Classifications

• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
  • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
  • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
  • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
  • H01J37/32321—Discharge generated by other radiation
  • H01J37/3233—Discharge generated by other radiation using charged particles

Landscapes

• Engineering & Computer Science (AREA)
• Physics & Mathematics (AREA)
• Plasma & Fusion (AREA)
• Chemical & Material Sciences (AREA)
• Analytical Chemistry (AREA)
• General Physics & Mathematics (AREA)
• Condensed Matter Physics & Semiconductors (AREA)
• Manufacturing & Machinery (AREA)
• Computer Hardware Design (AREA)
• Microelectronics & Electronic Packaging (AREA)
• Power Engineering (AREA)
• Plasma Technology (AREA)
• Physical Vapour Deposition (AREA)
• Chemical Vapour Deposition (AREA)

Applications Claiming Priority (1)

Publications (1)

Family

ID=18365953

Family Applications (1)

Country Status (6)

Families Citing this family (8)

Family Cites Families (11)

• 1997
  • 1997-11-28 JP JP09344008A patent/JP3129265B2/ja not_active Expired - Fee Related
• 1998
  • 1998-11-24 EP EP98122291A patent/EP0921556B1/de not_active Expired - Lifetime
  • 1998-11-24 DE DE69839988T patent/DE69839988D1/de not_active Expired - Lifetime
  • 1998-11-24 US US09/198,584 patent/US6051120A/en not_active Expired - Fee Related
  • 1998-11-27 KR KR1019980051201A patent/KR100552524B1/ko not_active IP Right Cessation
  • 1998-11-27 TW TW087119722A patent/TW398007B/zh not_active IP Right Cessation

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