EP0163199A3 - Verfahren und Vorrichtung zur Ermittlung von Deckungsfehlern zwischen nacheinander fotolithografisch auf eine Halbleiterscheibe zu übertragenden Strukturen - Google Patents
Verfahren und Vorrichtung zur Ermittlung von Deckungsfehlern zwischen nacheinander fotolithografisch auf eine Halbleiterscheibe zu übertragenden Strukturen Download PDFInfo
- Publication number
- EP0163199A3 EP0163199A3 EP85105950A EP85105950A EP0163199A3 EP 0163199 A3 EP0163199 A3 EP 0163199A3 EP 85105950 A EP85105950 A EP 85105950A EP 85105950 A EP85105950 A EP 85105950A EP 0163199 A3 EP0163199 A3 EP 0163199A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- mask
- semiconductor wafer
- photoresist
- semiconductor substrate
- vector field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3420081 | 1984-05-29 | ||
DE3420081 | 1984-05-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0163199A2 EP0163199A2 (de) | 1985-12-04 |
EP0163199A3 true EP0163199A3 (de) | 1988-09-14 |
Family
ID=6237163
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP85105950A Withdrawn EP0163199A3 (de) | 1984-05-29 | 1985-05-14 | Verfahren und Vorrichtung zur Ermittlung von Deckungsfehlern zwischen nacheinander fotolithografisch auf eine Halbleiterscheibe zu übertragenden Strukturen |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0163199A3 (de) |
JP (1) | JPS6111750A (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2683075B2 (ja) * | 1988-12-23 | 1997-11-26 | キヤノン株式会社 | 半導体製造装置及び方法 |
JP2842362B2 (ja) * | 1996-02-29 | 1999-01-06 | 日本電気株式会社 | 重ね合わせ測定方法 |
CN107346749A (zh) * | 2016-05-04 | 2017-11-14 | 台湾积体电路制造股份有限公司 | 半导体制程及其制程设备与控制装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0005462A2 (de) * | 1978-05-22 | 1979-11-28 | Siemens Aktiengesellschaft | Verfahren zum Positionieren von zwei aufeinander einzujustierenden Objekten |
US4356223A (en) * | 1980-02-28 | 1982-10-26 | Nippon Electric Co., Ltd. | Semiconductor device having a registration mark for use in an exposure technique for micro-fine working |
-
1985
- 1985-05-14 EP EP85105950A patent/EP0163199A3/de not_active Withdrawn
- 1985-05-28 JP JP60115199A patent/JPS6111750A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0005462A2 (de) * | 1978-05-22 | 1979-11-28 | Siemens Aktiengesellschaft | Verfahren zum Positionieren von zwei aufeinander einzujustierenden Objekten |
US4356223A (en) * | 1980-02-28 | 1982-10-26 | Nippon Electric Co., Ltd. | Semiconductor device having a registration mark for use in an exposure technique for micro-fine working |
Non-Patent Citations (2)
Title |
---|
IBM J. RES. DEVELOP., Band 26, Nr. 5, September 1982, Seiten 553-560; H.R. ROTTMANN: "Metrology in mask manufacturing" * |
IBM TECHNICAL DISCLOSURE BULLETIN, Band 25, Nr. 11A, April 1983, Seiten 5663,5664; J.P. BABINSKI: "Characterization of photolithographic tooling by use of an X-Y coordinate system" * |
Also Published As
Publication number | Publication date |
---|---|
JPS6111750A (ja) | 1986-01-20 |
EP0163199A2 (de) | 1985-12-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 19850827 |
|
AK | Designated contracting states |
Designated state(s): AT CH DE FR GB IT LI NL SE |
|
PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
AK | Designated contracting states |
Kind code of ref document: A3 Designated state(s): AT CH DE FR GB IT LI NL SE |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 19901201 |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: ROSSHAUPTER, ERICH, DIPL.-ING. (FH) Inventor name: DOEMENS, GUENTER, DR. |