CN1290415A - 光反应装置 - Google Patents
光反应装置 Download PDFInfo
- Publication number
- CN1290415A CN1290415A CN99802793A CN99802793A CN1290415A CN 1290415 A CN1290415 A CN 1290415A CN 99802793 A CN99802793 A CN 99802793A CN 99802793 A CN99802793 A CN 99802793A CN 1290415 A CN1290415 A CN 1290415A
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- China
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- mentioned
- laser
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- reaction compartment
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000006243 chemical reaction Methods 0.000 claims abstract description 108
- 239000002245 particle Substances 0.000 claims abstract description 17
- 238000010894 electron beam technology Methods 0.000 claims abstract description 8
- 238000006303 photolysis reaction Methods 0.000 claims abstract description 6
- 230000015843 photosynthesis, light reaction Effects 0.000 claims abstract description 5
- 230000008676 import Effects 0.000 claims description 18
- 230000003993 interaction Effects 0.000 claims description 9
- 238000010884 ion-beam technique Methods 0.000 claims description 4
- 230000005284 excitation Effects 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims 2
- 230000002123 temporal effect Effects 0.000 claims 1
- 239000007789 gas Substances 0.000 abstract description 21
- 230000003287 optical effect Effects 0.000 abstract description 10
- 239000007788 liquid Substances 0.000 abstract description 8
- 239000007787 solid Substances 0.000 abstract description 8
- -1 plasma Substances 0.000 abstract description 2
- 238000005375 photometry Methods 0.000 abstract 1
- 230000029553 photosynthesis Effects 0.000 abstract 1
- 238000010672 photosynthesis Methods 0.000 abstract 1
- 238000005086 pumping Methods 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 description 12
- 238000000034 method Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 238000007599 discharging Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 238000001819 mass spectrum Methods 0.000 description 2
- 241000931526 Acer campestre Species 0.000 description 1
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 1
- 206010020751 Hypersensitivity Diseases 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 208000026935 allergic disease Diseases 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- KPHWPUGNDIVLNH-UHFFFAOYSA-M diclofenac sodium Chemical compound [Na+].[O-]C(=O)CC1=CC=CC=C1NC1=C(Cl)C=CC=C1Cl KPHWPUGNDIVLNH-UHFFFAOYSA-M 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000009610 hypersensitivity Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000004446 light reflex Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters
- G21K1/12—Resonant absorbers or driving arrangements therefor, e.g. for Moessbauer-effect devices
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Lasers (AREA)
Abstract
Description
Claims (13)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31905998A JP3252125B2 (ja) | 1998-09-02 | 1998-11-10 | 光強度の強い、長い光の柱を形成する多面鏡装置またはそれを使用する方法 |
JP319059/1998 | 1998-11-10 | ||
JP319059/98 | 1998-11-10 | ||
JP04984799A JP2001327858A (ja) | 1999-02-26 | 1999-02-26 | 多波長多段階の光反応を可能とする多面鏡装置、又はそれを使用する方法 |
JP49847/1999 | 1999-02-26 | ||
JP49847/99 | 1999-02-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1290415A true CN1290415A (zh) | 2001-04-04 |
CN1256794C CN1256794C (zh) | 2006-05-17 |
Family
ID=26390295
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB998027936A Expired - Fee Related CN1256794C (zh) | 1998-11-10 | 1999-11-10 | 光反应装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6487003B1 (zh) |
EP (1) | EP1059708B1 (zh) |
KR (1) | KR100337623B1 (zh) |
CN (1) | CN1256794C (zh) |
AU (1) | AU1177400A (zh) |
DE (1) | DE69929631T2 (zh) |
WO (1) | WO2000028631A1 (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103347603A (zh) * | 2011-02-23 | 2013-10-09 | 大阳日酸株式会社 | 光化学反应装置和使用光化学反应装置的同位素浓缩方法 |
WO2015074246A1 (zh) * | 2013-11-22 | 2015-05-28 | 深圳市大族激光科技股份有限公司 | 径向偏振薄片激光器 |
CN105223151A (zh) * | 2014-06-26 | 2016-01-06 | 施耐德电器工业公司 | 用于气体探测装置的光学腔 |
CN106092997A (zh) * | 2016-08-09 | 2016-11-09 | 上海禾赛光电科技有限公司 | 基于plif技术的火焰检测装置及方法 |
US9806484B2 (en) | 2013-11-22 | 2017-10-31 | Han's Laser Technology Industry Group Co., Ltd. | Radial polarization thin-disk laser |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002333500A (ja) * | 2001-05-10 | 2002-11-22 | Sumitomo Heavy Ind Ltd | 短パルスx線発生装置及び発生方法 |
US7351300B2 (en) | 2001-08-22 | 2008-04-01 | Semiconductor Energy Laboratory Co., Ltd. | Peeling method and method of manufacturing semiconductor device |
WO2004040648A1 (ja) | 2002-10-30 | 2004-05-13 | Semiconductor Energy Laboratory Co., Ltd. | 半導体装置および半導体装置の作製方法 |
US7277526B2 (en) * | 2004-04-09 | 2007-10-02 | Lyncean Technologies, Inc. | Apparatus, system, and method for high flux, compact compton x-ray source |
US9997325B2 (en) | 2008-07-17 | 2018-06-12 | Verity Instruments, Inc. | Electron beam exciter for use in chemical analysis in processing systems |
JP5878120B2 (ja) * | 2009-08-14 | 2016-03-08 | エーエスエムエル ネザーランズ ビー.ブイ. | Euv放射システムおよびリソグラフィ装置 |
US10887974B2 (en) | 2015-06-22 | 2021-01-05 | Kla Corporation | High efficiency laser-sustained plasma light source |
EP3637436A1 (en) * | 2018-10-12 | 2020-04-15 | ASML Netherlands B.V. | Enrichment and radioisotope production |
WO2024147986A1 (en) * | 2023-01-03 | 2024-07-11 | Blue Laser Fusion, Inc. | Direct laser fusion system and method for energy generation |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3390532C2 (de) * | 1983-09-30 | 1989-08-24 | Inst Khim Fiz An Sssr | Optisches System zur mehrfachen Reflexion |
JPS6197020A (ja) | 1984-10-18 | 1986-05-15 | Toshiba Corp | 分離回収セル |
JPS6197021A (ja) | 1984-10-19 | 1986-05-15 | Toshiba Corp | レ−ザ法によるウランの濃縮装置 |
JPS61185985A (ja) * | 1985-02-14 | 1986-08-19 | Ishikawajima Harima Heavy Ind Co Ltd | レ−ザ光反応器 |
JPH01102985A (ja) | 1987-10-16 | 1989-04-20 | Rikagaku Kenkyusho | マルチビームラマン変換器および方法 |
JPH0249483A (ja) | 1988-08-11 | 1990-02-19 | Toshiba Corp | レーザ増幅器 |
US5300955A (en) * | 1989-06-30 | 1994-04-05 | The United States Of America As Represented By The United States Department Of Energy | Methods of and apparatus for recording images occurring just prior to a rapid, random event |
JP2877891B2 (ja) * | 1990-05-18 | 1999-04-05 | 新日本製鐵株式会社 | 光化学反応におけるレーザ集光方法 |
JPH04317737A (ja) * | 1991-04-15 | 1992-11-09 | Nippon Steel Corp | レーザ光化学反応装置 |
JP2526335Y2 (ja) | 1991-06-13 | 1997-02-19 | 動力炉・核燃料開発事業団 | 光共振器 |
JPH05110166A (ja) | 1991-10-17 | 1993-04-30 | Power Reactor & Nuclear Fuel Dev Corp | ラマンレーザ装置 |
JPH05137966A (ja) * | 1991-11-19 | 1993-06-01 | Nippon Steel Corp | レーザ光を用いた気相光化学反応装置 |
JP2882165B2 (ja) | 1992-03-04 | 1999-04-12 | 日本電気株式会社 | 荷電粒子ビーム励起ガスレーザー光の散乱光発生装置及びその方法 |
JP2930482B2 (ja) | 1992-09-08 | 1999-08-03 | 三菱重工業株式会社 | 円錐形ラマンレーザ装置 |
JP3059020B2 (ja) | 1993-02-16 | 2000-07-04 | 三菱重工業株式会社 | ラマンレーザ装置 |
KR970003502B1 (ko) * | 1994-02-03 | 1997-03-18 | 재단법인 한국화학연구소 | 레이저 vpe 방법과 그 장치 |
JP3027822B2 (ja) | 1994-03-08 | 2000-04-04 | 科学技術振興事業団 | 荷電粒子ビームのマイクロバンチング方法及びそのための装置 |
GB9517755D0 (en) * | 1995-08-31 | 1995-11-01 | Council Cent Lab Res Councils | Multiple pass optical system |
-
1999
- 1999-11-10 AU AU11774/00A patent/AU1177400A/en not_active Abandoned
- 1999-11-10 CN CNB998027936A patent/CN1256794C/zh not_active Expired - Fee Related
- 1999-11-10 US US09/581,525 patent/US6487003B1/en not_active Expired - Fee Related
- 1999-11-10 KR KR1020007007566A patent/KR100337623B1/ko not_active IP Right Cessation
- 1999-11-10 WO PCT/JP1999/006262 patent/WO2000028631A1/ja active IP Right Grant
- 1999-11-10 DE DE69929631T patent/DE69929631T2/de not_active Expired - Fee Related
- 1999-11-10 EP EP99971974A patent/EP1059708B1/en not_active Expired - Lifetime
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103347603A (zh) * | 2011-02-23 | 2013-10-09 | 大阳日酸株式会社 | 光化学反应装置和使用光化学反应装置的同位素浓缩方法 |
WO2015074246A1 (zh) * | 2013-11-22 | 2015-05-28 | 深圳市大族激光科技股份有限公司 | 径向偏振薄片激光器 |
CN105324890A (zh) * | 2013-11-22 | 2016-02-10 | 大族激光科技产业集团股份有限公司 | 径向偏振薄片激光器 |
US9640935B2 (en) | 2013-11-22 | 2017-05-02 | Han's Laser Technology Industry Group Co., Ltd. | Radially polarized thin disk laser |
US9806484B2 (en) | 2013-11-22 | 2017-10-31 | Han's Laser Technology Industry Group Co., Ltd. | Radial polarization thin-disk laser |
CN105324890B (zh) * | 2013-11-22 | 2018-02-27 | 大族激光科技产业集团股份有限公司 | 径向偏振薄片激光器 |
CN105393415B (zh) * | 2013-11-22 | 2018-12-28 | 大族激光科技产业集团股份有限公司 | 径向偏振薄片激光器 |
CN105223151A (zh) * | 2014-06-26 | 2016-01-06 | 施耐德电器工业公司 | 用于气体探测装置的光学腔 |
CN105223151B (zh) * | 2014-06-26 | 2019-07-12 | 施耐德电器工业公司 | 用于气体探测装置的光学腔 |
CN106092997A (zh) * | 2016-08-09 | 2016-11-09 | 上海禾赛光电科技有限公司 | 基于plif技术的火焰检测装置及方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1059708A1 (en) | 2000-12-13 |
DE69929631D1 (de) | 2006-04-13 |
EP1059708B1 (en) | 2006-01-25 |
US6487003B1 (en) | 2002-11-26 |
EP1059708A4 (en) | 2005-05-25 |
CN1256794C (zh) | 2006-05-17 |
KR20010033977A (ko) | 2001-04-25 |
KR100337623B1 (ko) | 2002-05-24 |
AU1177400A (en) | 2000-05-29 |
DE69929631T2 (de) | 2006-09-28 |
WO2000028631A1 (fr) | 2000-05-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: CO., LTD. IDX TECHNOLOGY Free format text: FORMER OWNER: TOKYO ELECTRON LTD. |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20050429 Address after: Tokyo, Japan Applicant after: IDX Technology K.K. Co-applicant after: Suzuki Yasuo Address before: Tokyo, Japan Applicant before: Tokyo Electron Ltd. Co-applicant before: Suzuki Yasuo |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20060517 Termination date: 20091210 |