DE69832282D1 - Polysilazan-amine und verfahren zur herstellung - Google Patents

Polysilazan-amine und verfahren zur herstellung

Info

Publication number
DE69832282D1
DE69832282D1 DE69832282T DE69832282T DE69832282D1 DE 69832282 D1 DE69832282 D1 DE 69832282D1 DE 69832282 T DE69832282 T DE 69832282T DE 69832282 T DE69832282 T DE 69832282T DE 69832282 D1 DE69832282 D1 DE 69832282D1
Authority
DE
Germany
Prior art keywords
polysilazaneamine
preparing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69832282T
Other languages
English (en)
Other versions
DE69832282T2 (de
Inventor
Yasuo Shimizu
Tomoko Aoki
Osamu Funayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EMD Performance Materials Corp
Original Assignee
AZ Electronic Materials USA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AZ Electronic Materials USA Corp filed Critical AZ Electronic Materials USA Corp
Publication of DE69832282D1 publication Critical patent/DE69832282D1/de
Application granted granted Critical
Publication of DE69832282T2 publication Critical patent/DE69832282T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/62—Nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/54—Nitrogen-containing linkages

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Silicon Polymers (AREA)
DE69832282T 1997-08-08 1998-08-10 Aminierte polysilazane und verfahren zur deren herstellung Expired - Lifetime DE69832282T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP22742097 1997-08-08
JP22742097A JP4030625B2 (ja) 1997-08-08 1997-08-08 アミン残基含有ポリシラザン及びその製造方法
PCT/JP1998/003549 WO1999007768A1 (fr) 1997-08-08 1998-08-10 Polysilazane amine et son procede de preparation

Publications (2)

Publication Number Publication Date
DE69832282D1 true DE69832282D1 (de) 2005-12-15
DE69832282T2 DE69832282T2 (de) 2006-08-10

Family

ID=16860573

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69832282T Expired - Lifetime DE69832282T2 (de) 1997-08-08 1998-08-10 Aminierte polysilazane und verfahren zur deren herstellung

Country Status (7)

Country Link
US (1) US6310168B1 (de)
EP (1) EP1002824B1 (de)
JP (1) JP4030625B2 (de)
KR (1) KR100571298B1 (de)
DE (1) DE69832282T2 (de)
TW (1) TW550276B (de)
WO (1) WO1999007768A1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3904691B2 (ja) * 1997-10-17 2007-04-11 Ａｚエレクトロニックマテリアルズ株式会社 ポリシラザン含有組成物及びシリカ質膜の形成方法
JP2000012536A (ja) * 1998-06-24 2000-01-14 Tokyo Ohka Kogyo Co Ltd シリカ被膜形成方法
CN100385683C (zh) * 1999-03-30 2008-04-30 精工爱普生株式会社 薄膜晶体管的制造方法
US7053005B2 (en) 2000-05-02 2006-05-30 Samsung Electronics Co., Ltd. Method of forming a silicon oxide layer in a semiconductor manufacturing process
KR100362834B1 (ko) * 2000-05-02 2002-11-29 삼성전자 주식회사 반도체 장치의 산화막 형성 방법 및 이에 의하여 제조된 반도체 장치
US6479405B2 (en) 2000-10-12 2002-11-12 Samsung Electronics Co., Ltd. Method of forming silicon oxide layer in semiconductor manufacturing process using spin-on glass composition and isolation method using the same method
TWI259844B (en) * 2001-04-27 2006-08-11 Clariant Int Ltd Anti-fouling coating solution containing inorganic polysilazane
US6756469B2 (en) * 2001-07-18 2004-06-29 Kion Corporation Polysilazane-modified polyamine hardeners for epoxy resins
JP3572300B2 (ja) * 2001-08-03 2004-09-29 三菱重工業株式会社 硬質膜を有する合成樹脂製航空機窓
JP2008547194A (ja) * 2005-06-15 2008-12-25 ダウ・コーニング・コーポレイション 水素シルセスキオキサンを硬化させていき、ナノスケールのトレンチ中において密にさせる方法
JP2007094368A (ja) * 2005-09-01 2007-04-12 Seiko Epson Corp マイクロレンズ基板、マイクロレンズ基板の製造方法、液晶パネルおよび投射型表示装置
US20070270625A1 (en) * 2006-05-18 2007-11-22 Joshua Gurman Treatment of Polysilazane Waste
JP5160189B2 (ja) 2007-10-26 2013-03-13 ＡｚエレクトロニックマテリアルズＩｐ株式会社 緻密なシリカ質膜を得ることができるポリシラザン化合物含有組成物
US7999355B2 (en) 2008-07-11 2011-08-16 Air Products And Chemicals, Inc. Aminosilanes for shallow trench isolation films
KR100909215B1 (ko) * 2009-02-16 2009-07-24 (주)스타네크 실리콘-수소 결합의 암모니아 치환을 감소시킨 폴리실라잔 및 폴리실라잔 용액의 제조방법
WO2011053551A1 (en) 2009-10-28 2011-05-05 Dow Corning Corporation Polysilane - polysilazane copolymers and methods for their preparation and use
WO2011062100A1 (ja) * 2009-11-19 2011-05-26 コニカミノルタホールディングス株式会社 ガスバリア性フィルム、その製造方法、それを用いた有機光電変換素子及び有機エレクトロルミネッセンス素子
JP2017200861A (ja) 2016-05-02 2017-11-09 アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ 緻密なシリカ質膜形成用組成物
JP6668288B2 (ja) * 2017-04-04 2020-03-18 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ 膜形成組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4720531A (en) * 1982-09-29 1988-01-19 General Electric Company Novel scavengers for one-component RTV compositions
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
US5032649A (en) * 1989-11-27 1991-07-16 Hercules Incorporated Organic amide-modified polysilazane ceramic precursors
JP3241823B2 (ja) * 1992-10-20 2001-12-25 触媒化成工業株式会社 シリカ系被膜形成用塗布液および被膜付基材

Also Published As

Publication number Publication date
JPH1160736A (ja) 1999-03-05
WO1999007768A1 (fr) 1999-02-18
TW550276B (en) 2003-09-01
KR100571298B1 (ko) 2006-04-17
EP1002824A1 (de) 2000-05-24
EP1002824A4 (de) 2000-11-02
EP1002824B1 (de) 2005-11-09
US6310168B1 (en) 2001-10-30
DE69832282T2 (de) 2006-08-10
JP4030625B2 (ja) 2008-01-09
KR20010022686A (ko) 2001-03-26

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