DE69738136D1 - Reagenzzuführbehälter für cvd - Google Patents
Reagenzzuführbehälter für cvdInfo
- Publication number
- DE69738136D1 DE69738136D1 DE69738136T DE69738136T DE69738136D1 DE 69738136 D1 DE69738136 D1 DE 69738136D1 DE 69738136 T DE69738136 T DE 69738136T DE 69738136 T DE69738136 T DE 69738136T DE 69738136 D1 DE69738136 D1 DE 69738136D1
- Authority
- DE
- Germany
- Prior art keywords
- cvd
- reagent tank
- reagent
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
- B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
- B67D7/00—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes
- B67D7/02—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants
- B67D7/0238—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants utilising compressed air or other gas acting directly or indirectly on liquids in storage containers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/008—Feed or outlet control devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
- B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
- B67D7/00—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes
- B67D7/06—Details or accessories
- B67D7/32—Arrangements of safety or warning devices; Means for preventing unauthorised delivery of liquid
- B67D7/3245—Arrangements of safety or warning devices; Means for preventing unauthorised delivery of liquid relating to the transfer method
- B67D7/3263—Arrangements of safety or warning devices; Means for preventing unauthorised delivery of liquid relating to the transfer method using a pressurised gas acting directly or indirectly on the bulk of the liquid to be transferred
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
- C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Vapour Deposition (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US3386596P | 1996-12-17 | 1996-12-17 | |
US33865P | 1996-12-17 | ||
PCT/US1997/023304 WO1998027247A1 (en) | 1996-12-17 | 1997-12-17 | Reagent supply vessel for chemical vapor deposition |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69738136D1 true DE69738136D1 (de) | 2007-10-25 |
DE69738136T2 DE69738136T2 (de) | 2008-06-12 |
Family
ID=21872903
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69738136T Expired - Lifetime DE69738136T2 (de) | 1996-12-17 | 1997-12-17 | Reagenzzuführbehälter für cvd |
Country Status (6)
Country | Link |
---|---|
US (1) | US6077356A (de) |
EP (1) | EP0953064B1 (de) |
JP (1) | JP3474201B2 (de) |
KR (1) | KR100364115B1 (de) |
DE (1) | DE69738136T2 (de) |
WO (1) | WO1998027247A1 (de) |
Families Citing this family (62)
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US7012292B1 (en) * | 1998-11-25 | 2006-03-14 | Advanced Technology Materials, Inc | Oxidative top electrode deposition process, and microelectronic device structure |
US6257446B1 (en) * | 1999-02-18 | 2001-07-10 | Advanced Micro Devices, Inc. | Liquid chemical container with integrated fluid reservoir |
GB9929279D0 (en) * | 1999-12-11 | 2000-02-02 | Epichem Ltd | An improved method of and apparatus for the delivery of precursors in the vapour phase to a plurality of epitaxial reactor sites |
JP3635323B2 (ja) * | 2000-07-28 | 2005-04-06 | みのる産業株式会社 | 薬液噴霧車 |
US6526824B2 (en) * | 2001-06-07 | 2003-03-04 | Air Products And Chemicals, Inc. | High purity chemical container with external level sensor and liquid sump |
US6431229B1 (en) | 2001-08-24 | 2002-08-13 | Air Products And Chemicals, Inc. | Solventless purgeable diaphragm valved manifold for low vapor pressure chemicals |
KR100419416B1 (ko) * | 2001-11-21 | 2004-02-19 | 삼성전자주식회사 | 변형 화학기상 증착 공정의 원료물질 제어장치 |
KR100450974B1 (ko) * | 2001-12-06 | 2004-10-02 | 삼성전자주식회사 | 변형 화학기상 증착 공정의 원료물질 기화량 유지장치 |
US6966348B2 (en) * | 2002-05-23 | 2005-11-22 | Air Products And Chemicals, Inc. | Purgeable container for low vapor pressure chemicals |
US6648034B1 (en) | 2002-05-23 | 2003-11-18 | Air Products And Chemicals, Inc. | Purgeable manifold for low vapor pressure chemicals containers |
US7124913B2 (en) | 2003-06-24 | 2006-10-24 | Air Products And Chemicals, Inc. | High purity chemical container with diptube and level sensor terminating in lowest most point of concave floor |
US7261118B2 (en) * | 2003-08-19 | 2007-08-28 | Air Products And Chemicals, Inc. | Method and vessel for the delivery of precursor materials |
US7249880B2 (en) | 2003-10-14 | 2007-07-31 | Advanced Technology Materials, Inc. | Flexible mixing bag for mixing solids, liquids and gases |
JP4626956B2 (ja) * | 2004-10-18 | 2011-02-09 | 東京エレクトロン株式会社 | 半導体製造装置、液量監視装置、半導体製造装置の液体材料監視方法、及び、液量監視方法 |
US20060133955A1 (en) * | 2004-12-17 | 2006-06-22 | Peters David W | Apparatus and method for delivering vapor phase reagent to a deposition chamber |
EP3006102A1 (de) * | 2005-04-25 | 2016-04-13 | Advanced Technology Materials, Inc. | Auskleidungsbasierende flüssigkeitslagerungs- und -ausgabesysteme mit leerzustands-erfassungsvermögen |
US9312557B2 (en) * | 2005-05-11 | 2016-04-12 | Schlumberger Technology Corporation | Fuel cell apparatus and method for downhole power systems |
WO2006133026A2 (en) | 2005-06-06 | 2006-12-14 | Advanced Technology Materials, Inc. | Fluid storage and dispensing systems and processes |
CN101300338B (zh) * | 2005-10-26 | 2015-10-21 | Atmi包装公司 | 具有混合器和喷射器的生物反应器 |
GB2432371B (en) * | 2005-11-17 | 2011-06-15 | Epichem Ltd | Improved bubbler for the transportation of substances by a carrier gas |
US8366311B2 (en) * | 2006-04-21 | 2013-02-05 | Atmi Bvba | Systems and devices for mixing substances and methods of making same |
SG10201503987WA (en) * | 2006-05-13 | 2015-06-29 | Pall Life Sciences Belgium | Disposable Bioreactor |
KR100773567B1 (ko) | 2006-07-06 | 2007-11-07 | 세메스 주식회사 | 증착물질 공급 장치 |
US9109287B2 (en) * | 2006-10-19 | 2015-08-18 | Air Products And Chemicals, Inc. | Solid source container with inlet plenum |
US8708320B2 (en) | 2006-12-15 | 2014-04-29 | Air Products And Chemicals, Inc. | Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel |
US7750173B2 (en) | 2007-01-18 | 2010-07-06 | Advanced Technology Materials, Inc. | Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films |
US7959994B2 (en) * | 2007-01-29 | 2011-06-14 | Praxair Technology, Inc. | Diptube apparatus and delivery method |
US7883745B2 (en) | 2007-07-30 | 2011-02-08 | Micron Technology, Inc. | Chemical vaporizer for material deposition systems and associated methods |
US20090107579A1 (en) * | 2007-10-26 | 2009-04-30 | Smith Robin E | Loading system |
US20090214777A1 (en) * | 2008-02-22 | 2009-08-27 | Demetrius Sarigiannis | Multiple ampoule delivery systems |
US20090255466A1 (en) | 2008-04-11 | 2009-10-15 | Peck John D | Reagent dispensing apparatus and delivery method |
US20090258143A1 (en) | 2008-04-11 | 2009-10-15 | Peck John D | Reagent dispensing apparatus and delivery method |
TWI396652B (zh) * | 2008-05-23 | 2013-05-21 | Century Display Shenxhen Co | Liquid crystal residual warning system |
KR20110088564A (ko) * | 2008-11-11 | 2011-08-03 | 프랙스에어 테크놀로지, 인코포레이티드 | 반응물 분배 장치 및 전달 방법 |
JP5656372B2 (ja) * | 2009-07-21 | 2015-01-21 | 日本エア・リキード株式会社 | 液体材料容器、液体材料供給装置、及び、液体材料の供給方法 |
WO2011053505A1 (en) | 2009-11-02 | 2011-05-05 | Sigma-Aldrich Co. | Evaporator |
CN102791383B (zh) * | 2010-01-06 | 2017-11-14 | 恩特格里斯公司 | 具有除气和感测能力的液体分配*** |
US20110174070A1 (en) * | 2010-01-20 | 2011-07-21 | Envicor Incorporated | Storage tank assembly and system for storing waste cooking oil |
JP5877702B2 (ja) * | 2011-12-14 | 2016-03-08 | 株式会社ニューフレアテクノロジー | 成膜装置および成膜方法 |
US9809711B2 (en) | 2012-01-17 | 2017-11-07 | Versum Materials Us, Llc | Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process |
US20130243968A1 (en) | 2012-03-16 | 2013-09-19 | Air Products And Chemicals, Inc. | Catalyst synthesis for organosilane sol-gel reactions |
KR101477784B1 (ko) * | 2013-05-24 | 2014-12-31 | 주식회사 티지오테크 | 금속 소스 공급 장치 및 이를 포함하는 증착막 형성 장치 |
US10170297B2 (en) | 2013-08-22 | 2019-01-01 | Versum Materials Us, Llc | Compositions and methods using same for flowable oxide deposition |
CN105934405B (zh) | 2013-09-20 | 2018-04-06 | 恩特格里斯公司 | 用于高粘度含液体材料的压力配送的设备和方法 |
US10151618B2 (en) * | 2014-01-24 | 2018-12-11 | Versum Materials Us, Llc | Ultrasonic liquid level sensing systems |
EP3120132A1 (de) * | 2014-03-17 | 2017-01-25 | Entegris-Jetalon Solutions, Inc. | Einweg-flüssigchemikaliensensorsystem |
US9580293B2 (en) | 2014-06-24 | 2017-02-28 | Air Products And Chemicals, Inc. | Diptube design for a host ampoule |
US9914632B2 (en) * | 2014-08-22 | 2018-03-13 | Applied Materials, Inc. | Methods and apparatus for liquid chemical delivery |
KR101684776B1 (ko) * | 2015-03-31 | 2016-12-08 | 세기아케마주식회사 | 위험물 보관 장치 |
US20180033614A1 (en) | 2016-07-27 | 2018-02-01 | Versum Materials Us, Llc | Compositions and Methods Using Same for Carbon Doped Silicon Containing Films |
KR102248860B1 (ko) * | 2016-09-21 | 2021-05-06 | 가부시키가이샤 코쿠사이 엘렉트릭 | 기판 처리 장치, 액체 원료 보충 시스템, 반도체 장치의 제조 방법, 프로그램 |
US10822458B2 (en) | 2017-02-08 | 2020-11-03 | Versum Materials Us, Llc | Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films |
US10315814B2 (en) * | 2017-08-04 | 2019-06-11 | Canon Kabushiki Kaisha | Transfer cap |
SG10201903201XA (en) | 2018-04-11 | 2019-11-28 | Versum Materials Us Llc | Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films |
US20190382886A1 (en) | 2018-06-15 | 2019-12-19 | Versum Materials Us, Llc | Siloxane Compositions and Methods for Using the Compositions to Deposit Silicon Containing Films |
US20200071819A1 (en) | 2018-08-29 | 2020-03-05 | Versum Materials Us, Llc | Methods For Making Silicon Containing Films That Have High Carbon Content |
US10985010B2 (en) | 2018-08-29 | 2021-04-20 | Versum Materials Us, Llc | Methods for making silicon and nitrogen containing films |
US20210398796A1 (en) | 2018-10-03 | 2021-12-23 | Versum Materials Us, Llc | Methods for making silicon and nitrogen containing films |
JP2022519295A (ja) | 2019-02-05 | 2022-03-22 | バーサム マテリアルズ ユーエス,リミティド ライアビリティ カンパニー | 炭素ドープされた酸化ケイ素の堆積 |
KR20200130121A (ko) * | 2019-05-07 | 2020-11-18 | 에이에스엠 아이피 홀딩 비.브이. | 딥 튜브가 있는 화학물질 공급원 용기 |
US11707594B2 (en) * | 2019-09-11 | 2023-07-25 | GE Precision Healthcare LLC | Systems and method for an optical anesthetic agent level sensor |
KR20220163999A (ko) | 2020-04-02 | 2022-12-12 | 버슘머트리얼즈 유에스, 엘엘씨 | 실리콘 함유 필름의 증착을 위한 유기아미노-작용기화된 사이클릭 올리고실록산 |
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US4676404A (en) * | 1983-10-17 | 1987-06-30 | Nippon Zeon Co., Ltd. | Method and apparatus for feeding drug liquid from hermetic returnable can |
US5102010A (en) * | 1988-02-16 | 1992-04-07 | Now Technologies, Inc. | Container and dispensing system for liquid chemicals |
DE69218152T2 (de) * | 1991-12-26 | 1997-08-28 | Canon K.K., Tokio/Tokyo | Herstellungsverfahren einer niedergeschlagenen Schicht mittels CVD, unter Verwendung von flüssigem Rohstoff und dazu geeignete Vorrichtung |
JPH06291040A (ja) * | 1992-03-03 | 1994-10-18 | Rintetsuku:Kk | 液体気化供給方法と液体気化供給器 |
US5335821A (en) * | 1992-09-11 | 1994-08-09 | Now Technologies, Inc. | Liquid chemical container and dispensing system |
US5526956A (en) * | 1992-09-11 | 1996-06-18 | Now Technologies, Inc. | Liquid chemical dispensing and recirculating system |
US5366119A (en) * | 1993-05-26 | 1994-11-22 | Kline James B | Dispenser bottle with internal pump |
US5383574A (en) * | 1993-07-19 | 1995-01-24 | Microbar Sytems, Inc. | System and method for dispensing liquid from storage containers |
US5388574A (en) * | 1993-07-29 | 1995-02-14 | Ingebrethsen; Bradley J. | Aerosol delivery article |
JPH07211646A (ja) * | 1994-01-14 | 1995-08-11 | Mitsubishi Electric Corp | 材料供給装置 |
US5366120A (en) * | 1994-04-19 | 1994-11-22 | Tonis Tollasepp | Paint pump |
US5749500A (en) * | 1996-04-23 | 1998-05-12 | Kraus; Joey | Liquid retrieving adaptor for cylindrical containers |
-
1997
- 1997-12-17 DE DE69738136T patent/DE69738136T2/de not_active Expired - Lifetime
- 1997-12-17 KR KR1019997005391A patent/KR100364115B1/ko not_active IP Right Cessation
- 1997-12-17 JP JP52795298A patent/JP3474201B2/ja not_active Expired - Fee Related
- 1997-12-17 EP EP97953275A patent/EP0953064B1/de not_active Expired - Lifetime
- 1997-12-17 US US08/992,932 patent/US6077356A/en not_active Expired - Lifetime
- 1997-12-17 WO PCT/US1997/023304 patent/WO1998027247A1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR100364115B1 (ko) | 2002-12-11 |
EP0953064A4 (de) | 2004-04-21 |
JP3474201B2 (ja) | 2003-12-08 |
KR20000057606A (ko) | 2000-09-25 |
DE69738136T2 (de) | 2008-06-12 |
JP2001503106A (ja) | 2001-03-06 |
WO1998027247A1 (en) | 1998-06-25 |
EP0953064A1 (de) | 1999-11-03 |
EP0953064B1 (de) | 2007-09-12 |
US6077356A (en) | 2000-06-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |