DE69620093T2 - Photoempfindliche Harzzusammensetzung und damit laminierter photoempfindlicher Harzfilm - Google Patents
Photoempfindliche Harzzusammensetzung und damit laminierter photoempfindlicher HarzfilmInfo
- Publication number
- DE69620093T2 DE69620093T2 DE1996620093 DE69620093T DE69620093T2 DE 69620093 T2 DE69620093 T2 DE 69620093T2 DE 1996620093 DE1996620093 DE 1996620093 DE 69620093 T DE69620093 T DE 69620093T DE 69620093 T2 DE69620093 T2 DE 69620093T2
- Authority
- DE
- Germany
- Prior art keywords
- photosensitive resin
- laminated
- resin composition
- resin film
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/093—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antistatic means, e.g. for charge depletion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
- B24C1/04—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for treating only selected parts of a surface, e.g. for carving stone or glass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/112—Cellulosic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31565—Next to polyester [polyethylene terephthalate, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31573—Next to addition polymer of ethylenically unsaturated monomer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31573—Next to addition polymer of ethylenically unsaturated monomer
- Y10T428/31576—Ester monomer type [polyvinylacetate, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31573—Next to addition polymer of ethylenically unsaturated monomer
- Y10T428/31587—Hydrocarbon polymer [polyethylene, polybutadiene, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31591—Next to cellulosic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31598—Next to silicon-containing [silicone, cement, etc.] layer
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30392195A JP3498876B2 (ja) | 1995-10-27 | 1995-10-27 | 感光性樹脂組成物及びそれを用いた感光性樹脂積層フィルム |
JP33621795A JP3468959B2 (ja) | 1995-11-30 | 1995-11-30 | 感光性樹脂組成物及びそれを用いた感光性樹脂積層フィルム |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69620093D1 DE69620093D1 (de) | 2002-05-02 |
DE69620093T2 true DE69620093T2 (de) | 2002-11-07 |
Family
ID=26563689
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1996620093 Expired - Fee Related DE69620093T2 (de) | 1995-10-27 | 1996-10-28 | Photoempfindliche Harzzusammensetzung und damit laminierter photoempfindlicher Harzfilm |
Country Status (4)
Country | Link |
---|---|
US (2) | US5776995A (de) |
EP (1) | EP0770923B1 (de) |
DE (1) | DE69620093T2 (de) |
TW (1) | TW475098B (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000066391A (ja) * | 1998-08-17 | 2000-03-03 | Tokyo Ohka Kogyo Co Ltd | サンドブラスト用感光性組成物及びそれを用いた感光性フィルム |
US6177357B1 (en) * | 1999-04-30 | 2001-01-23 | 3M Innovative Properties Company | Method for making flexible circuits |
KR100493961B1 (ko) * | 1999-08-17 | 2005-06-10 | 주식회사 엘지화학 | 감광성 수지 조성물 |
JP2002120152A (ja) * | 2000-07-31 | 2002-04-23 | Fuji Photo Film Co Ltd | 半導体チップ、半導体ウェハ、半導体デバイスおよびその製造方法 |
AU2001284499A1 (en) * | 2000-09-11 | 2002-03-26 | Showa Denko K K | Photosensitive composition, cured article thereof, and printed circuit board using the same |
JP2002148802A (ja) * | 2000-11-07 | 2002-05-22 | Tokyo Ohka Kogyo Co Ltd | サンドブラスト用感光性組成物及びそれを用いた感光性フィルム |
CN100378895C (zh) * | 2001-02-28 | 2008-04-02 | 友达光电股份有限公司 | 等离子显示器的不对称阻隔壁结构的制作方法 |
KR100521999B1 (ko) * | 2002-09-03 | 2005-10-18 | 주식회사 코오롱 | 샌드블래스트 레지스트용 감광성수지 조성물 |
JP3972021B2 (ja) * | 2003-05-28 | 2007-09-05 | 東京応化工業株式会社 | プラズマディスプレイ前面板製造用未焼成積層体およびプラズマディスプレイ前面板の製造方法 |
JP4360242B2 (ja) * | 2004-03-24 | 2009-11-11 | Jsr株式会社 | ネガ型感放射線性樹脂組成物 |
JP4509638B2 (ja) | 2004-04-26 | 2010-07-21 | 東京応化工業株式会社 | 感光性樹脂組成物およびこれを用いた感光性ドライフィルム |
DE102004025684A1 (de) * | 2004-04-29 | 2005-11-17 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip und Verfahren zum Ausbilden einer Kontaktstruktur zur elektrischen Kontaktierung eines optoelektronischen Halbleiterchips |
WO2019124307A1 (ja) * | 2017-12-20 | 2019-06-27 | 住友電気工業株式会社 | プリント配線板の製造方法及び積層体 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2000874B (en) * | 1977-07-12 | 1982-02-17 | Asahi Chemical Ind | Process for producing image and photosensitive element therefor and method of producing printed circuit board |
DE2822190A1 (de) * | 1978-05-20 | 1979-11-22 | Hoechst Ag | Photopolymerisierbares gemisch |
JPS55103554A (en) | 1979-02-02 | 1980-08-07 | Sumitomo Chem Co Ltd | Photosensitive resin composition for sand blast resist |
US4430416A (en) * | 1980-06-27 | 1984-02-07 | Asahi Kasei Kogyo Kabushiki Kaisha | Transfer element for sandblast carving |
US4587186A (en) * | 1982-05-13 | 1986-05-06 | Asahi Kasei Kogyo Kabushiki Kaisha | Mask element for selective sandblasting and a method |
DE3236560A1 (de) * | 1982-10-02 | 1984-04-05 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches schichtuebertragungsmaterial und verfahren zur herstellung einer photoresistschablone |
JPS608100A (ja) * | 1983-06-28 | 1985-01-16 | 旭化成株式会社 | 吹き付け食刻方法 |
US4849321A (en) * | 1985-06-20 | 1989-07-18 | M&T Chemicals Inc. | UV curable compositions for making improved solder mask coatings |
CA1312040C (en) * | 1985-12-19 | 1992-12-29 | Joseph Victor Koleske | Conformal coatings cured with actinic radiation |
US5102774A (en) * | 1986-12-08 | 1992-04-07 | Armstrong World Industries, Inc. | Photoimagable coating compositions which are developable in aqueous alkaline solutions and can be used for solder mask compositions |
US4855077A (en) * | 1988-04-20 | 1989-08-08 | Takiron Co., Ltd. | Sticking agent of ionic-conductive polymer |
JP2562954B2 (ja) | 1988-09-06 | 1996-12-11 | アイセロ化学 株式会社 | 彫食刻マスク用感光性積層フイルム |
US5356754A (en) * | 1992-09-25 | 1994-10-18 | Mitsubishi Rayon Co., Ltd. | Crosslinking curable resin composition |
JPH06161098A (ja) * | 1992-11-20 | 1994-06-07 | Tokyo Ohka Kogyo Co Ltd | サンドブラスト用感光性樹脂組成物及びこれを用いた感光性フィルム |
JP3167812B2 (ja) * | 1992-11-20 | 2001-05-21 | 東京応化工業株式会社 | サンドブラスト用感光性樹脂組成物及びこれを用いた積層フィルム |
US5405731A (en) * | 1992-12-22 | 1995-04-11 | E. I. Du Pont De Nemours And Company | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits |
EP0674225A1 (de) * | 1994-03-16 | 1995-09-27 | Hitachi Chemical Company, Ltd. | Fotoempfindliche Harzzusammensetzung und fotoempfindlicher Film |
JP3638660B2 (ja) * | 1995-05-01 | 2005-04-13 | 松下電器産業株式会社 | 感光性樹脂組成物、それを用いたサンドブラスト用感光性ドライフィルム及びそれを用いた食刻方法 |
-
1996
- 1996-10-24 TW TW85113079A patent/TW475098B/zh not_active IP Right Cessation
- 1996-10-25 US US08/738,079 patent/US5776995A/en not_active Expired - Fee Related
- 1996-10-28 EP EP19960117273 patent/EP0770923B1/de not_active Expired - Lifetime
- 1996-10-28 DE DE1996620093 patent/DE69620093T2/de not_active Expired - Fee Related
-
1997
- 1997-11-17 US US08/971,585 patent/US5919569A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TW475098B (en) | 2002-02-01 |
EP0770923A1 (de) | 1997-05-02 |
EP0770923B1 (de) | 2002-03-27 |
DE69620093D1 (de) | 2002-05-02 |
US5776995A (en) | 1998-07-07 |
US5919569A (en) | 1999-07-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |