DE69633292D1 - Überschall- und unterschalllaser mit rf-entladungsanregung - Google Patents

Überschall- und unterschalllaser mit rf-entladungsanregung

Info

Publication number
DE69633292D1
DE69633292D1 DE69633292T DE69633292T DE69633292D1 DE 69633292 D1 DE69633292 D1 DE 69633292D1 DE 69633292 T DE69633292 T DE 69633292T DE 69633292 T DE69633292 T DE 69633292T DE 69633292 D1 DE69633292 D1 DE 69633292D1
Authority
DE
Germany
Prior art keywords
transmitter
discharge engineering
underground laser
underground
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69633292T
Other languages
English (en)
Other versions
DE69633292T2 (de
Inventor
Alexander Krasnov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of DE69633292D1 publication Critical patent/DE69633292D1/de
Application granted granted Critical
Publication of DE69633292T2 publication Critical patent/DE69633292T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0979—Gas dynamic lasers, i.e. with expansion of the laser gas medium to supersonic flow speeds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S372/00—Coherent light generators
    • Y10S372/701—Nozzle

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
DE69633292T 1995-09-27 1996-09-26 Überschall- und unterschalllaser mit rf-entladungsanregung Expired - Lifetime DE69633292T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US534796 1990-06-07
US08/534,796 US5682400A (en) 1995-09-27 1995-09-27 Supersonic and subsonic laser with high frequency discharge excitation
PCT/US1996/015400 WO1997012430A1 (en) 1995-09-27 1996-09-26 Supersonic and subsonic laser with rf discharge excitation

Publications (2)

Publication Number Publication Date
DE69633292D1 true DE69633292D1 (de) 2004-10-07
DE69633292T2 DE69633292T2 (de) 2005-02-17

Family

ID=24131572

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69633292T Expired - Lifetime DE69633292T2 (de) 1995-09-27 1996-09-26 Überschall- und unterschalllaser mit rf-entladungsanregung

Country Status (5)

Country Link
US (1) US5682400A (de)
EP (1) EP0852835B1 (de)
JP (1) JP2002502548A (de)
DE (1) DE69633292T2 (de)
WO (1) WO1997012430A1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6198762B1 (en) * 1996-09-26 2001-03-06 Yuri Krasnov Supersonic and subsonic laser with RF discharge excitation
US6636545B2 (en) * 1996-09-26 2003-10-21 Alexander V. Krasnov Supersonic and subsonic laser with radio frequency excitation
US5911832A (en) * 1996-10-10 1999-06-15 Eaton Corporation Plasma immersion implantation with pulsed anode
US6804285B2 (en) 1998-10-29 2004-10-12 Canon Kabushiki Kaisha Gas supply path structure for a gas laser
US6377600B1 (en) 1999-06-03 2002-04-23 Trw Inc. Iodine monochloride/molecular iodine as the iodine source for COIL systems
US7154931B2 (en) * 2004-06-22 2006-12-26 Ksy Corporation Laser with Brayton cycle outlet pump
US8414779B2 (en) * 2006-11-14 2013-04-09 Atlantium Technologies Ltd. Method and apparatus for liquid disinfection using light transparent conduit
US20090285727A1 (en) * 2006-11-14 2009-11-19 Uri Levy Illumination unit for liquid disinfection systems
CN102010024B (zh) * 2006-11-14 2013-12-18 安特兰德技术有限公司 使用光透射导管进行液体消毒的方法和设备
KR20110093878A (ko) * 2008-11-10 2011-08-18 코넬 유니버시티 자가-발전형 압전-표면 탄성파 장치 및 방법
US20170179668A1 (en) * 2014-03-28 2017-06-22 Alexander V. Krasnov Gas Flow Laser
US10619518B2 (en) * 2016-08-15 2020-04-14 Rolls-Royce North American Technologies Inc. Exhaust system with directed energy beam interference avoidance system
US11095088B1 (en) 2018-02-21 2021-08-17 Zoyka Llc Multi-pass coaxial molecular gas laser

Family Cites Families (39)

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US29103A (en) * 1860-07-10 Lathe
US3543179A (en) * 1967-02-01 1970-11-24 Avco Corp Nitrogen laser action with supersonic flow
US3621461A (en) * 1969-09-09 1971-11-16 Us Army Self-pumped electroadiabatic laser
US3694770A (en) * 1970-12-18 1972-09-26 United Aircraft Corp Liquid fuel gas dynamic mixing laser
US3681710A (en) * 1971-05-21 1972-08-01 United Aircraft Corp Gas laser
US3748594A (en) * 1972-06-22 1973-07-24 Avco Corp Radio frequency electrically excited flowing gas laser
US4064465A (en) * 1973-05-30 1977-12-20 Westinghouse Electric Corporation Laser cavities with gas flow through the electrodes
US3946332A (en) * 1974-06-13 1976-03-23 Samis Michael A High power density continuous wave plasma glow jet laser system
FR2632462B1 (fr) * 1975-02-18 1992-01-03 Comp Generale Electricite Dispositif laser a flux gazeux
US4005374A (en) * 1975-03-31 1977-01-25 Xonics, Inc. Pulsed gas laser with low-inductance flow-through electrodes
US3998393A (en) * 1976-01-20 1976-12-21 The United States Of America As Represented By The Secretary Of The Air Force Supersonic diffuser
DE2608305C3 (de) * 1976-02-28 1981-03-26 Deutsche Aerospace AG, 80804 München Verfahren zum Anregen eines gasdynamischen Co↓2-Lasers bei hohen Stagnationstemperaturen und Anordnung zur Durchführung des Verfahrens
US4136317A (en) * 1977-04-13 1979-01-23 The United States Of America As Represented By The Secretary Of The Navy 14 And 16 micron, optically pumped, gas dynamic CO2 laser
US4200819A (en) * 1977-09-21 1980-04-29 The Boeing Company Unitary supersonic electrical discharge laser nozzle-channel
US4206429A (en) * 1977-09-23 1980-06-03 United Technologies Corporation Gas dynamic mixing laser
US4194169A (en) * 1977-11-25 1980-03-18 Calspan Corporation Molecular laser operating on fundamental and overtone bands
US4237428A (en) * 1978-09-01 1980-12-02 The United States Of America As Represented By The Secretary Of The Navy 15.9 Micron acetylene laser
US4251781A (en) * 1979-01-22 1981-02-17 Hughes Aircraft Company Electric discharge-excited flowing gas laser with discharge confinement shield
DE3218875C2 (de) * 1981-06-11 1984-07-26 Messerschmitt-Bölkow-Blohm GmbH, 8000 München Gasdynamischer Laser
US4457000A (en) * 1982-03-03 1984-06-26 Rockwell International Corporation Shock wave suppressing flow plate for pulsed lasers
US4598406A (en) * 1985-01-18 1986-07-01 Texas Instruments Incorporated Pressure-wave cycled, repetitively pulsed gas laser
US4686681A (en) * 1985-08-01 1987-08-11 Hughes Aircraft Company Continuous wave-mid-infrared gas laser utilizing RF excitation
US4805182A (en) * 1986-04-30 1989-02-14 Synrad, Inc. RF-excited, all-metal gas laser
DE3785028T2 (de) * 1986-12-22 1993-07-01 Fanuc Ltd Lasereinheit, angeregt durch hf-entladung.
JPH0787255B2 (ja) * 1986-12-23 1995-09-20 フアナツク株式会社 高周波放電励起レ−ザ装置
SU1674299A1 (ru) * 1987-01-28 1991-08-30 Научно-исследовательский центр по технологическим лазерам АН СССР Лазер на 3Р - 3 S-переходах неона
US4937834A (en) * 1987-07-17 1990-06-26 Fanuc Ltd. High-frequency discharge pumping laser device
US4837772A (en) * 1987-08-14 1989-06-06 Synrad, Inc. Electrically self-oscillating, rf-excited gas laser
JP2509638B2 (ja) * 1987-10-29 1996-06-26 ファナック株式会社 高周波放電励起レ―ザ装置
JP2644315B2 (ja) * 1989-01-23 1997-08-25 ファナック株式会社 高周波放電励起レーザ装置
DE3914923A1 (de) * 1989-05-06 1990-11-08 Heraeus Holding Entladungsvorrichtung
US5153892A (en) * 1990-01-24 1992-10-06 Hitachi, Ltd. High-pressure gas laser apparatus and method of laser processing
US5008894A (en) * 1990-03-30 1991-04-16 Synrad, Incorporated Drive system for RF-excited gas lasers
DE4028053C2 (de) * 1990-09-05 1994-08-18 Deutsche Forsch Luft Raumfahrt Gasdynamischer CO-Laser
DE4028054C2 (de) * 1990-09-05 2001-05-31 Deutsch Zentr Luft & Raumfahrt Gasdynamischer CO-Laser
DE4102123A1 (de) * 1991-01-25 1992-08-06 Deutsche Forsch Luft Raumfahrt Laengsgestroemter gaslaser
DE69200247T2 (de) * 1991-04-23 1994-11-24 Matsushita Electric Ind Co Ltd Entladungsgepumpter Gaslaser mit Baffle-Trennung für kontrollierten Gasfluss an Vorionisierern.
JP2758730B2 (ja) * 1991-04-25 1998-05-28 三菱電機株式会社 放電励起パルスレーザ発振装置
US5313487A (en) * 1991-05-23 1994-05-17 Mitsubishi Denki Kabushiki Kaisha Discharge excitation gas laser apparatus

Also Published As

Publication number Publication date
EP0852835B1 (de) 2004-09-01
EP0852835A1 (de) 1998-07-15
EP0852835A4 (de) 1998-07-29
JP2002502548A (ja) 2002-01-22
DE69633292T2 (de) 2005-02-17
US5682400A (en) 1997-10-28
WO1997012430A1 (en) 1997-04-03

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