DE69725295D1 - Gasentladungsvorrichtung - Google Patents

Gasentladungsvorrichtung

Info

Publication number
DE69725295D1
DE69725295D1 DE69725295T DE69725295T DE69725295D1 DE 69725295 D1 DE69725295 D1 DE 69725295D1 DE 69725295 T DE69725295 T DE 69725295T DE 69725295 T DE69725295 T DE 69725295T DE 69725295 D1 DE69725295 D1 DE 69725295D1
Authority
DE
Germany
Prior art keywords
gas discharge
discharge device
gas
discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69725295T
Other languages
English (en)
Other versions
DE69725295T2 (de
Inventor
Tatyana Borisovna Antonova
Gleb Elmirovich Bougrov
Sergei G Kondranin
Elena A Kralkina
Vladimir Borisovich Pavlov
Andrei Fedorovich Alexandrov
Anri Amvrosievich Rukhadze
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Plasma Tech Co Ltd
Original Assignee
Plasma Tech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plasma Tech Co Ltd filed Critical Plasma Tech Co Ltd
Publication of DE69725295D1 publication Critical patent/DE69725295D1/de
Application granted granted Critical
Publication of DE69725295T2 publication Critical patent/DE69725295T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • H01J27/16Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
DE69725295T 1996-11-18 1997-11-18 Gasentladungsvorrichtung Expired - Fee Related DE69725295T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
RU96122058A RU2121729C1 (ru) 1996-11-18 1996-11-18 Газоразрядное устройство
RU96122058 1996-11-18
PCT/KR1997/000225 WO1998022969A1 (en) 1996-11-18 1997-11-18 Gas discharge device

Publications (2)

Publication Number Publication Date
DE69725295D1 true DE69725295D1 (de) 2003-11-06
DE69725295T2 DE69725295T2 (de) 2004-07-29

Family

ID=20187334

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69725295T Expired - Fee Related DE69725295T2 (de) 1996-11-18 1997-11-18 Gasentladungsvorrichtung

Country Status (8)

Country Link
US (1) US6040547A (de)
EP (1) EP0892983B1 (de)
JP (1) JP3128139B2 (de)
KR (1) KR100261314B1 (de)
AU (1) AU5068898A (de)
DE (1) DE69725295T2 (de)
RU (1) RU2121729C1 (de)
WO (1) WO1998022969A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2151438C1 (ru) * 1999-09-23 2000-06-20 Бугров Глеб Эльмирович Плазменный источник ионов с ленточным пучком (варианты)
US7096660B2 (en) * 2002-05-20 2006-08-29 Keady John P Plasma impulse device
DE602004022397D1 (de) * 2003-04-14 2009-09-17 Cook Inc Ablagekatheter/schleuse mit grossem durchmesser
US11000670B2 (en) * 2003-04-28 2021-05-11 Cook Medical Technologies Llc Flexible sheath with varying durometer
US8834684B2 (en) 2009-04-14 2014-09-16 Rf Thummin Technologies, Inc. Method and apparatus for excitation of resonances in molecules
WO2011116187A1 (en) 2010-03-17 2011-09-22 Rf Thummim Technologies, Inc. Method and apparatus for electromagnetically producing a disturbance in a medium with simultaneous resonance of acoustic waves created by the disturbance

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2235086A (en) * 1989-06-01 1991-02-20 Ion Tech Ltd Ion beam source
US5429070A (en) * 1989-06-13 1995-07-04 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
CA2049876C (en) * 1990-08-31 1998-02-10 Harold R. Kaufman Capacitively coupled radiofrequency plasma source
US5279669A (en) * 1991-12-13 1994-01-18 International Business Machines Corporation Plasma reactor for processing substrates comprising means for inducing electron cyclotron resonance (ECR) and ion cyclotron resonance (ICR) conditions
JPH0636695A (ja) * 1992-07-13 1994-02-10 Nissin Electric Co Ltd 高周波イオン源装置

Also Published As

Publication number Publication date
JP3128139B2 (ja) 2001-01-29
WO1998022969A1 (en) 1998-05-28
US6040547A (en) 2000-03-21
KR100261314B1 (ko) 2000-07-01
EP0892983A1 (de) 1999-01-27
DE69725295T2 (de) 2004-07-29
EP0892983B1 (de) 2003-10-01
JPH11506565A (ja) 1999-06-08
AU5068898A (en) 1998-06-10
KR19980019240A (ko) 1998-06-05
RU2121729C1 (ru) 1998-11-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee