funnel-shaped pre-channels is to be produced by deep lithographic-galvanic means.
Der mit der Erfindung erzielbare, kontinuierliche Übergang von den Vorkanälen zu den Düsenkapillaren ist nicht nur bei kreisförmigen Querschnitten, sondern auch bei profilierten, z.B. sternförmigen Querschnitten der Düsenkapillaren möglich.The continuous transition from the pre-channels to the nozzle capillaries that can be achieved with the invention is not only with circular cross sections, but also with profiled, e.g. Star-shaped cross sections of the nozzle capillaries possible.
Die einzelnen erfindungsgemäßen Verfahrensschritte werden im folgenden anhand der Figuren erläutert:
- Die Figur 1 zeigt eine metallische Platte mit
trichterförmigen Vorkanälen 144. Die Seite derPlatte 141, an der die verjüngten Enden derVorkanäle 144 münden, ist mit einerSchicht 142 aus einem strahlungsempfindlichen Negativ-Resistmaterial verbunden. DieseSchicht 142 wird partiell durch dieVorkanäle 144 hindurch mitRöntgenstrahlung 143 eines Elektronensynchrotrons bestrahlt, so daß schwerlösliche Bereiche 145 entstehen, deren Form derjenigen der Düsenkapillaren entspricht.
- FIG. 1 shows a metallic plate with funnel-shaped pre-channels 144. The side of the
plate 141 at which the tapered ends of the pre-channels 144 open is connected to alayer 142 made of a radiation-sensitive negative resist material. Thislayer 142 is partially irradiated through the pre-channels 144 withX-rays 143 of an electron synchrotron, so thatregions 145 which are difficult to dissolve are formed, the shape of which corresponds to that of the nozzle capillaries.
Danach werden die Vorkanäle 144 mit einem wieder entfernbaren Füllmaterial 152 gefüllt, das sich mit den Bereichen 145 verbindet (Fig. 2). Nach dem Entfernen der nicht bestrahlten Bereiche der Schicht 142 mit einem flüssigen Entwickler entstehen auf der Platte 141 säulenförmige Negativformen 151 der Düsenkapillaren. Nun wird auf der als Galvanikelektrode dienenden metallischen Platte 141 eine die Negativformen 151 einschließende Galvanikschicht 162 erzeugt (Fig. 3). Das Füllmaterial 152 und die Negativformen 151 der Düsenkapillaren werden nach dem Einebnen der Galvanikschicht 162 herausgelöst, so daß eine aus den Teilen 141 und 162 bestehende Spinndüsenplatte 163 entsteht, bei der sich die Düsenkapillaren 161 nahtlos an die trichterförmigen Vorkanäle 144 anschließen (Figur 4).The pre-channels 144 are then filled with a
Im Falle der Verwendung eines Positiv-Resistmaterials als strahlungsempfindliche Schicht 142a werden zunächst die bestrahlten Bereiche 142b mit einem flüssigen Entwickler entfernt (Figur 2a) und sodann die entfernten Bereiche und die Vorkanäle 144 mit einem wieder entfernbaren Füllmaterial 152a ausgefüllt, das schwerer löslich ist als das Positiv-Resistmaterial der Schicht 142a (Figur 2b). Darauf werden die nicht bestrahlten Bereiche der Schicht 142a entfernt, so daß auch in diesem Falle säulenförmige Negativformen 151a der Düsenkapillaren auf der metallischen Platte 141 entsprechend Figur 2c entstehen. Die weiteren Schritte (Erzeugen und Einebnen der Galvanikschicht 162, Fig. 3a, Entfernen des Füllmaterials 152a) entsprechen den vorbeschriebenen, so daß auch in diesem Falle eine Spinndüsenplatte 163 erzeugt wird, wie sie schematisch in Figur 4 gezeigt ist.If a positive resist material is used as radiation-
Das erfindungsgemäße Verfahren läßt sich auch anwenden für die Herstellung von Spinndüsenplatten mit rohrförmigen Düsenkapillaren. Auch in diesem Falle wird die metallische Platte 141. mit den Vorkanälen 144 als Bestrahlungsmaske benutzt (Figur 5), worauf die Schicht 142 nochmals partiell von der gegenüberliegenden Seite aus bestrahlt wird. Bei Verwendung eines Negativ-Resistmaterials wird für die Bestrahlung mit der energiereichen Strahlung 181 (Fig. 6) eine Maske benutzt, deren Absorberstrukturen 182 den Außendurchmessern der rohrförmigen Ansätze der Düsenkapillaren entsprechen, so daß die bestrahlten Bereiche 174 und 175 nicht bestrahlte rohrförmige Bereiche 183 der Schicht 142 umschließen. Nach dem Auffüllen der Vorkanäle 144 mit einem wieder entfernbaren Füllmaterial 191 werden die nichtbestrahlten rohrförmigen Bereiche 183 mit einem flüssigen Entwickler herausgelöst, so daß rohrförmige Hohlräume 192 entstehen (Figur 7). In diesen Hohlräumen 192 wird unter Verwendung der Platte 141 als Elektrode eine Galvanikstruktur in der Form von rohrförmigen, metallischen Ansätzen 202 erzeugt (Figur 8). Sodann werden nach dem Einebnen der Galvanikstruktur das restliche Resistmaterial der Schicht 142 und das Füllmaterial 191 entfernt, so daß eine aus der Platte 141 mit den trichterförmigen Vorkanälen 144 und den rohrförmigen Düsenkapillaren 202 bestehende Spinndüsenplatte 211 entsteht (Figur 9).The method according to the invention can also be used for the production of spinneret plates with tubular nozzle capillaries. In this case too, the
Im Falle der Verwendung eines Positiv-Resistmaterials werden zunächst die bestrahlten, dem Innenraum der Düsenkapillaren entsprechenden Bereiche mit einem flüssigen Entwickler entfernt und durch ein strahlungsunempfindliches Füllmaterial 191a ersetzt, das auch die Vorkanäle 144 ausfüllt (Figur 6a). Sodann erfolgt eine nochmalige partielle Bestrahlung der Schicht 142a mit energiereicher Strahlung 181 über eine Maske, deren Absorberstrukturen 182a Durchbrüche 182b aufweisen, die den Außendurchmessern der rohrförmigen Ansätze für die Düsenkapillaren entsprechen.If a positive resist material is used, the irradiated areas corresponding to the interior of the nozzle capillaries are first removed with a liquid developer and replaced by a radiation-
Auf diese Weise entstehen zwischen dem Füllmaterial 191a und dem nicht bestrahlten Resistmaterial der Schicht 142a rohrförmige, bestrahlte Bereiche 183a, die mit einem flüssigen Entwickler entfernt werden, so daß rohrförmige Hohlräume 192a entstehen (Figur 7a). Die weitere Behandlung (Galvanisieren 202, Einebnen der Galvanikstruktur, Entfernen des Füllmaterials 191a und des restlichen Resistmaterials 142a) erfolgt analog der Beschreibung zu Figur 8 und 9.In this way, tubular,
Anhand der Figuren 10, 11 und 12 wird im folgenden gezeigt, daß auch die metallische Platte mit den trichterförmigen Vorkanälen auf tiefenlithographisch-galvanischem Wege hergestellt werden kann. Hierzu wird auf einer als Galvanikelektrode dienenden Platte 12 eine Schicht 121 aus einem Negativ-Resistmaterial aufgebracht. Diese Schicht 121 wird über eine in geringem Abstand angeordnete Maske 122 partiell mit paralleler Röntgenstrahlung 123 eines Elektronensynchrotrons bestrahlt. Während der Bestrahlung führt die aus Maske 122, Resistschicht 121 und Platte 12 bestehende Einheit eine Taumelbewegung (Pfeile) relativ zur Strahlrichtung aus. Die Durchbrüche 125 in der Absorber struktur der Maske 122 haben einen Querschnitt, der dem der Düsenkapillaren entspricht. Durch die Strahlung 123 entstehen in der Resistschicht 121 Bereiche 124 mit trichterförmigen zur Platte 12 sich erweiterndem Querschnitt, die aufgrund der Bestrahlung im Vergleich zu den nicht bestrahlten Bereichen der Schicht 121 schwerer löslich sind. Nach dem Entfernen der nicht bestrahlten Bereiche der Resistschicht 121 mit einem flüssigen Entwickler entstehen auf der Platte 12 Negativformen 131 der trichterförmigen Vorkanäle. Nach dem galvanischen Abscheiden von Metall auf der Platte 12 und dem Einebnen dieser Galvanikschicht 141 (Figur 11) werden die Platte 12 und die Negativformen 131 entfernt, so daß eine mit trichterförmigen Vorkanälen 144 versehene metallische Platte 141 gemäß Figur 12 entsteht.With reference to FIGS. 10, 11 and 12, it is shown below that the metallic plate with the funnel-shaped pre-channels is produced by deep lithographic-galvanic means can be put. For this purpose, a
Die Herstellung der metallischen Platte mit trichterförmigen Vorkanälen kann auch bei Verwendung eines Positiv-Resistmaterials auf tiefenlithographisch-galvanischem Wege erfolgen. Die gemäß Fig. 10 während der Bestrahlung mit einer Taumelbewegung entstandenen Bereiche werden in diesem Falle entfernt und durch ein Füllmaterial ersetzt. Nach dem Entfernen des restlichen Resistmaterials mit einem Entwickler erhält man so Negativformen der trichterförmigen Vorkanäle aus dem Füllmaterial, die entsprechend den Figuren 11 und 12 weiterbearbeitet werden. Bei trapezförmigen Vorkanälen kann an die Stelle einer Taumelbewegung eine Kippbewegung treten.The metallic plate with funnel-shaped pre-channels can also be produced by deep lithographic-galvanic means when using a positive resist material. In this case, the areas which have been created during the irradiation with a wobble movement according to FIG. 10 are removed and replaced by a filler material. After removing the remaining resist material with egg A developer thus obtains negative forms of the funnel-shaped pre-channels from the filling material, which are processed further in accordance with FIGS. 11 and 12. In the case of trapezoidal pre-channels, a wobble movement can take the place of a wobble movement.
Werden geringere Ansprüche an die Qualität der Vorkanäle gestellt, so kann anstelle der Bestrahlung mit einer Taumelbewegung eine Bestrahlung mit stark divergenter Strahlung einer flächenhaften Strahlungsquelle treten.If lower demands are placed on the quality of the pre-channels, then radiation with strongly divergent radiation from a planar radiation source can take the place of the radiation with a wobble movement.
Als Positiv-Resistmaterial wird PMMA verwendet, das nach der Bestrahlung in einem flüssigen Entwickler aus Butyldiglycol, Morpholin, Ethanolamin und Wasser gelöst wird. Das Negativ-Resistmaterial ist auf Polystyrol-Basis aufgebaut, der hierfür erforderliche Entwickler besteht aus einem Gemisch aus Ketonen und höheren Alkoholen. Die galvanische Abscheidung von Metall erfolgt in einem chloridfreien Nickelsulfamatbad bei einer Temperatur von 52° C. Weitere Badbestandteile sind Borsäure, die zur Pufferung des Elektrolyten bei pH = 4 dient, und ein Netzmittel zur Porenverhütung. Die Röntgenmaske besteht aus einem für Röntgenstrahlung weitgehend durchlässigen Maskenträger aus ca. 20 um starkem Beryllium und einem für Röntgenstrahlung weitgehend undurchlässigen Absorber aus ca. 15 um Gold. Als energiereiche Strahlung wird Synchrotronstrahlung mit einer charakteristischen Wellenlänge von λc= 0,2 nm verwendet. Das wieder entfernbare strahlungsunempfindliche Füllmaterial besteht aus einem Gemisch aus einem Epoxidharz und einem internen Trennmittel.PMMA is used as the positive resist material, which after the irradiation is dissolved in a liquid developer of butyl diglycol, morpholine, ethanolamine and water. The negative resist material is based on polystyrene, the developer required for this consists of a mixture of ketones and higher alcohols. The galvanic deposition of metal takes place in a chloride-free nickel sulfamate bath at a temperature of 52 ° C. Other bath components are boric acid, which serves to buffer the electrolyte at pH = 4, and a wetting agent to prevent pores. The X-ray mask consists of a mask carrier made of approximately 20 μm strong beryllium, which is largely transparent to X-rays, and an absorber made of approximately 15 μm gold, which is largely impermeable to X-rays. Synchrotron radiation with a characteristic wavelength of λ c = 0.2 nm is used as high-energy radiation. The removable radiation-insensitive filling material consists of a mixture of an epoxy resin and an internal release agent.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT86105992T ATE66254T1 (en) | 1985-07-09 | 1986-04-30 | PROCESS FOR MANUFACTURING SPINNOZE PLATES. |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19853524411 DE3524411A1 (en) | 1985-07-09 | 1985-07-09 | METHOD FOR PRODUCING SPINNING NOZZLE PLATES |
DE3524411 | 1985-07-09 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0209651A2 true EP0209651A2 (en) | 1987-01-28 |
EP0209651A3 EP0209651A3 (en) | 1988-09-14 |
EP0209651B1 EP0209651B1 (en) | 1991-08-14 |
Family
ID=6275266
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP86105992A Expired - Lifetime EP0209651B1 (en) | 1985-07-09 | 1986-04-30 | Process for manufacturing spinneret plates |
Country Status (8)
Country | Link |
---|---|
US (1) | US4694548A (en) |
EP (1) | EP0209651B1 (en) |
JP (1) | JPH0747249B2 (en) |
AT (1) | ATE66254T1 (en) |
AU (1) | AU585624B2 (en) |
BR (1) | BR8603196A (en) |
CA (1) | CA1258572A (en) |
DE (2) | DE3524411A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111702323A (en) * | 2020-06-30 | 2020-09-25 | 苏州锐涛光电科技有限公司 | Processing method of spinneret orifice of melt-blown plate die |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5189437A (en) * | 1987-09-19 | 1993-02-23 | Xaar Limited | Manufacture of nozzles for ink jet printers |
DE3841621A1 (en) * | 1988-12-10 | 1990-07-12 | Draegerwerk Ag | ELECTROCHEMICAL MEASURING CELL WITH MICROSTRUCTURED CAPILLARY OPENINGS IN THE MEASURING ELECTRODE |
US5119550A (en) * | 1989-07-03 | 1992-06-09 | Eastman Kodak Company | Method of making transfer apparatus having vacuum holes |
US5189777A (en) * | 1990-12-07 | 1993-03-02 | Wisconsin Alumni Research Foundation | Method of producing micromachined differential pressure transducers |
DE4042125A1 (en) * | 1990-12-28 | 1992-07-02 | Maxs Ag | METHOD FOR PRODUCING A REINFORCED FLAT OBJECT HAVING MICRO-OPENINGS |
US5206983A (en) * | 1991-06-24 | 1993-05-04 | Wisconsin Alumni Research Foundation | Method of manufacturing micromechanical devices |
US5190637A (en) * | 1992-04-24 | 1993-03-02 | Wisconsin Alumni Research Foundation | Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers |
US5378583A (en) * | 1992-12-22 | 1995-01-03 | Wisconsin Alumni Research Foundation | Formation of microstructures using a preformed photoresist sheet |
US5412265A (en) * | 1993-04-05 | 1995-05-02 | Ford Motor Company | Planar micro-motor and method of fabrication |
US5413668A (en) * | 1993-10-25 | 1995-05-09 | Ford Motor Company | Method for making mechanical and micro-electromechanical devices |
DE19530193A1 (en) * | 1995-08-17 | 1997-02-20 | Bosch Gmbh Robert | Nozzle plate, in particular for fuel injection valves, and method for producing a nozzle plate |
CA2233163A1 (en) * | 1995-10-30 | 1997-05-09 | Kimberly-Clark Corporation | Fiber spin pack |
GB9623185D0 (en) * | 1996-11-09 | 1997-01-08 | Epigem Limited | Improved micro relief element and preparation thereof |
EP1015445B1 (en) * | 1997-09-15 | 2009-02-25 | The Procter & Gamble Company | Antimicrobial quinolones, their compositions and uses |
US6272275B1 (en) | 1999-06-25 | 2001-08-07 | Corning Incorporated | Print-molding for process for planar waveguides |
DE10305425B4 (en) * | 2003-02-03 | 2006-04-27 | Siemens Ag | Production method for a perforated disk for ejecting a fluid |
DE10305427B4 (en) * | 2003-02-03 | 2006-05-24 | Siemens Ag | Production method for a perforated disk for ejecting a fluid |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4246076A (en) * | 1979-12-06 | 1981-01-20 | Xerox Corporation | Method for producing nozzles for ink jet printers |
EP0089480A1 (en) * | 1982-02-26 | 1983-09-28 | Kernforschungszentrum Karlsruhe Gmbh | Method of manufacturing separating nozzle elements |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3192136A (en) * | 1962-09-14 | 1965-06-29 | Sperry Rand Corp | Method of preparing precision screens |
US3512247A (en) * | 1966-11-16 | 1970-05-19 | Celanese Corp | Process for producing spinnerettes |
US3449221A (en) * | 1966-12-08 | 1969-06-10 | Dynamics Res Corp | Method of making a monometallic mask |
US4430784A (en) * | 1980-02-22 | 1984-02-14 | Celanese Corporation | Manufacturing process for orifice nozzle devices for ink jet printing apparati |
DE3042483A1 (en) * | 1980-11-11 | 1982-06-16 | Philips Patentverwaltung Gmbh, 2000 Hamburg | METHOD AND ARRANGEMENT FOR PRODUCING A NOZZLE PLATE FOR INK JET WRITER |
NL8203521A (en) * | 1982-09-10 | 1984-04-02 | Philips Nv | METHOD FOR MANUFACTURING AN APPARATUS |
US4552831A (en) * | 1984-02-06 | 1985-11-12 | International Business Machines Corporation | Fabrication method for controlled via hole process |
-
1985
- 1985-07-09 DE DE19853524411 patent/DE3524411A1/en active Granted
-
1986
- 1986-04-30 AT AT86105992T patent/ATE66254T1/en not_active IP Right Cessation
- 1986-04-30 EP EP86105992A patent/EP0209651B1/en not_active Expired - Lifetime
- 1986-04-30 DE DE8686105992T patent/DE3680837D1/en not_active Expired - Fee Related
- 1986-07-08 JP JP61158898A patent/JPH0747249B2/en not_active Expired - Lifetime
- 1986-07-08 CA CA000513271A patent/CA1258572A/en not_active Expired
- 1986-07-08 BR BR8603196A patent/BR8603196A/en not_active IP Right Cessation
- 1986-07-09 AU AU59888/86A patent/AU585624B2/en not_active Ceased
- 1986-07-09 US US06/883,633 patent/US4694548A/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4246076A (en) * | 1979-12-06 | 1981-01-20 | Xerox Corporation | Method for producing nozzles for ink jet printers |
EP0089480A1 (en) * | 1982-02-26 | 1983-09-28 | Kernforschungszentrum Karlsruhe Gmbh | Method of manufacturing separating nozzle elements |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111702323A (en) * | 2020-06-30 | 2020-09-25 | 苏州锐涛光电科技有限公司 | Processing method of spinneret orifice of melt-blown plate die |
CN111702323B (en) * | 2020-06-30 | 2022-05-10 | 苏州锐涛光电科技有限公司 | Processing method of spinneret orifice of melt-blown plate die |
Also Published As
Publication number | Publication date |
---|---|
JPS6244322A (en) | 1987-02-26 |
EP0209651A3 (en) | 1988-09-14 |
DE3680837D1 (en) | 1991-09-19 |
BR8603196A (en) | 1987-02-24 |
AU585624B2 (en) | 1989-06-22 |
JPH0747249B2 (en) | 1995-05-24 |
CA1258572A (en) | 1989-08-22 |
AU5988886A (en) | 1987-01-15 |
DE3524411C2 (en) | 1989-05-03 |
US4694548A (en) | 1987-09-22 |
DE3524411A1 (en) | 1987-01-15 |
ATE66254T1 (en) | 1991-08-15 |
EP0209651B1 (en) | 1991-08-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0209651A2 (en) | Process for manufacturing spinneret plates | |
DE4309524C1 (en) | Method of producing three=dimensional object free from distortion - by successively photo curing layers of liquid or powder under control of computer which differentiates between each core and outer skin | |
EP2864108B1 (en) | Device and method for layer-by-layer production of a three-dimensional object | |
DE19715582B4 (en) | Method and system for generating three-dimensional bodies from computer data | |
DE3704546C2 (en) | ||
WO2017005578A1 (en) | Powder bed-based additive manufacturing method with surface aftertreatment, and system which is suitable for said manufacturing method | |
EP2275247A1 (en) | Apparatus and method for producing three dimensional objects by means of a generative production method | |
DE102015207306A1 (en) | Method and device for producing a three-dimensional object | |
DE10042132B4 (en) | Selective surface layer melting | |
EP0024515B1 (en) | Process for manufacturing separating nozzles for separating gaseous or vaporous mixtures, particularly isotopic mixtures, and separating nozzles produced according to this process | |
DE3735558C2 (en) | ||
DE3517729C2 (en) | ||
DE3517730C2 (en) | ||
EP0020986B1 (en) | Process for manufacturing slot-nozzle elements for separating gaseous or vaporous mixtures, especially isotope mixtures | |
DE102019002292A1 (en) | Method and device for additive manufacturing of a component | |
EP0694088B1 (en) | Process for producing a base mould for electrolycally producing seamless rotary screen printing stencils, in particular of nickel | |
DE3631804A1 (en) | Process and apparatus for producing microfilters, and a microfilter produced accordingly | |
DE10305427B4 (en) | Production method for a perforated disk for ejecting a fluid | |
DE102021213790A1 (en) | Process and device for the production of a component using additive manufacturing processes by building up in layers | |
EP3254806A1 (en) | Method for producing a dressing tool for a grinding tool | |
DE102021106759A1 (en) | Device and method for carrying out an additive manufacturing method | |
DE102021119829A1 (en) | hot runner nozzle | |
DE102015207180A1 (en) | Method and device for producing three-dimensional structures in layers | |
EP4289595A1 (en) | Method for producing a component with shaping steps | |
DE102020004310A1 (en) | Method and device for manufacturing a body |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT CH DE FR GB IT LI NL SE |
|
17P | Request for examination filed |
Effective date: 19870227 |
|
PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
AK | Designated contracting states |
Kind code of ref document: A3 Designated state(s): AT CH DE FR GB IT LI NL SE |
|
17Q | First examination report despatched |
Effective date: 19900209 |
|
ITF | It: translation for a ep patent filed |
Owner name: DE DOMINICIS & MAYER S.R.L. |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT CH DE FR GB IT LI NL SE |
|
REF | Corresponds to: |
Ref document number: 66254 Country of ref document: AT Date of ref document: 19910815 Kind code of ref document: T |
|
ET | Fr: translation filed | ||
REF | Corresponds to: |
Ref document number: 3680837 Country of ref document: DE Date of ref document: 19910919 |
|
GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) | ||
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed | ||
EAL | Se: european patent in force in sweden |
Ref document number: 86105992.1 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: SE Payment date: 19970416 Year of fee payment: 12 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: AT Payment date: 19970425 Year of fee payment: 12 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 19970429 Year of fee payment: 12 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 19970430 Year of fee payment: 12 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: THE PATENT HAS BEEN ANNULLED BY A DECISION OF A NATIONAL AUTHORITY Effective date: 19980430 Ref country code: AT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 19980430 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 19980501 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 19981101 |
|
NLV4 | Nl: lapsed or anulled due to non-payment of the annual fee |
Effective date: 19981101 |
|
EUG | Se: european patent has lapsed |
Ref document number: 86105992.1 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 19990318 Year of fee payment: 14 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: CH Payment date: 19990329 Year of fee payment: 14 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20000430 Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20000430 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20000430 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20000430 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20040128 Year of fee payment: 19 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED. Effective date: 20050430 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20051101 |