DE69634032D1 - Unter etwas erhöhtem druck arbeitendes feldemissionsrasterelektronenmikroskop - Google Patents

Unter etwas erhöhtem druck arbeitendes feldemissionsrasterelektronenmikroskop

Info

Publication number
DE69634032D1
DE69634032D1 DE69634032T DE69634032T DE69634032D1 DE 69634032 D1 DE69634032 D1 DE 69634032D1 DE 69634032 T DE69634032 T DE 69634032T DE 69634032 T DE69634032 T DE 69634032T DE 69634032 D1 DE69634032 D1 DE 69634032D1
Authority
DE
Germany
Prior art keywords
under
increased pressure
sufficiently increased
pressure working
electronic microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
DE69634032T
Other languages
English (en)
Other versions
DE69634032T2 (de
Inventor
W Knowles
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FEI Co
Original Assignee
FEI Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=21699785&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69634032(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by FEI Co filed Critical FEI Co
Publication of DE69634032D1 publication Critical patent/DE69634032D1/de
Application granted granted Critical
Publication of DE69634032T2 publication Critical patent/DE69634032T2/de
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06341—Field emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/188—Differential pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002—Controlling environment of sample
    • H01J2237/2003—Environmental cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE69634032T 1995-08-11 1996-08-08 Unter etwas erhöhtem druck arbeitendes feldemissionsrasterelektronenmikroskop Revoked DE69634032T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US222495P 1995-08-11 1995-08-11
US2224 1995-08-11
PCT/US1996/012881 WO1997007525A1 (en) 1995-08-11 1996-08-08 Field emission environmental scanning electron microscope

Publications (2)

Publication Number Publication Date
DE69634032D1 true DE69634032D1 (de) 2005-01-20
DE69634032T2 DE69634032T2 (de) 2005-05-19

Family

ID=21699785

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69634032T Revoked DE69634032T2 (de) 1995-08-11 1996-08-08 Unter etwas erhöhtem druck arbeitendes feldemissionsrasterelektronenmikroskop

Country Status (5)

Country Link
US (1) US5828064A (de)
EP (1) EP0786145B1 (de)
JP (1) JP2002516018A (de)
DE (1) DE69634032T2 (de)
WO (1) WO1997007525A1 (de)

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FR2583531B1 (fr) * 1985-06-12 1988-11-04 Ituarte Angel Procede et appareil pour nettoyer et steriliser les lentilles de contact.
US6025592A (en) * 1995-08-11 2000-02-15 Philips Electronics North America High temperature specimen stage and detector for an environmental scanning electron microscope
CZ284288B6 (cs) * 1997-03-13 1998-10-14 Preciosa, A. S. Detekční systém rastrovacího elektronového mikroskopu
JPH11144671A (ja) * 1997-11-06 1999-05-28 Hitachi Ltd イオン注入装置
IL139743A0 (en) * 1998-05-22 2002-02-10 Euro Celtique Sa Dissolution stage for an environmental scanning electron microscope
DE10007650C2 (de) * 2000-02-19 2003-04-10 Leica Microsystems Lichtoptisches Mikroskop mit Elektronenstrahl-Einrichtung
EP1160825B1 (de) * 2000-05-31 2008-02-13 Advantest Corporation Teilchenstrahlgerät
US6285133B1 (en) 2000-06-14 2001-09-04 Advanced Micro Devices, Inc. Ion implanter with multi-level vacuum
DE10032607B4 (de) * 2000-07-07 2004-08-12 Leo Elektronenmikroskopie Gmbh Teilchenstrahlgerät mit einer im Ultrahochvakuum zu betreibenden Teilchenquelle und kaskadenförmige Pumpanordnung für ein solches Teilchenstrahlgerät
GB2374723B (en) * 2001-04-20 2005-04-20 Leo Electron Microscopy Ltd Scanning electron microscope
US20050103272A1 (en) * 2002-02-25 2005-05-19 Leo Elektronenmikroskopie Gmbh Material processing system and method
US6674076B1 (en) 2002-12-12 2004-01-06 Ballard Power Systems Inc. Humidified imaging with an environmental scanning electron microscope
EP1515359A1 (de) * 2003-09-12 2005-03-16 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Kammer mit geringer durch Elektronen stimulierter Desorption
JP4930754B2 (ja) * 2006-01-25 2012-05-16 エスアイアイ・ナノテクノロジー株式会社 荷電粒子ビーム装置
CN101379585B (zh) * 2006-02-02 2011-07-20 电子线技术院株式会社 用于为电子柱维持不同真空度的装置
EP2109873B1 (de) * 2007-02-06 2017-04-05 FEI Company Geladenes teilchenstrahlsystem unter hochdruck
US7863563B2 (en) * 2007-03-08 2011-01-04 International Business Machines Corporation Carbon tube for electron beam application
US7791020B2 (en) * 2008-03-31 2010-09-07 Fei Company Multistage gas cascade amplifier
US8299432B2 (en) * 2008-11-04 2012-10-30 Fei Company Scanning transmission electron microscope using gas amplification
JP5530664B2 (ja) * 2009-06-19 2014-06-25 日本電子株式会社 電子顕微鏡
JP5244730B2 (ja) * 2009-07-31 2013-07-24 株式会社日立ハイテクノロジーズ 低真空走査電子顕微鏡
US9679741B2 (en) 2010-11-09 2017-06-13 Fei Company Environmental cell for charged particle beam system
EP2631929A1 (de) 2012-02-27 2013-08-28 FEI Company Halteranordnung für die Kooperation mit einer Umgebungszelle und Elektronenmikroskop
CN104508791B (zh) 2012-07-30 2017-03-01 Fei 公司 环境扫描电子显微镜气体喷射***
US10340117B2 (en) 2014-09-29 2019-07-02 Hitachi, Ltd. Ion beam device and sample observation method
KR101735696B1 (ko) 2015-07-17 2017-05-25 한국표준과학연구원 주사전자현미경 및 이를 이용한 시료의 관찰 방법
KR101725506B1 (ko) 2015-07-20 2017-04-12 한국표준과학연구원 시료의 광학 이미지를 얻을 수 있는 주사전자현미경
US10262832B2 (en) * 2015-08-18 2019-04-16 Gerasimos Daniel Danilatos Wide field atmospheric scanning electron microscope
CN106680305B (zh) * 2016-11-23 2023-08-04 聚束科技（北京）有限公司 一种真空气氛处理装置、样品观测***及方法
US9934933B1 (en) * 2017-01-19 2018-04-03 Kla-Tencor Corporation Extractor electrode for electron source
US11469072B2 (en) 2021-02-17 2022-10-11 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam apparatus, scanning electron microscope, and method of operating a charged particle beam apparatus

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL109549C (de) * 1952-10-17
US3585349A (en) * 1963-04-15 1971-06-15 Rohr Corp Nonvacuum environmentally controlled electron beam
US4020387A (en) * 1972-02-14 1977-04-26 American Optical Corporation Field emission electron gun
US4720633A (en) * 1986-01-17 1988-01-19 Electro-Scan Corporation Scanning electron microscope for visualization of wet samples
EP0275306B1 (de) * 1986-08-01 1990-10-24 Electro-Scan Corporation Mehrzwecksgasdetektoranordnung fuer elektronmikroskopen
US4823006A (en) * 1987-05-21 1989-04-18 Electroscan Corporation Integrated electron optical/differential pumping/imaging signal detection system for an environmental scanning electron microscope
US5250808A (en) * 1987-05-21 1993-10-05 Electroscan Corporation Integrated electron optical/differential pumping/imaging signal system for an environmental scanning electron microscope
JPH0640475B2 (ja) * 1988-01-25 1994-05-25 日本電子株式会社 電界放出型電子銃
US5079428A (en) * 1989-08-31 1992-01-07 Bell Communications Research, Inc. Electron microscope with an asymmetrical immersion lens
US5150001A (en) * 1990-04-10 1992-09-22 Orchid One Corporation Field emission electron gun and method having complementary passive and active vacuum pumping
US5396067A (en) * 1992-06-11 1995-03-07 Nikon Corporation Scan type electron microscope
US5362964A (en) * 1993-07-30 1994-11-08 Electroscan Corporation Environmental scanning electron microscope
US5412211A (en) * 1993-07-30 1995-05-02 Electroscan Corporation Environmental scanning electron microscope
US5485008A (en) * 1994-06-23 1996-01-16 University Of Maryland, College Park Low magnification gas limiting aperture assembly for electron microscopy devices

Also Published As

Publication number Publication date
JP2002516018A (ja) 2002-05-28
EP0786145A4 (de) 2001-11-28
EP0786145A1 (de) 1997-07-30
WO1997007525A1 (en) 1997-02-27
EP0786145B1 (de) 2004-12-15
US5828064A (en) 1998-10-27
DE69634032T2 (de) 2005-05-19

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8331 Complete revocation