DE69738136D1 - Reagenzzuführbehälter für cvd - Google Patents

Reagenzzuführbehälter für cvd

Info

Publication number
DE69738136D1
DE69738136D1 DE69738136T DE69738136T DE69738136D1 DE 69738136 D1 DE69738136 D1 DE 69738136D1 DE 69738136 T DE69738136 T DE 69738136T DE 69738136 T DE69738136 T DE 69738136T DE 69738136 D1 DE69738136 D1 DE 69738136D1
Authority
DE
Germany
Prior art keywords
cvd
reagent tank
reagent
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69738136T
Other languages
English (en)
Other versions
DE69738136T2 (de
Inventor
Fred Bouchard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Technology Materials Inc
Original Assignee
Advanced Technology Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Technology Materials Inc filed Critical Advanced Technology Materials Inc
Application granted granted Critical
Publication of DE69738136D1 publication Critical patent/DE69738136D1/de
Publication of DE69738136T2 publication Critical patent/DE69738136T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B67OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
    • B67DDISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
    • B67D7/00Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes
    • B67D7/02Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants
    • B67D7/0238Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants utilising compressed air or other gas acting directly or indirectly on liquids in storage containers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00Feed or outlet devices; Feed or outlet control devices
    • B01J4/008Feed or outlet control devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B67OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
    • B67DDISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
    • B67D7/00Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes
    • B67D7/06Details or accessories
    • B67D7/32Arrangements of safety or warning devices; Means for preventing unauthorised delivery of liquid
    • B67D7/3245Arrangements of safety or warning devices; Means for preventing unauthorised delivery of liquid relating to the transfer method
    • B67D7/3263Arrangements of safety or warning devices; Means for preventing unauthorised delivery of liquid relating to the transfer method using a pressurised gas acting directly or indirectly on the bulk of the liquid to be transferred
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
DE69738136T 1996-12-17 1997-12-17 Reagenzzuführbehälter für cvd Expired - Lifetime DE69738136T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US3386596P 1996-12-17 1996-12-17
US33865P 1996-12-17
PCT/US1997/023304 WO1998027247A1 (en) 1996-12-17 1997-12-17 Reagent supply vessel for chemical vapor deposition

Publications (2)

Publication Number Publication Date
DE69738136D1 true DE69738136D1 (de) 2007-10-25
DE69738136T2 DE69738136T2 (de) 2008-06-12

Family

ID=21872903

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69738136T Expired - Lifetime DE69738136T2 (de) 1996-12-17 1997-12-17 Reagenzzuführbehälter für cvd

Country Status (6)

Country Link
US (1) US6077356A (de)
EP (1) EP0953064B1 (de)
JP (1) JP3474201B2 (de)
KR (1) KR100364115B1 (de)
DE (1) DE69738136T2 (de)
WO (1) WO1998027247A1 (de)

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7012292B1 (en) * 1998-11-25 2006-03-14 Advanced Technology Materials, Inc Oxidative top electrode deposition process, and microelectronic device structure
US6257446B1 (en) * 1999-02-18 2001-07-10 Advanced Micro Devices, Inc. Liquid chemical container with integrated fluid reservoir
GB9929279D0 (en) * 1999-12-11 2000-02-02 Epichem Ltd An improved method of and apparatus for the delivery of precursors in the vapour phase to a plurality of epitaxial reactor sites
JP3635323B2 (ja) * 2000-07-28 2005-04-06 みのる産業株式会社 薬液噴霧車
US6526824B2 (en) * 2001-06-07 2003-03-04 Air Products And Chemicals, Inc. High purity chemical container with external level sensor and liquid sump
US6431229B1 (en) 2001-08-24 2002-08-13 Air Products And Chemicals, Inc. Solventless purgeable diaphragm valved manifold for low vapor pressure chemicals
KR100419416B1 (ko) * 2001-11-21 2004-02-19 삼성전자주식회사 변형 화학기상 증착 공정의 원료물질 제어장치
KR100450974B1 (ko) * 2001-12-06 2004-10-02 삼성전자주식회사 변형 화학기상 증착 공정의 원료물질 기화량 유지장치
US6966348B2 (en) * 2002-05-23 2005-11-22 Air Products And Chemicals, Inc. Purgeable container for low vapor pressure chemicals
US6648034B1 (en) 2002-05-23 2003-11-18 Air Products And Chemicals, Inc. Purgeable manifold for low vapor pressure chemicals containers
US7124913B2 (en) 2003-06-24 2006-10-24 Air Products And Chemicals, Inc. High purity chemical container with diptube and level sensor terminating in lowest most point of concave floor
US7261118B2 (en) * 2003-08-19 2007-08-28 Air Products And Chemicals, Inc. Method and vessel for the delivery of precursor materials
US7249880B2 (en) 2003-10-14 2007-07-31 Advanced Technology Materials, Inc. Flexible mixing bag for mixing solids, liquids and gases
JP4626956B2 (ja) * 2004-10-18 2011-02-09 東京エレクトロン株式会社 半導体製造装置、液量監視装置、半導体製造装置の液体材料監視方法、及び、液量監視方法
US20060133955A1 (en) * 2004-12-17 2006-06-22 Peters David W Apparatus and method for delivering vapor phase reagent to a deposition chamber
EP3006102A1 (de) * 2005-04-25 2016-04-13 Advanced Technology Materials, Inc. Auskleidungsbasierende flüssigkeitslagerungs- und -ausgabesysteme mit leerzustands-erfassungsvermögen
US9312557B2 (en) * 2005-05-11 2016-04-12 Schlumberger Technology Corporation Fuel cell apparatus and method for downhole power systems
WO2006133026A2 (en) 2005-06-06 2006-12-14 Advanced Technology Materials, Inc. Fluid storage and dispensing systems and processes
CN101300338B (zh) * 2005-10-26 2015-10-21 Atmi包装公司 具有混合器和喷射器的生物反应器
GB2432371B (en) * 2005-11-17 2011-06-15 Epichem Ltd Improved bubbler for the transportation of substances by a carrier gas
US8366311B2 (en) * 2006-04-21 2013-02-05 Atmi Bvba Systems and devices for mixing substances and methods of making same
SG10201503987WA (en) * 2006-05-13 2015-06-29 Pall Life Sciences Belgium Disposable Bioreactor
KR100773567B1 (ko) 2006-07-06 2007-11-07 세메스 주식회사 증착물질 공급 장치
US9109287B2 (en) * 2006-10-19 2015-08-18 Air Products And Chemicals, Inc. Solid source container with inlet plenum
US8708320B2 (en) 2006-12-15 2014-04-29 Air Products And Chemicals, Inc. Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel
US7750173B2 (en) 2007-01-18 2010-07-06 Advanced Technology Materials, Inc. Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films
US7959994B2 (en) * 2007-01-29 2011-06-14 Praxair Technology, Inc. Diptube apparatus and delivery method
US7883745B2 (en) 2007-07-30 2011-02-08 Micron Technology, Inc. Chemical vaporizer for material deposition systems and associated methods
US20090107579A1 (en) * 2007-10-26 2009-04-30 Smith Robin E Loading system
US20090214777A1 (en) * 2008-02-22 2009-08-27 Demetrius Sarigiannis Multiple ampoule delivery systems
US20090255466A1 (en) 2008-04-11 2009-10-15 Peck John D Reagent dispensing apparatus and delivery method
US20090258143A1 (en) 2008-04-11 2009-10-15 Peck John D Reagent dispensing apparatus and delivery method
TWI396652B (zh) * 2008-05-23 2013-05-21 Century Display Shenxhen Co Liquid crystal residual warning system
KR20110088564A (ko) * 2008-11-11 2011-08-03 프랙스에어 테크놀로지, 인코포레이티드 반응물 분배 장치 및 전달 방법
JP5656372B2 (ja) * 2009-07-21 2015-01-21 日本エア・リキード株式会社 液体材料容器、液体材料供給装置、及び、液体材料の供給方法
WO2011053505A1 (en) 2009-11-02 2011-05-05 Sigma-Aldrich Co. Evaporator
CN102791383B (zh) * 2010-01-06 2017-11-14 恩特格里斯公司 具有除气和感测能力的液体分配***
US20110174070A1 (en) * 2010-01-20 2011-07-21 Envicor Incorporated Storage tank assembly and system for storing waste cooking oil
JP5877702B2 (ja) * 2011-12-14 2016-03-08 株式会社ニューフレアテクノロジー 成膜装置および成膜方法
US9809711B2 (en) 2012-01-17 2017-11-07 Versum Materials Us, Llc Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process
US20130243968A1 (en) 2012-03-16 2013-09-19 Air Products And Chemicals, Inc. Catalyst synthesis for organosilane sol-gel reactions
KR101477784B1 (ko) * 2013-05-24 2014-12-31 주식회사 티지오테크 금속 소스 공급 장치 및 이를 포함하는 증착막 형성 장치
US10170297B2 (en) 2013-08-22 2019-01-01 Versum Materials Us, Llc Compositions and methods using same for flowable oxide deposition
CN105934405B (zh) 2013-09-20 2018-04-06 恩特格里斯公司 用于高粘度含液体材料的压力配送的设备和方法
US10151618B2 (en) * 2014-01-24 2018-12-11 Versum Materials Us, Llc Ultrasonic liquid level sensing systems
EP3120132A1 (de) * 2014-03-17 2017-01-25 Entegris-Jetalon Solutions, Inc. Einweg-flüssigchemikaliensensorsystem
US9580293B2 (en) 2014-06-24 2017-02-28 Air Products And Chemicals, Inc. Diptube design for a host ampoule
US9914632B2 (en) * 2014-08-22 2018-03-13 Applied Materials, Inc. Methods and apparatus for liquid chemical delivery
KR101684776B1 (ko) * 2015-03-31 2016-12-08 세기아케마주식회사 위험물 보관 장치
US20180033614A1 (en) 2016-07-27 2018-02-01 Versum Materials Us, Llc Compositions and Methods Using Same for Carbon Doped Silicon Containing Films
KR102248860B1 (ko) * 2016-09-21 2021-05-06 가부시키가이샤 코쿠사이 엘렉트릭 기판 처리 장치, 액체 원료 보충 시스템, 반도체 장치의 제조 방법, 프로그램
US10822458B2 (en) 2017-02-08 2020-11-03 Versum Materials Us, Llc Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films
US10315814B2 (en) * 2017-08-04 2019-06-11 Canon Kabushiki Kaisha Transfer cap
SG10201903201XA (en) 2018-04-11 2019-11-28 Versum Materials Us Llc Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films
US20190382886A1 (en) 2018-06-15 2019-12-19 Versum Materials Us, Llc Siloxane Compositions and Methods for Using the Compositions to Deposit Silicon Containing Films
US20200071819A1 (en) 2018-08-29 2020-03-05 Versum Materials Us, Llc Methods For Making Silicon Containing Films That Have High Carbon Content
US10985010B2 (en) 2018-08-29 2021-04-20 Versum Materials Us, Llc Methods for making silicon and nitrogen containing films
US20210398796A1 (en) 2018-10-03 2021-12-23 Versum Materials Us, Llc Methods for making silicon and nitrogen containing films
JP2022519295A (ja) 2019-02-05 2022-03-22 バーサム マテリアルズ ユーエス,リミティド ライアビリティ カンパニー 炭素ドープされた酸化ケイ素の堆積
KR20200130121A (ko) * 2019-05-07 2020-11-18 에이에스엠 아이피 홀딩 비.브이. 딥 튜브가 있는 화학물질 공급원 용기
US11707594B2 (en) * 2019-09-11 2023-07-25 GE Precision Healthcare LLC Systems and method for an optical anesthetic agent level sensor
KR20220163999A (ko) 2020-04-02 2022-12-12 버슘머트리얼즈 유에스, 엘엘씨 실리콘 함유 필름의 증착을 위한 유기아미노-작용기화된 사이클릭 올리고실록산

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4676404A (en) * 1983-10-17 1987-06-30 Nippon Zeon Co., Ltd. Method and apparatus for feeding drug liquid from hermetic returnable can
US5102010A (en) * 1988-02-16 1992-04-07 Now Technologies, Inc. Container and dispensing system for liquid chemicals
DE69218152T2 (de) * 1991-12-26 1997-08-28 Canon K.K., Tokio/Tokyo Herstellungsverfahren einer niedergeschlagenen Schicht mittels CVD, unter Verwendung von flüssigem Rohstoff und dazu geeignete Vorrichtung
JPH06291040A (ja) * 1992-03-03 1994-10-18 Rintetsuku:Kk 液体気化供給方法と液体気化供給器
US5335821A (en) * 1992-09-11 1994-08-09 Now Technologies, Inc. Liquid chemical container and dispensing system
US5526956A (en) * 1992-09-11 1996-06-18 Now Technologies, Inc. Liquid chemical dispensing and recirculating system
US5366119A (en) * 1993-05-26 1994-11-22 Kline James B Dispenser bottle with internal pump
US5383574A (en) * 1993-07-19 1995-01-24 Microbar Sytems, Inc. System and method for dispensing liquid from storage containers
US5388574A (en) * 1993-07-29 1995-02-14 Ingebrethsen; Bradley J. Aerosol delivery article
JPH07211646A (ja) * 1994-01-14 1995-08-11 Mitsubishi Electric Corp 材料供給装置
US5366120A (en) * 1994-04-19 1994-11-22 Tonis Tollasepp Paint pump
US5749500A (en) * 1996-04-23 1998-05-12 Kraus; Joey Liquid retrieving adaptor for cylindrical containers

Also Published As

Publication number Publication date
KR100364115B1 (ko) 2002-12-11
EP0953064A4 (de) 2004-04-21
JP3474201B2 (ja) 2003-12-08
KR20000057606A (ko) 2000-09-25
DE69738136T2 (de) 2008-06-12
JP2001503106A (ja) 2001-03-06
WO1998027247A1 (en) 1998-06-25
EP0953064A1 (de) 1999-11-03
EP0953064B1 (de) 2007-09-12
US6077356A (en) 2000-06-20

Similar Documents

Publication Publication Date Title
DE69738136D1 (de) Reagenzzuführbehälter für cvd
DE69710626D1 (de) Verbesserungen für Behälter
DE69736909D1 (de) Behälter für parenterale Flüssigkeiten
DE69806460D1 (de) Hilfsrahmen für Fahrzeuge
DE69825763D1 (de) Versigelungssystem für trokar
DE69732755D1 (de) Zwischenebene für Navigationssystem
DE69828827D1 (de) Verbessertes Prüfsystem für Proben
DE69813220D1 (de) Spendesystem für flüssigkeiten
DE69701317D1 (de) Wiederholer für Telekommunikationssanordnung
DE69809712D1 (de) Treibstofftank für lastwagen
DE69509048D1 (de) Halter für rohrmaterial
DE69608495D1 (de) Behälter für befeuchtete Tücher
DE69734518D1 (de) Gehäuse für bandmass
DE69840547D1 (de) Schnittstellensystem für brillen
DE69818267D1 (de) Reflektierende fläche für wände von cvd-reaktoren
DE69820088D1 (de) Koppelungsarmatur für behälterventil
ATA18498A (de) Installationseinrichtung für rohrleitungen
DE69631671D1 (de) Kälteanlage für behälter
DE69616434D1 (de) Behälter für Mehrfachproben
DE69923226D1 (de) Beschleunigungsaufnehmer für autoreifen
DE69823311D1 (de) Entlüftungsleitung für Flüssigkeitsbehälter
DE69524133D1 (de) Offene Stationsarchitektur für Kuvertiersysteme
DE69701157D1 (de) Behälter für Tankentlüftungssystem
DE69901564D1 (de) Brennstoffsystem für flüssiggas
DE69811944D1 (de) Schaltgetriebe für fahrzeug

Legal Events

Date Code Title Description
8364 No opposition during term of opposition