DE69929631D1 - Gerät für photoreaktion - Google Patents

Gerät für photoreaktion

Info

Publication number
DE69929631D1
DE69929631D1 DE69929631T DE69929631T DE69929631D1 DE 69929631 D1 DE69929631 D1 DE 69929631D1 DE 69929631 T DE69929631 T DE 69929631T DE 69929631 T DE69929631 T DE 69929631T DE 69929631 D1 DE69929631 D1 DE 69929631D1
Authority
DE
Germany
Prior art keywords
promotion
photo
photo promotion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69929631T
Other languages
English (en)
Other versions
DE69929631T2 (de
Inventor
Yasuo Suzuki
Takashi Ikehata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IDX Technologies KK
Original Assignee
IDX Technologies KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP31905998A external-priority patent/JP3252125B2/ja
Priority claimed from JP04984799A external-priority patent/JP2001327858A/ja
Application filed by IDX Technologies KK filed Critical IDX Technologies KK
Publication of DE69929631D1 publication Critical patent/DE69929631D1/de
Application granted granted Critical
Publication of DE69929631T2 publication Critical patent/DE69929631T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters
    • G21K1/12—Resonant absorbers or driving arrangements therefor, e.g. for Moessbauer-effect devices

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Lasers (AREA)
DE69929631T 1998-11-10 1999-11-10 Gerät für photoreaktion Expired - Fee Related DE69929631T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP31905998A JP3252125B2 (ja) 1998-09-02 1998-11-10 光強度の強い、長い光の柱を形成する多面鏡装置またはそれを使用する方法
JP31905998 1998-11-10
JP04984799A JP2001327858A (ja) 1999-02-26 1999-02-26 多波長多段階の光反応を可能とする多面鏡装置、又はそれを使用する方法
JP4984799 1999-02-26
PCT/JP1999/006262 WO2000028631A1 (fr) 1998-11-10 1999-11-10 Appareil pour photoreaction

Publications (2)

Publication Number Publication Date
DE69929631D1 true DE69929631D1 (de) 2006-04-13
DE69929631T2 DE69929631T2 (de) 2006-09-28

Family

ID=26390295

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69929631T Expired - Fee Related DE69929631T2 (de) 1998-11-10 1999-11-10 Gerät für photoreaktion

Country Status (7)

Country Link
US (1) US6487003B1 (de)
EP (1) EP1059708B1 (de)
KR (1) KR100337623B1 (de)
CN (1) CN1256794C (de)
AU (1) AU1177400A (de)
DE (1) DE69929631T2 (de)
WO (1) WO2000028631A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002333500A (ja) * 2001-05-10 2002-11-22 Sumitomo Heavy Ind Ltd 短パルスｘ線発生装置及び発生方法
US7351300B2 (en) 2001-08-22 2008-04-01 Semiconductor Energy Laboratory Co., Ltd. Peeling method and method of manufacturing semiconductor device
WO2004040648A1 (ja) 2002-10-30 2004-05-13 Semiconductor Energy Laboratory Co., Ltd. 半導体装置および半導体装置の作製方法
US7277526B2 (en) * 2004-04-09 2007-10-02 Lyncean Technologies, Inc. Apparatus, system, and method for high flux, compact compton x-ray source
US9997325B2 (en) 2008-07-17 2018-06-12 Verity Instruments, Inc. Electron beam exciter for use in chemical analysis in processing systems
JP5878120B2 (ja) * 2009-08-14 2016-03-08 エーエスエムエル ネザーランズ ビー．ブイ． Ｅｕｖ放射システムおよびリソグラフィ装置
JP5632770B2 (ja) * 2011-02-23 2014-11-26 大陽日酸株式会社 光化学反応装置、及び光化学反応装置を用いた同位体濃縮方法
CN105324890B (zh) * 2013-11-22 2018-02-27 大族激光科技产业集团股份有限公司 径向偏振薄片激光器
CN105393415B (zh) * 2013-11-22 2018-12-28 大族激光科技产业集团股份有限公司 径向偏振薄片激光器
EP2960642A1 (de) * 2014-06-26 2015-12-30 Schneider Electric Industries SAS Optische kammer für gaserfassungsvorrichtung
US10887974B2 (en) 2015-06-22 2021-01-05 Kla Corporation High efficiency laser-sustained plasma light source
CN106092997B (zh) * 2016-08-09 2019-05-28 上海禾赛光电科技有限公司 基于plif技术的火焰检测装置及方法
EP3637436A1 (de) * 2018-10-12 2020-04-15 ASML Netherlands B.V. Anreicherung und radioisotopproduktion
WO2024147986A1 (en) * 2023-01-03 2024-07-11 Blue Laser Fusion, Inc. Direct laser fusion system and method for energy generation

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3390532C2 (de) * 1983-09-30 1989-08-24 Inst Khim Fiz An Sssr Optisches System zur mehrfachen Reflexion
JPS6197020A (ja) 1984-10-18 1986-05-15 Toshiba Corp 分離回収セル
JPS6197021A (ja) 1984-10-19 1986-05-15 Toshiba Corp レ−ザ法によるウランの濃縮装置
JPS61185985A (ja) * 1985-02-14 1986-08-19 Ishikawajima Harima Heavy Ind Co Ltd レ−ザ光反応器
JPH01102985A (ja) 1987-10-16 1989-04-20 Rikagaku Kenkyusho マルチビームラマン変換器および方法
JPH0249483A (ja) 1988-08-11 1990-02-19 Toshiba Corp レーザ増幅器
US5300955A (en) * 1989-06-30 1994-04-05 The United States Of America As Represented By The United States Department Of Energy Methods of and apparatus for recording images occurring just prior to a rapid, random event
JP2877891B2 (ja) * 1990-05-18 1999-04-05 新日本製鐵株式会社 光化学反応におけるレーザ集光方法
JPH04317737A (ja) * 1991-04-15 1992-11-09 Nippon Steel Corp レーザ光化学反応装置
JP2526335Y2 (ja) 1991-06-13 1997-02-19 動力炉・核燃料開発事業団 光共振器
JPH05110166A (ja) 1991-10-17 1993-04-30 Power Reactor & Nuclear Fuel Dev Corp ラマンレーザ装置
JPH05137966A (ja) * 1991-11-19 1993-06-01 Nippon Steel Corp レーザ光を用いた気相光化学反応装置
JP2882165B2 (ja) 1992-03-04 1999-04-12 日本電気株式会社 荷電粒子ビーム励起ガスレーザー光の散乱光発生装置及びその方法
JP2930482B2 (ja) 1992-09-08 1999-08-03 三菱重工業株式会社 円錐形ラマンレーザ装置
JP3059020B2 (ja) 1993-02-16 2000-07-04 三菱重工業株式会社 ラマンレーザ装置
KR970003502B1 (ko) * 1994-02-03 1997-03-18 재단법인 한국화학연구소 레이저 vpe 방법과 그 장치
JP3027822B2 (ja) 1994-03-08 2000-04-04 科学技術振興事業団 荷電粒子ビームのマイクロバンチング方法及びそのための装置
GB9517755D0 (en) * 1995-08-31 1995-11-01 Council Cent Lab Res Councils Multiple pass optical system

Also Published As

Publication number Publication date
EP1059708A1 (de) 2000-12-13
EP1059708B1 (de) 2006-01-25
US6487003B1 (en) 2002-11-26
EP1059708A4 (de) 2005-05-25
CN1256794C (zh) 2006-05-17
KR20010033977A (ko) 2001-04-25
KR100337623B1 (ko) 2002-05-24
AU1177400A (en) 2000-05-29
DE69929631T2 (de) 2006-09-28
WO2000028631A1 (fr) 2000-05-18
CN1290415A (zh) 2001-04-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee