DE69722812D1 - Verfahren und vorrichtung zur herstellung einer beschichtung auf einem substratmittels kathodenzerstäubung - Google Patents

Verfahren und vorrichtung zur herstellung einer beschichtung auf einem substratmittels kathodenzerstäubung

Info

Publication number
DE69722812D1
DE69722812D1 DE69722812T DE69722812T DE69722812D1 DE 69722812 D1 DE69722812 D1 DE 69722812D1 DE 69722812 T DE69722812 T DE 69722812T DE 69722812 T DE69722812 T DE 69722812T DE 69722812 D1 DE69722812 D1 DE 69722812D1
Authority
DE
Germany
Prior art keywords
substrate
pct
coating
width
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69722812T
Other languages
English (en)
Other versions
DE69722812T2 (de
Inventor
Brande Pierre Vanden
Alain Weymeersch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ArcelorMittal Liege Upstream SA
Original Assignee
Cockerill Sambre SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cockerill Sambre SA filed Critical Cockerill Sambre SA
Application granted granted Critical
Publication of DE69722812D1 publication Critical patent/DE69722812D1/de
Publication of DE69722812T2 publication Critical patent/DE69722812T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
DE69722812T 1996-12-10 1997-12-09 Verfahren und vorrichtung zur herstellung einer beschichtung auf einem substratmittels kathodenzerstäubung Expired - Lifetime DE69722812T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
BE9601030A BE1010797A3 (fr) 1996-12-10 1996-12-10 Procede et dispositif pour la formation d'un revetement sur un substrat, par pulverisation cathodique.
PCT/BE1997/000133 WO1998026108A1 (fr) 1996-12-10 1997-12-09 Procede et dispositif pour la formation d'un revetement sur un substrat, par pulverisation cathodique

Publications (2)

Publication Number Publication Date
DE69722812D1 true DE69722812D1 (de) 2003-07-17
DE69722812T2 DE69722812T2 (de) 2003-12-04

Family

ID=3890138

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69722812T Expired - Lifetime DE69722812T2 (de) 1996-12-10 1997-12-09 Verfahren und vorrichtung zur herstellung einer beschichtung auf einem substratmittels kathodenzerstäubung

Country Status (13)

Country Link
US (1) US6083359A (de)
EP (1) EP0944745B1 (de)
JP (1) JP3971458B2 (de)
AT (1) ATE242819T1 (de)
AU (1) AU5304898A (de)
BE (1) BE1010797A3 (de)
BR (1) BR9714383A (de)
CA (1) CA2271990C (de)
DE (1) DE69722812T2 (de)
DK (1) DK0944745T3 (de)
ES (1) ES2200203T3 (de)
PT (1) PT944745E (de)
WO (1) WO1998026108A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1783814A1 (de) 2005-11-07 2007-05-09 ARCELOR France Verfahren und Einrichtung zum Reinigen eines Metallbandes mittels Magnetron-Zerstäubung
WO2012066080A1 (en) 2010-11-17 2012-05-24 Bekaert Advanced Coatings Sputtering apparatus and method
JP5950866B2 (ja) * 2013-05-15 2016-07-13 株式会社神戸製鋼所 成膜装置及び成膜方法
DE102022110019A1 (de) 2022-04-26 2023-10-26 VON ARDENNE Asset GmbH & Co. KG Verfahren und Beschichtungsanordnung

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5974277A (ja) * 1982-10-21 1984-04-26 Mitsubishi Heavy Ind Ltd 真空蒸着装置
DE3400843A1 (de) * 1983-10-29 1985-07-18 VEGLA Vereinigte Glaswerke GmbH, 5100 Aachen Verfahren zum herstellen von autoglasscheiben mit streifenfoermigen blendschutzfiltern durch bedampfen oder sputtern, und vorrichtung zur durchfuehrung des verfahrens
JPH0772349B2 (ja) * 1987-05-12 1995-08-02 住友電気工業株式会社 大面積化合物薄膜の作製方法および装置
DE3926877A1 (de) * 1989-08-16 1991-02-21 Leybold Ag Verfahren zum beschichten eines dielektrischen substrats mit kupfer
JPH04371577A (ja) * 1991-06-19 1992-12-24 Sony Corp マグネトロン型スパッタリング装置
US5228963A (en) * 1991-07-01 1993-07-20 Himont Incorporated Hollow-cathode magnetron and method of making thin films
JP3463693B2 (ja) * 1992-10-29 2003-11-05 石川島播磨重工業株式会社 連続帯状物用真空蒸着装置
BE1008303A3 (fr) * 1994-06-02 1996-04-02 Cockerill Rech & Dev Procede et dispositif pour la formation d'un revetement sur un substrat par pulverisation cathodique.

Also Published As

Publication number Publication date
EP0944745B1 (de) 2003-06-11
EP0944745A1 (de) 1999-09-29
ATE242819T1 (de) 2003-06-15
BR9714383A (pt) 2000-05-16
AU5304898A (en) 1998-07-03
DE69722812T2 (de) 2003-12-04
US6083359A (en) 2000-07-04
WO1998026108A1 (fr) 1998-06-18
JP2001509209A (ja) 2001-07-10
BE1010797A3 (fr) 1999-02-02
DK0944745T3 (da) 2003-09-29
CA2271990C (fr) 2005-06-14
CA2271990A1 (fr) 1998-06-18
ES2200203T3 (es) 2004-03-01
JP3971458B2 (ja) 2007-09-05
PT944745E (pt) 2003-10-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition