DE69941635D1 - Abtastvorrichtung - Google Patents

Abtastvorrichtung

Info

Publication number
DE69941635D1
DE69941635D1 DE69941635T DE69941635T DE69941635D1 DE 69941635 D1 DE69941635 D1 DE 69941635D1 DE 69941635 T DE69941635 T DE 69941635T DE 69941635 T DE69941635 T DE 69941635T DE 69941635 D1 DE69941635 D1 DE 69941635D1
Authority
DE
Germany
Prior art keywords
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69941635T
Other languages
English (en)
Inventor
Wolfgang Retschke
Wolfgang Senf
Steffen Ruecker
Uwe Klowsky
Udo Battig
Ulrich Baumann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LIS LASER IMAGING SYSTEMS GmbH
Original Assignee
LIS LASER IMAGING SYSTEMS GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LIS LASER IMAGING SYSTEMS GmbH filed Critical LIS LASER IMAGING SYSTEMS GmbH
Application granted granted Critical
Publication of DE69941635D1 publication Critical patent/DE69941635D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
    • H04N1/19—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using multi-element arrays
    • H04N1/191—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using multi-element arrays the array comprising a one-dimensional array, or a combination of one-dimensional arrays, or a substantially one-dimensional array, e.g. an array of staggered elements
    • H04N1/192—Simultaneously or substantially simultaneously scanning picture elements on one main scanning line
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
    • H04N1/10—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using flat picture-bearing surfaces
    • H04N1/1008—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using flat picture-bearing surfaces with sub-scanning by translatory movement of the picture-bearing surface
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
    • H04N1/113—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using oscillating or rotating mirrors
    • H04N1/1135—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using oscillating or rotating mirrors for the main-scan only
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N2201/00—Indexing scheme relating to scanning, transmission or reproduction of documents or the like, and to details thereof
    • H04N2201/04—Scanning arrangements
    • H04N2201/047—Detection, control or error compensation of scanning velocity or position
    • H04N2201/04701—Detection of scanning velocity or position
    • H04N2201/0471—Detection of scanning velocity or position using dedicated detectors
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N2201/00—Indexing scheme relating to scanning, transmission or reproduction of documents or the like, and to details thereof
    • H04N2201/04—Scanning arrangements
    • H04N2201/047—Detection, control or error compensation of scanning velocity or position
    • H04N2201/04701—Detection of scanning velocity or position
    • H04N2201/04715—Detection of scanning velocity or position by detecting marks or the like, e.g. slits
    • H04N2201/04717—Detection of scanning velocity or position by detecting marks or the like, e.g. slits on the scanned sheet, e.g. a reference sheet
    • H04N2201/04718—Detection of scanning velocity or position by detecting marks or the like, e.g. slits on the scanned sheet, e.g. a reference sheet outside the image area
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N2201/00—Indexing scheme relating to scanning, transmission or reproduction of documents or the like, and to details thereof
    • H04N2201/04—Scanning arrangements
    • H04N2201/047—Detection, control or error compensation of scanning velocity or position
    • H04N2201/04701—Detection of scanning velocity or position
    • H04N2201/04732—Detecting at infrequent intervals, e.g. once or twice per line for main-scan control
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N2201/00—Indexing scheme relating to scanning, transmission or reproduction of documents or the like, and to details thereof
    • H04N2201/04—Scanning arrangements
    • H04N2201/047—Detection, control or error compensation of scanning velocity or position
    • H04N2201/04701—Detection of scanning velocity or position
    • H04N2201/04737—Detection of scanning velocity or position by detecting the scanned medium directly, e.g. a leading edge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Facsimile Scanning Arrangements (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laser Beam Printer (AREA)
  • Exposure Or Original Feeding In Electrophotography (AREA)
DE69941635T 1998-07-04 1999-03-15 Abtastvorrichtung Expired - Lifetime DE69941635D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19829986A DE19829986C1 (de) 1998-07-04 1998-07-04 Verfahren zur Direktbelichtung von Leiterplattensubstraten

Publications (1)

Publication Number Publication Date
DE69941635D1 true DE69941635D1 (de) 2009-12-31

Family

ID=7873021

Family Applications (3)

Application Number Title Priority Date Filing Date
DE19829986A Expired - Fee Related DE19829986C1 (de) 1998-07-04 1998-07-04 Verfahren zur Direktbelichtung von Leiterplattensubstraten
DE69923694T Expired - Fee Related DE69923694T2 (de) 1998-07-04 1999-03-15 Abtastvorrichtung und -verfahren
DE69941635T Expired - Lifetime DE69941635D1 (de) 1998-07-04 1999-03-15 Abtastvorrichtung

Family Applications Before (2)

Application Number Title Priority Date Filing Date
DE19829986A Expired - Fee Related DE19829986C1 (de) 1998-07-04 1998-07-04 Verfahren zur Direktbelichtung von Leiterplattensubstraten
DE69923694T Expired - Fee Related DE69923694T2 (de) 1998-07-04 1999-03-15 Abtastvorrichtung und -verfahren

Country Status (9)

Country Link
US (2) US7046266B1 (de)
EP (2) EP1569037B1 (de)
JP (5) JP4512270B2 (de)
CN (3) CN1263357C (de)
AU (1) AU3414199A (de)
DE (3) DE19829986C1 (de)
IL (2) IL140699A0 (de)
TW (1) TW479444B (de)
WO (1) WO2000002424A1 (de)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL133889A (en) 2000-01-05 2007-03-08 Orbotech Ltd Pulse light pattern writer
US7058474B2 (en) 2000-11-08 2006-06-06 Orbotech Ltd. Multi-layer printed circuit board fabrication system and method
US6819789B1 (en) 2000-11-08 2004-11-16 Orbotech Ltd. Scaling and registration calibration especially in printed circuit board fabrication
US7062354B2 (en) 2000-11-08 2006-06-13 Orbotech Ltd. Multi-layer printed circuit board fabrication system and method
US6701197B2 (en) 2000-11-08 2004-03-02 Orbotech Ltd. System and method for side to side registration in a printed circuit imager
US7453486B2 (en) 2000-12-13 2008-11-18 Orbotech Ltd Pulse light pattern writer
WO2002054837A2 (en) 2001-01-04 2002-07-11 Laser Imaging Systems Gmbh & Co. Kg Direct pattern writer
US6419148B1 (en) 2001-01-23 2002-07-16 Orbotech Ltd. System for forming bumps on wafers
US7061450B2 (en) * 2001-04-09 2006-06-13 Microvision, Inc. Electronically scanned beam display
JP4563170B2 (ja) 2002-05-02 2010-10-13 オーボテック リミテッド 電気回路パターンの製造方法及びシステム
US7483196B2 (en) 2003-09-23 2009-01-27 Applied Materials, Inc. Apparatus for multiple beam deflection and intensity stabilization
US8441694B2 (en) * 2003-09-30 2013-05-14 Hewlett-Packard Development Company, L.P. Method and an apparatus for adjusting a scanning target area of an image reproduction device
JP2006337551A (ja) * 2005-05-31 2006-12-14 Hitachi Via Mechanics Ltd レーザ直描装置およびその描画方法
US20100141732A1 (en) * 2005-07-25 2010-06-10 Fujifilm Corporation Image recording device and method
ITPD20070201A1 (it) * 2007-06-08 2008-12-09 Helios Technology Societa A Re Macchina per la rimozione di superfici di semiconduttori, ed in particolare di superfici con circuiti integrati
JP5489050B2 (ja) * 2008-02-04 2014-05-14 日本精工株式会社 露光装置
GB2457720A (en) 2008-02-23 2009-08-26 Philip Thomas Rumsby Method for laser processing on the opposite sides of thin transparent substrates
WO2009153792A2 (en) * 2008-06-19 2009-12-23 Utilight Ltd. Light induced patterning
EP2344680A2 (de) * 2008-10-12 2011-07-20 Utilight Ltd. Solarzellen und herstellungsverfahren dafür
IL194967A0 (en) * 2008-10-28 2009-08-03 Orbotech Ltd Producing electrical circuit patterns using multi-population transformation
CN102460632B (zh) * 2009-05-20 2015-11-25 迈普尔平版印刷Ip有限公司 产生二级图案以供光刻处理的方法和使用该方法的图案产生器
JP2013501242A (ja) * 2009-08-05 2013-01-10 コーニング インコーポレイテッド 光学走査を用いたラベル非依存光学読取システム及びラベル非依存光学読取方法
IL203353A (en) * 2010-01-17 2015-10-29 Orbotech Ltd Empty grip system
NL2006253A (en) * 2010-02-23 2011-08-24 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
CN102822748B (zh) * 2010-06-04 2015-09-16 株式会社新克 激光曝光方法及制品
US8531751B2 (en) * 2011-08-19 2013-09-10 Orbotech Ltd. System and method for direct imaging
CN103946748A (zh) 2011-11-22 2014-07-23 旭化成电子材料株式会社 热反应型抗蚀剂材料、模具的制造方法、模具、显影方法以及图案形成材料
US9568831B2 (en) 2012-01-17 2017-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2011253A (en) * 2012-08-23 2014-02-25 Asml Netherlands Bv Lithographic apparatus, device manufacturing method and displacement measurement system.
US10149390B2 (en) * 2012-08-27 2018-12-04 Mycronic AB Maskless writing of a workpiece using a plurality of exposures having different focal planes using multiple DMDs
KR101853864B1 (ko) * 2013-06-28 2018-05-02 인텔 코포레이션 Mems 스캐닝 미러 광 패턴 생성
JP6411508B2 (ja) 2013-12-10 2018-10-24 ドルビー ラボラトリーズ ライセンシング コーポレイション プロジェクションシステムのための音響光学ビームステアリング変調器
US9467680B2 (en) 2013-12-12 2016-10-11 Intel Corporation Calibration of a three-dimensional acquisition system
KR101963488B1 (ko) * 2014-04-28 2019-03-28 가부시키가이샤 니콘 패턴 묘화 장치, 패턴 묘화 방법, 디바이스 제조 방법, 레이저 광원 장치, 빔 주사 장치 및 빔 주사 방법
US9269149B2 (en) 2014-05-08 2016-02-23 Orbotech Ltd. Calibration of a direct-imaging system
EP3185655B8 (de) * 2015-12-22 2024-01-03 Heraeus Electronics GmbH & Co. KG Verfahren zur individuellen codierung von metall-keramik-substraten
JP2017128084A (ja) * 2016-01-22 2017-07-27 株式会社沖データ 露光装置、画像形成ユニットおよび画像形成装置
EP3427008B1 (de) * 2016-03-11 2022-09-07 Kaarta, Inc. Laserscanner mit online-eigenbewegungsschätzung in echtzeit
US10659764B2 (en) 2016-06-20 2020-05-19 Intel Corporation Depth image provision apparatus and method
US10609359B2 (en) 2016-06-22 2020-03-31 Intel Corporation Depth image provision apparatus and method
WO2018066338A1 (ja) * 2016-10-05 2018-04-12 株式会社ニコン パターン描画装置
JP6932524B2 (ja) 2017-03-10 2021-09-08 キヤノン株式会社 光学部材及び光学部材の製造方法
US10620293B2 (en) * 2017-11-02 2020-04-14 The Boeing Company Determining direction of arrival of an electromagnetic wave
JP7500545B2 (ja) 2018-09-06 2024-06-17 オルボテック リミテッド 光学検査システム向けマルチモダリティ多重化照明
US20210094232A1 (en) * 2019-09-30 2021-04-01 Ricoh Company, Ltd. Irradiation target flying apparatus, three-dimensional modeling apparatus, and irradiation target flying method
CN114888443A (zh) * 2022-03-30 2022-08-12 北京理工大学 一种飞秒激光在透明材料双面进行高尺寸精度刻型的方法

Family Cites Families (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2758305C2 (de) 1977-12-27 1981-09-24 Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel Verfahren und Vorrichtung zur Vermeidung von Zeilenstrukturen bei der Bildaufzeichnung
JPS5497050A (en) * 1978-01-17 1979-07-31 Fuji Photo Film Co Ltd Video clock signal generator
US4205348A (en) 1978-07-05 1980-05-27 Xerox Corporation Laser scanning utilizing facet tracking and acousto pulse imaging techniques
US4419675A (en) * 1979-05-24 1983-12-06 American Hoechst Corporation Imaging system and method for printed circuit artwork and the like
JPS5667277A (en) * 1979-11-05 1981-06-06 Canon Inc Laser recording device
JPS5731134A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Drawing device by electron beam
DE3174899D1 (en) * 1980-10-31 1986-08-07 Toshiba Kk Picture information input apparatus
JPS5778260A (en) * 1980-10-31 1982-05-15 Toshiba Corp Video information file device
JPS5778268A (en) * 1980-10-31 1982-05-15 Toshiba Corp Video information input device
JPS5857108A (ja) * 1981-09-30 1983-04-05 Fujitsu Ltd 光走査方式
US4445125A (en) * 1982-04-19 1984-04-24 Xerox Corporation Diode laser array system for printing and copying applications
US4588269A (en) * 1984-07-05 1986-05-13 Eastman Kodak Company Apparatus which shapes gaussian beams by spherical mirrors
JPS61258239A (ja) * 1985-05-10 1986-11-15 Dainippon Screen Mfg Co Ltd シ−ト材の吸着保持装置
GB2183358A (en) * 1985-08-19 1987-06-03 Philips Electronic Associated Acousto-optic modulator
DE8530144U1 (de) * 1985-10-24 1987-12-23 Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel Optoelektronischer Abtastkopf
US4667155A (en) * 1986-01-07 1987-05-19 Virginia Panel Corporation Modular molded vacuum test fixture
DE3603544A1 (de) * 1986-02-05 1987-08-06 Sick Optik Elektronik Erwin Optische abtastvorrichtung
US4721462A (en) * 1986-10-21 1988-01-26 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Active hold-down for heat treating
JPH01237513A (ja) * 1987-05-13 1989-09-22 Dainippon Screen Mfg Co Ltd 光ビーム偏向走査装置
EP0299455A3 (de) 1987-07-17 1991-03-27 Dainippon Screen Mfg. Co., Ltd. Laserbelichtungsverfahren und -Gerät für ein Bildabtast-/Bildaufzeichnungsgerät
US4826268A (en) * 1987-11-25 1989-05-02 Holotek, Ltd. Hologon scanner system
JPH07111508B2 (ja) * 1988-06-20 1995-11-29 大日本スクリーン製造株式会社 画像走査記録装置のレーザ露光方法
JPH02105110A (ja) * 1988-10-14 1990-04-17 Asahi Optical Co Ltd 複数ビーム走査方法
JPH07113705B2 (ja) * 1988-10-24 1995-12-06 大日本スクリーン製造株式会社 光ビーム走査装置
US5191442A (en) * 1990-04-26 1993-03-02 Ecrm Apparatus for scanning a document
IL94308A0 (en) * 1990-05-07 1991-03-10 Scitex Corp Ltd Laser scanning apparatus
JP2685346B2 (ja) * 1990-10-12 1997-12-03 富士写真フイルム株式会社 複数光ビームによる走査露光方法
JPH04264420A (ja) * 1991-02-19 1992-09-21 Ricoh Co Ltd 光走査装置
US5635976A (en) 1991-07-17 1997-06-03 Micronic Laser Systems Ab Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate
JP2524567B2 (ja) * 1991-08-03 1996-08-14 キヤノン株式会社 複数ビ―ム走査光学装置
DE69226511T2 (de) 1992-03-05 1999-01-28 Micronic Laser Systems Ab Verfahren und Vorrichtung zur Belichtung von Substraten
JP2580933B2 (ja) * 1992-04-10 1997-02-12 キヤノン株式会社 ジッター量測定手段を有した光走査装置
EP0603430B1 (de) * 1992-08-11 1999-02-10 Agfa-Gevaert N.V. Dokumentabtaster und Saugtisch dafür
JP3191438B2 (ja) * 1992-08-31 2001-07-23 ソニー株式会社 光学記録方法及び光学記録装置
US5342715A (en) * 1993-04-23 1994-08-30 Xerox Corporation Color printer having reduced first copy out time and extended photoreceptor life
US5576880A (en) * 1994-03-31 1996-11-19 Aurora Photonics, Inc. Acousto-optic bragg cell
EP0679520A3 (de) * 1994-04-29 1998-06-03 Eastman Kodak Company Mehrfach verstellbare Linsenanordnung zum Belichten von lichtempfindlichen Medien in einem rotierenden Drucker
US5608444A (en) * 1994-06-10 1997-03-04 Minnesota Mining And Manufacturing Company Image scanning/recording apparatus and method
JP3712017B2 (ja) * 1995-05-12 2005-11-02 セイコーエプソン株式会社 光走査装置
US5706994A (en) * 1995-06-26 1998-01-13 Marquip, Inc. Vacuum assisted web drive for corrugator double backer
US5923359A (en) 1997-03-14 1999-07-13 Cymbolic Sciences International Inc. Internal drum scophony raster recording device
JPH09277134A (ja) * 1996-04-11 1997-10-28 Sony Corp 真空吸着式ワーク固定装置及び方法
US6037967A (en) 1996-12-18 2000-03-14 Etec Systems, Inc. Short wavelength pulsed laser scanner
US6052140A (en) * 1997-01-08 2000-04-18 Fuji Photo Film Co., Ltd. Image forming apparatus
JP2000258714A (ja) * 1999-03-10 2000-09-22 Asahi Optical Co Ltd 走査式描画装置及びそのピント調整方法
US6182957B1 (en) * 1999-08-12 2001-02-06 International Business Machines Corporation Apparatus and method for holding a flexible product in a flat and secure position

Also Published As

Publication number Publication date
DE19829986C1 (de) 2000-03-30
DE69923694D1 (de) 2005-03-17
EP1569037A2 (de) 2005-08-31
TW479444B (en) 2002-03-11
CN100580559C (zh) 2010-01-13
IL140699A (en) 2010-04-15
WO2000002424A1 (en) 2000-01-13
JP2010044400A (ja) 2010-02-25
US7046266B1 (en) 2006-05-16
EP1569037A3 (de) 2006-03-15
JP4512270B2 (ja) 2010-07-28
EP1569037B1 (de) 2009-11-18
JP2011237819A (ja) 2011-11-24
US20060132590A1 (en) 2006-06-22
IL140699A0 (en) 2002-02-10
JP5631272B2 (ja) 2014-11-26
CN1308837A (zh) 2001-08-15
JP4801762B2 (ja) 2011-10-26
CN1263357C (zh) 2006-07-05
JP2010044402A (ja) 2010-02-25
AU3414199A (en) 2000-01-24
JP4865843B2 (ja) 2012-02-01
CN1782880A (zh) 2006-06-07
EP1110437B1 (de) 2005-02-09
JP2002520644A (ja) 2002-07-09
JP2010044401A (ja) 2010-02-25
EP1110437A1 (de) 2001-06-27
JP4801763B2 (ja) 2011-10-26
US7259777B2 (en) 2007-08-21
CN1881088A (zh) 2006-12-20
DE69923694T2 (de) 2006-03-23

Similar Documents

Publication Publication Date Title
DE69941635D1 (de) Abtastvorrichtung
DE59914158D1 (de) Metallocenmonohalogenide
ATE341990T1 (de) Sigmidoskop
DE59911453D1 (de) Aktivkohlefilter
DE69808145T2 (de) Tintenbehälternachfüllsystem
DE59912371D1 (de) Gleitschalungsfertiger
DE59901560D1 (de) Retrograder tibianagel
DE59902874D1 (de) Buchsenkontakt
DE59907306D1 (de) Fadenchangierung
DE59906931D1 (de) Exzenterzahnradgetriebe
NO20006412L (no) Arylalkanoylpyridaziner
DE59911683D1 (de) Fahrzeugschliessanlage
DE69730383D1 (de) Abtastsystem
DE69929009D1 (de) Mehrstrahlabtastgerät
DE59913393D1 (de) Fadenchangierung
DE59908968D1 (de) Benzoylpyridazine
DE59908769D1 (de) N-arylsulfonyl-aminosäure-omega-amide
DE60032048D1 (de) Bildabtaster
DE59903106D1 (de) Tripode-gleichlaufdrehgelenk
DE59908057D1 (de) Underdruckhandhabungseinrichung
DE59901046D1 (de) Methylcyclotetradec-5-en-1-one
DE60038767D1 (de) Abtastgerät
DE59807217D1 (de) Nadellager
DE69924445D1 (de) Multilaser Abtastvorrichtung
DE19842103B4 (de) Stanznietzuführung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition