DE69730861D1 - Flash-verdampfer - Google Patents
Flash-verdampferInfo
- Publication number
- DE69730861D1 DE69730861D1 DE69730861T DE69730861T DE69730861D1 DE 69730861 D1 DE69730861 D1 DE 69730861D1 DE 69730861 T DE69730861 T DE 69730861T DE 69730861 T DE69730861 T DE 69730861T DE 69730861 D1 DE69730861 D1 DE 69730861D1
- Authority
- DE
- Germany
- Prior art keywords
- flash evaporator
- evaporator
- flash
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/0082—Regulation; Control
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/06—Flash distillation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Sampling And Sample Adjustment (AREA)
- Chemical Vapour Deposition (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US778048 | 1991-10-16 | ||
US08/778,048 US5887117A (en) | 1997-01-02 | 1997-01-02 | Flash evaporator |
PCT/US1997/024082 WO1998031844A2 (en) | 1997-01-02 | 1997-12-31 | Flash evaporator |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69730861D1 true DE69730861D1 (de) | 2004-10-28 |
DE69730861T2 DE69730861T2 (de) | 2005-09-29 |
Family
ID=25112155
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69730861T Expired - Lifetime DE69730861T2 (de) | 1997-01-02 | 1997-12-31 | Flash-verdampfer |
Country Status (6)
Country | Link |
---|---|
US (1) | US5887117A (de) |
EP (1) | EP0950124B1 (de) |
JP (1) | JP3510636B2 (de) |
KR (1) | KR100320614B1 (de) |
DE (1) | DE69730861T2 (de) |
WO (1) | WO1998031844A2 (de) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6836295B1 (en) | 1995-12-07 | 2004-12-28 | J. Carl Cooper | Audio to video timing measurement for MPEG type television systems |
KR20030041974A (ko) * | 2000-08-24 | 2003-05-27 | 코바 테크놀로지스, 인크. | 단일 트랜지스터 희토류 망가나이트 강유전성 비휘발성메모리 셀 |
US6477890B1 (en) | 2000-09-15 | 2002-11-12 | K-Line Industries, Inc. | Smoke-producing apparatus for detecting leaks |
DE10057491A1 (de) * | 2000-11-20 | 2002-05-23 | Aixtron Ag | Vorrichtung und Verfahren zum Zuführen eines in die Gasform gebrachten flüssigen Ausgangsstoffes in einen CVD-Reaktor |
US20020164850A1 (en) | 2001-03-02 | 2002-11-07 | Gnadinger Alfred P. | Single transistor rare earth manganite ferroelectric nonvolatile memory cell |
US7780785B2 (en) * | 2001-10-26 | 2010-08-24 | Applied Materials, Inc. | Gas delivery apparatus for atomic layer deposition |
US6758591B1 (en) | 2002-03-22 | 2004-07-06 | Novellus Systems, Inc. | Mixing of materials in an integrated circuit manufacturing equipment |
US20030202785A1 (en) * | 2002-04-29 | 2003-10-30 | Monitto Perry H. | Fog machine with instantaneous heating element |
US6825517B2 (en) * | 2002-08-28 | 2004-11-30 | Cova Technologies, Inc. | Ferroelectric transistor with enhanced data retention |
US6888736B2 (en) | 2002-09-19 | 2005-05-03 | Cova Technologies, Inc. | Ferroelectric transistor for storing two data bits |
US6714435B1 (en) | 2002-09-19 | 2004-03-30 | Cova Technologies, Inc. | Ferroelectric transistor for storing two data bits |
EP1420080A3 (de) * | 2002-11-14 | 2005-11-09 | Applied Materials, Inc. | Vorrichtung und Verfahren zu hybriden chemischen Abscheidungsverfahren |
SE527139C2 (sv) * | 2003-04-16 | 2005-12-27 | Xcounter Ab | Anordning och förfarande för dubbelenergi- och skanningbaserad detektering av joniserade strålning med stackade linjedetektorer och filter |
US20080073559A1 (en) * | 2003-12-12 | 2008-03-27 | Horsky Thomas N | Controlling the flow of vapors sublimated from solids |
CN1894763B (zh) * | 2003-12-12 | 2010-12-08 | 山米奎普公司 | 用于在离子植入中延长设备正常运行时间的方法及装置 |
EP1866465A2 (de) | 2005-01-18 | 2007-12-19 | ASM America, Inc. | Reaktionssystem zur herstellung eines dünnen films |
US7713473B2 (en) * | 2005-06-30 | 2010-05-11 | Ethicon, Inc. | Sterilization system and vaporizer therefor |
DE102005030822A1 (de) | 2005-07-01 | 2007-01-11 | Krones Ag | Verfahren und Vorrichtung zum Überwachen eines Verdampfers |
KR100688780B1 (ko) * | 2005-08-10 | 2007-03-02 | 동부일렉트로닉스 주식회사 | 반도체 소자 제조를 위한 이온주입공정에 사용되는 고체소스의 기화장치 |
DE102007031457A1 (de) * | 2007-07-05 | 2009-01-08 | Leybold Optics Gmbh | Verfahren und Vorrichtung zur Aufbringung einer Schicht eines Trennmittels auf ein Substrat |
US8291857B2 (en) * | 2008-07-03 | 2012-10-23 | Applied Materials, Inc. | Apparatuses and methods for atomic layer deposition |
JP2011072894A (ja) * | 2009-09-30 | 2011-04-14 | Chino Corp | 蒸発装置 |
KR101881617B1 (ko) * | 2010-12-21 | 2018-07-24 | 가부시키가이샤 와타나베 쇼코 | 기화기 |
CA2848660C (en) | 2011-09-14 | 2015-11-03 | Aquasource Technologies Corporation | System and method for water treatment |
KR20140135036A (ko) * | 2013-05-15 | 2014-11-25 | 삼성디스플레이 주식회사 | 기화기 및 이를 구비한 박막 증착 시스템 |
CN103556118B (zh) * | 2013-10-12 | 2016-03-02 | 深圳市华星光电技术有限公司 | 蒸镀装置 |
CN103676652B (zh) * | 2013-12-06 | 2016-04-13 | 杭州电子科技大学 | 一种动态闪蒸器建模方法 |
US10203108B2 (en) * | 2014-08-14 | 2019-02-12 | De Luca Oven Technologies, Llc | Vapor generator including wire mesh heating element |
JP7028955B2 (ja) * | 2017-04-10 | 2022-03-02 | バーサム マテリアルズ ユーエス,リミティド ライアビリティ カンパニー | 堆積プロセスにおける化学前駆体のバブリングのためのエーロゾルフリー型ベッセル |
US10872803B2 (en) | 2017-11-03 | 2020-12-22 | Asm Ip Holding B.V. | Apparatus and methods for isolating a reaction chamber from a loading chamber resulting in reduced contamination |
US10872804B2 (en) | 2017-11-03 | 2020-12-22 | Asm Ip Holding B.V. | Apparatus and methods for isolating a reaction chamber from a loading chamber resulting in reduced contamination |
US10807017B2 (en) * | 2018-12-20 | 2020-10-20 | Schlumberger Technology Corporation | Heating flash-on-oil vapor section |
KR20220043028A (ko) * | 2020-09-28 | 2022-04-05 | 가부시키가이샤 코쿠사이 엘렉트릭 | 기화 시스템, 기판 처리 장치 및 반도체 장치의 제조 방법 |
JP7258970B2 (ja) * | 2020-09-28 | 2023-04-17 | 株式会社Kokusai Electric | 気化システム、基板処理装置および半導体装置の製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US522718A (en) * | 1894-07-10 | Harry ward leonard | ||
US2219522A (en) * | 1936-11-04 | 1940-10-29 | O W Reinsdorff | Apparatus for gasifying liquid fuel |
DE58901441D1 (de) * | 1988-02-11 | 1992-06-25 | Siemens Ag | Thermostatisierte anordnung zur sicheren und kontrollierten verdampfung von giftigen oder an der luft hochreaktiven fluessigen reaktionsmedien, vorzugsweise fuer niederdruckdampfabscheideanlagen in der halbleitertechnik. |
DE4124018C1 (de) * | 1991-07-19 | 1992-11-19 | Leybold Ag, 6450 Hanau, De |
-
1997
- 1997-01-02 US US08/778,048 patent/US5887117A/en not_active Expired - Lifetime
- 1997-12-31 JP JP53439198A patent/JP3510636B2/ja not_active Expired - Fee Related
- 1997-12-31 DE DE69730861T patent/DE69730861T2/de not_active Expired - Lifetime
- 1997-12-31 EP EP97954802A patent/EP0950124B1/de not_active Expired - Lifetime
- 1997-12-31 WO PCT/US1997/024082 patent/WO1998031844A2/en active IP Right Grant
- 1997-12-31 KR KR1019997006055A patent/KR100320614B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP3510636B2 (ja) | 2004-03-29 |
WO1998031844A3 (en) | 1998-10-29 |
KR20000069866A (ko) | 2000-11-25 |
KR100320614B1 (ko) | 2002-01-16 |
EP0950124A4 (de) | 2002-06-19 |
US5887117A (en) | 1999-03-23 |
JP2001507757A (ja) | 2001-06-12 |
WO1998031844A2 (en) | 1998-07-23 |
DE69730861T2 (de) | 2005-09-29 |
EP0950124B1 (de) | 2004-09-22 |
EP0950124A2 (de) | 1999-10-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |