DK2655698T3 - Hovedelektrode til ecpr samt fremgangsmåder til fremstilling af denne - Google Patents

Hovedelektrode til ecpr samt fremgangsmåder til fremstilling af denne

Info

Publication number
DK2655698T3
DK2655698T3 DK10793274.1T DK10793274T DK2655698T3 DK 2655698 T3 DK2655698 T3 DK 2655698T3 DK 10793274 T DK10793274 T DK 10793274T DK 2655698 T3 DK2655698 T3 DK 2655698T3
Authority
DK
Denmark
Prior art keywords
ecpr
procedures
manufacturing
main electrode
electrode
Prior art date
Application number
DK10793274.1T
Other languages
English (en)
Inventor
Patrik Möller
Mikael Fredenberg
Matteo Dainese
Silvia Corlevi
Cecilia Aronsson
Alan Cuthbertson
Den Hoek Wilbert Van
Original Assignee
Luxembourg Institute Of Science And Tech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Luxembourg Institute Of Science And Tech filed Critical Luxembourg Institute Of Science And Tech
Application granted granted Critical
Publication of DK2655698T3 publication Critical patent/DK2655698T3/da

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/288Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
    • H01L21/2885Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition using an external electrical current, i.e. electro-deposition
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/20Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
    • H05K3/205Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern using a pattern electroplated or electroformed on a metallic carrier
DK10793274.1T 2010-12-23 2010-12-23 Hovedelektrode til ecpr samt fremgangsmåder til fremstilling af denne DK2655698T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2010/070644 WO2012084045A1 (en) 2010-12-23 2010-12-23 Master electrode for ecpr and manufacturing methods thereof

Publications (1)

Publication Number Publication Date
DK2655698T3 true DK2655698T3 (da) 2019-08-12

Family

ID=43799694

Family Applications (1)

Application Number Title Priority Date Filing Date
DK10793274.1T DK2655698T3 (da) 2010-12-23 2010-12-23 Hovedelektrode til ecpr samt fremgangsmåder til fremstilling af denne

Country Status (3)

Country Link
EP (1) EP2655698B1 (da)
DK (1) DK2655698T3 (da)
WO (1) WO2012084045A1 (da)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5722933B2 (ja) * 2013-02-04 2015-05-27 株式会社豊田中央研究所 積層電極

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57154829A (en) * 1981-03-20 1982-09-24 Internatl Rectifier Corp Japan Ltd Forming method for electrode metal of semiconductor device
SE523309E (sv) 2001-06-15 2009-10-26 Replisaurus Technologies Ab Metod, elektrod och apparat för att skapa mikro- och nanostrukturer i ledande material genom mönstring med masterelektrod och elektrolyt
US6787450B2 (en) * 2002-05-29 2004-09-07 Micron Technology, Inc. High aspect ratio fill method and resulting structure
JP2009516388A (ja) * 2005-11-18 2009-04-16 レプリソールス テクノロジーズ アーベー 多層構造の形成方法

Also Published As

Publication number Publication date
WO2012084045A1 (en) 2012-06-28
EP2655698A1 (en) 2013-10-30
EP2655698B1 (en) 2019-05-15
WO2012084045A8 (en) 2019-02-07

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